JP2009504432A - 先に作られたトレースを用いてレーザービームにより脆い平坦部材を裂く方法 - Google Patents
先に作られたトレースを用いてレーザービームにより脆い平坦部材を裂く方法 Download PDFInfo
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- JP2009504432A JP2009504432A JP2008525379A JP2008525379A JP2009504432A JP 2009504432 A JP2009504432 A JP 2009504432A JP 2008525379 A JP2008525379 A JP 2008525379A JP 2008525379 A JP2008525379 A JP 2008525379A JP 2009504432 A JP2009504432 A JP 2009504432A
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- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000000926 separation method Methods 0.000 claims abstract description 12
- 229910052594 sapphire Inorganic materials 0.000 claims abstract description 4
- 239000010980 sapphire Substances 0.000 claims abstract description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims abstract description 3
- 239000000919 ceramic Substances 0.000 claims abstract description 3
- 239000002826 coolant Substances 0.000 claims abstract description 3
- 239000011521 glass Substances 0.000 claims abstract description 3
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 3
- 239000010703 silicon Substances 0.000 claims abstract description 3
- 238000002844 melting Methods 0.000 claims abstract 2
- 230000008018 melting Effects 0.000 claims abstract 2
- 238000001020 plasma etching Methods 0.000 claims description 2
- 230000035939 shock Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 17
- 230000005855 radiation Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005192 partition Methods 0.000 description 4
- 101100008048 Caenorhabditis elegans cut-4 gene Proteins 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26F—PERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
- B26F3/00—Severing by means other than cutting; Apparatus therefor
- B26F3/06—Severing by using heat
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Floor Finish (AREA)
- Treatment Of Fiber Materials (AREA)
Abstract
Description
ウェハのダイシングのための本発明を以下に説明するが、これに限定されず、むしろいかなる砕けやすい平坦部材の切断にも応用できる。
2 x分割線
3 y分割線
4 切込み
5 分離クラック
6 第1レーザー放射
7 第2レーザー放射
Claims (7)
- 例えばガラス、セラミック、シリコン、ガリウムヒ素又はサファイアなどの脆い平坦部材を裂く方法であって、
平坦部材がレーザーにより溶融温度以下で所望の分割線に沿って加熱され、次いでクーラントジェットで衝撃を与えられ、熱誘起された機械的応力差により部材分離がなされる方法において、
トレースが分割線に沿って平坦部材において先に作られ、それで平坦部材は未処理部材よりもトレースに沿って小さい破壊応力を有し、レーザーによる分離がこれらのトレースに沿って行なわれることを特徴とする方法。 - トレースは部材除去により切込みの形式で作られることを特徴とする請求項1に記載の方法。
- 部材除去はレーザーにより行われることを特徴とする請求項2に記載の方法。
- 部材除去は、部材分離が実行されるのと同じレーザーにより行なわれることを特徴とする請求項3に記載の方法。
- 部材除去はプラズマエッチングにより行われることを特徴とする請求項2に記載の方法。
- トレースは部材変形により作られ、トレースに沿う臨界破壊応力が減少されることを特徴とする請求項1に記載の方法。
- 分割線に沿う平坦部材の応力と部材厚さの差を補償するために、トレースの幾何学形状、特に深さが分割線に沿って局所的に変更されることを特徴とする請求項2又は6に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005038027A DE102005038027A1 (de) | 2005-08-06 | 2005-08-06 | Verfahren zum Durchtrennen von spröden Flachmaterialien |
PCT/DE2006/001243 WO2007016895A1 (de) | 2005-08-06 | 2006-07-14 | Verfahren zum durchtrennen von spröden flachmaterialien mittels laser entlang einer zuvor erzeugten spur |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009504432A true JP2009504432A (ja) | 2009-02-05 |
Family
ID=37110308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008525379A Pending JP2009504432A (ja) | 2005-08-06 | 2006-07-14 | 先に作られたトレースを用いてレーザービームにより脆い平坦部材を裂く方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8212180B2 (ja) |
EP (1) | EP1924392B1 (ja) |
JP (1) | JP2009504432A (ja) |
KR (1) | KR101323078B1 (ja) |
AT (1) | ATE480363T1 (ja) |
DE (3) | DE102005038027A1 (ja) |
WO (1) | WO2007016895A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014069237A (ja) * | 2012-10-02 | 2014-04-21 | Mitsuboshi Diamond Industrial Co Ltd | パターン付き基板の加工方法 |
JP2015167968A (ja) * | 2014-03-06 | 2015-09-28 | 株式会社ディスコ | レーザー加工方法 |
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KR101130702B1 (ko) * | 2009-08-17 | 2012-04-02 | 한양대학교 산학협력단 | 열응력을 이용한 유리판 절단장치 및 유리판 절단방법 |
JP2011156582A (ja) * | 2010-02-03 | 2011-08-18 | Disco Abrasive Syst Ltd | Co2レーザによる分割方法 |
TWI494284B (zh) * | 2010-03-19 | 2015-08-01 | Corning Inc | 強化玻璃之機械劃割及分離 |
US9296066B2 (en) | 2010-07-12 | 2016-03-29 | Rofin-Sinar Technologies Inc. | Method of material processing by laser filamentation |
US8864005B2 (en) | 2010-07-16 | 2014-10-21 | Corning Incorporated | Methods for scribing and separating strengthened glass substrates |
DE102010032029B4 (de) * | 2010-07-21 | 2012-09-13 | Jenoptik Automatisierungstechnik Gmbh | Verfahren zum Trennen einer runden Planplatte aus sprödbrüchigem Material in mehrere rechteckige Einzelplatten mittels Laser |
