JP2010536185A - 半導体基板の運搬および大気中保管のための輸送支持具を処理する方法、ならびにそのような方法を実施するための処理ステーション - Google Patents
半導体基板の運搬および大気中保管のための輸送支持具を処理する方法、ならびにそのような方法を実施するための処理ステーション Download PDFInfo
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Abstract
Description
処理されるべき表面をもつ少なくとも1つの輸送支持具を受けるのに適した、ポンピング・デバイスに連結するための密封チャンバと、
前記処理されるべき表面を赤外線にさらすのに適した少なくとも1つの赤外線源と、
前記処理されるべき表面を準大気圧のガス圧と赤外線との複合作用にさらす、ポンピング・デバイスおよび赤外線源を制御するのに適した制御デバイスとを含む、輸送支持具処理ステーションを計画する。
チャンバの閉位置でガスケットを圧迫するのに適した少なくとも1つのシリンダを含む、チャンバの密閉カバーとは反対側でチャンバの開口部の周辺に置かれたガスケット、
前記ステーションのフレームの下面と床との間に置かれた、振動を減衰させるデバイス、
チャンバに連結された誘導励起セルを含み、前記セルの内側にプラズマを形成するのに適した電磁励起アンテナを含む、ガス種のための制御デバイス。
a)1時間にわたって大気圧Paで赤外線(50℃)によって加熱した後、残りの脱ガスは、2.5sccmであった。
b)追加加熱なしに1時間にわたって真空内に置いた後、残りの脱ガスは、0.77sccmであった。
c)1時間にわたって赤外線(50℃)によって追加加熱しながら真空内に置いた後、残りの脱ガスは、0.6sccmであった。
Claims (21)
- 基板の運搬および保管のための輸送支持具(1)の処理方法であって、
前記輸送支持具(1)上の処理されるべき表面(1a)から異物を除去するために前記処理されるべき表面(1a)がその間に準大気圧のガス圧(PSA)と赤外線(IR)との複合作用にさらされる処理ステージを含むことを特徴とする、方法。 - 前記準大気圧(PSA)が、除去されるべき前記異物の状態図の三重点の圧力(PT)よりも大きいことを特徴とする、請求項1に記載の方法。
- 前記赤外線(IR)が、除去されるべき1つまたは複数の前記異物の(1つまたは複数の)吸収波長あたりに最大強度をもつ発光スペクトルを呈することを特徴とする、請求項1または2のいずれか1項に記載の方法。
- 前記赤外線(IR)が断続的赤外線であることを特徴とする、請求項1乃至3のいずれか1項に記載の方法。
- 前記断続的赤外線(IR)が前記処理されるべき表面(1a)を適切な温度に設定する連続的な初期ステージ(E1)を含むことを特徴とする、請求項4に記載の方法。
- 前記処理されるべき表面(1a)の温度(TM)を代表する試験温度が測定され、前記赤外線(IR)が、前記試験温度にしたがって、前記処理されるべき表面の前記温度(TM)を最高許容温度閾値(TA)よりも低い温度設定(TC)あたりで維持するように制御されることを特徴とする、請求項4または5のいずれか1項に記載の方法。
- 前記準大気圧のガス圧(PSA)が測定され、圧力設定(PC)と比較されて、その比較に応じて、前記準大気圧のガス圧(PSA)を前記圧力設定(PC)あたりにもっていき、そのガス圧をそのレベルで維持するように、ポンピング速度、ポンピング・コンダクタンス、ガス流注入コンダクタンスなど、圧力を調節する手段を制御することを特徴とする、請求項1乃至6のいずれか1項に記載の方法。
- 前記処理されるべき表面(1a)上の少なくとも1つの異物捕捉領域の近くに局所的なガス流(47)がその間に注入されるステージを含むことを特徴とする、請求項1乃至7のいずれか1項に記載の方法。
- 前記処理されるべき表面(1a)が、その間に、除去されるべき異物を含まないクリーンなガス流(48)の注入による大気圧(Pa)あたりへのガス圧(PSA)の漸次上昇と周囲温度(Ta)あたりへの温度(TM)の降下とにさらされる、コンディショニング・ステージ(EC)を含むことを特徴とする、請求項1乃至8のいずれか1項に記載の方法。
- 前記クリーンなガス流(48)が、十分に低速で選択され、ただし、高流量を可能にし、したがって干渉静電荷の生成および汚濁粒子の取込みを回避するために、広く分散されることを特徴とする、請求項9に記載の方法。
- 前記処理されるべき表面(1a)からの前記異物の除去を代表するパラメータ(前記輸送支持具の重量、真空ポンプの出口のところの湿気またはAMCの量、前記密封チャンバ内の分圧または全圧)が測定され、前記代表パラメータが参照に達するときには前記処理が中断されることを特徴とする、請求項1乃至10のいずれか1項に記載の方法。
- 基板の運搬および保管のための輸送支持具(1)のための処理ステーション(10)であって、
処理されるべき表面(1a)をもつ少なくとも1つの輸送支持具(1)を受けるのに適した、ポンピング・デバイス(5、46)に連結するための密封チャンバ(4)と、
前記処理されるべき表面(1a)を赤外線(IR)にさらすのに適した少なくとも1つの赤外線源(49)と、
前記処理されるべき表面(1a)を準大気圧のガス圧(PSA)と赤外線(IR)との複合作用にさらす、前記ポンピング・デバイス(5、46)および前記赤外線源(49)を制御するのに適した制御デバイス(17)とを含むことを特徴とする、処理ステーション(10)。 - 前記密封チャンバ(4)内に置かれた、前記処理されるべき表面(1a)の温度(TM)を代表する試験温度を測定するのに適した少なくとも1つの温度センサ(50)を含むことを特徴とする、請求項12に記載の処理ステーション。
