JP2010118664A5 - - Google Patents
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- Publication number
- JP2010118664A5 JP2010118664A5 JP2009259203A JP2009259203A JP2010118664A5 JP 2010118664 A5 JP2010118664 A5 JP 2010118664A5 JP 2009259203 A JP2009259203 A JP 2009259203A JP 2009259203 A JP2009259203 A JP 2009259203A JP 2010118664 A5 JP2010118664 A5 JP 2010118664A5
- Authority
- JP
- Japan
- Prior art keywords
- bis
- divinylsilane
- diallylsilane
- vinyl
- based precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- 239000002243 precursor Substances 0.000 claims 7
- JKAIQRHZPWVOQN-UHFFFAOYSA-N aminosilylethene Chemical compound N[SiH2]C=C JKAIQRHZPWVOQN-UHFFFAOYSA-N 0.000 claims 5
- 239000010409 thin film Substances 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 4
- 229920002554 vinyl polymer Polymers 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 3
- -1 isopropylamino Chemical group 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 3
- 239000000376 reactant Substances 0.000 claims 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 2
- 150000001336 alkenes Chemical class 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 125000000524 functional group Chemical group 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- WWDXBDRBEKUZOS-UHFFFAOYSA-N n-[bis(ethenyl)-(propan-2-ylamino)silyl]propan-2-amine Chemical compound CC(C)N[Si](C=C)(C=C)NC(C)C WWDXBDRBEKUZOS-UHFFFAOYSA-N 0.000 claims 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- IUWOFVSRONFKBV-UHFFFAOYSA-N 1-tert-butyl-2-[(2-tert-butylhydrazinyl)-bis(ethenyl)silyl]hydrazine Chemical compound CC(C)(C)NN[Si](C=C)(C=C)NNC(C)(C)C IUWOFVSRONFKBV-UHFFFAOYSA-N 0.000 claims 1
- CKPCWHCCTJSKHK-UHFFFAOYSA-N CC(C)N[SiH](CC=C)NC(C)C Chemical group CC(C)N[SiH](CC=C)NC(C)C CKPCWHCCTJSKHK-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- QIYXRFMWGJJGGK-UHFFFAOYSA-N bis(ethenyl)-dipyrrolidin-1-ylsilane Chemical compound C1CCCN1[Si](C=C)(C=C)N1CCCC1 QIYXRFMWGJJGGK-UHFFFAOYSA-N 0.000 claims 1
- PMSZNCMIJVNSPB-UHFFFAOYSA-N bis(ethenyl)silicon Chemical compound C=C[Si]C=C PMSZNCMIJVNSPB-UHFFFAOYSA-N 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 claims 1
- 239000003085 diluting agent Substances 0.000 claims 1
- 238000010790 dilution Methods 0.000 claims 1
- 239000012895 dilution Substances 0.000 claims 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- YTMGVLAWLCOWNT-UHFFFAOYSA-N n-[bis(ethenyl)-[ethyl(methyl)amino]silyl]-n-methylethanamine Chemical compound CCN(C)[Si](C=C)(C=C)N(C)CC YTMGVLAWLCOWNT-UHFFFAOYSA-N 0.000 claims 1
- 229910052754 neon Inorganic materials 0.000 claims 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052724 xenon Inorganic materials 0.000 claims 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11362408P | 2008-11-12 | 2008-11-12 | |
| US61/113,624 | 2008-11-12 | ||
| US12/609,542 US8580993B2 (en) | 2008-11-12 | 2009-10-30 | Amino vinylsilane precursors for stressed SiN films |
| US12/609,542 | 2009-10-30 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012214658A Division JP5508496B2 (ja) | 2008-11-12 | 2012-09-27 | 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010118664A JP2010118664A (ja) | 2010-05-27 |
| JP2010118664A5 true JP2010118664A5 (enExample) | 2011-11-04 |
| JP5175261B2 JP5175261B2 (ja) | 2013-04-03 |
Family
ID=41509788
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009259203A Expired - Fee Related JP5175261B2 (ja) | 2008-11-12 | 2009-11-12 | 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体 |
