JP2010538143A5 - - Google Patents
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- Publication number
- JP2010538143A5 JP2010538143A5 JP2010523924A JP2010523924A JP2010538143A5 JP 2010538143 A5 JP2010538143 A5 JP 2010538143A5 JP 2010523924 A JP2010523924 A JP 2010523924A JP 2010523924 A JP2010523924 A JP 2010523924A JP 2010538143 A5 JP2010538143 A5 JP 2010538143A5
- Authority
- JP
- Japan
- Prior art keywords
- filling
- weight
- semiconductor fine
- fine gap
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 23
- 229920000642 polymer Polymers 0.000 claims 18
- 239000000203 mixture Substances 0.000 claims 16
- 150000001875 compounds Chemical class 0.000 claims 14
- 239000000126 substance Substances 0.000 claims 11
- 125000004432 carbon atom Chemical group C* 0.000 claims 7
- 238000009833 condensation Methods 0.000 claims 7
- 230000005494 condensation Effects 0.000 claims 7
- 239000003431 cross linking reagent Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 3
- 239000003377 acid catalyst Substances 0.000 claims 3
- 239000003960 organic solvent Substances 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 239000003381 stabilizer Substances 0.000 claims 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 1
- 229920000877 Melamine resin Polymers 0.000 claims 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- 150000008064 anhydrides Chemical class 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- 229940125898 compound 5 Drugs 0.000 claims 1
- 150000003997 cyclic ketones Chemical class 0.000 claims 1
- ZHGASCUQXLPSDT-UHFFFAOYSA-N cyclohexanesulfonic acid Chemical class OS(=O)(=O)C1CCCCC1 ZHGASCUQXLPSDT-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 150000002170 ethers Chemical class 0.000 claims 1
- 229910052500 inorganic mineral Inorganic materials 0.000 claims 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims 1
- 239000011976 maleic acid Substances 0.000 claims 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims 1
- 239000011707 mineral Substances 0.000 claims 1
- 235000006408 oxalic acid Nutrition 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims 1
- 150000003672 ureas Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2007-0090677 | 2007-09-06 | ||
| KR1020070090677A KR100894417B1 (ko) | 2007-09-06 | 2007-09-06 | 갭 필 능력이 개선된 반도체 미세 갭 필용 유기실란계중합체 및 이를 이용한 반도체 미세 갭 필용 조성물 |
| PCT/KR2007/007061 WO2009031733A1 (en) | 2007-09-06 | 2007-12-31 | Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010538143A JP2010538143A (ja) | 2010-12-09 |
| JP2010538143A5 true JP2010538143A5 (enExample) | 2011-01-27 |
| JP5345624B2 JP5345624B2 (ja) | 2013-11-20 |
Family
ID=40429032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010523924A Active JP5345624B2 (ja) | 2007-09-06 | 2007-12-31 | ギャップ充填特性が改善された半導体微細ギャップ充填用有機シラン系重合体及びこれを利用した半導体微細ギャップ充填用コーティング組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8299197B2 (enExample) |
| JP (1) | JP5345624B2 (enExample) |
| KR (1) | KR100894417B1 (enExample) |
| CN (1) | CN101796101B (enExample) |
| TW (1) | TWI386438B (enExample) |
| WO (1) | WO2009031733A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110074253A (ko) * | 2009-12-24 | 2011-06-30 | 제일모직주식회사 | 미세 갭필용 중합체, 이를 포함하는 미세 갭필용 조성물, 및 이를 이용한 반도체 집적회로 디바이스의 제조방법 |