- 前記温度センサ(50)が、その一方の面(56)が前記赤外線(IR)にさらされ、その反対側の面が温度プローブ(54)と接触している、処理されるべき前記輸送支持具(1)を構成するのと類似の材料で作製された小さい厚さ(e)の試験層(55)を含むことを特徴とする、請求項13に記載の処理ステーション。
- 前記制御デバイス(17)が、前記温度センサ(50)によって生成される温度データを調べ、前記温度センサ(50)によって測定された温度が、それ自体が最高許容温度閾値(TA)を下回る温度設定(TC)よりも所定の差を超えて低いときには、前記赤外線源(49)の電力供給をトリガし、前記温度センサ(50)によって測定された温度が所定の差を超えて前記温度設定(TC)を上回るときには前記赤外線源(49)の電力供給を遮断する、赤外線制御プログラムを含むことを特徴とする、請求項13または14のいずれか1項に記載の処理ステーション。
- 前記赤外線源(49)が、箱の形態の輸送支持具(1)の内側に挿入するのに適した少なくとも1つの線源部分(49a)を含むことを特徴とする、請求項12乃至15のいずれか1項に記載の処理ステーション。
- 前記処理されるべき表面(1a)の近傍に第1の局所的なガス流(47)を注入するために初期ガス注入デバイス(18)を含むことを特徴とする、請求項12乃至16のいずれか1項に記載の処理ステーション。
- 前記処理されるべき表面(1a)から隔てられた前記密封チャンバ(4)にクリーンなガス流(48)を注入するために第2のガス注入デバイス(60)を含むことを特徴とする、請求項12乃至17のいずれか1項に記載の処理ステーション。
- 前記処理ステーションが、前記処理されるべき表面(1a)からの異物の除去を代表するパラメータを測定する手段(41、45、17)を含んでおり、前記制御デバイス(17)が、前記代表パラメータが参照値に達するときには前記処理を中断するのに適していることを特徴とする、請求項12乃至18のいずれか1項に記載の処理ステーション。
- 代表パラメータのための前記測定デバイスが、
輸送支持具(1)の重量を測定し、重量信号を生成するのに適したはかり(41)、および前記重量信号(17)を処理して前記重量信号から前記処理ステージの終わりを推定する手段、
ならびに/または、前記ポンピング・デバイス(5、46)の前記真空ポンプ(5)の出口のところの湿度および/もしくはAMCセンサ(57)、
ならびに/または、前記密封チャンバ(4)のための圧力計(45)を含むことを特徴とする、請求項18に記載の処理ステーション。 - また、前記密封チャンバ(4)自体内で直接前記輸送支持具(1)を洗浄するために使用される洗浄デバイス(58)も含むことを特徴とする、請求項12乃至20のいずれか1項に記載の処理ステーション。
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FR0757049A FR2920046A1 (fr) | 2007-08-13 | 2007-08-13 | Procede de post-traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de post-traitement pour la mise en oeuvre d'un tel procede |
PCT/EP2008/060548 WO2009021941A1 (fr) | 2007-08-13 | 2008-08-11 | Procede de traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de traitement pour la mise en œuvre d'un tel procede |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017527108A (ja) * | 2014-07-24 | 2017-09-14 | ファイファー バキユーム | 基板の搬送及び大気圧中保管用の、プラスチック製搬送ボックスを処理する方法、及びステーション |
JP2018538504A (ja) * | 2015-11-25 | 2018-12-27 | コケリル マントナンス エ アンジェニエリー ソシエテ アノニム | 真空チャンバーを乾燥させるための方法及び設備 |
JP2020155453A (ja) * | 2019-03-18 | 2020-09-24 | 大日商事株式会社 | 半導体搬送容器の乾燥方法 |
JP2022050623A (ja) * | 2015-10-05 | 2022-03-30 | ブルックス シーシーエス ゲーエムベーハー | 半導体システムにおける湿度制御 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2946736A1 (fr) * | 2009-06-12 | 2010-12-17 | Alcatel Lucent | Station et procede de sechage et/ou de degazage d'un produit ou d'une enceinte de transport pour le convoyage et le stockage atmospherique de substrats |
WO2010146561A1 (en) * | 2009-06-17 | 2010-12-23 | Dynamic Micro Systems | Integrated cleaner and dryer |
