JP2010538816A - 基体を大気圧でプラズマで透明コーティングする方法 - Google Patents
基体を大気圧でプラズマで透明コーティングする方法 Download PDFInfo
- Publication number
- JP2010538816A JP2010538816A JP2010524446A JP2010524446A JP2010538816A JP 2010538816 A JP2010538816 A JP 2010538816A JP 2010524446 A JP2010524446 A JP 2010524446A JP 2010524446 A JP2010524446 A JP 2010524446A JP 2010538816 A JP2010538816 A JP 2010538816A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- plasma treatment
- transparent
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Metallurgy (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Ceramic Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Dispersion Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
・高価な真空工程は、しばしば割愛されることができ、このことは、コーティングの製造をたいていより単純にし、かつ経済的により効率的にする。
・前記方法により、大きな幾何学的寸法を有する基体のコーティングがしばしば本質的に単純化される。
・コーティングへのエネルギー供給は、技術水準による方法に比較して、基体に害を及ぼさない程度に限定される。
アルキル:線状及び分枝鎖状のC1〜C8−アルキル、
長鎖アルキル:線状及び分枝鎖状のC5〜C20アルキル
アルケニル:C2〜C6−アルケニル、
シクロアルキル:C3〜C8−シクロアルキル、
アルコキシド/アルコキシ:線状及び分枝鎖状の、C1〜C6−アルコキシ
長鎖のアルコキシド/アルコキシ:線状及び分枝鎖状のC5〜C20アルコキシ
アリール:300Da未満の分子量を有する芳香族化合物から選択される。
置換ポリエーテル:R2−(O−CH2−CH(R1))n−OR3及びR2−(O−CH2−CH(R2))n−R3を有する群から選択される、ここで、R1、R2、R3は独立して水素、アルキル、長鎖アルキル、アリール、ハロゲンから選択されており、かつnは1〜250である。
エーテル:化合物R1−O−R2、ここで、それぞれR1及びR2は独立して水素、ハロゲン、アルキル、シクロアルキル、アリール、長鎖アルキルを有する群から選択されている。
アルキル:線状及び分枝鎖状のC1〜C6−アルキル、
アルケニル:C3〜C6−アルケニル、
シクロアルキル:C6〜C8−シクロアルキル、
アルコキシ、アルコキシド:C1〜C4−アルコキシ、特にイソプロピルオキシド
長鎖アルコキシ:線状及び分枝鎖状のC5〜C10アルコキシ、好ましくは線状のC6〜C8アルコキシ
ポリエーテル:H−(O−CH2−CH(R))n−OH及びH−(O−CH2−CH(R))n−Hを有する群から選択される、ここで、Rは独立して水素、アルキル、アリール、ハロゲンから選択されており、かつnは10〜250である。
・前記コーティングは、ヒトの眼には本質的に均質であり、かつ多くの用途には、唯一のコーティングで十分である(前記の多層系の場合以外)。
・製造されたコーティング(もしくは"多層コーティング"の場合にそれぞれ個々の下層)の厚さは、− 以下にさらに記載されるように − 多くの用途の場合に≧50〜≦500nmの範囲内である。これは、故に、熱的及び機械的な応力(特に曲げ負荷)に対して大幅に非感受性であり、かつ部品寸法及び許容差に非本質的に影響を及ぼすに過ぎない。
・光学機器
・眼鏡
・自動車技術におけるヘッドライトケーシング
・特に自動車技術における、窓ガラス(Scheiben)
・コックピットキャノピー
・表示板(Schilder)
・オートミラー
・太陽電池、特にフレキシブルな太陽電池
のための、本発明によるコーティング及び/又は本発明による光学部品の使用に関する。
スクラッチ試験/曇り
前記コーティングの機械的安定性を、次のようにして測定した:
一端を、粘着テープを用いてスチールウール1つ(タイプ00=極めて微細)が固定されている180gの重さのハンマーを、試料側あたり4回、別の垂直の力を作用させることなく、それぞれのコーティングの上で引いた。引く方向は特に図2に示されている。
Claims (10)
- プラズマ処理を特徴とする、特に透明な基体用の、透明なコーティングを処理する方法。
- プラズマ処理を大気圧プラズマとして実施する、請求項1記載の方法。
- プラズマ処理を、≧2bar〜≦8barのプロセスガス圧で実施する、請求項1又は2記載の方法。
- プラズマ処理を、コーティングへのエネルギー供給が50W/cm2〜≦250W/cm2であるように実施する、請求項1から3までのいずれか1項記載の方法。
- 前記処理が、硬化及び/又は架橋を含む、請求項1から4までのいずれか1項記載の方法。
- 請求項1から5までのいずれか1項記載の方法により製造された、コーティング。
- 透明な基体並びに前記基体に施与された及び/又は配置された請求項1から6までのいずれか1項記載のコーティングを含む、光学部品。
- 前記基体が、ガラス、好ましくはポリカーボネート、ポリアクリル、PET、PEN、COC、PES、PSU、金属、透明な熱硬化性材料、特にエポキシド及びアクリラート及びこれらの混合物を有する群から選択される、透明なプラスチック、並びにこれらの混合物を有する群から選択されている、請求項7記載の光学部品。
- コーティングが、3層−反射防止コーティングである及び/又は含む、請求項7記載の光学部品。
- ・光学機器
・眼鏡
・自動車技術におけるヘッドライトケーシング
・特に自動車技術における、窓ガラス(Scheiben)
・コックピットキャノピー
・表示板(Schilder)
・オートミラー
・太陽電池、特にフレキシブルな太陽電池
のための、請求項6記載のコーティング並びに請求項7から9までのいずれか1項記載の光学部品の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007043650.7 | 2007-09-13 | ||
