ATE516384T1 - Verfahren und system zur ablagerung eines metalls oder metalloids auf kohlenstoffnanoröhrchen - Google Patents

Verfahren und system zur ablagerung eines metalls oder metalloids auf kohlenstoffnanoröhrchen

Info

Publication number
ATE516384T1
ATE516384T1 AT09718643T AT09718643T ATE516384T1 AT E516384 T1 ATE516384 T1 AT E516384T1 AT 09718643 T AT09718643 T AT 09718643T AT 09718643 T AT09718643 T AT 09718643T AT E516384 T1 ATE516384 T1 AT E516384T1
Authority
AT
Austria
Prior art keywords
metalloid
metal
ntc
deposing
carbon nanotube
Prior art date
Application number
AT09718643T
Other languages
English (en)
Inventor
Serge Bordere
Daniel Cochard
Eric Dutilh
Patrice Gaillard
Damien Voiry
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Application granted granted Critical
Publication of ATE516384T1 publication Critical patent/ATE516384T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/168—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
AT09718643T 2008-03-11 2009-02-20 Verfahren und system zur ablagerung eines metalls oder metalloids auf kohlenstoffnanoröhrchen ATE516384T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0851581A FR2928662B1 (fr) 2008-03-11 2008-03-11 Procede et systeme de depot d'un metal ou metalloide sur des nanotubes de carbone
PCT/FR2009/050274 WO2009112738A1 (fr) 2008-03-11 2009-02-20 Procede et systeme de depot d'un metal ou metalloïde sur des nanotubes de carbone

Publications (1)

Publication Number Publication Date
ATE516384T1 true ATE516384T1 (de) 2011-07-15

Family

ID=39876675

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09718643T ATE516384T1 (de) 2008-03-11 2009-02-20 Verfahren und system zur ablagerung eines metalls oder metalloids auf kohlenstoffnanoröhrchen

Country Status (11)

Country Link
US (1) US20110052805A1 (de)
EP (1) EP2250298B1 (de)
JP (1) JP2011513596A (de)
KR (1) KR20100126344A (de)
CN (1) CN101970715A (de)
AT (1) ATE516384T1 (de)
BR (1) BRPI0909305A2 (de)
ES (1) ES2368117T3 (de)
FR (1) FR2928662B1 (de)
PL (1) PL2250298T3 (de)
WO (1) WO2009112738A1 (de)

