JP2009127127A - 平板表示装置の薄膜蒸着用マスク組立体 - Google Patents
平板表示装置の薄膜蒸着用マスク組立体 Download PDFInfo
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- JP2009127127A JP2009127127A JP2008072139A JP2008072139A JP2009127127A JP 2009127127 A JP2009127127 A JP 2009127127A JP 2008072139 A JP2008072139 A JP 2008072139A JP 2008072139 A JP2008072139 A JP 2008072139A JP 2009127127 A JP2009127127 A JP 2009127127A
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- 238000007740 vapor deposition Methods 0.000 title abstract description 17
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000000427 thin-film deposition Methods 0.000 claims description 14
- 238000004140 cleaning Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 6
- 238000005019 vapor deposition process Methods 0.000 description 6
- 238000005452 bending Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】マスク組立体は、開口部201を囲む一対の第1支持部22及び一対の第2支持部24を備えたフレーム20と、少なくとも一組のパターン開口部401を形成し、引張力が加わった状態で第1支持部22に固定される複数の単位マスク40と、を含む。第1支持部は単位マスクが固定される第1基準面221と、第1基準面から単位マスクの厚さ方向に沿って第1基準面と高低差を有する第2基準面222とを含む。
【選択図】図1
Description
ここで、W1は第1支持部の幅を示し、W2は第1基準面の幅を示す。
22 第1支持部
24 第2支持部
40 単位マスク群
100 マスク組立体
201 開口部
221 第1基準面
222 第2基準面
401 パターン開口部
Claims (6)
- 開口部を囲む一対の第1支持部及び一対の第2支持部を備えたフレームと、
少なくとも一組のパターン開口部を形成し、引張力が加わった状態で前記第1支持部に固定される複数の単位マスクと、
を含み、
前記第1支持部は、
前記単位マスクが固定される第1基準面と、
前記第1基準面から前記単位マスクの厚さ方向に沿って前記第1基準面と高低差を有する第2基準面と、
を含むことを特徴とする、平板表示装置の薄膜蒸着用マスク組立体。 - 前記第1基準面が前記第2基準面より前記開口部に近く位置し、前記第2基準面が前記第1基準面より低い高さで形成されることを特徴とする、請求項1に記載の平板表示装置の薄膜蒸着用マスク組立体。
- 前記第1基準面で測定される前記第1支持部の厚さが前記第2基準面で測定される前記第1支持部の厚さより大きいことを特徴とする、請求項2に記載の平板表示装置の薄膜蒸着用マスク組立体。
- 前記第1支持部は前記第1基準面と前記第2基準面の反対側面を平らに形成することを特徴とする、請求項3に記載の平板表示装置の薄膜蒸着用マスク組立体。
- 前記第1基準面は前記第2支持部と同一な高さに位置することを特徴とする、請求項2に記載の平板表示装置の薄膜蒸着用マスク組立体。
- 前記第1支持部は下記条件を満足することを特徴とする、請求項1乃至請求項5のいずれか一項に記載の平板表示装置の薄膜蒸着用マスク組立体。
条件:0.2≦W2/W1≦0.4
ここで、W1は前記第1支持部の幅を示し、W2は前記第1基準面の幅を示す。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR1020070120267A KR100971753B1 (ko) | 2007-11-23 | 2007-11-23 | 평판 표시장치의 박막 증착용 마스크 조립체 |
KR10-2007-0120267 | 2007-11-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009127127A true JP2009127127A (ja) | 2009-06-11 |
JP4809386B2 JP4809386B2 (ja) | 2011-11-09 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008072139A Active JP4809386B2 (ja) | 2007-11-23 | 2008-03-19 | 平板表示装置の薄膜蒸着用マスク組立体 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8286579B2 (ja) |
JP (1) | JP4809386B2 (ja) |
KR (1) | KR100971753B1 (ja) |
CN (1) | CN101440476A (ja) |
TW (1) | TWI419984B (ja) |
Cited By (4)
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---|---|---|---|---|
EP2257046A2 (en) | 2009-05-27 | 2010-12-01 | Sony Corporation | Image pickup apparatus, electronic device, panoramic image recording method, and program |
CN102776473A (zh) * | 2012-08-10 | 2012-11-14 | 深圳市华星光电技术有限公司 | 有机电致发光二极管有机材料蒸镀用掩模装置 |
JP2014031569A (ja) * | 2012-08-03 | 2014-02-20 | Samsung Display Co Ltd | フレームおよびこれを含むマスク組立体 |
JP2019031743A (ja) * | 2017-01-10 | 2019-02-28 | 大日本印刷株式会社 | 蒸着マスク、蒸着マスク装置の製造方法および蒸着マスクの製造方法 |
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KR101135544B1 (ko) | 2009-09-22 | 2012-04-17 | 삼성모바일디스플레이주식회사 | 마스크 조립체, 이의 제조 방법 및 이를 이용한 평판표시장치용 증착 장치 |
CN101665903B (zh) * | 2009-09-30 | 2011-08-31 | 友达光电股份有限公司 | 遮罩组件以及镀膜机台 |
KR101030030B1 (ko) * | 2009-12-11 | 2011-04-20 | 삼성모바일디스플레이주식회사 | 마스크 조립체 |
KR101156432B1 (ko) | 2009-12-15 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 박막 증착용 마스크 프레임 조립체 및 유기 발광 디스플레이 장치 |
KR101182440B1 (ko) | 2010-01-11 | 2012-09-12 | 삼성디스플레이 주식회사 | 박막 증착용 마스크 프레임 조립체 |
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2007
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- 2008-03-19 JP JP2008072139A patent/JP4809386B2/ja active Active
- 2008-08-22 US US12/196,445 patent/US8286579B2/en active Active
- 2008-08-25 TW TW097132338A patent/TWI419984B/zh active
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EP2257046A2 (en) | 2009-05-27 | 2010-12-01 | Sony Corporation | Image pickup apparatus, electronic device, panoramic image recording method, and program |
JP2014031569A (ja) * | 2012-08-03 | 2014-02-20 | Samsung Display Co Ltd | フレームおよびこれを含むマスク組立体 |
US9953828B2 (en) | 2012-08-03 | 2018-04-24 | Samsung Display Co., Ltd. | Frame and mask assembly having the same |
CN102776473A (zh) * | 2012-08-10 | 2012-11-14 | 深圳市华星光电技术有限公司 | 有机电致发光二极管有机材料蒸镀用掩模装置 |
JP2019031743A (ja) * | 2017-01-10 | 2019-02-28 | 大日本印刷株式会社 | 蒸着マスク、蒸着マスク装置の製造方法および蒸着マスクの製造方法 |
JP7288594B2 (ja) | 2017-01-10 | 2023-06-08 | 大日本印刷株式会社 | 蒸着マスクおよび蒸着マスク装置の製造方法 |
Also Published As
Publication number | Publication date |
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CN101440476A (zh) | 2009-05-27 |
US8286579B2 (en) | 2012-10-16 |
TWI419984B (zh) | 2013-12-21 |
JP4809386B2 (ja) | 2011-11-09 |
US20090137180A1 (en) | 2009-05-28 |
KR100971753B1 (ko) | 2010-07-21 |
TW200923111A (en) | 2009-06-01 |
KR20090053418A (ko) | 2009-05-27 |
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