JP2010177454A - 絶縁ゲート型半導体装置 - Google Patents
絶縁ゲート型半導体装置 Download PDFInfo
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- JP2010177454A JP2010177454A JP2009018517A JP2009018517A JP2010177454A JP 2010177454 A JP2010177454 A JP 2010177454A JP 2009018517 A JP2009018517 A JP 2009018517A JP 2009018517 A JP2009018517 A JP 2009018517A JP 2010177454 A JP2010177454 A JP 2010177454A
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- electrode layer
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 59
- 239000000758 substrate Substances 0.000 claims description 57
- 230000001681 protective effect Effects 0.000 claims description 38
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 255
- 150000004767 nitrides Chemical class 0.000 description 13
- 239000012535 impurity Substances 0.000 description 12
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 12
- 229920005591 polysilicon Polymers 0.000 description 12
- 108091006146 Channels Proteins 0.000 description 11
- 210000000746 body region Anatomy 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
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- 239000004642 Polyimide Substances 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
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Abstract
【解決手段】電極構造を2層とし、ゲートパッド部と非重畳で保護ダイオードを配置する。ゲートパッド部下方にセルおよび1層目のソース電極層を配置でき、ソース電極層内の抵抗の偏りを小さくできる。更に、保護ダイオードを素子領域と隣接してその外側のチップ端部で且つ、ゲートパッド部と直近に配置する。これにより効率的にトランジスタ動作を行える素子領域を大きく確保でき、且つ配線部下方の第1ソース電極層抵抗を低減できる。
【選択図】図1
Description
2 n−型半導体層
4 チャネル層
7 トレンチ
10、10’ MOSFET
11 ゲート絶縁膜
13 ゲート電極
14 ボディ領域
15 ソース領域
16 層間絶縁膜
17 第1ソース電極層
18 第1ゲート電極層
19 第1ドレイン電極層
20 素子領域
21 セル
23 第1絶縁膜(窒化膜)
24 UBM
25 第2絶縁膜
27 第2ソース電極層
28 第2ゲート電極層
29 第2ドレイン電極層
28p ゲートパッド部
28w 配線部
28c コンタクト部
27p ソースパッド部
29p ドレインパッド部
37 ソースバンプ電極
38 ゲートバンプ電極
39 ドレインバンプ電極
200、210 MOSFET
217 第1ソース電極層
218 第1ゲート電極層
227 第2ソース電極層
227p ソースパッド部
228 第2ゲート電極層
228p ゲートパッド部
Claims (7)
- 一導電型半導体基板と、
該半導体基板に設けられ絶縁ゲート型トランジスタのセルが複数配置された素子領域と、
前記半導体基板上に設けられて前記素子領域の一の部分と直接接触せず上方を覆い、該素子領域に接続する第1端子電極層と、
前記半導体基板上に設けられて前記素子領域の他の部分と直接接触せず上方を覆い、該素子領域に制御信号を印加する外部接続手段が固着するパッド部を有する第2端子電極層と、
前記素子領域外で該素子領域に隣接して設けられた保護ダイオードとを具備し、
前記パッド部と前記保護ダイオードを非重畳でかつ直近に配置することを特徴とする絶縁ゲート型半導体装置。 - 前記第2端子電極層は、前記パッド部から前記保護ダイオード上まで最短距離で延在する配線部を有することを特徴とする請求項1に記載の絶縁ゲート型半導体装置。
- 前記パッド部下方に前記セルが配置されることを特徴とする請求項1または請求項2に記載の絶縁ゲート型半導体装置。
- 前記第1端子電極層下方に該第1端子電極層と接続する他の第1端子電極層が設けられ、前記第2端子電極層下方の前記素子領域外に該第2端子電極層および前記素子領域と接続する他の第2端子電極層が設けられることを特徴とする請求項3に記載の絶縁ゲート型半導体装置。
- 前記他の第2端子電極層下方で前記半導体基板上に前記保護ダイオードが配置され、該保護ダイオードの一端は前記他の第1端子電極層に接続し、他端は前記素子領域のゲート電極に接続されることを特徴とする請求項4に記載の絶縁ゲート型半導体装置。
- 前記配線部は前記他の第2端子電極層に接続することを特徴とする請求項5に記載の絶縁ゲート型半導体装置。
- 前記配線部下方に前記セルが配置されることを特徴とする請求項6に記載の絶縁ゲート型半導体装置。
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