FR2954583B1 (fr) | 2009-12-18 | 2017-11-24 | Alcatel Lucent | Procede et dispositif de pilotage de fabrication de semi conducteurs par mesure de contamination |
FR2955927B1 (fr) * | 2010-02-01 | 2012-04-06 | Alcatel Lucent | Dispositif et procede de pilotage d'une operation de deshydratation durant un traitement de lyophilisation |
FR2961946B1 (fr) | 2010-06-29 | 2012-08-03 | Alcatel Lucent | Dispositif de traitement pour boites de transport et de stockage |
FR2999015B1 (fr) * | 2012-11-30 | 2014-12-12 | Adixen Vacuum Products | Station et procede de mesure de la contamination en particules d'une enceinte de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs |
US10309722B1 (en) | 2013-03-14 | 2019-06-04 | International Research Institute Inc. | Microwave and vacuum drying device, system, and related methods |
KR102095474B1 (ko) * | 2013-03-27 | 2020-04-01 | 삼성디스플레이 주식회사 | 유기 화합물 검출 장치 및 이를 구비한 표시 장치의 제조 설비 |
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TWI544973B (zh) * | 2015-03-20 | 2016-08-11 | 家登精密工業股份有限公司 | 半導體容器清洗機的運作方法 |
US20160359080A1 (en) | 2015-06-07 | 2016-12-08 | Solarcity Corporation | System, method and apparatus for chemical vapor deposition |
JP6428575B2 (ja) * | 2015-11-18 | 2018-11-28 | 株式会社ダイフク | 搬送設備 |
US9748434B1 (en) | 2016-05-24 | 2017-08-29 | Tesla, Inc. | Systems, method and apparatus for curing conductive paste |
US9954136B2 (en) | 2016-08-03 | 2018-04-24 | Tesla, Inc. | Cassette optimized for an inline annealing system |
JP6849368B2 (ja) * | 2016-09-30 | 2021-03-24 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
US10115856B2 (en) | 2016-10-31 | 2018-10-30 | Tesla, Inc. | System and method for curing conductive paste using induction heating |
KR102127716B1 (ko) * | 2018-05-25 | 2020-06-29 | 에스케이실트론 주식회사 | 웨이퍼 카세트 스토커 및 그를 이용한 웨이퍼 카세트의 건조 방법 |
AT523220B1 (de) * | 2019-11-15 | 2022-08-15 | Sirona Dental Systems Gmbh | Nachbearbeitungssystem und -verfahren |
CN114234596B (zh) * | 2021-12-22 | 2022-07-29 | 南京苏恩瑞干燥设备有限公司 | 一种具有智能取料系统的溶剂回收真空干燥箱 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59161826A (ja) * | 1983-03-07 | 1984-09-12 | Hitachi Ltd | リンサ・ドライヤ |
JPS62163323A (ja) * | 1986-01-14 | 1987-07-20 | Matsushita Electric Ind Co Ltd | 赤外線加熱装置 |
JPH04242930A (ja) * | 1990-12-29 | 1992-08-31 | Tokyo Electron Ltd | 被処理物の乾燥方法 |
JPH08122232A (ja) * | 1994-10-28 | 1996-05-17 | Nec Corp | 乾燥装置 |
JP2002126678A (ja) * | 2000-10-25 | 2002-05-08 | Kaijo Corp | 密閉型容器の洗浄方法及び洗浄装置 |
JP2003174007A (ja) * | 2001-12-04 | 2003-06-20 | Supurauto:Kk | 基板の真空乾燥方法 |
