JP5264914B2 - 基体を大気圧でプラズマで透明コーティングする方法 - Google Patents
基体を大気圧でプラズマで透明コーティングする方法 Download PDFInfo
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- JP5264914B2 JP5264914B2 JP2010524446A JP2010524446A JP5264914B2 JP 5264914 B2 JP5264914 B2 JP 5264914B2 JP 2010524446 A JP2010524446 A JP 2010524446A JP 2010524446 A JP2010524446 A JP 2010524446A JP 5264914 B2 JP5264914 B2 JP 5264914B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/256—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Thermal Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Dispersion Chemistry (AREA)
- Ceramic Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
Description
・高価な真空工程は、しばしば割愛されることができ、このことは、コーティングの製造をたいていより単純にし、かつ経済的により効率的にする。
・前記方法により、大きな幾何学的寸法を有する基体のコーティングがしばしば本質的に単純化される。
・コーティングへのエネルギー供給は、技術水準による方法に比較して、基体に害を及ぼさない程度に限定される。
アルキル:線状及び分枝鎖状のC1〜C8−アルキル、
長鎖アルキル:線状及び分枝鎖状のC5〜C20アルキル
アルケニル:C2〜C6−アルケニル、
シクロアルキル:C3〜C8−シクロアルキル、
アルコキシド/アルコキシ:線状及び分枝鎖状の、C1〜C6−アルコキシ
長鎖のアルコキシド/アルコキシ:線状及び分枝鎖状のC5〜C20アルコキシ
アリール:300Da未満の分子量を有する芳香族化合物から選択される。
置換ポリエーテル:R2−(O−CH2−CH(R1))n−OR3及びR2−(O−CH2−CH(R2))n−R3を有する群から選択される、ここで、R1、R2、R3は独立して水素、アルキル、長鎖アルキル、アリール、ハロゲンから選択されており、かつnは1〜250である。
エーテル:化合物R1−O−R2、ここで、それぞれR1及びR2は独立して水素、ハロゲン、アルキル、シクロアルキル、アリール、長鎖アルキルを有する群から選択されている。
アルキル:線状及び分枝鎖状のC1〜C6−アルキル、
アルケニル:C3〜C6−アルケニル、
シクロアルキル:C6〜C8−シクロアルキル、
アルコキシ、アルコキシド:C1〜C4−アルコキシ、特にイソプロピルオキシド
長鎖アルコキシ:線状及び分枝鎖状のC5〜C10アルコキシ、好ましくは線状のC6〜C8アルコキシ
ポリエーテル:H−(O−CH2−CH(R))n−OH及びH−(O−CH2−CH(R))n−Hを有する群から選択される、ここで、Rは独立して水素、アルキル、アリール、ハロゲンから選択されており、かつnは10〜250である。
・前記コーティングは、ヒトの眼には本質的に均質であり、かつ多くの用途には、唯一のコーティングで十分である(前記の多層系の場合以外)。
・製造されたコーティング(もしくは"多層コーティング"の場合にそれぞれ個々の下層)の厚さは、− 以下にさらに記載されるように − 多くの用途の場合に50nm以上500nm以下の範囲内である。これは、故に、熱的及び機械的な応力(特に曲げ負荷)に対して大幅に非感受性であり、かつ部品寸法及び許容差に非本質的に影響を及ぼすに過ぎない。
・光学機器
・眼鏡
・自動車技術におけるヘッドライトケーシング
・特に自動車技術における、窓ガラス(Scheiben)
・コックピットキャノピー
・表示板(Schilder)
・オートミラー
・太陽電池、特にフレキシブルな太陽電池
のための、本発明によるコーティング及び/又は本発明による光学部品の使用に関する。
スクラッチ試験/曇り
前記コーティングの機械的安定性を、次のようにして測定した:
一端を、粘着テープを用いてスチールウール1つ(タイプ00=極めて微細)が固定されている180gの重さのハンマーを、試料側あたり4回、別の垂直の力を作用させることなく、それぞれのコーティングの上で引いた。引く方向は特に図2に示されている。
Claims (3)
- プラズマ処理を特徴とする、透明なコーティングを処理する方法であって、プラズマ処理を、2bar以上8bar以下のプロセスガス圧で実施し、かつ前記プラズマ処理の前にゾル−ゲルプロセスを実施する、透明なコーティングを処理する方法。
- プラズマ処理を、コーティングへのエネルギー供給が50W/cm2 以上250W/cm2 以下であるように実施する、請求項1記載の方法。
- 前記処理が、硬化及び/又は架橋を含む、請求項1又は2記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007043650.7 | 2007-09-13 | ||
DE102007043650A DE102007043650A1 (de) | 2007-09-13 | 2007-09-13 | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
PCT/EP2008/061186 WO2009037073A1 (de) | 2007-09-13 | 2008-08-27 | Verfahren zur transparenten beschichtung von einem substrat mit plasma bei atmosphärendruck |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010538816A JP2010538816A (ja) | 2010-12-16 |
JP2010538816A5 JP2010538816A5 (ja) | 2012-05-17 |
JP5264914B2 true JP5264914B2 (ja) | 2013-08-14 |
Family
ID=39970871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010524446A Expired - Fee Related JP5264914B2 (ja) | 2007-09-13 | 2008-08-27 | 基体を大気圧でプラズマで透明コーティングする方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8632859B2 (ja) |
EP (1) | EP2188224A1 (ja) |
JP (1) | JP5264914B2 (ja) |
CN (1) | CN101815686A (ja) |
DE (1) | DE102007043650A1 (ja) |
WO (1) | WO2009037073A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007043653A1 (de) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Transparente poröse SiO2-Beschichtung für ein transparentes Substratmaterial mit verbesserten optischen Eigenschaften |
WO2014073664A1 (ja) | 2012-11-09 | 2014-05-15 | 三井化学株式会社 | アルデヒド化合物の製造方法 |
DE102012111710B4 (de) * | 2012-12-03 | 2014-12-11 | Ernst-Moritz-Arndt-Universität Greifswald | Verfa zur Plasmabehandlung einer kolloidalen Lösung und Anwendung des Verfahrens |
