JP2009539626A5 - - Google Patents

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Publication number
JP2009539626A5
JP2009539626A5 JP2009513475A JP2009513475A JP2009539626A5 JP 2009539626 A5 JP2009539626 A5 JP 2009539626A5 JP 2009513475 A JP2009513475 A JP 2009513475A JP 2009513475 A JP2009513475 A JP 2009513475A JP 2009539626 A5 JP2009539626 A5 JP 2009539626A5
Authority
JP
Japan
Prior art keywords
substrate
flexible membrane
central chamber
pressing
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009513475A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009539626A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2007/070243 external-priority patent/WO2007143566A2/en
Publication of JP2009539626A publication Critical patent/JP2009539626A/ja
Publication of JP2009539626A5 publication Critical patent/JP2009539626A5/ja
Pending legal-status Critical Current

Links

JP2009513475A 2006-06-02 2007-06-01 メンブレン膨張ステップなしの研磨ヘッドへの高速基板ローディング Pending JP2009539626A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81041506P 2006-06-02 2006-06-02
PCT/US2007/070243 WO2007143566A2 (en) 2006-06-02 2007-06-01 Fast substrate loading on polishing head without membrane inflation step

Publications (2)

Publication Number Publication Date
JP2009539626A JP2009539626A (ja) 2009-11-19
JP2009539626A5 true JP2009539626A5 (enExample) 2010-07-22

Family

ID=38802256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009513475A Pending JP2009539626A (ja) 2006-06-02 2007-06-01 メンブレン膨張ステップなしの研磨ヘッドへの高速基板ローディング

Country Status (4)

Country Link
US (1) US7527271B2 (enExample)
JP (1) JP2009539626A (enExample)
TW (1) TWI354347B (enExample)
WO (1) WO2007143566A2 (enExample)

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FR2898657B1 (fr) * 2006-03-16 2008-04-18 Novatec Sa Procede de mise en oeuvre d'un support intercalaire universel
JP5074125B2 (ja) * 2007-08-09 2012-11-14 リンテック株式会社 固定治具並びにワークの処理方法
WO2009066351A1 (ja) * 2007-11-20 2009-05-28 Shin-Etsu Handotai Co., Ltd. 研磨ヘッド及び研磨装置
KR100931197B1 (ko) * 2008-02-22 2009-12-10 주식회사 실트론 웨이퍼 연마장치용 헤드 어셈블리
DE102008018536B4 (de) * 2008-04-12 2020-08-13 Erich Thallner Vorrichtung und Verfahren zum Aufbringen und/oder Ablösen eines Wafers auf einen/von einem Träger
JP5390807B2 (ja) * 2008-08-21 2014-01-15 株式会社荏原製作所 研磨方法および装置
US8454408B2 (en) 2008-11-26 2013-06-04 Applied Materials, Inc. Load cup substrate sensing
AT516595B1 (de) * 2009-03-05 2020-10-15 Thallner Erich Vorrichtung und Verfahren zum Aufbringen und/oder Ablösen eines Wafers auf einen/von einem Träger
US8460067B2 (en) 2009-05-14 2013-06-11 Applied Materials, Inc. Polishing head zone boundary smoothing
JP5648954B2 (ja) * 2010-08-31 2015-01-07 不二越機械工業株式会社 研磨装置
KR101801264B1 (ko) * 2011-06-13 2017-11-27 삼성전자주식회사 반도체 제조 장치 및 이를 이용한 반도체 패키지 방법
US10099327B2 (en) * 2012-08-28 2018-10-16 Nissan Motor Co., Ltd. Device for press-fitting oil seal
US8998678B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Spider arm driven flexible chamber abrading workholder
US8998677B2 (en) 2012-10-29 2015-04-07 Wayne O. Duescher Bellows driven floatation-type abrading workholder
US9233452B2 (en) 2012-10-29 2016-01-12 Wayne O. Duescher Vacuum-grooved membrane abrasive polishing wafer workholder
US8845394B2 (en) 2012-10-29 2014-09-30 Wayne O. Duescher Bellows driven air floatation abrading workholder
US9039488B2 (en) 2012-10-29 2015-05-26 Wayne O. Duescher Pin driven flexible chamber abrading workholder
US9604339B2 (en) 2012-10-29 2017-03-28 Wayne O. Duescher Vacuum-grooved membrane wafer polishing workholder
US9011207B2 (en) 2012-10-29 2015-04-21 Wayne O. Duescher Flexible diaphragm combination floating and rigid abrading workholder
US9199354B2 (en) 2012-10-29 2015-12-01 Wayne O. Duescher Flexible diaphragm post-type floating and rigid abrading workholder
WO2014145456A1 (en) * 2013-03-15 2014-09-18 Rudolph Technologies, Inc. Flexible handling system for semiconductor substrates
JP6454326B2 (ja) * 2014-04-18 2019-01-16 株式会社荏原製作所 基板処理装置、基板処理システム、および基板処理方法
CN107000158B (zh) * 2014-12-19 2020-11-06 应用材料公司 用于化学机械抛光工具的部件
KR102346786B1 (ko) * 2015-07-03 2022-01-04 주식회사 케이씨텍 화학 기계적 연마 시스템의 웨이퍼 로딩 장치
KR102461598B1 (ko) * 2015-12-18 2022-11-01 주식회사 케이씨텍 화학 기계적 연마 시스템의 기판 로딩 장치
US10510563B2 (en) * 2016-04-15 2019-12-17 Taiwan Semiconductor Manufacturing Company Ltd. Wafer carrier assembly
JP6650345B2 (ja) * 2016-05-26 2020-02-19 日本特殊陶業株式会社 基板保持装置及びその製造方法
US10618447B2 (en) * 2016-10-17 2020-04-14 Walmart Apollo, Llc Delivery vehicle and systems or parts thereof
KR102330274B1 (ko) * 2017-05-31 2021-11-24 주식회사 케이씨텍 기판 거치대 및 이를 구비한 기판 처리 장치
US10926378B2 (en) 2017-07-08 2021-02-23 Wayne O. Duescher Abrasive coated disk islands using magnetic font sheet
CN110142689B (zh) * 2019-04-17 2021-09-14 杭州众硅电子科技有限公司 一种晶圆装载支架、晶圆装载系统及晶圆装片方法
US11691241B1 (en) * 2019-08-05 2023-07-04 Keltech Engineering, Inc. Abrasive lapping head with floating and rigid workpiece carrier
US11945073B2 (en) * 2019-08-22 2024-04-02 Applied Materials, Inc. Dual membrane carrier head for chemical mechanical polishing
US11484987B2 (en) 2020-03-09 2022-11-01 Applied Materials, Inc. Maintenance methods for polishing systems and articles related thereto
US20230207326A1 (en) * 2021-12-29 2023-06-29 Canon Kabushiki Kaisha Planarization process, apparatus and method of manufacturing an article
US20240363371A1 (en) * 2023-04-28 2024-10-31 Applied Materials, Inc. Substrate cleaning improvement

