ATE548327T1 - Verfahren zur herstellung von nanostrukturen - Google Patents

Verfahren zur herstellung von nanostrukturen

Info

Publication number
ATE548327T1
ATE548327T1 AT06727077T AT06727077T ATE548327T1 AT E548327 T1 ATE548327 T1 AT E548327T1 AT 06727077 T AT06727077 T AT 06727077T AT 06727077 T AT06727077 T AT 06727077T AT E548327 T1 ATE548327 T1 AT E548327T1
Authority
AT
Austria
Prior art keywords
nanostructures
nanomaterials
substrate
forming
carbon nanotubes
Prior art date
Application number
AT06727077T
Other languages
English (en)
Inventor
Sembukutiarachilage Silva
Ben Poul Jensen
Gaun Chen
Original Assignee
Surrey Nanosystems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surrey Nanosystems Ltd filed Critical Surrey Nanosystems Ltd
Application granted granted Critical
Publication of ATE548327T1 publication Critical patent/ATE548327T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • C01B32/162—Preparation characterised by catalysts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT06727077T 2005-05-11 2006-05-11 Verfahren zur herstellung von nanostrukturen ATE548327T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0509499.0A GB0509499D0 (en) 2005-05-11 2005-05-11 Use of thermal barrier for low temperature growth of nanostructures using top-down heating approach
PCT/GB2006/001726 WO2006120449A1 (en) 2005-05-11 2006-05-11 Nanostructure production methods and apparatus

Publications (1)

Publication Number Publication Date
ATE548327T1 true ATE548327T1 (de) 2012-03-15

Family

ID=34685363

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06727077T ATE548327T1 (de) 2005-05-11 2006-05-11 Verfahren zur herstellung von nanostrukturen

Country Status (8)

Country Link
US (1) US9334167B2 (de)
EP (1) EP1885909B1 (de)
JP (2) JP5097107B2 (de)
KR (2) KR20140022423A (de)
CN (1) CN101213321B (de)
AT (1) ATE548327T1 (de)
GB (1) GB0509499D0 (de)
WO (1) WO2006120449A1 (de)

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GB0509499D0 (en) 2005-05-11 2005-06-15 Univ Surrey Use of thermal barrier for low temperature growth of nanostructures using top-down heating approach
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US8919428B2 (en) * 2007-10-17 2014-12-30 Purdue Research Foundation Methods for attaching carbon nanotubes to a carbon substrate
KR101430969B1 (ko) * 2008-11-16 2014-08-18 금호석유화학 주식회사 급속냉각장치를 가지는 탄소나노튜브 반응챔버
US8541058B2 (en) * 2009-03-06 2013-09-24 Timothy S. Fisher Palladium thiolate bonding of carbon nanotubes
US8323439B2 (en) 2009-03-08 2012-12-04 Hewlett-Packard Development Company, L.P. Depositing carbon nanotubes onto substrate
US9376321B2 (en) * 2009-05-29 2016-06-28 Postech Academy-Industry Foundation Method and apparatus for manufacturing a nanowire
GB2478269A (en) * 2009-12-18 2011-09-07 Surrey Nanosystems Ltd Nanomaterials growth system and method
TWI466816B (zh) * 2009-12-30 2015-01-01 Univ Tunghai 筆直直立奈米線陣列結構及其製造方法
CN101942649A (zh) * 2010-10-21 2011-01-12 韩山师范学院 一种实现低温构筑高密度纳米硅结构的方法
KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
KR102095494B1 (ko) * 2013-07-01 2020-03-31 삼성전자주식회사 씨모스 이미지 센서
KR101626404B1 (ko) * 2013-10-02 2016-06-13 김승규 할로겐 램프 제조방법
GB201421827D0 (en) 2014-12-09 2015-01-21 Short Brothers Plc Fibre-reinforced components including nanostructures
GB201515271D0 (en) * 2015-08-27 2015-10-14 Surrey Nanosystems Ltd Ultra low reflectivity coating and method therefor
US11558937B2 (en) * 2017-01-20 2023-01-17 Whirlpool Corporation Transparent conductive door for a microwave oven and methods of making the same
CN108335916A (zh) * 2017-12-20 2018-07-27 肇庆市华师大光电产业研究院 一种多壁碳纳米管@x复合电极及其制备方法和应用
US12240761B2 (en) * 2020-02-03 2025-03-04 Cealtech As Device for large-scale production of graphene
JP2023180522A (ja) * 2022-06-09 2023-12-21 新光電気工業株式会社 基板固定装置及び基板固定装置の製造方法

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Also Published As

Publication number Publication date
US20090061217A1 (en) 2009-03-05
US9334167B2 (en) 2016-05-10
JP2008540313A (ja) 2008-11-20
GB0509499D0 (en) 2005-06-15
EP1885909A1 (de) 2008-02-13
WO2006120449A8 (en) 2008-01-24
KR20080010414A (ko) 2008-01-30
KR20140022423A (ko) 2014-02-24
JP5097107B2 (ja) 2012-12-12
JP2013014507A (ja) 2013-01-24
CN101213321B (zh) 2010-12-08
JP5612033B2 (ja) 2014-10-22
WO2006120449A1 (en) 2006-11-16
EP1885909B1 (de) 2012-03-07
CN101213321A (zh) 2008-07-02
KR101368457B1 (ko) 2014-03-12

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