JP5224438B2 - 透明導電膜およびその製造方法 - Google Patents

透明導電膜およびその製造方法 Download PDF

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Publication number
JP5224438B2
JP5224438B2 JP2007268343A JP2007268343A JP5224438B2 JP 5224438 B2 JP5224438 B2 JP 5224438B2 JP 2007268343 A JP2007268343 A JP 2007268343A JP 2007268343 A JP2007268343 A JP 2007268343A JP 5224438 B2 JP5224438 B2 JP 5224438B2
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JP
Japan
Prior art keywords
transparent conductive
conductive film
film
magnesium
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007268343A
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English (en)
Japanese (ja)
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JP2009099327A (ja
JP2009099327A5 (enExample
Inventor
俊郎 久慈
雅史 千葉
貴充 本城
小一郎 小戸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
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Publication date
Priority to JP2007268343A priority Critical patent/JP5224438B2/ja
Application filed by Individual filed Critical Individual
Priority to CN2008801121097A priority patent/CN101821819B/zh
Priority to PCT/JP2008/068460 priority patent/WO2009051075A1/ja
Priority to EP08840743A priority patent/EP2228805A4/en
Priority to SG2012077202A priority patent/SG185923A1/en
Priority to US12/682,971 priority patent/US20100227176A1/en
Priority to KR1020107010260A priority patent/KR20100075622A/ko
Priority to TW097139319A priority patent/TWI466136B/zh
Publication of JP2009099327A publication Critical patent/JP2009099327A/ja
Publication of JP2009099327A5 publication Critical patent/JP2009099327A5/ja
Application granted granted Critical
Publication of JP5224438B2 publication Critical patent/JP5224438B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)
JP2007268343A 2007-10-15 2007-10-15 透明導電膜およびその製造方法 Expired - Fee Related JP5224438B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2007268343A JP5224438B2 (ja) 2007-10-15 2007-10-15 透明導電膜およびその製造方法
PCT/JP2008/068460 WO2009051075A1 (ja) 2007-10-15 2008-10-10 透明導電膜およびその製造方法
EP08840743A EP2228805A4 (en) 2007-10-15 2008-10-10 TRANSPARENT CONDUCTIVE FILM AND METHOD FOR THE PRODUCTION THEREOF
SG2012077202A SG185923A1 (en) 2007-10-15 2008-10-10 Transparent conductive film andmethod for manufacturing the same
CN2008801121097A CN101821819B (zh) 2007-10-15 2008-10-10 透明导电膜及其制造方法
US12/682,971 US20100227176A1 (en) 2007-10-15 2008-10-10 Transparent Conductive Film and Method for Manufacturing the Same
KR1020107010260A KR20100075622A (ko) 2007-10-15 2008-10-10 투명 도전막 및 그 제조 방법
TW097139319A TWI466136B (zh) 2007-10-15 2008-10-14 透明導電膜及其製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007268343A JP5224438B2 (ja) 2007-10-15 2007-10-15 透明導電膜およびその製造方法

Publications (3)

Publication Number Publication Date
JP2009099327A JP2009099327A (ja) 2009-05-07
JP2009099327A5 JP2009099327A5 (enExample) 2012-11-29
JP5224438B2 true JP5224438B2 (ja) 2013-07-03

Family

ID=40567342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007268343A Expired - Fee Related JP5224438B2 (ja) 2007-10-15 2007-10-15 透明導電膜およびその製造方法

Country Status (8)

Country Link
US (1) US20100227176A1 (enExample)
EP (1) EP2228805A4 (enExample)
JP (1) JP5224438B2 (enExample)
KR (1) KR20100075622A (enExample)
CN (1) CN101821819B (enExample)
SG (1) SG185923A1 (enExample)
TW (1) TWI466136B (enExample)
WO (1) WO2009051075A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5881995B2 (ja) * 2011-08-26 2016-03-09 久慈　俊郎 透明導電膜及びその製造方法
CN108321239A (zh) * 2017-12-21 2018-07-24 君泰创新（北京）科技有限公司 一种太阳能异质结电池及其制备方法
JP2019173048A (ja) * 2018-03-26 2019-10-10 Ｊｘ金属株式会社 スパッタリングターゲット部材及びその製造方法
US11520451B2 (en) * 2018-07-30 2022-12-06 Asahi Kasei Kabushiki Kaisha Conductive film and conductive film roll, electronic paper, touch panel and flat-panel display comprising the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183759A (ja) * 1989-12-12 1991-08-09 Toyobo Co Ltd 積層プラスチックフイルムおよびその製造方法
EP0924777A3 (en) * 1997-10-15 1999-07-07 Canon Kabushiki Kaisha A method for the formation of an indium oxide film by electro deposition process or electroless deposition process, a substrate provided with said indium oxide film for a semiconductor element, and a semiconductor element provided with said substrate
JP4429467B2 (ja) * 1999-04-08 2010-03-10 帝人株式会社 透明導電性フィルム
JP4092958B2 (ja) * 2002-06-11 2008-05-28 コニカミノルタホールディングス株式会社 Ｉｔｏ膜、ｉｔｏ膜材料及びｉｔｏ膜の形成方法
JP2004179139A (ja) * 2002-09-30 2004-06-24 Sumitomo Osaka Cement Co Ltd 導電性粒子とそれを含有する導電性接着材料及び透明導電膜形成用塗料及びそれを用いた透明導電膜並びに表示装置
DE602004010409T2 (de) * 2003-09-26 2008-10-16 Matsushita Electric Industrial Co., Ltd., Kadoma Plasmaanzeigetafel
JP4752507B2 (ja) 2003-12-24 2011-08-17 コニカミノルタホールディングス株式会社 透明プラスチックフィルム、および有機ｅｌ素子
CN1957425A (zh) * 2004-05-21 2007-05-02 Tdk株式会社 透明导电材料、透明导电膏、透明导电膜和透明电极
US8728615B2 (en) * 2004-09-13 2014-05-20 Sumitomo Metal Mining Co., Ltd. Transparent conductive film and method of fabricating the same, transparent conductive base material, and light-emitting device

Also Published As

Publication number Publication date
EP2228805A1 (en) 2010-09-15
TW200923974A (en) 2009-06-01
CN101821819B (zh) 2012-07-25
US20100227176A1 (en) 2010-09-09
KR20100075622A (ko) 2010-07-02
JP2009099327A (ja) 2009-05-07
EP2228805A4 (en) 2012-08-22
CN101821819A (zh) 2010-09-01
SG185923A1 (en) 2012-12-28
WO2009051075A1 (ja) 2009-04-23
TWI466136B (zh) 2014-12-21

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