DE102007043650A DE102007043650A1 (de) | 2007-09-13 | 2007-09-13 | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
PCT/EP2008/061186 WO2009037073A1 (de) | 2007-09-13 | 2008-08-27 | Verfahren zur transparenten beschichtung von einem substrat mit plasma bei atmosphärendruck |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010538816A true JP2010538816A (ja) | 2010-12-16 |
JP2010538816A5 JP2010538816A5 (ja) | 2012-05-17 |
JP5264914B2 JP5264914B2 (ja) | 2013-08-14 |
Family
ID=39970871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010524446A Expired - Fee Related JP5264914B2 (ja) | 2007-09-13 | 2008-08-27 | 基体を大気圧でプラズマで透明コーティングする方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8632859B2 (ja) |
EP (1) | EP2188224A1 (ja) |
JP (1) | JP5264914B2 (ja) |
CN (1) | CN101815686A (ja) |
DE (1) | DE102007043650A1 (ja) |
WO (1) | WO2009037073A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011502181A (ja) * | 2007-09-13 | 2011-01-20 | シーメンス アクチエンゲゼルシヤフト | 改善された光学的性質を有する透明な基体材料用の透明な多孔質SiO2コーティング |
US9487475B2 (en) | 2012-11-09 | 2016-11-08 | Mitsui Chemicals, Inc. | Preparation method of aldehyde compound with limited amount of acrylonitrile |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012111710B4 (de) * | 2012-12-03 | 2014-12-11 | Ernst-Moritz-Arndt-Universität Greifswald | Verfa zur Plasmabehandlung einer kolloidalen Lösung und Anwendung des Verfahrens |
FR3028778B1 (fr) * | 2014-11-26 | 2019-04-12 | Glass Surface Technology | Procede de fabrication d'une couche de revetement de la face interne d'un recipient et recipient obtenu avec un tel procede |
CN112960910A (zh) * | 2021-01-29 | 2021-06-15 | 深圳市宏海福新材料有限公司 | 一种长效易洁防雾玻璃镜片及其制作方法 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5265575A (en) * | 1975-11-21 | 1977-05-31 | Us Government | Method of protection of surface of plastic material |
JPH0673208A (ja) * | 1991-09-25 | 1994-03-15 | Matsushita Electric Works Ltd | 表面の改質方法 |
JPH11335844A (ja) * | 1998-04-29 | 1999-12-07 | Microcoating Technol Inc | 化学気相成長装置 |
JP2002080970A (ja) * | 2000-09-08 | 2002-03-22 | Sekisui Chem Co Ltd | 反射防止層を有する光学物品の製造方法 |
JP2003161807A (ja) * | 2001-11-27 | 2003-06-06 | Konica Corp | 反射防止フィルムの製造方法 |
JP2004107788A (ja) * | 2002-07-26 | 2004-04-08 | Kobe Steel Ltd | シリコン酸化薄膜またはチタン酸化薄膜の製造方法 |
JP2005120355A (ja) * | 2003-09-25 | 2005-05-12 | Jsr Corp | 膜形成用組成物、膜の形成方法およびシリカ系膜 |
JP2006503686A (ja) * | 2002-07-30 | 2006-02-02 | サン−ゴバン グラス フランス | 常圧cvdによるチタニアコーティング |
JP2006098527A (ja) * | 2004-09-28 | 2006-04-13 | Dainippon Printing Co Ltd | パターン形成体の製造方法 |
WO2006129461A1 (ja) * | 2005-06-01 | 2006-12-07 | Konica Minolta Holdings, Inc. | 薄膜形成方法及び透明導電膜 |
JP2007031550A (ja) * | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | 大気圧プラズマ表面処理方法 |
WO2007023658A1 (ja) * | 2005-08-25 | 2007-03-01 | Matsushita Electric Industrial Co., Ltd. | ガラス膜およびその製造方法、ならびに光学電子デバイス |
JP2008514813A (ja) * | 2004-09-27 | 2008-05-08 | ダウ グローバル テクノロジーズ インコーポレーテッド | プラズマ強化化学蒸着による多層被膜 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69327420T2 (de) | 1992-03-31 | 2000-05-11 | Canon Kk | Antireflex-Beschichtung |