| JP2012214658A Active JP5508496B2 (ja) | 2008-11-12 | 2012-09-27 | 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012214658A Active JP5508496B2 (ja) | 2008-11-12 | 2012-09-27 | 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8580993B2 (enExample) |
| EP (2) | EP2465861A1 (enExample) |
| JP (2) | JP5175261B2 (enExample) |
| KR (2) | KR101396139B1 (enExample) |
| CN (2) | CN101899651B (enExample) |
| TW (2) | TWI412622B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8580993B2 (en) * | 2008-11-12 | 2013-11-12 | Air Products And Chemicals, Inc. | Amino vinylsilane precursors for stressed SiN films |
| US8889235B2 (en) * | 2009-05-13 | 2014-11-18 | Air Products And Chemicals, Inc. | Dielectric barrier deposition using nitrogen containing precursor |
| US8637411B2 (en) | 2010-04-15 | 2014-01-28 | Novellus Systems, Inc. | Plasma activated conformal dielectric film deposition |
| US9373500B2 (en) | 2014-02-21 | 2016-06-21 | Lam Research Corporation | Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications |
| US9892917B2 (en) | 2010-04-15 | 2018-02-13 | Lam Research Corporation | Plasma assisted atomic layer deposition of multi-layer films for patterning applications |
| US9257274B2 (en) | 2010-04-15 | 2016-02-09 | Lam Research Corporation | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method |
| US9997357B2 (en) | 2010-04-15 | 2018-06-12 | Lam Research Corporation | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors |
| US8460753B2 (en) | 2010-12-09 | 2013-06-11 | Air Products And Chemicals, Inc. | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes |
| US8647993B2 (en) * | 2011-04-11 | 2014-02-11 | Novellus Systems, Inc. | Methods for UV-assisted conformal film deposition |
| KR20160093093A (ko) | 2011-06-03 | 2016-08-05 | 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 | 탄소-도핑된 규소-함유 막을 증착시키기 위한 조성물 및 방법 |
| SG2013083654A (en) | 2012-11-08 | 2014-06-27 | Novellus Systems Inc | Methods for depositing films on sensitive substrates |
| US9564312B2 (en) | 2014-11-24 | 2017-02-07 | Lam Research Corporation | Selective inhibition in atomic layer deposition of silicon-containing films |
| US10566187B2 (en) | 2015-03-20 | 2020-02-18 | Lam Research Corporation | Ultrathin atomic layer deposition film accuracy thickness control |
| KR20170019668A (ko) * | 2015-08-12 | 2017-02-22 | (주)디엔에프 | 플라즈마 원자층 증착법을 이용한 실리콘 질화 박막의 제조방법 |
| US9773643B1 (en) | 2016-06-30 | 2017-09-26 | Lam Research Corporation | Apparatus and method for deposition and etch in gap fill |
| US10062563B2 (en) | 2016-07-01 | 2018-08-28 | Lam Research Corporation | Selective atomic layer deposition with post-dose treatment |
| WO2018016871A1 (ko) * | 2016-07-22 | 2018-01-25 | (주)디엔에프 | 플라즈마 원자층 증착법을 이용한 실리콘 질화 박막의 제조방법 |
| US10037884B2 (en) | 2016-08-31 | 2018-07-31 | Lam Research Corporation | Selective atomic layer deposition for gapfill using sacrificial underlayer |
| US10269559B2 (en) | 2017-09-13 | 2019-04-23 | Lam Research Corporation | Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer |
| CN114127890B (zh) | 2019-05-01 | 2025-10-14 | 朗姆研究公司 | 调整的原子层沉积 |
| KR20220006663A (ko) | 2019-06-07 | 2022-01-17 | 램 리써치 코포레이션 | 원자 층 증착 동안 막 특성들의 인-시츄 (in-situ) 제어 |
| KR102727074B1 (ko) * | 2020-03-19 | 2024-11-06 | 삼성디스플레이 주식회사 | 표시 장치 |
| TWI798765B (zh) * | 2020-07-24 | 2023-04-11 | 美商慧盛材料美國責任有限公司 | 用於鍺種子層的組合物及使用其的方法 |
| WO2023102376A1 (en) * | 2021-12-01 | 2023-06-08 | Lam Research Corporation | Deposition of high compressive stress thermally stable nitride film |
| CN114447435A (zh) * | 2022-01-21 | 2022-05-06 | 恒实科技发展(南京)有限公司 | 用于锂二次电池的非水电解液及其制备方法和应用 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2854787B2 (ja) * | 1993-08-31 | 1999-02-03 | 信越化学工業株式会社 | シリコーンゴム組成物の製造方法 |
