JP2021091038A5 - - Google Patents

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Publication number
JP2021091038A5
JP2021091038A5 JP2019222892A JP2019222892A JP2021091038A5 JP 2021091038 A5 JP2021091038 A5 JP 2021091038A5 JP 2019222892 A JP2019222892 A JP 2019222892A JP 2019222892 A JP2019222892 A JP 2019222892A JP 2021091038 A5 JP2021091038 A5 JP 2021091038A5
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JP
Japan
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data
polishing
training
film thickness
dimensional
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JP2019222892A
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English (en)
Japanese (ja)
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JP7469032B2 (ja
JP2021091038A (ja
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Priority claimed from JP2019222892A external-priority patent/JP7469032B2/ja
Priority to JP2019222892A priority Critical patent/JP7469032B2/ja
Priority to SG10202012033VA priority patent/SG10202012033VA/en
Priority to US17/110,797 priority patent/US11759913B2/en
Priority to KR1020200168165A priority patent/KR102802312B1/ko
Priority to TW109143142A priority patent/TWI901615B/zh
Priority to CN202011422501.0A priority patent/CN112936090B/zh
Publication of JP2021091038A publication Critical patent/JP2021091038A/ja
Publication of JP2021091038A5 publication Critical patent/JP2021091038A5/ja
Priority to US18/232,278 priority patent/US20230381919A1/en
Publication of JP7469032B2 publication Critical patent/JP7469032B2/ja
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JP2019222892A 2019-12-10 2019-12-10 研磨方法および研磨装置 Active JP7469032B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2019222892A JP7469032B2 (ja) 2019-12-10 2019-12-10 研磨方法および研磨装置
SG10202012033VA SG10202012033VA (en) 2019-12-10 2020-12-02 Polishing method and polishing apparatus
US17/110,797 US11759913B2 (en) 2019-12-10 2020-12-03 Polishing method and polishing apparatus
KR1020200168165A KR102802312B1 (ko) 2019-12-10 2020-12-04 연마 방법 및 연마 장치
TW109143142A TWI901615B (zh) 2019-12-10 2020-12-08 研磨方法及研磨裝置
CN202011422501.0A CN112936090B (zh) 2019-12-10 2020-12-08 研磨方法及研磨装置
US18/232,278 US20230381919A1 (en) 2019-12-10 2023-08-09 Polishing method and polishing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019222892A JP7469032B2 (ja) 2019-12-10 2019-12-10 研磨方法および研磨装置

Publications (3)

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JP2021091038A JP2021091038A (ja) 2021-06-17
JP2021091038A5 true JP2021091038A5 (enExample) 2022-05-09
JP7469032B2 JP7469032B2 (ja) 2024-04-16

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JP2019222892A Active JP7469032B2 (ja) 2019-12-10 2019-12-10 研磨方法および研磨装置

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US (2) US11759913B2 (enExample)
JP (1) JP7469032B2 (enExample)
KR (1) KR102802312B1 (enExample)
CN (1) CN112936090B (enExample)
SG (1) SG10202012033VA (enExample)

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JP7709281B2 (ja) * 2021-01-14 2025-07-16 株式会社荏原製作所 研磨装置、研磨方法、および基板の膜厚分布の可視化情報を出力する方法
WO2022186988A1 (en) * 2021-03-03 2022-09-09 Applied Materials, Inc. In-situ monitoring to label training spectra for machine learning system for spectrographic monitoring
JP7547275B2 (ja) * 2021-03-31 2024-09-09 株式会社荏原製作所 ワークピースの膜厚を推定するモデルを作成する方法、そのようなモデルを用いてワークピースの研磨中に膜厚を推定する方法、およびコンピュータにこれらの方法を実行させるためのプログラム
JP7709930B2 (ja) 2022-02-18 2025-07-17 株式会社Ｓｃｒｅｅｎホールディングス 基板処理条件の設定方法、基板処理方法、基板処理条件の設定システム、及び、基板処理システム
CN116713892B (zh) * 2023-08-10 2023-11-10 北京特思迪半导体设备有限公司 用于晶圆薄膜磨削的终点检测方法及设备
US20250316491A1 (en) * 2024-04-08 2025-10-09 Applied Materials, Inc. Integrated substrate thinning

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JPH05128256A (ja) 1991-10-31 1993-05-25 Sumitomo Light Metal Ind Ltd 欠陥画像処理装置及び静止画像取込装置
JPH07111721B2 (ja) 1992-06-05 1995-11-29 日本アイ・ビー・エム株式会社 線要素データの３次元変換装置及び方法
JP3259225B2 (ja) * 1999-12-27 2002-02-25 株式会社ニコン 研磨状況モニタ方法及びその装置、研磨装置、プロセスウエハ、半導体デバイス製造方法、並びに半導体デバイス
JP3971731B2 (ja) 2003-10-23 2007-09-05 日本電信電話株式会社 光周波数シフタアレイ
JP2005342310A (ja) 2004-06-04 2005-12-15 Takeya Co Ltd 遊技機
JP3906230B2 (ja) 2005-03-11 2007-04-18 株式会社東芝 音響信号処理装置、音響信号処理方法、音響信号処理プログラム、及び音響信号処理プログラムを記録したコンピュータ読み取り可能な記録媒体
KR101324644B1 (ko) * 2005-08-22 2013-11-01 어플라이드 머티어리얼스, 인코포레이티드 화학적 기계적 폴리싱의 스펙트럼 기반 모니터링을 위한 장치 및 방법
JP5376293B2 (ja) * 2008-11-17 2013-12-25 株式会社ニコン 終点検出装置および研磨装置
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TWI635929B (zh) * 2013-07-11 2018-09-21 日商荏原製作所股份有限公司 研磨裝置及研磨狀態監視方法
JP2015126179A (ja) * 2013-12-27 2015-07-06 株式会社荏原製作所 研磨終点検出方法、及び研磨終点検出装置
US10399203B2 (en) * 2014-04-22 2019-09-03 Ebara Corporation Polishing method and polishing apparatus
JP6475604B2 (ja) * 2015-11-24 2019-02-27 株式会社荏原製作所 研磨方法
SG10202111787PA (en) * 2016-10-18 2021-11-29 Ebara Corp Local polisher, method of a local polisher and program
TWI807987B (zh) * 2016-11-30 2023-07-01 美商應用材料股份有限公司 使用神經網路的光譜監測
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