DE10209667B4 (de) | 2002-03-05 | 2005-06-02 | Sächsisches Textilforschungsinstitut e.V. | Verfahren zur Oberflächenmodifizierung textiler Filtermedien durch Sol-Gel-Behandlung |
DE10239875B4 (de) | 2002-08-29 | 2008-11-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen |
TW200415726A (en) * | 2002-12-05 | 2004-08-16 | Adv Lcd Tech Dev Ct Co Ltd | Plasma processing apparatus and plasma processing method |
DE102004029911B4 (de) | 2003-06-20 | 2006-11-23 | Innovent E.V. Technologieentwicklung | Verfahren und Anordnung zur Herstellung anorganischer Schichten |
US7462678B2 (en) | 2003-09-25 | 2008-12-09 | Jsr Corporation | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
US20060128563A1 (en) | 2004-12-09 | 2006-06-15 | Flabeg Gmbh & Co., Kg | Method for manufacturing a non-fogging element and device for activating such an element |
DE102005007825B4 (de) | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
DE102005020510A1 (de) * | 2005-04-29 | 2006-11-09 | Basf Ag | Verbundelement, insbesondere Fensterscheibe |
FI20060178L (fi) | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | Pinnoitusmenetelmä |
US8077801B2 (en) | 2007-01-10 | 2011-12-13 | Qualcomm Incorporated | Pilot structure with multiplexed unicast and SFN transmissions |
-
2007
- 2007-09-13 DE DE102007043650A patent/DE102007043650A1/de not_active Ceased
-
2008
- 2008-08-27 EP EP08803253A patent/EP2188224A1/de not_active Withdrawn
- 2008-08-27 JP JP2010524446A patent/JP5264914B2/ja not_active Expired - Fee Related
- 2008-08-27 WO PCT/EP2008/061186 patent/WO2009037073A1/de active Application Filing
- 2008-08-27 US US12/733,681 patent/US8632859B2/en not_active Expired - Fee Related
- 2008-08-27 CN CN200880106714A patent/CN101815686A/zh active Pending
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5265575A (en) * | 1975-11-21 | 1977-05-31 | Us Government | Method of protection of surface of plastic material |
JPH0673208A (ja) * | 1991-09-25 | 1994-03-15 | Matsushita Electric Works Ltd | 表面の改質方法 |
JPH11335844A (ja) * | 1998-04-29 | 1999-12-07 | Microcoating Technol Inc | 化学気相成長装置 |
JP2002080970A (ja) * | 2000-09-08 | 2002-03-22 | Sekisui Chem Co Ltd | 反射防止層を有する光学物品の製造方法 |
JP2003161807A (ja) * | 2001-11-27 | 2003-06-06 | Konica Corp | 反射防止フィルムの製造方法 |
JP2004107788A (ja) * | 2002-07-26 | 2004-04-08 | Kobe Steel Ltd | シリコン酸化薄膜またはチタン酸化薄膜の製造方法 |
JP2006503686A (ja) * | 2002-07-30 | 2006-02-02 | サン−ゴバン グラス フランス | 常圧cvdによるチタニアコーティング |
JP2005120355A (ja) * | 2003-09-25 | 2005-05-12 | Jsr Corp | 膜形成用組成物、膜の形成方法およびシリカ系膜 |
JP2008514813A (ja) * | 2004-09-27 | 2008-05-08 | ダウ グローバル テクノロジーズ インコーポレーテッド | プラズマ強化化学蒸着による多層被膜 |
JP2006098527A (ja) * | 2004-09-28 | 2006-04-13 | Dainippon Printing Co Ltd | パターン形成体の製造方法 |
WO2006129461A1 (ja) * | 2005-06-01 | 2006-12-07 | Konica Minolta Holdings, Inc. | 薄膜形成方法及び透明導電膜 |
JP2007031550A (ja) * | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | 大気圧プラズマ表面処理方法 |
