KR101767179B1 - 폴리머 물질 표면 상호작용을 변화시키는 방법 및 공정 - Google Patents

폴리머 물질 표면 상호작용을 변화시키는 방법 및 공정 Download PDF

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KR101767179B1
KR101767179B1 KR1020090126769A KR20090126769A KR101767179B1 KR 101767179 B1 KR101767179 B1 KR 101767179B1 KR 1020090126769 A KR1020090126769 A KR 1020090126769A KR 20090126769 A KR20090126769 A KR 20090126769A KR 101767179 B1 KR101767179 B1 KR 101767179B1
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delete delete
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resist
acrylate
substrate
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Korean (ko)
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KR20100071925A (ko
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야콥 닐손
마티아스 킬 킬
요한 링
바박 에이다리
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오브듀캇 아베
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
KR1020090126769A 2008-12-19 2009-12-18 폴리머 물질 표면 상호작용을 변화시키는 방법 및 공정 Active KR101767179B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13903008P 2008-12-19 2008-12-19
US61/139,030 2008-12-19
EP08172342.1 2008-12-19
EP08172342.1A EP2199855B1 (en) 2008-12-19 2008-12-19 Methods and processes for modifying polymer material surface interactions

Publications (2)

Publication Number Publication Date
KR20100071925A KR20100071925A (ko) 2010-06-29
KR101767179B1 true KR101767179B1 (ko) 2017-08-10

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KR1020090126769A Active KR101767179B1 (ko) 2008-12-19 2009-12-18 폴리머 물질 표면 상호작용을 변화시키는 방법 및 공정

Country Status (7)

Country Link
US (1) US9063408B2 (https=)
EP (1) EP2199855B1 (https=)
JP (2) JP5725465B2 (https=)
KR (1) KR101767179B1 (https=)
CN (1) CN101872115B (https=)
SG (1) SG162674A1 (https=)
TW (1) TWI515510B (https=)

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Also Published As

Publication number Publication date
EP2199855A1 (en) 2010-06-23
JP5838002B2 (ja) 2015-12-24
JP2015097293A (ja) 2015-05-21
US20100160478A1 (en) 2010-06-24
TW201027251A (en) 2010-07-16
EP2199855B1 (en) 2016-07-20
HK1149804A1 (en) 2011-10-14
KR20100071925A (ko) 2010-06-29
TWI515510B (zh) 2016-01-01
JP5725465B2 (ja) 2015-05-27
CN101872115B (zh) 2015-09-30
JP2010183064A (ja) 2010-08-19
CN101872115A (zh) 2010-10-27
US9063408B2 (en) 2015-06-23
SG162674A1 (en) 2010-07-29

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