JP2009516928A5 - - Google Patents
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- Publication number
- JP2009516928A5 JP2009516928A5 JP2008542318A JP2008542318A JP2009516928A5 JP 2009516928 A5 JP2009516928 A5 JP 2009516928A5 JP 2008542318 A JP2008542318 A JP 2008542318A JP 2008542318 A JP2008542318 A JP 2008542318A JP 2009516928 A5 JP2009516928 A5 JP 2009516928A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- abrasive
- water
- polishing system
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 claims 25
- 238000000034 method Methods 0.000 claims 14
- 239000000758 substrate Substances 0.000 claims 9
- -1 silicate compound Chemical class 0.000 claims 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 6
- 229910052913 potassium silicate Inorganic materials 0.000 claims 6
- 235000019353 potassium silicate Nutrition 0.000 claims 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 4
- 239000004111 Potassium silicate Substances 0.000 claims 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims 4
- 239000004115 Sodium Silicate Substances 0.000 claims 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 4
- 239000007800 oxidant agent Substances 0.000 claims 4
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims 4
- 229910052911 sodium silicate Inorganic materials 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims 2
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 claims 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims 2
- LFLZOWIFJOBEPN-UHFFFAOYSA-N nitrate, nitrate Chemical compound O[N+]([O-])=O.O[N+]([O-])=O LFLZOWIFJOBEPN-UHFFFAOYSA-N 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims 2
- 235000019795 sodium metasilicate Nutrition 0.000 claims 2
- 235000019794 sodium silicate Nutrition 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/287,039 US20070117497A1 (en) | 2005-11-22 | 2005-11-22 | Friction reducing aid for CMP |
| PCT/US2006/041420 WO2007149113A2 (en) | 2005-11-22 | 2006-10-24 | Friction reducing aid for cmp |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009516928A JP2009516928A (ja) | 2009-04-23 |
| JP2009516928A5 true JP2009516928A5 (enExample) | 2009-12-10 |
Family
ID=38054171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008542318A Pending JP2009516928A (ja) | 2005-11-22 | 2006-10-24 | Ｃｍｐ用の摩擦低減補助 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20070117497A1 (enExample) |
| JP (1) | JP2009516928A (enExample) |
| KR (1) | KR20080070675A (enExample) |
| CN (1) | CN101313388A (enExample) |
| TW (1) | TWI311091B (enExample) |
| WO (1) | WO2007149113A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007103578A1 (en) * | 2006-03-09 | 2007-09-13 | Cabot Microelectronics Corporation | Method of polishing a tungsten carbide surface |
| EP2634157B1 (en) * | 2011-05-24 | 2016-08-10 | Rohm and Haas Company | Improved quality multi-spectral zinc sulfide |
| EP2798669B1 (en) * | 2011-12-28 | 2021-03-31 | Entegris, Inc. | Compositions and methods for selectively etching titanium nitride |
| CN102775916B (zh) * | 2012-07-16 | 2015-01-07 | 芜湖海森材料科技有限公司 | 一种提高蓝宝石表面质量的抛光组合物 |
| US9259818B2 (en) * | 2012-11-06 | 2016-02-16 | Sinmat, Inc. | Smooth diamond surfaces and CMP method for forming |
| JP6007094B2 (ja) * | 2012-12-18 | 2016-10-12 | 花王株式会社 | サファイア板用研磨液組成物 |
| TWI614093B (zh) * | 2013-01-04 | 2018-02-11 | 福吉米股份有限公司 | 研磨用組成物、合金材料、合金材料之硏磨方法及合金材料之製造方法 |
| DE112014001038T5 (de) * | 2013-02-28 | 2015-11-26 | Fujimi Incorporated | Polieraufschlämmung zur Kobaltentfernung |
