JP2010520939A5 - - Google Patents
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- Publication number
- JP2010520939A5 JP2010520939A5 JP2009552821A JP2009552821A JP2010520939A5 JP 2010520939 A5 JP2010520939 A5 JP 2010520939A5 JP 2009552821 A JP2009552821 A JP 2009552821A JP 2009552821 A JP2009552821 A JP 2009552821A JP 2010520939 A5 JP2010520939 A5 JP 2010520939A5
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- independently
- optical film
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- 125000002947 alkylene group Chemical group 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 230000003287 optical Effects 0.000 claims 9
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 claims 6
- 229910052736 halogen Inorganic materials 0.000 claims 5
- 150000002367 halogens Chemical group 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 239000011342 resin composition Substances 0.000 claims 5
- 239000007795 chemical reaction product Substances 0.000 claims 4
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 3
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 2
- 239000004593 Epoxy Substances 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 description 3
- 125000004432 carbon atoms Chemical group C* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 description 1
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US89395307P | 2007-03-09 | 2007-03-09 | |
US60/893,953 | 2007-03-09 | ||
US94861107P | 2007-07-09 | 2007-07-09 | |
US60/948,611 | 2007-07-09 | ||
PCT/US2008/055654 WO2008112452A2 (en) | 2007-03-09 | 2008-03-03 | Triphenyl monomers suitable for microstructured optical films |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010520939A JP2010520939A (ja) | 2010-06-17 |
JP2010520939A5 true JP2010520939A5 (US20040106767A1-20040603-C00005.png) | 2012-09-13 |
JP5443177B2 JP5443177B2 (ja) | 2014-03-19 |
Family
ID=39535897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009552821A Expired - Fee Related JP5443177B2 (ja) | 2007-03-09 | 2008-03-03 | 微細構造化光学フィルムに好適なトリフェニルモノマー |
Country Status (5)
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7194355B2 (ja) | 2016-07-21 | 2022-12-22 | 三菱瓦斯化学株式会社 | 化合物、樹脂、組成物及びパターン形成方法 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5320167B2 (ja) * | 2008-05-30 | 2013-10-23 | 富士フイルム株式会社 | バリア性積層体、ガスバリアフィルム、デバイスおよび積層体の製造方法 |
JP5281964B2 (ja) | 2008-06-26 | 2013-09-04 | 富士フイルム株式会社 | バリア性積層体、ガスバリアフィルム、デバイスおよび積層体の製造方法 |
CN102307917B (zh) * | 2008-12-22 | 2019-07-12 | 3M创新有限公司 | 包含可聚合紫外线吸收剂的微结构化光学膜 |
JPWO2010143568A1 (ja) * | 2009-06-08 | 2012-11-22 | Dic株式会社 | 光ディスク及び光ディスク中間層用紫外線硬化型組成物 |
JP5580561B2 (ja) * | 2009-09-01 | 2014-08-27 | 富士フイルム株式会社 | バリア性積層体、ガスバリアフィルムおよびバリア性積層体の製造方法 |
KR101842728B1 (ko) | 2010-05-07 | 2018-03-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 미세구조화 표면을 포함하는 반사방지 필름 |
SG194729A1 (en) * | 2011-05-13 | 2013-12-30 | 3M Innovative Properties Co | Benzyl (meth)acrylate monomers suitable for microstructured optical films |
EP2682448B1 (en) * | 2012-07-05 | 2016-04-20 | Merck Patent GmbH | Polymerisable compounds and the use thereof in liquid-crystal displays |
US9360591B2 (en) | 2012-09-20 | 2016-06-07 | 3M Innovative Properties Company | Microstructured film comprising nanoparticles and monomer comprising alkylene oxide repeat units |
EP2949716B1 (en) | 2013-01-28 | 2020-04-29 | Nippon Soda Co., Ltd. | Coating agent |
US20160362567A1 (en) * | 2013-11-28 | 2016-12-15 | Jnc Corporation | Photocurable inkjet ink |
US20180273793A1 (en) * | 2015-12-21 | 2018-09-27 | Nippon Soda Co., Ltd. | Coating agent |
US10498808B2 (en) | 2018-03-28 | 2019-12-03 | Bank Of America Corporation | Blockchain-based property management |
US11475422B2 (en) | 2018-03-28 | 2022-10-18 | Bank Of America Corporation | Blockchain-based property management |
US11295402B2 (en) | 2018-03-28 | 2022-04-05 | Bank Of America Corporation | Blockchain-based property repair |
WO2020012329A2 (en) | 2018-07-12 | 2020-01-16 | 3M Innovative Properties Company | Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer |
US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
WO2020234776A1 (en) | 2019-05-22 | 2020-11-26 | 3M Innovative Properties Company | Composition comprising styrene isoprene block copolymer and ethylenically unsaturated monomer |
KR20200139426A (ko) * | 2019-06-04 | 2020-12-14 | 주식회사 동진쎄미켐 | 광중합성 조성물 및 이를 이용한 경화막, 표시장치 |
EP4018023B1 (en) | 2019-08-21 | 2023-11-01 | 3M Innovative Properties Company | Core-sheath filaments including diene-based rubbers and methods of making the same |
US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
US20210155584A1 (en) * | 2019-11-27 | 2021-05-27 | Facebook Technologies, Llc | Aromatic substituted methane-core monomers and polymers thereof for volume bragg gratings |
US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
Family Cites Families (42)
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US4576850A (en) * | 1978-07-20 | 1986-03-18 | Minnesota Mining And Manufacturing Company | Shaped plastic articles having replicated microstructure surfaces |
DE3223104A1 (de) * | 1982-06-21 | 1983-12-22 | Hoechst Ag, 6230 Frankfurt | Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial |
EP0109073B1 (en) * | 1982-11-11 | 1988-04-13 | Showa Denko Kabushiki Kaisha | Polymerizable compositions |
JPS5986615A (ja) | 1982-11-11 | 1984-05-18 | Showa Denko Kk | 重合性組成物 |
DE3479651D1 (en) | 1983-05-20 | 1989-10-12 | Showa Denko Kk | Naphthalene derivative, polymerizable composition containing the same and polymer obtainable by polymerizing this composition |
JPS61127712A (ja) | 1984-11-27 | 1986-06-16 | Mitsui Toatsu Chem Inc | 高屈折率レンズ用樹脂 |
FR2577229B1 (fr) * | 1985-02-08 | 1987-02-20 | Rhone Poulenc Spec Chim | Compositions thermodurcissables a base de prepolymere a groupements imides stables au stockage et procede de preparation |
AU616064B2 (en) * | 1988-10-20 | 1991-10-17 | Sumitomo Seika Chemicals Co., Ltd. | 4,4'-bis(methacryloylthio)diphenyl sulfide and curable composition containing same |
US5334681A (en) * | 1989-06-20 | 1994-08-02 | Ciba-Geigy Corporation | Fluorine and/or silicone containing poly(alkylene-oxide)-block copolymer hydrogels and contact lenses thereof |
JPH07110890B2 (ja) * | 1990-06-29 | 1995-11-29 | ダイキン工業株式会社 | 含フッ素共重合体およびそれを用いた塗料用組成物 |
JPH0558950A (ja) * | 1991-06-21 | 1993-03-09 | Nippon Kayaku Co Ltd | (メタ)アクリル酸エステル |
TW417034B (en) * | 1993-11-24 | 2001-01-01 | Canon Kk | Color filter, method for manufacturing it, and liquid crystal panel |
JP3397448B2 (ja) | 1994-05-30 | 2003-04-14 | 日本化薬株式会社 | 紫外線硬化型透過型スクリーン用樹脂組成物及びその硬化物 |
JP3604754B2 (ja) * | 1995-01-11 | 2004-12-22 | 積水化学工業株式会社 | 硬化性樹脂 |
JPH0987336A (ja) | 1995-09-19 | 1997-03-31 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物、レンズシートおよびバックライト |
JPH09272707A (ja) | 1996-04-04 | 1997-10-21 | Toagosei Co Ltd | 活性エネルギー線硬化型(メタ)アクリレート組成物 |
JPH11116625A (ja) | 1997-10-21 | 1999-04-27 | Nof Corp | プラスチック光学材料 |
JP3735196B2 (ja) | 1997-12-26 | 2006-01-18 | 三菱レイヨン株式会社 | 活性エネルギー線硬化性組成物およびそれを用いた光学シート |