| JP3430097B2 (ja) | 1999-12-22 | 2003-07-28 | 日本電気株式会社 | 薄膜トランジスタアレイ基板の製造方法 |
| JP2002246381A (ja) * | 2001-02-15 | 2002-08-30 | Anelva Corp | Ｃｖｄ方法 |
| JP2004223769A (ja) * | 2003-01-20 | 2004-08-12 | Dainippon Printing Co Ltd | 透明積層フィルム、反射防止フィルム及びそれを用いた偏光板、液晶表示装置 |
| US7122222B2 (en) * | 2003-01-23 | 2006-10-17 | Air Products And Chemicals, Inc. | Precursors for depositing silicon containing films and processes thereof |
| US7579496B2 (en) * | 2003-10-10 | 2009-08-25 | Advanced Technology Materials, Inc. | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same |
| JP2005310861A (ja) | 2004-04-19 | 2005-11-04 | Mitsui Chemicals Inc | 炭化窒化珪素膜の形成方法 |
| US7129187B2 (en) * | 2004-07-14 | 2006-10-31 | Tokyo Electron Limited | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films |
| US20060045986A1 (en) | 2004-08-30 | 2006-03-02 | Hochberg Arthur K | Silicon nitride from aminosilane using PECVD |
| JP2006120992A (ja) | 2004-10-25 | 2006-05-11 | C Bui Res:Kk | シリコン窒化膜の製造方法及びその製造装置 |
| US20060182885A1 (en) * | 2005-02-14 | 2006-08-17 | Xinjian Lei | Preparation of metal silicon nitride films via cyclic deposition |
| JP2006294485A (ja) | 2005-04-13 | 2006-10-26 | Konica Minolta Holdings Inc | 有機エレクトロルミネッセンス素子、その製造方法及び表示装置 |
| US7875556B2 (en) | 2005-05-16 | 2011-01-25 | Air Products And Chemicals, Inc. | Precursors for CVD silicon carbo-nitride and silicon nitride films |
| US7732342B2 (en) | 2005-05-26 | 2010-06-08 | Applied Materials, Inc. | Method to increase the compressive stress of PECVD silicon nitride films |
| ES2389665T3 (es) * | 2005-05-31 | 2012-10-30 | Toho Titanium Co., Ltd. | Compuestos aminosilánicos, componentes catalíticos y catalizadores para la polimerización de olefinas, y procedimiento para la producción de polímeros olefínicos con los mismos |
| JP2007092166A (ja) * | 2005-09-02 | 2007-04-12 | Japan Advanced Institute Of Science & Technology Hokuriku | 薄膜堆積装置、薄膜堆積方法及び化合物薄膜 |
| US20080142046A1 (en) * | 2006-12-13 | 2008-06-19 | Andrew David Johnson | Thermal F2 etch process for cleaning CVD chambers |
| US7790635B2 (en) * | 2006-12-14 | 2010-09-07 | Applied Materials, Inc. | Method to increase the compressive stress of PECVD dielectric films |
| US20100003483A1 (en) | 2007-02-05 | 2010-01-07 | Kazuhiro Fukuda | Transparent gas barrier film |
| JP5391557B2 (ja) * | 2007-02-28 | 2014-01-15 | 住友化学株式会社 | 共役ジエン系重合体、共役ジエン系重合体の製造方法及び共役ジエン系重合体組成物 |
| US8580993B2 (en) * | 2008-11-12 | 2013-11-12 | Air Products And Chemicals, Inc. | Amino vinylsilane precursors for stressed SiN films |
-
2009
- 2009-10-30 US US12/609,542 patent/US8580993B2/en not_active Expired - Fee Related
- 2009-11-09 TW TW098137987A patent/TWI412622B/zh not_active IP Right Cessation
- 2009-11-09 TW TW100140431A patent/TWI437117B/zh not_active IP Right Cessation
- 2009-11-11 KR KR1020090108666A patent/KR101396139B1/ko not_active Expired - Fee Related
- 2009-11-12 JP JP2009259203A patent/JP5175261B2/ja not_active Expired - Fee Related
- 2009-11-12 CN CN2009102468369A patent/CN101899651B/zh not_active Expired - Fee Related
- 2009-11-12 EP EP12159248A patent/EP2465861A1/en not_active Withdrawn
- 2009-11-12 CN CN201110404812.9A patent/CN102491990B/zh not_active Expired - Fee Related
- 2009-11-12 EP EP09175806A patent/EP2192207B1/en not_active Not-in-force
-
2012
- 2012-09-27 JP JP2012214658A patent/JP5508496B2/ja active Active
- 2012-12-28 KR KR1020120156542A patent/KR101553863B1/ko not_active Expired - Fee Related
-
2013
- 2013-11-04 US US14/070,957 patent/US20140065844A1/en not_active Abandoned
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