JP2011073961A5 - - Google Patents

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Publication number
JP2011073961A5
JP2011073961A5 JP2010193335A JP2010193335A JP2011073961A5 JP 2011073961 A5 JP2011073961 A5 JP 2011073961A5 JP 2010193335 A JP2010193335 A JP 2010193335A JP 2010193335 A JP2010193335 A JP 2010193335A JP 2011073961 A5 JP2011073961 A5 JP 2011073961A5
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JP
Japan
Prior art keywords
glass
temperature
range
titania
tzc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010193335A
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English (en)
Japanese (ja)
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JP2011073961A (ja
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Publication date
Application filed filed Critical
Publication of JP2011073961A publication Critical patent/JP2011073961A/ja
Publication of JP2011073961A5 publication Critical patent/JP2011073961A5/ja
Pending legal-status Critical Current

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JP2010193335A 2009-08-31 2010-08-31 超低膨張ガラスのアニールによるＴｚｃの調節 Pending JP2011073961A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23839409P 2009-08-31 2009-08-31

Publications (2)

Publication Number Publication Date
JP2011073961A JP2011073961A (ja) 2011-04-14
JP2011073961A5 true JP2011073961A5 (https=) 2013-10-03

Family

ID=43525412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010193335A Pending JP2011073961A (ja) 2009-08-31 2010-08-31 超低膨張ガラスのアニールによるＴｚｃの調節

Country Status (3)

Country Link
US (2) US8713969B2 (https=)
JP (1) JP2011073961A (https=)
DE (1) DE102010039924A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5768452B2 (ja) 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
US20130047669A1 (en) 2011-08-31 2013-02-28 Sezhian Annamalai Method of making a silica-titania glass having a ternary doped critical zone
US9034450B2 (en) * 2011-08-31 2015-05-19 Corning Incorporated Binary silica-titania glass articles having a ternary doped silica-titania critical zone
DE102011085358B3 (de) 2011-10-28 2012-07-12 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung
JP6020234B2 (ja) 2012-02-21 2016-11-02 旭硝子株式会社 チタニア含有シリカガラス体の製造方法
US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
US8901019B2 (en) 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
US9505649B2 (en) 2013-09-13 2016-11-29 Corning Incorporated Ultralow expansion glass
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US20150239767A1 (en) * 2014-02-26 2015-08-27 Corning Incorporated HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT
US9382150B2 (en) * 2014-03-14 2016-07-05 Corning Incorporated Boron-doped titania-silica glass having very low CTE slope
WO2018118964A1 (en) 2016-12-21 2018-06-28 Corning Incorporated Sintering system and sintered articles
EP3224213B1 (en) 2014-11-26 2022-03-23 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
WO2016154190A1 (en) 2015-03-26 2016-09-29 Corning Incorporated Glass composite for use in extreme ultra-violet lithography
EP4727901A2 (en) * 2023-06-19 2026-04-22 Corning Incorporated Titania-silica glass with plurality of compositional variation sections

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69634667T2 (de) 1995-09-12 2006-04-27 Corning Inc. Boule-oszillationsmuster für die herstellung von geschmolzenem quarzglas
US5970751A (en) 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
US6931097B1 (en) * 1999-07-22 2005-08-16 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
US6988277B2 (en) 2000-02-08 2006-01-17 Mario Kovac System and method for advertisement sponsored content distribution
US7053017B2 (en) 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP4792705B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
US7155936B2 (en) 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
JP4492123B2 (ja) * 2004-01-05 2010-06-30 旭硝子株式会社 シリカガラス
US20070137253A1 (en) * 2005-12-21 2007-06-21 Beall Lorrie F Reduced striae low expansion glass and elements, and a method for making same
US20070137252A1 (en) 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
DE102007019154B4 (de) * 2007-04-20 2012-07-26 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit
EP2217539A4 (en) 2007-11-30 2015-07-01 Corning Inc LOW DILATION GLASS MATERIAL HAVING A LOW GRADIENT OF EXPANSION POWER
JP5314901B2 (ja) * 2008-02-13 2013-10-16 国立大学法人東北大学 シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法
JP5365247B2 (ja) * 2008-02-25 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP5365248B2 (ja) * 2008-02-26 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP5417884B2 (ja) * 2008-02-27 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP2011162359A (ja) * 2008-05-29 2011-08-25 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
US9505649B2 (en) * 2013-09-13 2016-11-29 Corning Incorporated Ultralow expansion glass

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