WO2007023658A1 (ja) * | 2005-08-25 | 2007-03-01 | Matsushita Electric Industrial Co., Ltd. | ガラス膜およびその製造方法、ならびに光学電子デバイス |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011502181A (ja) * | 2007-09-13 | 2011-01-20 | シーメンス アクチエンゲゼルシヤフト | 改善された光学的性質を有する透明な基体材料用の透明な多孔質SiO2コーティング |
US8734954B2 (en) | 2007-09-13 | 2014-05-27 | Siemens Aktiengesellschaft | Transparent porous SiO2-coating for a transparent substrate material having improved optical properties |
US9487475B2 (en) | 2012-11-09 | 2016-11-08 | Mitsui Chemicals, Inc. | Preparation method of aldehyde compound with limited amount of acrylonitrile |
Also Published As
Publication number | Publication date |
---|---|
US8632859B2 (en) | 2014-01-21 |
DE102007043650A1 (de) | 2009-04-02 |
EP2188224A1 (de) | 2010-05-26 |
JP5264914B2 (ja) | 2013-08-14 |
US20100213164A1 (en) | 2010-08-26 |
WO2009037073A1 (de) | 2009-03-26 |
CN101815686A (zh) | 2010-08-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8277899B2 (en) | Porous films by backfilling with reactive compounds | |
JP3628692B2 (ja) | 高屈折率を有する複合材料、該複合材料の製造方法及び該複合材料を含む光学活性材料 | |
JP4107050B2 (ja) | コーティング材組成物及びそれにより形成された被膜を有する物品 | |
JP5835324B2 (ja) | 水蒸気バリアフィルム、及びその製造方法、並びにこれを用いた電子機器 | |
EA024640B1 (ru) | Способ изготовления стойкого к истиранию оптического изделия | |
AU2003299829A1 (en) | Rapid, thermally cured, back side mar resistant and antireflective coating for ophthalmic lenses | |
TW201543068A (zh) | 光學元件 | |
JP5264914B2 (ja) | 基体を大気圧でプラズマで透明コーティングする方法 | |
JP4247354B2 (ja) | 表面微細凹凸組織の低温形成法および当該組織を有する基体 | |
JPH10279362A (ja) | SiO2系セラミックス膜の形成方法 | |
JP4251093B2 (ja) | 照明装置 | |
JPH11166157A (ja) | コーティング組成物及びシリカ系セラミックス膜の製造方法 | |
WO2015037513A1 (ja) | 撥水性ガラスおよびその製造方法、ならびにそれを用いた撥水性フィルム | |
JP6433110B2 (ja) | 光学用部材及びその製造方法 | |
JP6877866B2 (ja) | 反射防止膜を有する光学部材及びその反射防止膜の製造方法 | |
KR101445437B1 (ko) | 반사방지필름 및 그의 제조방법 | |
JP2594042B2 (ja) | 反射防止膜 | |
CN115093131A (zh) | 一种具有隔热保温功能的镀膜玻璃及其制备方法 | |
JP6826363B2 (ja) | 反射防止膜の製造方法 | |
JP5919028B2 (ja) | 鱗片状の金属酸化物微粒子を含む硬化層を形成する方法 | |
JP2000160098A (ja) | コーティング溶液、光学機能性膜及び反射防止膜フィルム | |
JP5366953B2 (ja) | 改善された光学的性質を有する透明な基体材料用の透明な多孔質SiO2コーティング | |
JP7176819B2 (ja) | ガラス類似フィルム | |
JPH08319109A (ja) | 無機質組成物及び積層体の製造方法 | |
JP2002148402A (ja) | 光学物品及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101228 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111115 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111118 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120220 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120227 |
|
A524 | Written submission of copy of amendment under section 19 (pct) |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20120319 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121207 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130306 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130401 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130430 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |