JP2010183064A5 - - Google Patents
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- Publication number
- JP2010183064A5 JP2010183064A5 JP2009283148A JP2009283148A JP2010183064A5 JP 2010183064 A5 JP2010183064 A5 JP 2010183064A5 JP 2009283148 A JP2009283148 A JP 2009283148A JP 2009283148 A JP2009283148 A JP 2009283148A JP 2010183064 A5 JP2010183064 A5 JP 2010183064A5
- Authority
- JP
- Japan
- Prior art keywords
- photocurable
- ips
- providing
- polyfunctional
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000463 material Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical group [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 16
- -1 perfluoro fluorine Chemical compound 0.000 claims description 15
- 150000002118 epoxides Chemical group 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 9
- 239000012949 free radical photoinitiator Substances 0.000 claims description 8
- 239000012952 cationic photoinitiator Substances 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 4
- 125000002091 cationic group Chemical group 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims 9
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 3
- 239000004094 surface-active agent Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical class FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 2
- 238000001127 nanoimprint lithography Methods 0.000 claims 2
- 238000004381 surface treatment Methods 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- 229920002554 vinyl polymer Chemical group 0.000 claims 2
- 239000007983 Tris buffer Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 230000000977 initiatory effect Effects 0.000 claims 1
- 239000000126 substance Chemical group 0.000 claims 1
- 208000014117 bile duct papillary neoplasm Diseases 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- BESKSSIEODQWBP-UHFFFAOYSA-N 3-tris(trimethylsilyloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C BESKSSIEODQWBP-UHFFFAOYSA-N 0.000 description 1
- GHYMLBPVGKHIFE-UHFFFAOYSA-N CC(C)(CCOCCC(C)(C)OC(C=C)=O)C(C(C(C(CF)(F)F)(F)F)(F)F)(F)F Chemical compound CC(C)(CCOCCC(C)(C)OC(C=C)=O)C(C(C(C(CF)(F)F)(F)F)(F)F)(F)F GHYMLBPVGKHIFE-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- JZDGWLGMEGSUGH-UHFFFAOYSA-N phenyl-(2,4,6-trimethylbenzoyl)phosphinic acid Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(O)(=O)C1=CC=CC=C1 JZDGWLGMEGSUGH-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- GRJISGHXMUQUMC-UHFFFAOYSA-N silyl prop-2-enoate Chemical class [SiH3]OC(=O)C=C GRJISGHXMUQUMC-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13903008P | 2008-12-19 | 2008-12-19 | |
| US61/139,030 | 2008-12-19 | ||
| EP08172342.1 | 2008-12-19 | ||
| EP08172342.1A EP2199855B1 (en) | 2008-12-19 | 2008-12-19 | Methods and processes for modifying polymer material surface interactions |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015022431A Division JP5838002B2 (ja) | 2008-12-19 | 2015-02-06 | ポリマー材料表面相互作用を変えるための方法及びプロセス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010183064A JP2010183064A (ja) | 2010-08-19 |
| JP2010183064A5 true JP2010183064A5 (https=) | 2014-04-24 |
| JP5725465B2 JP5725465B2 (ja) | 2015-05-27 |
Family
ID=40521956
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009283148A Active JP5725465B2 (ja) | 2008-12-19 | 2009-12-14 | ポリマー材料表面相互作用を変えるための方法及びプロセス |
| JP2015022431A Active JP5838002B2 (ja) | 2008-12-19 | 2015-02-06 | ポリマー材料表面相互作用を変えるための方法及びプロセス |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015022431A Active JP5838002B2 (ja) | 2008-12-19 | 2015-02-06 | ポリマー材料表面相互作用を変えるための方法及びプロセス |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9063408B2 (https=) |
| EP (1) | EP2199855B1 (https=) |
| JP (2) | JP5725465B2 (https=) |
| KR (1) | KR101767179B1 (https=) |
| CN (1) | CN101872115B (https=) |
| SG (1) | SG162674A1 (https=) |
| TW (1) | TWI515510B (https=) |
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| KR101653626B1 (ko) * | 2009-07-13 | 2016-09-02 | 주식회사 동진쎄미켐 | 광경화형 함불소 수지 조성물 및 이를 이용한 수지 몰드의 제조방법 |
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| CN102791452B (zh) * | 2010-03-10 | 2015-07-08 | 旭化成电子材料株式会社 | 树脂模具 |
| SG10201506124TA (en) | 2010-08-06 | 2015-09-29 | Soken Kagaku Kk | Resin Mold For Nanoimprinting And Production Method Thereof |
| WO2012025316A1 (en) * | 2010-08-26 | 2012-03-01 | Asml Netherlands B.V. | Imprint lithography method and imprintable medium |
| JP5306404B2 (ja) * | 2011-03-25 | 2013-10-02 | 株式会社東芝 | パターン形成方法 |
| NL2010004A (en) * | 2012-01-13 | 2013-07-16 | Asml Netherlands Bv | Self-assemblable polymer and methods for use in lithography. |
| JP5959865B2 (ja) * | 2012-02-09 | 2016-08-02 | キヤノン株式会社 | 光硬化物及びその製造方法 |
| JP6090732B2 (ja) * | 2012-05-14 | 2017-03-08 | 東洋合成工業株式会社 | 光インプリント方法 |
| US10126648B2 (en) * | 2012-05-25 | 2018-11-13 | Micro Resist Technology Gesellschaft Für Chemische Materialien Spezieller Protoresistsysteme Gmbh | Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof |
| JP6071255B2 (ja) * | 2012-06-04 | 2017-02-01 | キヤノン株式会社 | 光硬化物 |
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| JP6371076B2 (ja) * | 2014-02-24 | 2018-08-08 | 旭化成株式会社 | フィルム状モールドの製造方法 |
| US10754244B2 (en) * | 2016-03-31 | 2020-08-25 | Canon Kabushiki Kaisha | Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold |
| JP6754344B2 (ja) * | 2017-09-26 | 2020-09-09 | 富士フイルム株式会社 | インプリント用下層膜形成用組成物、キット、積層体、積層体の製造方法、硬化物パターンの製造方法、回路基板の製造方法 |
| JP2018166222A (ja) * | 2018-07-13 | 2018-10-25 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | スタンパ構造を備えたスタンパ並びにその製造方法 |
| US11549020B2 (en) | 2019-09-23 | 2023-01-10 | Canon Kabushiki Kaisha | Curable composition for nano-fabrication |
| US11975478B2 (en) * | 2020-04-24 | 2024-05-07 | Illumina Cambridge Limited | Flow cells |
| CN112731764A (zh) * | 2020-12-29 | 2021-04-30 | 苏州理硕科技有限公司 | 负性光刻胶组合物和形成光刻胶图案的方法 |
| EP4263868A4 (en) | 2021-03-12 | 2024-11-27 | Singular Genomics Systems, Inc. | NANONETWORKS AND METHODS OF USE THEREOF |
| US11884977B2 (en) | 2021-03-12 | 2024-01-30 | Singular Genomics Systems, Inc. | Nanoarrays and methods of use thereof |
| WO2022232308A1 (en) | 2021-04-27 | 2022-11-03 | Singular Genomics Systems, Inc. | High density sequencing and multiplexed priming |
| WO2023023638A1 (en) | 2021-08-20 | 2023-02-23 | Singular Genomics Systems, Inc. | Chemical and thermal assisted nucleic acid amplification methods |
| EP4396372A2 (en) | 2021-09-03 | 2024-07-10 | Singular Genomics Systems, Inc. | Amplification oligonucleotides |
| EP4422792A4 (en) | 2021-10-26 | 2025-12-17 | Singular Genomics Systems Inc | TARGETED MULTIPLEX AMPLIFICATION OF POLYNUCLEOTIDS |
| US20250188521A1 (en) | 2022-03-10 | 2025-06-12 | Singular Genomics Systems, Inc. | Nucleic acid delivery scaffolds |
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| TWI887123B (zh) * | 2024-09-20 | 2025-06-11 | 華碩電腦股份有限公司 | 壓印油墨及其壓印方法 |
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| EP2199854B1 (en) * | 2008-12-19 | 2015-12-16 | Obducat AB | Hybrid polymer mold for nano-imprinting and method for making the same |
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2008
- 2008-12-19 EP EP08172342.1A patent/EP2199855B1/en active Active
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2009
- 2009-12-04 SG SG200908085-4A patent/SG162674A1/en unknown
- 2009-12-10 US US12/635,329 patent/US9063408B2/en active Active
- 2009-12-14 JP JP2009283148A patent/JP5725465B2/ja active Active
- 2009-12-16 TW TW098143041A patent/TWI515510B/zh active
- 2009-12-17 CN CN200910261311.2A patent/CN101872115B/zh active Active
- 2009-12-18 KR KR1020090126769A patent/KR101767179B1/ko active Active
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2015
- 2015-02-06 JP JP2015022431A patent/JP5838002B2/ja active Active
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