US6329485B1 (en) * | 1998-12-11 | 2001-12-11 | Bausch & Lomb Incorporated | High refractive index hydrogel compositions for ophthalmic implants |
US6458908B1 (en) * | 1999-06-01 | 2002-10-01 | Mitsui Chemicals, Inc. | Sulfur-containing unsaturated carboxylate compound and its cured products |
US6541591B2 (en) * | 2000-12-21 | 2003-04-01 | 3M Innovative Properties Company | High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers |
JP4782949B2 (ja) | 2001-07-19 | 2011-09-28 | 日本化薬株式会社 | 高屈折率(メタ)アクリル酸エステル化合物を含有する樹脂組成物 |
US7553544B2 (en) | 2001-11-30 | 2009-06-30 | Nikon Corporation | Precursor composition for optical resin, resin for optical use, optical element, and optical article |
JP4117832B2 (ja) * | 2002-12-06 | 2008-07-16 | 日東電工株式会社 | 重合性テルフェニル液晶化合物、液晶性組成物、コレステリック液晶組成物、光学フィルム、及び画像表示装置 |
JP2004231704A (ja) | 2003-01-28 | 2004-08-19 | Toagosei Co Ltd | 硬化型組成物 |
GB0304011D0 (en) | 2003-02-21 | 2003-03-26 | Microsharp Corp Ltd | High refractive index material |
JP2004323557A (ja) | 2003-04-21 | 2004-11-18 | Toagosei Co Ltd | 硬化型組成物及びその硬化物 |
US20060132945A1 (en) * | 2003-06-06 | 2006-06-22 | Koichi Sano | Microstructured optical film and production process thereof |
JP2004361835A (ja) | 2003-06-06 | 2004-12-24 | Three M Innovative Properties Co | 光学フィルム及びその製造方法 |
US7282272B2 (en) * | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
US7074463B2 (en) * | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
US20050147838A1 (en) * | 2003-12-30 | 2005-07-07 | 3M Innovative Properties Company | Polymerizable compositions for optical articles |
US20050148735A1 (en) * | 2003-12-30 | 2005-07-07 | Olson David B. | Polymerizable composition for optical articles |
JP2005272773A (ja) | 2004-03-26 | 2005-10-06 | Toagosei Co Ltd | 活性エネルギー線硬化型光学材料用組成物 |
JP2005283632A (ja) | 2004-03-26 | 2005-10-13 | Fuji Photo Film Co Ltd | 重合性組成物およびネガ型画像記録材料 |
US20060128853A1 (en) * | 2004-12-13 | 2006-06-15 | General Electric Company | Compositions for articles comprising replicated microstructures |
WO2006098899A2 (en) * | 2005-03-11 | 2006-09-21 | 3M Innovative Properties Company | Light management films with zirconia particles |
JP2006308840A (ja) | 2005-04-28 | 2006-11-09 | Nippon Kayaku Co Ltd | 光学レンズ用高屈折率樹脂組成物およびその硬化物 |
JP4802707B2 (ja) * | 2005-05-17 | 2011-10-26 | 住友化学株式会社 | 光制御膜 |
US7547467B2 (en) * | 2005-11-15 | 2009-06-16 | 3M Innovative Properties Company | Brightness enhancing film and methods of surface treating inorganic nanoparticles |
JP2010519599A (ja) | 2007-02-27 | 2010-06-03 | スリーエム イノベイティブ プロパティズ カンパニー | 耐亀裂性が改良されたナノコンポジット構造を備えた輝度向上フィルム |
US20080221291A1 (en) * | 2007-03-07 | 2008-09-11 | 3M Innovative Properties Company | Microstructured optical films comprising biphenyl difunctional monomers |
-
2008
- 2008-03-03 WO PCT/US2008/055654 patent/WO2008112452A2/en active Application Filing
- 2008-03-03 EP EP08754848.3A patent/EP2125914B1/en not_active Not-in-force
- 2008-03-03 JP JP2009552821A patent/JP5443177B2/ja not_active Expired - Fee Related
- 2008-03-03 US US12/528,636 patent/US8586154B2/en not_active Expired - Fee Related
- 2008-03-03 KR KR1020097021004A patent/KR101494026B1/ko not_active IP Right Cessation
-
2013
- 2013-09-10 US US14/022,375 patent/US8871315B2/en not_active Expired - Fee Related
-
2014
- 2014-10-01 US US14/503,459 patent/US9221743B2/en not_active Expired - Fee Related
-
2015
- 2015-11-20 US US14/947,421 patent/US9885807B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7194355B2 (ja) | 2016-07-21 | 2022-12-22 | 三菱瓦斯化学株式会社 | 化合物、樹脂、組成物及びパターン形成方法 |
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