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US5423716A (en) * 1994-01-05 1995-06-13 Strasbaugh; Alan Wafer-handling apparatus having a resilient membrane which holds wafer when a vacuum is applied
US5762751A (en) * 1995-08-17 1998-06-09 Semitool, Inc. Semiconductor processor with wafer face protection
US6183354B1 (en) 1996-11-08 2001-02-06 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
US6056632A (en) * 1997-02-13 2000-05-02 Speedfam-Ipec Corp. Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
US6398621B1 (en) * 1997-05-23 2002-06-04 Applied Materials, Inc. Carrier head with a substrate sensor
US5964653A (en) * 1997-07-11 1999-10-12 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
US6080050A (en) * 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
US5993302A (en) 1997-12-31 1999-11-30 Applied Materials, Inc. Carrier head with a removable retaining ring for a chemical mechanical polishing apparatus
US6152808A (en) * 1998-08-25 2000-11-28 Micron Technology, Inc. Microelectronic substrate polishing systems, semiconductor wafer polishing systems, methods of polishing microelectronic substrates, and methods of polishing wafers
US6159079A (en) * 1998-09-08 2000-12-12 Applied Materials, Inc. Carrier head for chemical mechanical polishing a substrate
US6165058A (en) * 1998-12-09 2000-12-26 Applied Materials, Inc. Carrier head for chemical mechanical polishing
US6162116A (en) 1999-01-23 2000-12-19 Applied Materials, Inc. Carrier head for chemical mechanical polishing
US6156124A (en) 1999-06-18 2000-12-05 Applied Materials, Inc. Wafer transfer station for a chemical mechanical polisher
JP3816297B2 (ja) * 2000-04-25 2006-08-30 株式会社荏原製作所 研磨装置
US6722965B2 (en) * 2000-07-11 2004-04-20 Applied Materials Inc. Carrier head with flexible membranes to provide controllable pressure and loading area
US6857945B1 (en) * 2000-07-25 2005-02-22 Applied Materials, Inc. Multi-chamber carrier head with a flexible membrane
DE60138343D1 (de) * 2000-07-31 2009-05-28 Ebara Corp Substrathalter und Poliervorrichtung
US6848980B2 (en) * 2001-10-10 2005-02-01 Applied Materials, Inc. Vibration damping in a carrier head
US6652362B2 (en) * 2000-11-23 2003-11-25 Samsung Electronics Co., Ltd. Apparatus for polishing a semiconductor wafer and method therefor
JP3862065B2 (ja) * 2001-11-29 2006-12-27 信越半導体株式会社 ウェーハ研磨ヘッド
US7101253B2 (en) 2002-08-27 2006-09-05 Applied Materials Inc. Load cup for chemical mechanical polishing
US6905392B2 (en) * 2003-06-30 2005-06-14 Freescale Semiconductor, Inc. Polishing system having a carrier head with substrate presence sensing
US7044832B2 (en) 2003-11-17 2006-05-16 Applied Materials Load cup for chemical mechanical polishing
US7255771B2 (en) 2004-03-26 2007-08-14 Applied Materials, Inc. Multiple zone carrier head with flexible membrane
US7210991B1 (en) * 2006-04-03 2007-05-01 Applied Materials, Inc. Detachable retaining ring

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