JP2003254045A (ja) * | 2002-02-25 | 2003-09-10 | Nissan Diesel Motor Co Ltd | ディーゼルパティキュレートフィルタの再生装置 |
JP2005140536A (ja) * | 2003-11-04 | 2005-06-02 | Mitsubishi Heavy Ind Ltd | 真空乾燥システム |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE889426C (de) * | 1951-01-31 | 1953-09-10 | Otto Dipl-Kfm Kiefer | Verfahren zur Steuerung des Trockenvorgangs, insbesondere bei Stapelguetern |
US3006077A (en) * | 1958-03-03 | 1961-10-31 | Production Control Units Inc | Apparatus for dehydration of refrigeration hermetic compressors |
GB1479453A (en) * | 1974-10-04 | 1977-07-13 | Bicc Ltd | Manufacture of insulated electrical conductors |
DE3111223A1 (de) * | 1981-03-21 | 1982-10-07 | Arthur Pfeiffer Vakuumtechnik Wetzlar Gmbh, 6334 Asslar | Vakuum-trockenverfahren |
DE3832726C2 (de) * | 1988-01-25 | 1997-04-30 | Sartorius Gmbh | Trocknungswaage mit digitaler Auswerteeinheit zur Bestimmung des Endpunktes der Trocknung |
FR2652888A1 (fr) * | 1989-10-06 | 1991-04-12 | Annamasse Sa Ultrasons | Procede de sechage sous vide de pieces diverses et dispositif de mise en óoeuvre du procede. |
US4977688A (en) * | 1989-10-27 | 1990-12-18 | Semifab Incorporated | Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol |
US5263264A (en) * | 1990-01-25 | 1993-11-23 | Speedfam Clean System Company Limited | Method and apparatus for drying wet work |
CA2040989A1 (en) * | 1990-05-01 | 1991-11-02 | Ichiro Yoshida | Washing/drying method and apparatus |
US5273589A (en) * | 1992-07-10 | 1993-12-28 | Griswold Bradley L | Method for low pressure rinsing and drying in a process chamber |
JPH0684877A (ja) | 1992-08-31 | 1994-03-25 | Kyushu Electron Metal Co Ltd | Siウエーハ保管ケースの乾燥方法及び乾燥装置 |
DE4230899A1 (de) | 1992-09-11 | 1993-03-18 | Klaus Hoffmann | Vakuumtrockengeraet |
JPH0632989U (ja) * | 1992-09-25 | 1994-04-28 | 新日本製鐵株式会社 | 真空乾燥機 |
JPH0712458A (ja) * | 1993-06-23 | 1995-01-17 | Murata Mfg Co Ltd | 部品乾燥機 |
JPH0745574A (ja) | 1993-07-27 | 1995-02-14 | Sankyo Eng Kk | ワークの洗浄及び乾燥方法とその装置 |
US5660751A (en) * | 1995-06-02 | 1997-08-26 | O'rorke; Blondale | Bowling ball rejuvenator |
JPH08338659A (ja) | 1995-06-12 | 1996-12-24 | Hokushin:Kk | 除菌消臭乾燥装置 |
US5830279A (en) * | 1995-09-29 | 1998-11-03 | Harris Corporation | Device and method for improving corrosion resistance and etch tool integrity in dry metal etching |
KR0182167B1 (ko) * | 1996-03-19 | 1999-04-15 | 김광호 | 웨이퍼 캐리어의 건식 세정 장치 |
US5732478A (en) * | 1996-05-10 | 1998-03-31 | Altos Engineering, Inc. | Forced air vacuum drying |
US6096100A (en) * | 1997-12-12 | 2000-08-01 | Texas Instruments Incorporated | Method for processing wafers and cleaning wafer-handling implements |
