JP2010528476A - 除害システムの効率的な運転のための方法及び装置 - Google Patents
除害システムの効率的な運転のための方法及び装置 Download PDFInfo
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- JP2010528476A JP2010528476A JP2010509389A JP2010509389A JP2010528476A JP 2010528476 A JP2010528476 A JP 2010528476A JP 2010509389 A JP2010509389 A JP 2010509389A JP 2010509389 A JP2010509389 A JP 2010509389A JP 2010528476 A JP2010528476 A JP 2010528476A
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- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000012545 processing Methods 0.000 claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 claims abstract description 36
- 239000000446 fuel Substances 0.000 claims description 16
- 239000003153 chemical reaction reagent Substances 0.000 claims description 15
- 239000002826 coolant Substances 0.000 claims description 13
- 239000000126 substance Substances 0.000 description 10
- 239000012707 chemical precursor Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000013024 troubleshooting Methods 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/4184—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by fault tolerance, reliability of production system
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/005—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B9/00—Safety arrangements
- G05B9/02—Safety arrangements electric
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45026—Circuit board, pcb
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P80/00—Climate change mitigation technologies for sector-wide applications
- Y02P80/10—Efficient use of energy, e.g. using compressed air or pressurized fluid as energy carrier
- Y02P80/15—On-site combined power, heat or cool generation or distribution, e.g. combined heat and power [CHP] supply
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- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Thermal Sciences (AREA)
- Quality & Reliability (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Incineration Of Waste (AREA)
- Treating Waste Gases (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Vapour Deposition (AREA)
- General Factory Administration (AREA)
- Computer Hardware Design (AREA)
Abstract
Description
Claims (19)
- 除害システムに関する情報をインターフェースで受け取り、
情報に応答して処理ツール及び除害ツールを停止させることを含む電子デバイス製造システムの運転方法。 - 情報が、燃料フローに関係する請求項1記載の方法。
- 情報が、試薬フローに関係する請求項1記載の方法。
- 情報が、冷却剤フローに関係する請求項1記載の方法。
- 情報が、危険又は容認し難いほど効果的でない除害状態に関係する請求項1記載の方法。
- 情報が、除害ツールの温度に関係する請求項1記載の方法。
- 情報が、除害ツールの圧力に関係する請求項1記載の方法。
- 情報が、流出物及び除害資源の少なくとも1つを受け取る除害ツールに関係し、受け取りによって、危険又は容認し難いほど効果的でない除害状態が発生する請求項1記載の方法。
- インターフェースによって処理ツール及び除害ツールが停止させられる請求項1記載の方法。
- 電子デバイス処理ツールに関する情報をインターフェースで受け取り、
情報に応答して除害ツールを待機モードにおくことを含む電子デバイス製造システムの運転方法。 - 情報が、電子デバイス処理ツールが流出物を発生しているか否かに更に関係する請求項10記載の方法。
- インターフェースが、流出物フローを測定するように構成されたセンサから情報を受け取る請求項10記載の方法。
- 情報が、電子デバイス処理ツールの運転スケジュールを含む請求項10記載の方法。
- インターフェースが、流出物の組成を測定するように構成されたセンサから情報を受け取る請求項10記載の方法。
- 電子デバイス製造処理ツールと、
電子デバイス製造処理ツールからの流出物を除害するように構成された除害ツールと、
除害資源を除害ツールに供給するように構成された除害資源供給源と、
除害ツールへの除害資源のフロー及び除害ツールの動作パラメータの少なくとも1つを測定するように構成されたセンサと、
除害資源の流量を含む情報を流量センサから受け取るように構成されたインターフェースとを備える電子デバイス製造システム。 - 警告装置を更に備える請求項15記載の電子デバイス製造システム。
- 電子デバイス製造処理ツールが、インターフェースによって停止されるように構成されている請求項15記載の電子デバイス製造システム。
- センサが、除害ツール内の温度、圧力、火炎の存在及び電力の少なくとも1つを測定するように構成されている請求項15記載の電子デバイス製造システム。