| US9633831B2 (en) * | 2013-08-26 | 2017-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same |
| CN103589344B (zh) * | 2013-11-14 | 2015-06-10 | 上海新安纳电子科技有限公司 | 一种氧化铝抛光液的制备方法 |
| JPWO2016043089A1 (ja) * | 2014-09-16 | 2017-08-10 | 山口精研工業株式会社 | サファイア基板用研磨剤組成物 |
| KR102447178B1 (ko) | 2015-09-01 | 2022-09-26 | 삼성전자주식회사 | 반도체 장치의 제조 방법 |
| WO2017142885A1 (en) * | 2016-02-16 | 2017-08-24 | Cabot Microelectronics Corporation | Method of polishing group iii-v materials |
| US10253216B2 (en) * | 2016-07-01 | 2019-04-09 | Versum Materials Us, Llc | Additives for barrier chemical mechanical planarization |
| DE102017110198A1 (de) * | 2017-05-11 | 2018-11-15 | Walter Maschinenbau Gmbh | Schleif- und/oder Erodiermaschine sowie Verfahren zur Vermessung und/oder Referenzierung der Maschine |
| KR102431416B1 (ko) | 2017-11-15 | 2022-08-12 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 재료 제거 작업을 수행하기 위한 조성물 및 이를 형성하기 위한 방법 |
| CN110358454A (zh) * | 2019-07-20 | 2019-10-22 | 大连理工大学 | 一种通用化学机械抛光液 |
| WO2021065815A1 (ja) * | 2019-10-03 | 2021-04-08 | 日産化学株式会社 | カチオンを含むレーザーマーク周辺の隆起を解消するための研磨用組成物 |
| US11879094B2 (en) | 2022-06-03 | 2024-01-23 | Halliburton Energy Services, Inc. | Enhancing friction reduction and protection of wellbore equipment during hydraulic fracturing |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2710997C3 (de) * | 1977-03-14 | 1980-08-14 | Dr. Karl Thomae Gmbh, 7950 Biberach | 4-Alkoxy carbonylamino-phenyläthanolamine, deren Herstellung und deren Verwendung als Arzneimittel |
| JPH0228112A (ja) * | 1988-04-21 | 1990-01-30 | Kaken Pharmaceut Co Ltd | 点眼用眼圧調整剤 |
| US5352277A (en) * | 1988-12-12 | 1994-10-04 | E. I. Du Pont De Nemours & Company | Final polishing composition |
| DE3902753A1 (de) * | 1989-01-31 | 1990-08-02 | Henkel Kgaa | Verfahren zur hydrothermalen herstellung von kaliumsilikatloesungen mit hohem si0(pfeil abwaerts)2(pfeil abwaerts):k(pfeil abwaerts)2(pfeil abwaerts)0-molverhaeltnis |
| DE3938789A1 (de) * | 1989-11-23 | 1991-05-29 | Henkel Kgaa | Verfahren zur hydrothermalen herstellung von kaliumsilikatloesungen |
| DE19643592A1 (de) * | 1996-10-22 | 1998-04-23 | Bayer Ag | Verfahren zur Herstellung von alpha-Alkoxy-alpha-trifluormethyl-arylessigsäureestern und -arylessigsäuren |
| SG54606A1 (en) * | 1996-12-05 | 1998-11-16 | Fujimi Inc | Polishing composition |
| WO1998048453A1 (en) * | 1997-04-23 | 1998-10-29 | Advanced Chemical Systems International, Inc. | Planarization compositions for cmp of interlayer dielectrics |
| TW593331B (en) * | 1997-07-25 | 2004-06-21 | Inspire Pharmaceuticals Inc | Method for large-scale production of di(uridine 5')-tetraphosphate and salts thereof |
| US6051605A (en) * | 1997-08-08 | 2000-04-18 | Warner-Lambert Company | Method of treating psychosis and schizophrenia |
| JPH11140427A (ja) * | 1997-11-13 | 1999-05-25 | Kobe Steel Ltd | 研磨液および研磨方法 |
| CO5070714A1 (es) * | 1998-03-06 | 2001-08-28 | Nalco Chemical Co | Proceso para la preparacion de silice coloidal estable |
| US6217416B1 (en) * | 1998-06-26 | 2001-04-17 | Cabot Microelectronics Corporation | Chemical mechanical polishing slurry useful for copper/tantalum substrates |
| US6276996B1 (en) * | 1998-11-10 | 2001-08-21 | Micron Technology, Inc. | Copper chemical-mechanical polishing process using a fixed abrasive polishing pad and a copper layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
| JP3941284B2 (ja) * | 1999-04-13 | 2007-07-04 | 株式会社日立製作所 | 研磨方法 |