JP3698342B2 (ja) * | 1997-03-28 | 2005-09-21 | パロマ工業株式会社 | 厨芥処理機 |
DE19756830A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Vakuumtechnisches Trocknen von Halbleiterbruch |
JP3563605B2 (ja) * | 1998-03-16 | 2004-09-08 | 東京エレクトロン株式会社 | 処理装置 |
AU2490000A (en) * | 1999-01-05 | 2000-07-24 | Universal Preservation Technologies, Inc. | Vacuum control system for foam drying apparatus |
JP3181895B2 (ja) * | 1999-06-23 | 2001-07-03 | 株式会社半導体先端テクノロジーズ | 半導体用キャリアの洗浄装置および洗浄方法 |
JP4060017B2 (ja) * | 1999-11-24 | 2008-03-12 | 東洋精機株式会社 | 加熱装置 |
BR0017101B1 (pt) * | 2000-02-10 | 2012-12-25 | aparelho para cozer produtos alimentÍcios localizados sobre uma superfÍcie transportadora, e, processo de cozimento. | |
WO2003006963A1 (en) * | 2001-07-10 | 2003-01-23 | Steris Inc. | Monitor and control using mid-infrared spectroscopy for vapor hydrogen peroxide processing technics |
JP2003142451A (ja) | 2001-10-31 | 2003-05-16 | Applied Materials Inc | 半導体ウェハ乾燥装置 |
JP4025096B2 (ja) * | 2002-03-08 | 2007-12-19 | 株式会社荏原製作所 | 基板処理方法 |
JP2004266212A (ja) | 2003-03-04 | 2004-09-24 | Tadahiro Omi | 基板の処理システム |
US20050102851A1 (en) * | 2003-11-15 | 2005-05-19 | Tianqing He | Device and methods for rapid drying of porous materials |
ITBO20040149A1 (it) | 2004-03-12 | 2004-06-12 | Romaco Srl | Cabina di lavaggio per contenitori |
FR2880105B1 (fr) * | 2004-12-23 | 2007-04-20 | Cie Financiere Alcatel Sa | Dispositif et procede de pilotage de l'operation de deshydratation durant un traitement de lyophilisation |
DE102005004912A1 (de) * | 2005-02-02 | 2006-08-03 | Ac Microwave Gmbh | Mikrowellen-Vakuumtrocknungsvorrichtung und Verfahren zum Mikrowellen-Vakuumtrocknen |
JP2007097692A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | 放射線像変換パネルの消毒システム |
FR2901546B1 (fr) * | 2006-05-24 | 2010-10-15 | Cit Alcatel | Procede et dispositif de depollution d'environnement confine |
US20090144015A1 (en) * | 2007-12-04 | 2009-06-04 | Creative Inspirations By Meryle, Llp | Apparatus And Method for Monitoring A Heating System |
US8143553B2 (en) * | 2009-02-19 | 2012-03-27 | Defranco Matthew | Portable sterilizing towel warmer |
-
2007
- 2007-08-13 FR FR0757049A patent/FR2920046A1/fr active Pending
-
2008
- 2008-08-11 WO PCT/EP2008/060548 patent/WO2009021941A1/fr active Application Filing
- 2008-08-11 SG SG2012059648A patent/SG183719A1/en unknown
- 2008-08-11 EP EP08787122.4A patent/EP2179236B1/fr active Active
- 2008-08-11 JP JP2010520552A patent/JP5260653B2/ja active Active
