JP2011073961A5 - - Google Patents
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- Publication number
- JP2011073961A5 JP2011073961A5 JP2010193335A JP2010193335A JP2011073961A5 JP 2011073961 A5 JP2011073961 A5 JP 2011073961A5 JP 2010193335 A JP2010193335 A JP 2010193335A JP 2010193335 A JP2010193335 A JP 2010193335A JP 2011073961 A5 JP2011073961 A5 JP 2011073961A5
- Authority
- JP
- Japan
- Prior art keywords
- glass
- temperature
- range
- titania
- tzc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 26
- 239000011521 glass Substances 0.000 claims 16
- 238000000034 method Methods 0.000 claims 14
- 238000001816 cooling Methods 0.000 claims 11
- 238000000137 annealing Methods 0.000 claims 5
- 239000005347 annealed glass Substances 0.000 claims 2
- 230000007423 decrease Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 230000014759 maintenance of location Effects 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23839409P | 2009-08-31 | 2009-08-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011073961A JP2011073961A (ja) | 2011-04-14 |
| JP2011073961A5 true JP2011073961A5 (https=) | 2013-10-03 |
Family
ID=43525412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010193335A Pending JP2011073961A (ja) | 2009-08-31 | 2010-08-31 | 超低膨張ガラスのアニールによるＴｚｃの調節 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8713969B2 (https=) |
| JP (1) | JP2011073961A (https=) |
| DE (1) | DE102010039924A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5768452B2 (ja) | 2011-04-11 | 2015-08-26 | 信越化学工業株式会社 | チアニアドープ石英ガラスの製造方法 |
| US9034450B2 (en) | 2011-08-31 | 2015-05-19 | Corning Incorporated | Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
| US20130047669A1 (en) | 2011-08-31 | 2013-02-28 | Sezhian Annamalai | Method of making a silica-titania glass having a ternary doped critical zone |
| DE102011085358B3 (de) * | 2011-10-28 | 2012-07-12 | Carl Zeiss Smt Gmbh | Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung |
| JP6020234B2 (ja) | 2012-02-21 | 2016-11-02 | 旭硝子株式会社 | チタニア含有シリカガラス体の製造方法 |
| US8987155B2 (en) * | 2012-08-30 | 2015-03-24 | Corning Incorporated | Niobium doped silica titania glass and method of preparation |
| US8901019B2 (en) | 2012-11-30 | 2014-12-02 | Corning Incorporated | Very low CTE slope doped silica-titania glass |
| DE102013101328B3 (de) * | 2013-02-11 | 2014-02-13 | Heraeus Quarzglas Gmbh & Co. Kg | Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung |
| US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| US20150239767A1 (en) * | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
| US9382150B2 (en) * | 2014-03-14 | 2016-07-05 | Corning Incorporated | Boron-doped titania-silica glass having very low CTE slope |
| JP2017536323A (ja) | 2014-11-26 | 2017-12-07 | コーニング インコーポレイテッド | 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法 |
| US9822030B2 (en) | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| JP2018513093A (ja) | 2015-03-26 | 2018-05-24 | コーニング インコーポレイテッド | 極紫外線リソグラフィーに使用するためのガラス複合体 |
| CN115181502B (zh) | 2016-12-21 | 2023-09-22 | 康宁股份有限公司 | 烧结系统和烧结制品 |
| WO2024263324A2 (en) * | 2023-06-19 | 2024-12-26 | Corning Incorporated | Titania-silica glass with plurality of compositional variation sections |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997010184A1 (en) | 1995-09-12 | 1997-03-20 | Corning Incorporated | Boule oscillation patterns for producing fused silica glass |
| US5970751A (en) | 1998-09-22 | 1999-10-26 | Corning Incorporated | Fused SiO2 -TiO2 glass method |
| US6931097B1 (en) * | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| AU2001241459A1 (en) | 2000-02-08 | 2001-08-20 | Kovac×Ñ, Mario | System and method for advertisement sponsored content distribution |
| US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| JP5367204B2 (ja) * | 2003-04-03 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造法 |
| US7155936B2 (en) | 2003-08-08 | 2007-01-02 | Corning Incorporated | Doped silica glass articles and methods of forming doped silica glass boules and articles |
| JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
| US20070137253A1 (en) * | 2005-12-21 | 2007-06-21 | Beall Lorrie F | Reduced striae low expansion glass and elements, and a method for making same |
| US20070137252A1 (en) | 2005-12-21 | 2007-06-21 | Maxon John E | Reduced striae low expansion glass and elements, and a method for making same |
| DE102007019154B4 (de) * | 2007-04-20 | 2012-07-26 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit |
| WO2009070223A1 (en) | 2007-11-30 | 2009-06-04 | Corning Incorporated | Low expansion glass material having low expansivity gradient |
| JP5314901B2 (ja) * | 2008-02-13 | 2013-10-16 | 国立大学法人東北大学 | シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法 |
| JP5365247B2 (ja) * | 2008-02-25 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| JP5365248B2 (ja) * | 2008-02-26 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| JP5417884B2 (ja) * | 2008-02-27 | 2014-02-19 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| JP2011162359A (ja) * | 2008-05-29 | 2011-08-25 | Asahi Glass Co Ltd | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| US9505649B2 (en) * | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
-
2010
- 2010-08-26 US US12/868,934 patent/US8713969B2/en active Active
- 2010-08-30 DE DE102010039924A patent/DE102010039924A1/de not_active Withdrawn
- 2010-08-31 JP JP2010193335A patent/JP2011073961A/ja active Pending
-
2014
- 2014-03-13 US US14/208,568 patent/US20140194271A1/en not_active Abandoned
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