JP2009505847A5 - - Google Patents

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Publication number
JP2009505847A5
JP2009505847A5 JP2008528048A JP2008528048A JP2009505847A5 JP 2009505847 A5 JP2009505847 A5 JP 2009505847A5 JP 2008528048 A JP2008528048 A JP 2008528048A JP 2008528048 A JP2008528048 A JP 2008528048A JP 2009505847 A5 JP2009505847 A5 JP 2009505847A5
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JP
Japan
Prior art keywords
spectrum
current
spectra
determining whether
substrate
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JP2008528048A
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English (en)
Japanese (ja)
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JP2009505847A (ja
JP5534672B2 (ja
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Priority claimed from US11/213,344 external-priority patent/US7764377B2/en
Priority claimed from US11/261,742 external-priority patent/US7406394B2/en
Application filed filed Critical
Priority claimed from PCT/US2006/032659 external-priority patent/WO2007024807A2/en
Publication of JP2009505847A publication Critical patent/JP2009505847A/ja
Publication of JP2009505847A5 publication Critical patent/JP2009505847A5/ja
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Publication of JP5534672B2 publication Critical patent/JP5534672B2/ja
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JP2008528048A 2005-08-22 2006-08-21 化学機械的研磨のスペクトルに基づく監視のための装置および方法 Active JP5534672B2 (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US71068205P 2005-08-22 2005-08-22
US60/710,682 2005-08-22
US11/213,344 US7764377B2 (en) 2005-08-22 2005-08-26 Spectrum based endpointing for chemical mechanical polishing
US11/213,674 2005-08-26
US11/213,674 US7226339B2 (en) 2005-08-22 2005-08-26 Spectrum based endpointing for chemical mechanical polishing
US11/213,675 US7306507B2 (en) 2005-08-22 2005-08-26 Polishing pad assembly with glass or crystalline window
US11/213,675 2005-08-26
US11/213,344 2005-08-26
US11/261,742 2005-10-28
US11/261,742 US7406394B2 (en) 2005-08-22 2005-10-28 Spectra based endpointing for chemical mechanical polishing
US74776806P 2006-05-19 2006-05-19
US60/747,768 2006-05-19
PCT/US2006/032659 WO2007024807A2 (en) 2005-08-22 2006-08-21 Apparatus and methods for spectrum based monitoring of chemical mechanical polishing

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP2012168682A Division JP5622807B2 (ja) 2005-08-22 2012-07-30 化学機械的研磨のスペクトルに基づく監視のための装置および方法
JP2012168681A Division JP5622806B2 (ja) 2005-08-22 2012-07-30 化学機械的研磨のスペクトルに基づく監視のための装置および方法
JP2012168680A Division JP6047327B2 (ja) 2005-08-22 2012-07-30 化学機械的研磨のスペクトルに基づく監視のための装置および方法
JP2012220364A Division JP5624099B2 (ja) 2005-08-22 2012-10-02 化学機械的研磨のスペクトルに基づく監視のための装置および方法

Publications (3)

Publication Number Publication Date
JP2009505847A JP2009505847A (ja) 2009-02-12
JP2009505847A5 true JP2009505847A5 (enExample) 2009-10-01
JP5534672B2 JP5534672B2 (ja) 2014-07-02

Family

ID=37560902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008528048A Active JP5534672B2 (ja) 2005-08-22 2006-08-21 化学機械的研磨のスペクトルに基づく監視のための装置および方法

Country Status (4)

Country Link
JP (1) JP5534672B2 (enExample)
KR (1) KR101324644B1 (enExample)
TW (1) TWI366872B (enExample)
WO (1) WO2007024807A2 (enExample)