- 2008-08-11 KR KR1020107005548A patent/KR101176715B1/ko active IP Right Grant
- 2008-08-11 US US12/733,081 patent/US8898930B2/en active Active
- 2008-08-11 CN CN2008801108105A patent/CN101821573B/zh active Active
- 2008-08-13 TW TW097130818A patent/TWI480499B/zh active
-
2013
- 2013-01-04 JP JP2013000147A patent/JP5775098B2/ja active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59161826A (ja) * | 1983-03-07 | 1984-09-12 | Hitachi Ltd | リンサ・ドライヤ |
JPS62163323A (ja) * | 1986-01-14 | 1987-07-20 | Matsushita Electric Ind Co Ltd | 赤外線加熱装置 |
JPH04242930A (ja) * | 1990-12-29 | 1992-08-31 | Tokyo Electron Ltd | 被処理物の乾燥方法 |
JPH08122232A (ja) * | 1994-10-28 | 1996-05-17 | Nec Corp | 乾燥装置 |
JP2002126678A (ja) * | 2000-10-25 | 2002-05-08 | Kaijo Corp | 密閉型容器の洗浄方法及び洗浄装置 |
JP2003174007A (ja) * | 2001-12-04 | 2003-06-20 | Supurauto:Kk | 基板の真空乾燥方法 |
JP2003254045A (ja) * | 2002-02-25 | 2003-09-10 | Nissan Diesel Motor Co Ltd | ディーゼルパティキュレートフィルタの再生装置 |
JP2005140536A (ja) * | 2003-11-04 | 2005-06-02 | Mitsubishi Heavy Ind Ltd | 真空乾燥システム |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017527108A (ja) * | 2014-07-24 | 2017-09-14 | ファイファー バキユーム | 基板の搬送及び大気圧中保管用の、プラスチック製搬送ボックスを処理する方法、及びステーション |
US10478872B2 (en) | 2014-07-24 | 2019-11-19 | Pfeiffer Vacuum | Method and station for treatment of a transport container made of plastic material for the atmospheric storage and conveyance of substrates |
JP2022050623A (ja) * | 2015-10-05 | 2022-03-30 | ブルックス シーシーエス ゲーエムベーハー | 半導体システムにおける湿度制御 |
JP7372362B2 (ja) | 2015-10-05 | 2023-10-31 | ブルックス シーシーエス ゲーエムベーハー | 半導体システムにおける湿度制御 |
JP2018538504A (ja) * | 2015-11-25 | 2018-12-27 | コケリル マントナンス エ アンジェニエリー ソシエテ アノニム | 真空チャンバーを乾燥させるための方法及び設備 |
JP2020155453A (ja) * | 2019-03-18 | 2020-09-24 | 大日商事株式会社 | 半導体搬送容器の乾燥方法 |
JP7168961B2 (ja) | 2019-03-18 | 2022-11-10 | 大日商事株式会社 | 半導体搬送容器の乾燥方法 |
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EP2179236B1 (fr) | 2016-08-10 |
SG183719A1 (en) | 2012-09-27 |
US20100282272A1 (en) | 2010-11-11 |
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TWI480499B (zh) | 2015-04-11 |
JP5260653B2 (ja) | 2013-08-14 |
CN101821573B (zh) | 2012-04-11 |
US8898930B2 (en) | 2014-12-02 |
KR101176715B1 (ko) | 2012-08-23 |
WO2009021941A1 (fr) | 2009-02-19 |
EP2179236A1 (fr) | 2010-04-28 |
JP2013070097A (ja) | 2013-04-18 |
CN101821573A (zh) | 2010-09-01 |
FR2920046A1 (fr) | 2009-02-20 |
TW200938794A (en) | 2009-09-16 |
KR20100075837A (ko) | 2010-07-05 |
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