JP2009117845A5 - - Google Patents

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Publication number
JP2009117845A5
JP2009117845A5 JP2008287978A JP2008287978A JP2009117845A5 JP 2009117845 A5 JP2009117845 A5 JP 2009117845A5 JP 2008287978 A JP2008287978 A JP 2008287978A JP 2008287978 A JP2008287978 A JP 2008287978A JP 2009117845 A5 JP2009117845 A5 JP 2009117845A5
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JP
Japan
Prior art keywords
substrate
substrate support
processing system
semiconductor processing
support shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008287978A
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English (en)
Japanese (ja)
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JP2009117845A (ja
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Publication date
Priority claimed from US12/111,817 external-priority patent/US20090120368A1/en
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Publication of JP2009117845A publication Critical patent/JP2009117845A/ja
Publication of JP2009117845A5 publication Critical patent/JP2009117845A5/ja
Pending legal-status Critical Current

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JP2008287978A 2007-11-08 2008-11-10 膜均一性のための回転温度制御基板ペデスタル Pending JP2009117845A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US98632907P 2007-11-08 2007-11-08
US12/111,817 US20090120368A1 (en) 2007-11-08 2008-04-29 Rotating temperature controlled substrate pedestal for film uniformity

Publications (2)

Publication Number Publication Date
JP2009117845A JP2009117845A (ja) 2009-05-28
JP2009117845A5 true JP2009117845A5 (enExample) 2011-12-22

Family

ID=40345034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008287978A Pending JP2009117845A (ja) 2007-11-08 2008-11-10 膜均一性のための回転温度制御基板ペデスタル

Country Status (7)

Country Link
US (1) US20090120368A1 (enExample)
EP (1) EP2058849A3 (enExample)
JP (1) JP2009117845A (enExample)
KR (1) KR101140017B1 (enExample)
CN (1) CN101527254B (enExample)
SG (1) SG152212A1 (enExample)
TW (1) TW200941615A (enExample)

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