DE102011012275A1 (de) * | 2011-02-24 | 2012-08-30 | Ritek Corp. | Verfahren zum Schneiden eines Solarzellenpanels und Ausrüstung dafür |
US10351460B2 (en) | 2012-05-22 | 2019-07-16 | Corning Incorporated | Methods of separating strengthened glass sheets by mechanical scribing |
US9404198B2 (en) * | 2012-07-30 | 2016-08-02 | Rayton Solar Inc. | Processes and apparatuses for manufacturing wafers |
US9499921B2 (en) | 2012-07-30 | 2016-11-22 | Rayton Solar Inc. | Float zone silicon wafer manufacturing system and related process |
US20170092463A1 (en) * | 2012-07-30 | 2017-03-30 | Rayton Solar Inc. | Wafer manufacturing system and related process |
JP6054234B2 (ja) * | 2013-04-22 | 2016-12-27 | 株式会社ディスコ | ウエーハの加工方法 |
EP3024616B1 (de) | 2013-07-23 | 2019-04-10 | 3D-Micromac AG | Verfahren und vorrichtung zur trennung eines flachen werkstücks in mehrere teilstücke |
DE102013016682A1 (de) | 2013-10-08 | 2015-04-09 | Siltectra Gmbh | Erzeugung einer Rissauslösestelle oder einer Rissführung zum verbesserten Abspalten einer Festkörperschicht von einem Festkörper |
EP2990172A1 (de) | 2014-08-26 | 2016-03-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Teilen von plattenförmigen Objekten aus spröden Werkstoffen |
TWI543834B (zh) | 2015-04-24 | 2016-08-01 | 納諾股份有限公司 | 脆性物件切斷裝置及其切斷方法 |
US11420894B2 (en) | 2015-04-24 | 2022-08-23 | Nanoplus Ltd. | Brittle object cutting apparatus and cutting method thereof |
DE102015118042A1 (de) | 2015-10-22 | 2017-04-27 | Nexwafe Gmbh | Verfahren und Vorrichtung zum Herstellen einer Halbleiterschicht |
DE102017219256A1 (de) | 2017-10-26 | 2019-05-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur Trennung eines flachen Werkstücks ohne Partikelablagerungen |
EP3695944B1 (de) | 2019-02-12 | 2024-04-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und vorrichtung zum teilen von plattenförmigen objekten aus spröden werkstoffen |
EP3839107A1 (de) | 2019-12-18 | 2021-06-23 | Siltronic AG | Verfahren zur bestimmung von defektdichten in halbleiterscheiben aus einkristallinem silizium |
DE102021121684A1 (de) | 2021-08-20 | 2023-02-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren zum Vereinzeln von Halbleiterbauelementen |
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JPH0532428A (ja) * | 1991-07-30 | 1993-02-09 | Hoya Corp | ガラス加工方法及びその装置 |
JPH09260310A (ja) * | 1996-03-22 | 1997-10-03 | Hitachi Ltd | 電子回路装置の製造方法 |
JP2002134451A (ja) * | 2000-10-27 | 2002-05-10 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
JP2003002676A (ja) * | 2001-06-19 | 2003-01-08 | Seiko Epson Corp | 基板の分割方法及び液晶装置の製造方法 |
JP2003321234A (ja) * | 2000-12-01 | 2003-11-11 | Lg Electronics Inc | ガラス切断方法および装置 |
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2005
- 2005-08-06 DE DE102005038027A patent/DE102005038027A1/de not_active Withdrawn
-
2006
- 2006-07-14 WO PCT/DE2006/001243 patent/WO2007016895A1/de active Application Filing
- 2006-07-14 JP JP2008525379A patent/JP2009504432A/ja active Pending
- 2006-07-14 EP EP06761820A patent/EP1924392B1/de active Active
- 2006-07-14 DE DE112006002738T patent/DE112006002738A5/de not_active Withdrawn
- 2006-07-14 DE DE502006007860T patent/DE502006007860D1/de active Active
- 2006-07-14 US US11/997,852 patent/US8212180B2/en active Active
- 2006-07-14 KR KR1020077030809A patent/KR101323078B1/ko active IP Right Grant
- 2006-07-14 AT AT06761820T patent/ATE480363T1/de active
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JPH09260310A (ja) * | 1996-03-22 | 1997-10-03 | Hitachi Ltd | 電子回路装置の製造方法 |
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JP2004223796A (ja) * | 2003-01-21 | 2004-08-12 | Kyoto Seisakusho Co Ltd | 脆性材料の割断加工方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014069237A (ja) * | 2012-10-02 | 2014-04-21 | Mitsuboshi Diamond Industrial Co Ltd | パターン付き基板の加工方法 |
JP2015167968A (ja) * | 2014-03-06 | 2015-09-28 | 株式会社ディスコ | レーザー加工方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20080034855A (ko) | 2008-04-22 |
US20080217311A1 (en) | 2008-09-11 |
KR101323078B1 (ko) | 2013-10-29 |
ATE480363T1 (de) | 2010-09-15 |
EP1924392A1 (de) | 2008-05-28 |
DE112006002738A5 (de) | 2008-07-17 |
US8212180B2 (en) | 2012-07-03 |
EP1924392B1 (de) | 2010-09-08 |
WO2007016895A1 (de) | 2007-02-15 |
DE102005038027A1 (de) | 2007-02-08 |
DE502006007860D1 (de) | 2010-10-21 |
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