JP2010538816A - 基体を大気圧でプラズマで透明コーティングする方法 - Google Patents
基体を大気圧でプラズマで透明コーティングする方法 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 59
- 239000011248 coating agent Substances 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 title claims description 26
- 238000009832 plasma treatment Methods 0.000 claims abstract description 25
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 9
- 239000004417 polycarbonate Substances 0.000 claims description 8
- 229920000515 polycarbonate Polymers 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 5
- 229920003023 plastic Polymers 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 238000004132 cross linking Methods 0.000 claims description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 2
- 239000006117 anti-reflective coating Substances 0.000 claims description 2
- 150000002118 epoxides Chemical class 0.000 claims description 2
- 239000005357 flat glass Substances 0.000 claims description 2
- -1 polyacrylic Polymers 0.000 claims description 2
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 abstract description 6
- 125000000217 alkyl group Chemical group 0.000 description 13
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 229920000570 polyether Polymers 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- 150000004703 alkoxides Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004171 alkoxy aryl group Chemical group 0.000 description 1
- 125000005741 alkyl alkenyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G02B1/11—Anti-reflection coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
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- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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Abstract
Description
・高価な真空工程は、しばしば割愛されることができ、このことは、コーティングの製造をたいていより単純にし、かつ経済的により効率的にする。
・前記方法により、大きな幾何学的寸法を有する基体のコーティングがしばしば本質的に単純化される。
・コーティングへのエネルギー供給は、技術水準による方法に比較して、基体に害を及ぼさない程度に限定される。
アルキル:線状及び分枝鎖状のC1〜C8−アルキル、
長鎖アルキル:線状及び分枝鎖状のC5〜C20アルキル
アルケニル:C2〜C6−アルケニル、
シクロアルキル:C3〜C8−シクロアルキル、
アルコキシド/アルコキシ:線状及び分枝鎖状の、C1〜C6−アルコキシ
長鎖のアルコキシド/アルコキシ:線状及び分枝鎖状のC5〜C20アルコキシ
アリール:300Da未満の分子量を有する芳香族化合物から選択される。
置換ポリエーテル:R2−(O−CH2−CH(R1))n−OR3及びR2−(O−CH2−CH(R2))n−R3を有する群から選択される、ここで、R1、R2、R3は独立して水素、アルキル、長鎖アルキル、アリール、ハロゲンから選択されており、かつnは1〜250である。
エーテル:化合物R1−O−R2、ここで、それぞれR1及びR2は独立して水素、ハロゲン、アルキル、シクロアルキル、アリール、長鎖アルキルを有する群から選択されている。
アルキル:線状及び分枝鎖状のC1〜C6−アルキル、
アルケニル:C3〜C6−アルケニル、
シクロアルキル:C6〜C8−シクロアルキル、
アルコキシ、アルコキシド:C1〜C4−アルコキシ、特にイソプロピルオキシド
長鎖アルコキシ:線状及び分枝鎖状のC5〜C10アルコキシ、好ましくは線状のC6〜C8アルコキシ
ポリエーテル:H−(O−CH2−CH(R))n−OH及びH−(O−CH2−CH(R))n−Hを有する群から選択される、ここで、Rは独立して水素、アルキル、アリール、ハロゲンから選択されており、かつnは10〜250である。
・前記コーティングは、ヒトの眼には本質的に均質であり、かつ多くの用途には、唯一のコーティングで十分である(前記の多層系の場合以外)。
・製造されたコーティング(もしくは"多層コーティング"の場合にそれぞれ個々の下層)の厚さは、− 以下にさらに記載されるように − 多くの用途の場合に≧50〜≦500nmの範囲内である。これは、故に、熱的及び機械的な応力(特に曲げ負荷)に対して大幅に非感受性であり、かつ部品寸法及び許容差に非本質的に影響を及ぼすに過ぎない。
