JP2009060137A - 半導体集積回路デバイス - Google Patents
半導体集積回路デバイス Download PDFInfo
- Publication number
- JP2009060137A JP2009060137A JP2008290462A JP2008290462A JP2009060137A JP 2009060137 A JP2009060137 A JP 2009060137A JP 2008290462 A JP2008290462 A JP 2008290462A JP 2008290462 A JP2008290462 A JP 2008290462A JP 2009060137 A JP2009060137 A JP 2009060137A
- Authority
- JP
- Japan
- Prior art keywords
- self
- landing pad
- aligned contact
- polysilicon
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 64
- 229920005591 polysilicon Polymers 0.000 claims abstract description 64
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 239000010703 silicon Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 125000006850 spacer group Chemical group 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 29
- 238000005530 etching Methods 0.000 description 21
- 229910052581 Si3N4 Inorganic materials 0.000 description 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 17
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 238000001020 plasma etching Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
【解決手段】フィールド酸化物領域と、そこから離間した活性領域とを有するシリコン製基板と、フィールド酸化物領域と、活性領域にそれぞれ関連して、第1と第2の自己整合接点ウィンドウ開口内にそれぞれ形成された第1と第2の自己整合接点と、フィールド酸化物領域の上で、かつ前記第1自己整合接点ウィンドウ開口の下に形成されたダミーのポリシリコンランディングパッドと、ダミーのポリシリコンランディングパッドの上に形成された動作用ポリシリコンランディングパッドとを有する。
【選択図】 図5
Description
21 第1レジスト層
22 フィールド酸化物領域
22 第2レジスト層
24 ゲート酸化物層
26 ドープトシリコン製基板
30 ポリシリコン層
32 酸化物層
34 窒化シリコン層
36 ドレイン/ソース
38 ゲート側壁スペーサ
40 ドレイン/ソース領域
44 窒化シリコン層
60 NANDメモリ
62 NORセル
64 フローティングゲートトランジスタ
66 フローティングゲート
68 N+ソース
70 N+ドレイン
72 P型基板
74 制御ゲート
76 ワードライン
78 ビットライン
90 シリコン製基板
91a フィールド酸化物領域
91b 活性領域
92 ポリシリコン製ランディングパッド
100 通常のウィンドウ開口
100a 接点
101 自己整合接点ウィンドウ開口
102 自己整合接点ウィンドウ開口
103 酸化物薄膜層
105 側壁スペーサ
105a ハードマスク酸化物
105b 窒化シリコン層
110 第1上部部分
112 第2下部部分
114 ポリシリコン製ランディングパッド構造
130 ダミーランディングパッド
131 第1自己整合接点ウィンドウ開口
131a 自己整合接点
132 実際のポリシリコン製ランディングパッド
140 第2の自己整合接点ウィンドウ
142 上部部分
144 下部部分
200 ダミーのポリシリコン製ランディングパッドを形成する
202 ポリシリコン製ゲート積層構造を形成する
204 ポリシリコン製のゲートを形成する
206 スペーサ用酸化物を堆積する
208 スペーサを形成する
210 窒化シリコン層を堆積する
212 誘電体層1を堆積する
214 第1ウィンドウ自己整合接点エッチングを実行する
Claims (5)
- フィールド酸化物領域と、そこから離間した活性領域とを有するシリコン製基板と、
前記フィールド酸化物領域と活性領域にそれぞれ関連して、第1と第2の自己整合接点ウィンドウ開口内にそれぞれ形成された第1と第2の自己整合接点と、
前記フィールド酸化物領域の上で、かつ前記第1自己整合接点ウィンドウ開口の下方に形成されたダミーのポリシリコンランディングパッドと、
前記ダミーのポリシリコンランディングパッドの上方に形成された動作用ポリシリコンランディングパッドと、
を有することを特徴とする半導体集積回路デバイス。 - 前記第2の自己整合接点ウィンドウ開口の下方に配置された酸化物薄膜層
をさらに有することを特徴とする請求項1記載のデバイス。 - 前記活性領域の部分の上に形成されたポリシリコンランディングパッド
をさらに有することを特徴とする請求項1記載のデバイス。 - 前記活性領域の部分の上のポリシリコンランディングパッドの端部に形成された側壁スペーサ
をさらに有することを特徴とする請求項1記載のデバイス。 - 前記動作用ポリシリコンランディングパッドの端部に形成された側壁スペーサ
をさらに有することを特徴とする請求項1記載のデバイス。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/451,054 US6483144B2 (en) | 1999-11-30 | 1999-11-30 | Semiconductor device having self-aligned contact and landing pad structure and method of forming same |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000362265A Division JP4820978B2 (ja) | 1999-11-30 | 2000-11-29 | 半導体集積回路デバイスの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009060137A true JP2009060137A (ja) | 2009-03-19 |
Family
ID=23790627
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000362265A Expired - Fee Related JP4820978B2 (ja) | 1999-11-30 | 2000-11-29 | 半導体集積回路デバイスの製造方法 |
JP2008290462A Pending JP2009060137A (ja) | 1999-11-30 | 2008-11-13 | 半導体集積回路デバイス |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000362265A Expired - Fee Related JP4820978B2 (ja) | 1999-11-30 | 2000-11-29 | 半導体集積回路デバイスの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6483144B2 (ja) |
JP (2) | JP4820978B2 (ja) |
KR (1) | KR100704132B1 (ja) |
GB (1) | GB2362756B (ja) |