| KR101354637B1 (ko) * | 2009-12-30 | 2014-01-22 | 제일모직주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 반도체 집적회로 디바이스의 제조방법 |
| JP5445473B2 (ja) * | 2011-01-14 | 2014-03-19 | 信越化学工業株式会社 | 光学材料形成用シリコーン樹脂組成物及び光学材料 |
| WO2017048268A1 (en) * | 2015-09-17 | 2017-03-23 | Intel Corporation | Gap filling material and process for semiconductor devices |
| US10947412B2 (en) * | 2017-12-19 | 2021-03-16 | Honeywell International Inc. | Crack-resistant silicon-based planarizing compositions, methods and films |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2831398B2 (ja) * | 1989-09-28 | 1998-12-02 | 触媒化成工業株式会社 | 半導体装置の製造方法 |
| WO1995024639A1 (fr) * | 1994-03-11 | 1995-09-14 | Kawasaki Steel Corporation | Procede d'evaluation du siloxane utilise pour former une couche isolante, fluide d'enrobage utilise pour former une telle couche, procede de production de ce fluide, procede de formation d'une couche isolante pour un dispositif a semi-conducteur, et procede de production d'un dispositif a semi-conducteur |
| JPH11181352A (ja) * | 1997-12-25 | 1999-07-06 | Sumitomo Chem Co Ltd | シリカコーティング膜形成用塗布液 |
| US6140445A (en) * | 1998-04-17 | 2000-10-31 | Crompton Corporation | Silane functional oligomer |
| DE19825796A1 (de) * | 1998-06-10 | 1999-12-16 | Degussa | Neue oligomere Organosilanpolysulfane, deren Verwendung in Kautschukmischungen und zur Herstellung von Formkörpern |
| US6713643B2 (en) * | 2001-05-24 | 2004-03-30 | Board Of Trustees Of Michigan State University | Ultrastable organofunctional microporous to mesoporous silica compositions |
| DE10132941A1 (de) * | 2001-07-06 | 2003-01-23 | Degussa | Oligomere Organosilane, Verfahren zu deren Herstellung und deren Verwendung |
| US6852367B2 (en) * | 2001-11-20 | 2005-02-08 | Shipley Company, L.L.C. | Stable composition |
| JP3631236B2 (ja) * | 2002-07-12 | 2005-03-23 | 東京応化工業株式会社 | シリカ系有機被膜の製造方法 |
| JP3906916B2 (ja) * | 2002-07-29 | 2007-04-18 | Ｊｓｒ株式会社 | 膜形成用組成物、膜形成方法および膜 |
| US20040109950A1 (en) * | 2002-09-13 | 2004-06-10 | Shipley Company, L.L.C. | Dielectric materials |
| EP1632956A1 (en) * | 2004-09-07 | 2006-03-08 | Rohm and Haas Electronic Materials, L.L.C. | Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films |
| JP4860953B2 (ja) * | 2005-07-08 | 2012-01-25 | 富士通株式会社 | シリカ系被膜形成用材料、シリカ系被膜及びその製造方法、多層配線及びその製造方法、並びに、半導体装置及びその製造方法 |
| EP1762895B1 (en) * | 2005-08-29 | 2016-02-24 | Rohm and Haas Electronic Materials, L.L.C. | Antireflective Hard Mask Compositions |
| US7678529B2 (en) * | 2005-11-21 | 2010-03-16 | Shin-Etsu Chemical Co., Ltd. | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method |
| KR100796047B1 (ko) * | 2006-11-21 | 2008-01-21 | 제일모직주식회사 | 레지스트 하층막용 하드마스크 조성물, 이를 이용한 반도체집적회로 디바이스의 제조방법 및 그로부터 제조된 반도체집적회로 디바이스 |
| JP2009199061A (ja) * | 2007-11-12 | 2009-09-03 | Rohm & Haas Electronic Materials Llc | オーバーコートされたフォトレジストと共に用いるためのコーティング組成物 |
-
2007
- 2007-09-06 KR KR1020070090677A patent/KR100894417B1/ko active Active
- 2007-12-31 WO PCT/KR2007/007061 patent/WO2009031733A1/en not_active Ceased
- 2007-12-31 CN CN2007801005212A patent/CN101796101B/zh active Active
- 2007-12-31 JP JP2010523924A patent/JP5345624B2/ja active Active
-
2008
- 2008-08-27 TW TW097132713A patent/TWI386438B/zh active
-
2010
- 2010-03-08 US US12/659,379 patent/US8299197B2/en active Active
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