・光学機器
・眼鏡
・自動車技術におけるヘッドライトケーシング
・特に自動車技術における、窓ガラス(Scheiben)
・コックピットキャノピー
・表示板(Schilder)
・オートミラー
・太陽電池、特にフレキシブルな太陽電池
のための、本発明によるコーティング及び/又は本発明による光学部品の使用に関する。
スクラッチ試験/曇り
前記コーティングの機械的安定性を、次のようにして測定した:
一端を、粘着テープを用いてスチールウール1つ(タイプ00=極めて微細)が固定されている180gの重さのハンマーを、試料側あたり4回、別の垂直の力を作用させることなく、それぞれのコーティングの上で引いた。引く方向は特に図2に示されている。
Claims (10)
- プラズマ処理を特徴とする、特に透明な基体用の、透明なコーティングを処理する方法。
- プラズマ処理を大気圧プラズマとして実施する、請求項1記載の方法。
- プラズマ処理を、≧2bar〜≦8barのプロセスガス圧で実施する、請求項1又は2記載の方法。
- プラズマ処理を、コーティングへのエネルギー供給が50W/cm2〜≦250W/cm2であるように実施する、請求項1から3までのいずれか1項記載の方法。
- 前記処理が、硬化及び/又は架橋を含む、請求項1から4までのいずれか1項記載の方法。
- 請求項1から5までのいずれか1項記載の方法により製造された、コーティング。
- 透明な基体並びに前記基体に施与された及び/又は配置された請求項1から6までのいずれか1項記載のコーティングを含む、光学部品。
- 前記基体が、ガラス、好ましくはポリカーボネート、ポリアクリル、PET、PEN、COC、PES、PSU、金属、透明な熱硬化性材料、特にエポキシド及びアクリラート及びこれらの混合物を有する群から選択される、透明なプラスチック、並びにこれらの混合物を有する群から選択されている、請求項7記載の光学部品。
- コーティングが、3層−反射防止コーティングである及び/又は含む、請求項7記載の光学部品。
- ・光学機器
・眼鏡
・自動車技術におけるヘッドライトケーシング
・特に自動車技術における、窓ガラス(Scheiben)
・コックピットキャノピー
・表示板(Schilder)
・オートミラー
・太陽電池、特にフレキシブルな太陽電池
のための、請求項6記載のコーティング並びに請求項7から9までのいずれか1項記載の光学部品の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007043650A DE102007043650A1 (de) | 2007-09-13 | 2007-09-13 | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
DE102007043650.7 | 2007-09-13 | ||
PCT/EP2008/061186 WO2009037073A1 (de) | 2007-09-13 | 2008-08-27 | Verfahren zur transparenten beschichtung von einem substrat mit plasma bei atmosphärendruck |
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EP (1) | EP2188224A1 (ja) |
JP (1) | JP5264914B2 (ja) |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011502181A (ja) * | 2007-09-13 | 2011-01-20 | シーメンス アクチエンゲゼルシヤフト | 改善された光学的性質を有する透明な基体材料用の透明な多孔質SiO2コーティング |
US9487475B2 (en) | 2012-11-09 | 2016-11-08 | Mitsui Chemicals, Inc. | Preparation method of aldehyde compound with limited amount of acrylonitrile |
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DE102012111710B4 (de) * | 2012-12-03 | 2014-12-11 | Ernst-Moritz-Arndt-Universität Greifswald | Verfa zur Plasmabehandlung einer kolloidalen Lösung und Anwendung des Verfahrens |
FR3028778B1 (fr) * | 2014-11-26 | 2019-04-12 | Glass Surface Technology | Procede de fabrication d'une couche de revetement de la face interne d'un recipient et recipient obtenu avec un tel procede |
CN112960910A (zh) * | 2021-01-29 | 2021-06-15 | 深圳市宏海福新材料有限公司 | 一种长效易洁防雾玻璃镜片及其制作方法 |
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Also Published As
Publication number | Publication date |
---|---|
DE102007043650A1 (de) | 2009-04-02 |
JP5264914B2 (ja) | 2013-08-14 |
CN101815686A (zh) | 2010-08-25 |
EP2188224A1 (de) | 2010-05-26 |
US20100213164A1 (en) | 2010-08-26 |
US8632859B2 (en) | 2014-01-21 |
WO2009037073A1 (de) | 2009-03-26 |
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