JP2009099327A5 - - Google Patents
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- Publication number
- JP2009099327A5 JP2009099327A5 JP2007268343A JP2007268343A JP2009099327A5 JP 2009099327 A5 JP2009099327 A5 JP 2009099327A5 JP 2007268343 A JP2007268343 A JP 2007268343A JP 2007268343 A JP2007268343 A JP 2007268343A JP 2009099327 A5 JP2009099327 A5 JP 2009099327A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- carbon
- transparent conductive
- magnesium
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 16
- 229910052749 magnesium Inorganic materials 0.000 claims 16
- 239000011777 magnesium Substances 0.000 claims 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 12
- 229910052799 carbon Inorganic materials 0.000 claims 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 5
- 229910052796 boron Inorganic materials 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 5
- 239000010703 silicon Substances 0.000 claims 5
- 230000008020 evaporation Effects 0.000 claims 4
- 238000001704 evaporation Methods 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052599 brucite Inorganic materials 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007268343A JP5224438B2 (ja) | 2007-10-15 | 2007-10-15 | 透明導電膜およびその製造方法 |
| PCT/JP2008/068460 WO2009051075A1 (ja) | 2007-10-15 | 2008-10-10 | 透明導電膜およびその製造方法 |
| EP08840743A EP2228805A4 (en) | 2007-10-15 | 2008-10-10 | TRANSPARENT CONDUCTIVE FILM AND METHOD FOR THE PRODUCTION THEREOF |
| SG2012077202A SG185923A1 (en) | 2007-10-15 | 2008-10-10 | Transparent conductive film andmethod for manufacturing the same |
| CN2008801121097A CN101821819B (zh) | 2007-10-15 | 2008-10-10 | 透明导电膜及其制造方法 |
| US12/682,971 US20100227176A1 (en) | 2007-10-15 | 2008-10-10 | Transparent Conductive Film and Method for Manufacturing the Same |
| KR1020107010260A KR20100075622A (ko) | 2007-10-15 | 2008-10-10 | 투명 도전막 및 그 제조 방법 |
| TW097139319A TWI466136B (zh) | 2007-10-15 | 2008-10-14 | 透明導電膜及其製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007268343A JP5224438B2 (ja) | 2007-10-15 | 2007-10-15 | 透明導電膜およびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009099327A JP2009099327A (ja) | 2009-05-07 |
| JP2009099327A5 true JP2009099327A5 (enExample) | 2012-11-29 |
| JP5224438B2 JP5224438B2 (ja) | 2013-07-03 |
Family
ID=40567342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007268343A Expired - Fee Related JP5224438B2 (ja) | 2007-10-15 | 2007-10-15 | 透明導電膜およびその製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20100227176A1 (enExample) |
| EP (1) | EP2228805A4 (enExample) |
| JP (1) | JP5224438B2 (enExample) |
| KR (1) | KR20100075622A (enExample) |
| CN (1) | CN101821819B (enExample) |
| SG (1) | SG185923A1 (enExample) |
| TW (1) | TWI466136B (enExample) |
| WO (1) | WO2009051075A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5881995B2 (ja) * | 2011-08-26 | 2016-03-09 | 久慈 俊郎 | 透明導電膜及びその製造方法 |
| CN108321239A (zh) * | 2017-12-21 | 2018-07-24 | 君泰创新（北京）科技有限公司 | 一种太阳能异质结电池及其制备方法 |
| JP2019173048A (ja) * | 2018-03-26 | 2019-10-10 | Ｊｘ金属株式会社 | スパッタリングターゲット部材及びその製造方法 |
| US11520451B2 (en) * | 2018-07-30 | 2022-12-06 | Asahi Kasei Kabushiki Kaisha | Conductive film and conductive film roll, electronic paper, touch panel and flat-panel display comprising the same |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03183759A (ja) * | 1989-12-12 | 1991-08-09 | Toyobo Co Ltd | 積層プラスチックフイルムおよびその製造方法 |
| EP0924777A3 (en) * | 1997-10-15 | 1999-07-07 | Canon Kabushiki Kaisha | A method for the formation of an indium oxide film by electro deposition process or electroless deposition process, a substrate provided with said indium oxide film for a semiconductor element, and a semiconductor element provided with said substrate |
| JP4429467B2 (ja) * | 1999-04-08 | 2010-03-10 | 帝人株式会社 | 透明導電性フィルム |
| JP4092958B2 (ja) * | 2002-06-11 | 2008-05-28 | コニカミノルタホールディングス株式会社 | Ｉｔｏ膜、ｉｔｏ膜材料及びｉｔｏ膜の形成方法 |
| JP2004179139A (ja) * | 2002-09-30 | 2004-06-24 | Sumitomo Osaka Cement Co Ltd | 導電性粒子とそれを含有する導電性接着材料及び透明導電膜形成用塗料及びそれを用いた透明導電膜並びに表示装置 |
| DE602004010409T2 (de) * | 2003-09-26 | 2008-10-16 | Matsushita Electric Industrial Co., Ltd., Kadoma | Plasmaanzeigetafel |
| JP4752507B2 (ja) | 2003-12-24 | 2011-08-17 | コニカミノルタホールディングス株式会社 | 透明プラスチックフィルム、および有機ｅｌ素子 |
| CN1957425A (zh) * | 2004-05-21 | 2007-05-02 | Tdk株式会社 | 透明导电材料、透明导电膏、透明导电膜和透明电极 |
| US8728615B2 (en) * | 2004-09-13 | 2014-05-20 | Sumitomo Metal Mining Co., Ltd. | Transparent conductive film and method of fabricating the same, transparent conductive base material, and light-emitting device |
-
2007
- 2007-10-15 JP JP2007268343A patent/JP5224438B2/ja not_active Expired - Fee Related
-
2008
- 2008-10-10 EP EP08840743A patent/EP2228805A4/en not_active Withdrawn
- 2008-10-10 KR KR1020107010260A patent/KR20100075622A/ko not_active Ceased
- 2008-10-10 US US12/682,971 patent/US20100227176A1/en not_active Abandoned
- 2008-10-10 SG SG2012077202A patent/SG185923A1/en unknown
- 2008-10-10 WO PCT/JP2008/068460 patent/WO2009051075A1/ja not_active Ceased
- 2008-10-10 CN CN2008801121097A patent/CN101821819B/zh not_active Expired - Fee Related
- 2008-10-14 TW TW097139319A patent/TWI466136B/zh not_active IP Right Cessation
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