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US10240419B2 (en) 2009-12-08 2019-03-26 Baker Hughes, A Ge Company, Llc Downhole flow inhibition tool and method of unplugging a seat
US9243475B2 (en) 2009-12-08 2016-01-26 Baker Hughes Incorporated Extruded powder metal compact
FR2968676B1 (fr) 2010-12-14 2012-12-07 Arkema France Procede d'introduction de nanocharges d'origine carbonique dans un metal ou un alliage
US8631876B2 (en) 2011-04-28 2014-01-21 Baker Hughes Incorporated Method of making and using a functionally gradient composite tool
US9080098B2 (en) 2011-04-28 2015-07-14 Baker Hughes Incorporated Functionally gradient composite article
KR101249799B1 (ko) * 2011-05-02 2013-04-03 한국과학기술연구원 탄소나노튜브와 금속 나노입자의 항균 복합나노구조체를 이용한 항균 필터여재 제조장치 및 방법
US9139928B2 (en) 2011-06-17 2015-09-22 Baker Hughes Incorporated Corrodible downhole article and method of removing the article from downhole environment
US9707739B2 (en) 2011-07-22 2017-07-18 Baker Hughes Incorporated Intermetallic metallic composite, method of manufacture thereof and articles comprising the same
US9833838B2 (en) 2011-07-29 2017-12-05 Baker Hughes, A Ge Company, Llc Method of controlling the corrosion rate of alloy particles, alloy particle with controlled corrosion rate, and articles comprising the particle
US9643250B2 (en) 2011-07-29 2017-05-09 Baker Hughes Incorporated Method of controlling the corrosion rate of alloy particles, alloy particle with controlled corrosion rate, and articles comprising the particle
US9033055B2 (en) 2011-08-17 2015-05-19 Baker Hughes Incorporated Selectively degradable passage restriction and method
US9856547B2 (en) 2011-08-30 2018-01-02 Bakers Hughes, A Ge Company, Llc Nanostructured powder metal compact
US9109269B2 (en) 2011-08-30 2015-08-18 Baker Hughes Incorporated Magnesium alloy powder metal compact
US9090956B2 (en) 2011-08-30 2015-07-28 Baker Hughes Incorporated Aluminum alloy powder metal compact
US9643144B2 (en) * 2011-09-02 2017-05-09 Baker Hughes Incorporated Method to generate and disperse nanostructures in a composite material
US9010416B2 (en) 2012-01-25 2015-04-21 Baker Hughes Incorporated Tubular anchoring system and a seat for use in the same
US9605508B2 (en) 2012-05-08 2017-03-28 Baker Hughes Incorporated Disintegrable and conformable metallic seal, and method of making the same
US9365426B2 (en) * 2012-07-30 2016-06-14 Scnte, Llc Process for the production of nanostructured carbon materials
US9304095B2 (en) 2013-04-30 2016-04-05 Hewlett-Packard Development Company, L.P. Dosimetry via platinum—ruthenium nanoparticle-decorated nanostructure
CN103343331B (zh) * 2013-07-02 2015-07-01 中国航空工业集团公司北京航空制造工程研究所 化学气相沉积反应的装置
US9816339B2 (en) 2013-09-03 2017-11-14 Baker Hughes, A Ge Company, Llc Plug reception assembly and method of reducing restriction in a borehole
US10150713B2 (en) 2014-02-21 2018-12-11 Terves, Inc. Fluid activated disintegrating metal system
US11167343B2 (en) 2014-02-21 2021-11-09 Terves, Llc Galvanically-active in situ formed particles for controlled rate dissolving tools
US10689740B2 (en) 2014-04-18 2020-06-23 Terves, LLCq Galvanically-active in situ formed particles for controlled rate dissolving tools
US9910026B2 (en) 2015-01-21 2018-03-06 Baker Hughes, A Ge Company, Llc High temperature tracers for downhole detection of produced water
US10378303B2 (en) 2015-03-05 2019-08-13 Baker Hughes, A Ge Company, Llc Downhole tool and method of forming the same
US10221637B2 (en) 2015-08-11 2019-03-05 Baker Hughes, A Ge Company, Llc Methods of manufacturing dissolvable tools via liquid-solid state molding
KR101997595B1 (ko) * 2015-11-27 2019-07-08 주식회사 엘지화학 탄소나노튜브섬유, 그 제조 장치 및 방법
US10016810B2 (en) 2015-12-14 2018-07-10 Baker Hughes, A Ge Company, Llc Methods of manufacturing degradable tools using a galvanic carrier and tools manufactured thereof
CN106179335A (zh) * 2016-07-05 2016-12-07 张启辉 碳银复合催化剂的制备方法
GB2556051A (en) * 2016-11-14 2018-05-23 Aurubis Belgium Nv/Sa Methods and apparatus for use in producing carbon nanotube/metal composites
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Also Published As

Publication number Publication date
CN101970715A (zh) 2011-02-09
FR2928662A1 (fr) 2009-09-18
EP2250298B1 (de) 2011-07-13
KR20100126344A (ko) 2010-12-01
US20110052805A1 (en) 2011-03-03
ES2368117T3 (es) 2011-11-14
EP2250298A1 (de) 2010-11-17
PL2250298T3 (pl) 2011-12-30
WO2009112738A1 (fr) 2009-09-17
JP2011513596A (ja) 2011-04-28
BRPI0909305A2 (pt) 2015-08-11
FR2928662B1 (fr) 2011-08-26

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