TW (1) | TW471138B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100380348B1 (ko) * | 2001-01-11 | 2003-04-11 | 삼성전자주식회사 | 자기 정렬 콘택의 게이트 스페이서를 형성하는 방법 |
KR20220003870A (ko) | 2020-07-02 | 2022-01-11 | 삼성전자주식회사 | 반도체 메모리 장치 및 그 제조 방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62122238A (ja) * | 1985-11-22 | 1987-06-03 | Hitachi Ltd | 半導体装置 |
JPH05218211A (ja) * | 1991-12-13 | 1993-08-27 | Nec Corp | セルフアライン・コンタクト孔の形成方法 |
JPH06224196A (ja) * | 1993-01-28 | 1994-08-12 | Hitachi Ltd | 半導体集積回路装置 |
JPH098008A (ja) * | 1995-06-16 | 1997-01-10 | Sony Corp | 配線形成方法及び配線構造 |
JPH09199589A (ja) * | 1996-01-18 | 1997-07-31 | Sony Corp | 配線形成方法 |
JPH1041482A (ja) * | 1996-07-18 | 1998-02-13 | Fujitsu Ltd | 半導体装置およびその製造方法 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
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GB2021861B (en) * | 1978-05-26 | 1982-09-29 | Rockwell International Corp | Field effect transistors |
US4686000A (en) * | 1985-04-02 | 1987-08-11 | Heath Barbara A | Self-aligned contact process |
US5036378A (en) | 1989-11-01 | 1991-07-30 | At&T Bell Laboratories | Memory device |
US5166771A (en) | 1990-01-12 | 1992-11-24 | Paradigm Technology, Inc. | Self-aligning contact and interconnect structure |
JPH03283570A (ja) * | 1990-03-30 | 1991-12-13 | Fujitsu Ltd | 半導体装置及びその製造方法 |
JPH04218918A (ja) * | 1990-04-27 | 1992-08-10 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US5087584A (en) * | 1990-04-30 | 1992-02-11 | Intel Corporation | Process for fabricating a contactless floating gate memory array utilizing wordline trench vias |
KR930011462B1 (ko) * | 1990-11-23 | 1993-12-08 | 현대전자산업 주식회사 | 다층배선의 단차를 완화시키는 방법 |
US5298792A (en) * | 1992-02-03 | 1994-03-29 | Micron Technology, Inc. | Integrated circuit device with bi-level contact landing pads |
JP2748070B2 (ja) * | 1992-05-20 | 1998-05-06 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JPH0774326A (ja) * | 1993-09-01 | 1995-03-17 | Seiko Epson Corp | 半導体装置及びその製造方法 |
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JP3665426B2 (ja) * | 1996-07-17 | 2005-06-29 | 東芝マイクロエレクトロニクス株式会社 | 半導体装置の製造方法 |
US5907779A (en) | 1996-10-15 | 1999-05-25 | Samsung Electronics Co., Ltd. | Selective landing pad fabricating methods for integrated circuits |
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-
1999
- 1999-11-30 US US09/451,054 patent/US6483144B2/en not_active Expired - Lifetime
-
2000
- 2000-11-20 GB GB0028276A patent/GB2362756B/en not_active Expired - Fee Related
- 2000-11-23 TW TW089124902A patent/TW471138B/zh not_active IP Right Cessation
- 2000-11-29 JP JP2000362265A patent/JP4820978B2/ja not_active Expired - Fee Related
- 2000-11-30 KR KR1020000071927A patent/KR100704132B1/ko not_active IP Right Cessation
-
2008
- 2008-11-13 JP JP2008290462A patent/JP2009060137A/ja active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62122238A (ja) * | 1985-11-22 | 1987-06-03 | Hitachi Ltd | 半導体装置 |
JPH05218211A (ja) * | 1991-12-13 | 1993-08-27 | Nec Corp | セルフアライン・コンタクト孔の形成方法 |
JPH06224196A (ja) * | 1993-01-28 | 1994-08-12 | Hitachi Ltd | 半導体集積回路装置 |
JPH098008A (ja) * | 1995-06-16 | 1997-01-10 | Sony Corp | 配線形成方法及び配線構造 |
JPH09199589A (ja) * | 1996-01-18 | 1997-07-31 | Sony Corp | 配線形成方法 |
JPH1041482A (ja) * | 1996-07-18 | 1998-02-13 | Fujitsu Ltd | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
GB0028276D0 (en) | 2001-01-03 |
KR100704132B1 (ko) | 2007-04-09 |
TW471138B (en) | 2002-01-01 |
JP2001189392A (ja) | 2001-07-10 |
KR20010052043A (ko) | 2001-06-25 |
JP4820978B2 (ja) | 2011-11-24 |
US20020000601A1 (en) | 2002-01-03 |
GB2362756A (en) | 2001-11-28 |
GB2362756B (en) | 2002-06-05 |
US6483144B2 (en) | 2002-11-19 |
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