| AU1464101A (en) * | 1999-12-21 | 2001-07-03 | Gpi Nil Holdings, Inc. | Hydantoin derivative compounds, pharmaceutical compositions, and methods of using same |
| US6602117B1 (en) * | 2000-08-30 | 2003-08-05 | Micron Technology, Inc. | Slurry for use with fixed-abrasive polishing pads in polishing semiconductor device conductive structures that include copper and tungsten and polishing methods |
| US6551935B1 (en) * | 2000-08-31 | 2003-04-22 | Micron Technology, Inc. | Slurry for use in polishing semiconductor device conductive structures that include copper and tungsten and polishing methods |
| US6709316B1 (en) * | 2000-10-27 | 2004-03-23 | Applied Materials, Inc. | Method and apparatus for two-step barrier layer polishing |
| US20030032078A1 (en) * | 2001-01-23 | 2003-02-13 | Board Of Regents, The University Of Texas System | Methods and compositions for the treatment of macular and retinal degenerations |
| JP3945745B2 (ja) * | 2001-03-09 | 2007-07-18 | 三井金属鉱業株式会社 | セリウム系研摩材及び研摩材スラリー並びにセリウム系研摩材の製造方法 |
| US6656241B1 (en) * | 2001-06-14 | 2003-12-02 | Ppg Industries Ohio, Inc. | Silica-based slurry |
| US6800218B2 (en) * | 2001-08-23 | 2004-10-05 | Advanced Technology Materials, Inc. | Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same |
| JP4008219B2 (ja) * | 2001-09-27 | 2007-11-14 | 触媒化成工業株式会社 | 研磨材 |
| JP4278020B2 (ja) * | 2001-10-30 | 2009-06-10 | 日揮触媒化成株式会社 | 研磨用粒子および研磨材の製造方法 |
| PA8557501A1 (es) * | 2001-11-12 | 2003-06-30 | Pfizer Prod Inc | Benzamida, heteroarilamida y amidas inversas |
| US6685755B2 (en) * | 2001-11-21 | 2004-02-03 | Saint-Gobain Abrasives Technology Company | Porous abrasive tool and method for making the same |
| US6827639B2 (en) * | 2002-03-27 | 2004-12-07 | Catalysts & Chemicals Industries Co., Ltd. | Polishing particles and a polishing agent |
| US6913517B2 (en) * | 2002-05-23 | 2005-07-05 | Cabot Microelectronics Corporation | Microporous polishing pads |
| JP2004128112A (ja) * | 2002-10-01 | 2004-04-22 | Renesas Technology Corp | 半導体装置の製造方法 |
| EP2324823A3 (en) * | 2003-03-14 | 2011-11-16 | University of Washington | Retinoid replacements and opsin agonists and methods for the use thereof |
| JP2005007520A (ja) * | 2003-06-19 | 2005-01-13 | Nihon Micro Coating Co Ltd | 研磨パッド及びその製造方法並びに研磨方法 |
| US7485241B2 (en) * | 2003-09-11 | 2009-02-03 | Cabot Microelectronics Corporation | Chemical-mechanical polishing composition and method for using the same |
| US20050136670A1 (en) * | 2003-12-19 | 2005-06-23 | Ameen Joseph G. | Compositions and methods for controlled polishing of copper |
| US7566808B2 (en) * | 2004-02-17 | 2009-07-28 | President And Fellows Of Harvard College | Management of ophthalmologic disorders, including macular degeneration |
| US20060252107A1 (en) * | 2005-02-22 | 2006-11-09 | Acucela, Inc. | Compositions and methods for diagnosing and treating retinal diseases |
| US20070039926A1 (en) * | 2005-08-17 | 2007-02-22 | Cabot Microelectronics Corporation | Abrasive-free polishing system |
-
2005
- 2005-11-22 US US11/287,039 patent/US20070117497A1/en not_active Abandoned
-
2006
- 2006-10-24 JP JP2008542318A patent/JP2009516928A/ja active Pending
- 2006-10-24 KR KR1020087012131A patent/KR20080070675A/ko not_active Withdrawn
- 2006-10-24 CN CNA2006800437962A patent/CN101313388A/zh active Pending
- 2006-10-24 WO PCT/US2006/041420 patent/WO2007149113A2/en not_active Ceased
- 2006-11-08 TW TW095141357A patent/TWI311091B/zh not_active IP Right Cessation
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