- センサが、除害資源のフローを測定するように構成されている請求項15記載の電子デバイス製造システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US93173107P | 2007-05-25 | 2007-05-25 | |
US60/931,731 | 2007-05-25 | ||
PCT/US2008/006587 WO2008147524A1 (en) | 2007-05-25 | 2008-05-24 | Methods and apparatus for efficient operation of an abatement system |
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JP2014179909A Division JP6023134B2 (ja) | 2007-05-25 | 2014-09-04 | 除害システムの効率的な運転のための方法及び装置 |
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Publication Number | Publication Date |
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JP2010528476A true JP2010528476A (ja) | 2010-08-19 |
JP2010528476A5 JP2010528476A5 (ja) | 2011-07-14 |
JP5660888B2 JP5660888B2 (ja) | 2015-01-28 |
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JP2010509389A Active JP5660888B2 (ja) | 2007-05-25 | 2008-05-24 | 除害システムの効率的な運転のための方法及び装置 |
JP2014179909A Active JP6023134B2 (ja) | 2007-05-25 | 2014-09-04 | 除害システムの効率的な運転のための方法及び装置 |
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JP2014179909A Active JP6023134B2 (ja) | 2007-05-25 | 2014-09-04 | 除害システムの効率的な運転のための方法及び装置 |
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US (2) | US20080290041A1 (ja) |
EP (1) | EP2150360A4 (ja) |
JP (2) | JP5660888B2 (ja) |
KR (2) | KR101551170B1 (ja) |
CN (1) | CN101678407A (ja) |
TW (2) | TW200915124A (ja) |
WO (2) | WO2008147524A1 (ja) |
Cited By (1)
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JP2017505988A (ja) * | 2014-01-14 | 2017-02-23 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 半導体製造における窒素酸化物の軽減 |
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JP6030278B2 (ja) | 2006-03-16 | 2016-11-24 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 電子デバイス製造システムの操作を改善する方法及び装置 |
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WO2008147524A1 (en) * | 2007-05-25 | 2008-12-04 | Applied Materials, Inc. | Methods and apparatus for efficient operation of an abatement system |
CN101681398B (zh) | 2007-05-25 | 2016-08-10 | 应用材料公司 | 组装及操作电子器件制造系统的方法和设备 |
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- 2008-05-24 WO PCT/US2008/006587 patent/WO2008147524A1/en active Application Filing
- 2008-05-24 KR KR1020097027092A patent/KR101551170B1/ko active IP Right Grant
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- 2008-05-24 KR KR1020157014804A patent/KR20150069034A/ko not_active Application Discontinuation
- 2008-05-25 US US12/126,920 patent/US20080290041A1/en not_active Abandoned
- 2008-05-25 US US12/126,925 patent/US20080310975A1/en not_active Abandoned
- 2008-05-26 TW TW097119431A patent/TW200915124A/zh unknown
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Also Published As
Publication number | Publication date |
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JP2015043430A (ja) | 2015-03-05 |
TW200901271A (en) | 2009-01-01 |
WO2008147523A1 (en) | 2008-12-04 |
TWI492270B (zh) | 2015-07-11 |
JP5660888B2 (ja) | 2015-01-28 |
KR101551170B1 (ko) | 2015-09-09 |
US20080310975A1 (en) | 2008-12-18 |
EP2150360A4 (en) | 2013-01-23 |
EP2150360A1 (en) | 2010-02-10 |
CN101678407A (zh) | 2010-03-24 |
WO2008147524A1 (en) | 2008-12-04 |
KR20100033977A (ko) | 2010-03-31 |
US20080290041A1 (en) | 2008-11-27 |
JP6023134B2 (ja) | 2016-11-09 |
TW200915124A (en) | 2009-04-01 |
KR20150069034A (ko) | 2015-06-22 |
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