FR3028778B1 (fr) * | 2014-11-26 | 2019-04-12 | Glass Surface Technology | Procede de fabrication d'une couche de revetement de la face interne d'un recipient et recipient obtenu avec un tel procede |
CN112960910A (zh) * | 2021-01-29 | 2021-06-15 | 深圳市宏海福新材料有限公司 | 一种长效易洁防雾玻璃镜片及其制作方法 |
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CA1077787A (en) * | 1975-11-21 | 1980-05-20 | National Aeronautics And Space Administration | Abrasion resistant coatings for plastic surfaces |
JP2698005B2 (ja) * | 1991-09-25 | 1998-01-19 | 松下電工株式会社 | 表面の改質方法 |
DE69327420T2 (de) | 1992-03-31 | 2000-05-11 | Canon Kk | Antireflex-Beschichtung |
US6368665B1 (en) | 1998-04-29 | 2002-04-09 | Microcoating Technologies, Inc. | Apparatus and process for controlled atmosphere chemical vapor deposition |
JP2002080970A (ja) * | 2000-09-08 | 2002-03-22 | Sekisui Chem Co Ltd | 反射防止層を有する光学物品の製造方法 |
JP4066647B2 (ja) * | 2001-11-27 | 2008-03-26 | コニカミノルタホールディングス株式会社 | 反射防止フィルムの製造方法 |
DE10209667B4 (de) | 2002-03-05 | 2005-06-02 | Sächsisches Textilforschungsinstitut e.V. | Verfahren zur Oberflächenmodifizierung textiler Filtermedien durch Sol-Gel-Behandlung |
JP4133353B2 (ja) | 2002-07-26 | 2008-08-13 | 株式会社神戸製鋼所 | シリコン酸化薄膜またはチタン酸化薄膜の製造方法 |
GB0217553D0 (en) * | 2002-07-30 | 2002-09-11 | Sheel David W | Titania coatings by CVD at atmospheric pressure |
DE10239875B4 (de) | 2002-08-29 | 2008-11-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen |
TW200415726A (en) * | 2002-12-05 | 2004-08-16 | Adv Lcd Tech Dev Ct Co Ltd | Plasma processing apparatus and plasma processing method |
DE102004029911B4 (de) | 2003-06-20 | 2006-11-23 | Innovent E.V. Technologieentwicklung | Verfahren und Anordnung zur Herstellung anorganischer Schichten |
US7462678B2 (en) | 2003-09-25 | 2008-12-09 | Jsr Corporation | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
JP2005120355A (ja) * | 2003-09-25 | 2005-05-12 | Jsr Corp | 膜形成用組成物、膜の形成方法およびシリカ系膜 |
FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
CA2578354A1 (en) * | 2004-09-27 | 2006-04-06 | Dow Global Technologies Inc. | Multilayer coatings by plasma enhanced chemical vapor deposition |
JP4641774B2 (ja) * | 2004-09-28 | 2011-03-02 | 大日本印刷株式会社 | パターン形成体の製造方法 |
US20060128563A1 (en) | 2004-12-09 | 2006-06-15 | Flabeg Gmbh & Co., Kg | Method for manufacturing a non-fogging element and device for activating such an element |
DE102005007825B4 (de) | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
DE102005020510A1 (de) * | 2005-04-29 | 2006-11-09 | Basf Ag | Verbundelement, insbesondere Fensterscheibe |
US20090081412A1 (en) * | 2005-06-01 | 2009-03-26 | Konica Minolta Holdings, Inc. | Thin film forming method and transparent conductive film |
JP2007031550A (ja) * | 2005-07-26 | 2007-02-08 | Menicon Co Ltd | 大気圧プラズマ表面処理方法 |
JPWO2007023658A1 (ja) * | 2005-08-25 | 2009-03-26 | パナソニック株式会社 | ガラス膜およびその製造方法、ならびに光学電子デバイス |
FI20060178L (fi) | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | Pinnoitusmenetelmä |
US8077801B2 (en) | 2007-01-10 | 2011-12-13 | Qualcomm Incorporated | Pilot structure with multiplexed unicast and SFN transmissions |
-
2007
- 2007-09-13 DE DE102007043650A patent/DE102007043650A1/de not_active Ceased
-
2008
- 2008-08-27 EP EP08803253A patent/EP2188224A1/de not_active Withdrawn
- 2008-08-27 JP JP2010524446A patent/JP5264914B2/ja not_active Expired - Fee Related
- 2008-08-27 WO PCT/EP2008/061186 patent/WO2009037073A1/de active Application Filing
- 2008-08-27 US US12/733,681 patent/US8632859B2/en not_active Expired - Fee Related
- 2008-08-27 CN CN200880106714A patent/CN101815686A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
US8632859B2 (en) | 2014-01-21 |
DE102007043650A1 (de) | 2009-04-02 |
JP2010538816A (ja) | 2010-12-16 |
EP2188224A1 (de) | 2010-05-26 |
US20100213164A1 (en) | 2010-08-26 |
WO2009037073A1 (de) | 2009-03-26 |
CN101815686A (zh) | 2010-08-25 |
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