TW200632989A - Vacuum dryer and vacuum drying method - Google Patents

Vacuum dryer and vacuum drying method

Info

Publication number
TW200632989A
TW200632989A TW094132526A TW94132526A TW200632989A TW 200632989 A TW200632989 A TW 200632989A TW 094132526 A TW094132526 A TW 094132526A TW 94132526 A TW94132526 A TW 94132526A TW 200632989 A TW200632989 A TW 200632989A
Authority
TW
Taiwan
Prior art keywords
vacuum
drying method
substrate
main surface
dryer
Prior art date
Application number
TW094132526A
Other languages
Chinese (zh)
Other versions
TWI283003B (en
Inventor
Takashi Kakimura
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200632989A publication Critical patent/TW200632989A/en
Application granted granted Critical
Publication of TWI283003B publication Critical patent/TWI283003B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Abstract

To provide a vacuum dryer and a vacuum drying method capable of rapidly drying a thin film formed on a main surface of a substrate without causing bumping. A support pin 21 is raised with a support plate 22 to minimize the distance between the main surface of the substrate W and the upper surface 14 of a chamber 10, and evacuation is performed in a small displacement in this state. Therefore, the support pin 21 is lowered with the support plate 22 to increase the distance between the main surface of the substrate W and the upper surface 14 of the chamber 10, and evacuation is performed in a large displacement in this state.
TW094132526A 2004-10-07 2005-09-20 Vacuum dryer and vacuum drying method TWI283003B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004294668A JP2006105524A (en) 2004-10-07 2004-10-07 Vacuum dryer and vacuum drying method

Publications (2)

Publication Number Publication Date
TW200632989A true TW200632989A (en) 2006-09-16
TWI283003B TWI283003B (en) 2007-06-21

Family

ID=36375482

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094132526A TWI283003B (en) 2004-10-07 2005-09-20 Vacuum dryer and vacuum drying method

Country Status (4)

Country Link
JP (1) JP2006105524A (en)
KR (1) KR100730453B1 (en)
CN (1) CN1758142A (en)
TW (1) TWI283003B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI637656B (en) * 2015-09-29 2018-10-01 日商東京威力科創股份有限公司 Drying device and drying processing method

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8113757B2 (en) 2006-08-01 2012-02-14 Tokyo Electron Limited Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber
JP4312787B2 (en) * 2006-11-15 2009-08-12 東京エレクトロン株式会社 Vacuum dryer
JP5090079B2 (en) * 2007-06-27 2012-12-05 大日本スクリーン製造株式会社 Vacuum dryer
JP5436763B2 (en) * 2007-07-27 2014-03-05 東京エレクトロン株式会社 Airtight module and exhaust method of the airtight module
JP5192747B2 (en) * 2007-08-06 2013-05-08 東レエンジニアリング株式会社 Vacuum dryer
JP5411470B2 (en) * 2008-09-01 2014-02-12 光洋サーモシステム株式会社 Heat treatment equipment
KR101509830B1 (en) * 2009-09-07 2015-04-06 도쿄엘렉트론가부시키가이샤 Decompression drier and decompression dry method
KR101501362B1 (en) 2012-08-09 2015-03-10 가부시키가이샤 스크린 홀딩스 Substrate processing apparatus and substrate processing method
KR101512560B1 (en) 2012-08-31 2015-04-15 가부시키가이샤 스크린 홀딩스 Substrate processing apparatus
CN107628577B (en) * 2017-09-09 2019-04-05 芜湖润林包装材料有限公司 Paper lifting cranes on corrugated board corner protector
JP7076135B2 (en) * 2018-07-27 2022-05-27 株式会社Joled Manufacturing method of organic EL display panel
KR20200115884A (en) * 2019-03-28 2020-10-08 삼성디스플레이 주식회사 Vacuum dryer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3631847B2 (en) * 1996-05-28 2005-03-23 大日本印刷株式会社 Vacuum drying equipment
JP2000241623A (en) * 1998-12-25 2000-09-08 Canon Inc Drying method for resin composition layer, manufacture of color filter substrate using the method, and liquid crystal, display element
JP3711226B2 (en) * 2000-02-23 2005-11-02 大日本印刷株式会社 Vacuum drying apparatus and vacuum drying method
US6808566B2 (en) * 2001-09-19 2004-10-26 Tokyo Electron Limited Reduced-pressure drying unit and coating film forming method
JP3766336B2 (en) * 2002-03-12 2006-04-12 東京エレクトロン株式会社 Vacuum drying apparatus and vacuum drying method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI637656B (en) * 2015-09-29 2018-10-01 日商東京威力科創股份有限公司 Drying device and drying processing method

Also Published As

Publication number Publication date
CN1758142A (en) 2006-04-12
KR100730453B1 (en) 2007-06-19
JP2006105524A (en) 2006-04-20
TWI283003B (en) 2007-06-21
KR20060052069A (en) 2006-05-19

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