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US7967661B2 (en) 2008-06-19 2011-06-28 Micron Technology, Inc. Systems and pads for planarizing microelectronic workpieces and associated methods of use and manufacture
US8439723B2 (en) 2008-08-11 2013-05-14 Applied Materials, Inc. Chemical mechanical polisher with heater and method
US8414357B2 (en) 2008-08-22 2013-04-09 Applied Materials, Inc. Chemical mechanical polisher having movable slurry dispensers and method
JP5675617B2 (ja) * 2008-09-04 2015-02-25 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 加工時における基板の分光モニタリングを使用した研磨速度の調整
WO2010062497A2 (en) * 2008-10-27 2010-06-03 Applied Materials, Inc. Goodness of fit in spectrographic monitoring of a substrate during processing
US8751033B2 (en) * 2008-11-14 2014-06-10 Applied Materials, Inc. Adaptive tracking spectrum features for endpoint detection
US8579675B2 (en) * 2008-11-26 2013-11-12 Applied Materials, Inc. Methods of using optical metrology for feed back and feed forward process control
WO2011056485A2 (en) * 2009-11-03 2011-05-12 Applied Materials, Inc. Endpoint method using peak location of spectra contour plots versus time
JP5728239B2 (ja) 2010-03-02 2015-06-03 株式会社荏原製作所 研磨監視方法、研磨方法、研磨監視装置、および研磨装置
TWI496661B (zh) * 2010-04-28 2015-08-21 Applied Materials Inc 用於光學監測之參考光譜的自動產生
US9579767B2 (en) 2010-04-28 2017-02-28 Applied Materials, Inc. Automatic generation of reference spectra for optical monitoring of substrates
WO2011139571A2 (en) * 2010-05-05 2011-11-10 Applied Materials, Inc. Dynamically or adaptively tracking spectrum features for endpoint detection
US8834229B2 (en) 2010-05-05 2014-09-16 Applied Materials, Inc. Dynamically tracking spectrum features for endpoint detection
US20110281510A1 (en) * 2010-05-12 2011-11-17 Applied Materials, Inc. Pad Window Insert
US8190285B2 (en) * 2010-05-17 2012-05-29 Applied Materials, Inc. Feedback for polishing rate correction in chemical mechanical polishing
JP2012019114A (ja) * 2010-07-08 2012-01-26 Tokyo Seimitsu Co Ltd 研磨終点検出装置、及び研磨終点検出方法
TWI478259B (zh) * 2010-07-23 2015-03-21 Applied Materials Inc 用於終點偵測之二維光譜特徵追蹤
JP5612945B2 (ja) 2010-07-23 2014-10-22 株式会社荏原製作所 基板の研磨の進捗を監視する方法および研磨装置
US8954186B2 (en) 2010-07-30 2015-02-10 Applied Materials, Inc. Selecting reference libraries for monitoring of multiple zones on a substrate
WO2012068428A2 (en) * 2010-11-18 2012-05-24 Cabot Microelectronics Corporation Polishing pad comprising transmissive region
JP5980476B2 (ja) 2010-12-27 2016-08-31 株式会社荏原製作所 ポリッシング装置およびポリッシング方法
US8547538B2 (en) * 2011-04-21 2013-10-01 Applied Materials, Inc. Construction of reference spectra with variations in environmental effects
KR101981814B1 (ko) * 2011-04-28 2019-05-23 어플라이드 머티어리얼스, 인코포레이티드 연마를 위한 모델 기반 스펙트럼 라이브러리의 생성
JP5715034B2 (ja) * 2011-11-30 2015-05-07 株式会社東京精密 研磨装置による研磨方法
US9289875B2 (en) * 2012-04-25 2016-03-22 Applied Materials, Inc. Feed forward and feed-back techniques for in-situ process control
US9221147B2 (en) * 2012-10-23 2015-12-29 Applied Materials, Inc. Endpointing with selective spectral monitoring
WO2014149330A1 (en) * 2013-03-15 2014-09-25 Applied Materials, Inc. Dynamic residue clearing control with in-situ profile control (ispc)
US10012494B2 (en) 2013-10-25 2018-07-03 Applied Materials, Inc. Grouping spectral data from polishing substrates
JP7197999B2 (ja) 2018-05-11 2022-12-28 キオクシア株式会社 研磨装置および研磨パッド
KR102586252B1 (ko) * 2018-07-06 2023-10-11 주식회사 케이씨텍 기판의 실리콘 산화막 두께 검출 장치 및 방법
KR102808528B1 (ko) 2018-09-24 2025-05-16 어플라이드 머티어리얼스, 인코포레이티드 Cmp 프로세스 제어 알고리즘에 대한 입력으로서의 기계 시각
JP7253458B2 (ja) * 2019-06-27 2023-04-06 株式会社荏原製作所 光学式膜厚測定装置の最適な動作レシピを決定する方法、装置、およびシステム
JP7469032B2 (ja) * 2019-12-10 2024-04-16 株式会社荏原製作所 研磨方法および研磨装置
US11847776B2 (en) 2020-06-29 2023-12-19 Applied Materials, Inc. System using film thickness estimation from machine learning based processing of substrate images

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