|
US2447789A
(en)
*
|
1945-03-23 |
1948-08-24 |
Polaroid Corp |
Evaporating crucible for coating apparatus
|
|
GB1253124A
(https=)
|
1969-02-28 |
1971-11-10 |
|
|
|
DE3200848C2
(de)
*
|
1982-01-14 |
1984-09-27 |
GfO Gesellschaft für Oberflächentechnik mbH, 7070 Schwäbisch Gmünd |
Vorrichtung zum Beschicken von Verdampfern in Aufdampfanlagen
|
|
JPS59177365A
(ja)
*
|
1983-03-24 |
1984-10-08 |
Matsushita Electric Ind Co Ltd |
蒸発方法とその装置
|
|
JPH0743322B2
(ja)
|
1985-07-19 |
1995-05-15 |
株式会社日立製作所 |
検査方法および装置
|
|
US4885211A
(en)
*
|
1987-02-11 |
1989-12-05 |
Eastman Kodak Company |
Electroluminescent device with improved cathode
|
|
US4769292A
(en)
*
|
1987-03-02 |
1988-09-06 |
Eastman Kodak Company |
Electroluminescent device with modified thin film luminescent zone
|
|
US5041719A
(en)
*
|
1990-06-01 |
1991-08-20 |
General Electric Company |
Two-zone electrical furnace for molecular beam epitaxial apparatus
|
|
JPH05117864A
(ja)
|
1991-06-25 |
1993-05-14 |
Anelva Corp |
Ｃｖｄ装置
|
|
JPH0530761U
(ja)
|
1991-09-30 |
1993-04-23 |
京セラ株式会社 |
欠陥観察装置
|
|
JPH09219289A
(ja)
|
1996-02-09 |
1997-08-19 |
Chisso Corp |
有機薄膜電界発光素子とその製造方法
|
|
US5849089A
(en)
*
|
1997-03-14 |
1998-12-15 |
Kabushiki Kaisha Toshiba |
Evaporator for liquid raw material and evaporation method therefor
|
|
TW411458B
(en)
*
|
1997-05-08 |
2000-11-11 |
Matsushita Electric Industrial Co Ltd |
Apparatus and process for production of optical recording medium
|
|
JPH1161386A
(ja)
*
|
1997-08-22 |
1999-03-05 |
Fuji Electric Co Ltd |
有機薄膜発光素子の成膜装置
|
|
US6337102B1
(en)
*
|
1997-11-17 |
2002-01-08 |
The Trustees Of Princeton University |
Low pressure vapor phase deposition of organic thin films
|
|
JPH11251067A
(ja)
*
|
1998-03-02 |
1999-09-17 |
Junji Kido |
有機エレクトロルミネッセント素子
|
|
US6330494B1
(en)
*
|
1998-06-09 |
2001-12-11 |
Sony Corporation |
Robot and method of its attitude control
|
|
JP2000068055A
(ja)
|
1998-08-26 |
2000-03-03 |
Tdk Corp |
有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
|
|
JP3610837B2
(ja)
|
1998-09-18 |
2005-01-19 |
株式会社日立製作所 |
試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
|
|
US6123993A
(en)
*
|
1998-09-21 |
2000-09-26 |
Advanced Technology Materials, Inc. |
Method and apparatus for forming low dielectric constant polymeric films
|
|
JP2000248358A
(ja)
|
1999-03-01 |
2000-09-12 |
Casio Comput Co Ltd |
蒸着装置および蒸着方法
|
|
TW521303B
(en)
*
|
2000-02-28 |
2003-02-21 |
Semiconductor Energy Lab |
Electronic device
|
|
US6237529B1
(en)
*
|
2000-03-03 |
2001-05-29 |
Eastman Kodak Company |
Source for thermal physical vapor deposition of organic electroluminescent layers
|
|
US6660328B1
(en)
*
|
2000-03-31 |
2003-12-09 |
Florida State University Research Foundation |
Powder precursor delivery system for chemical vapor deposition
|
|
ATE497028T1
(de)
*
|
2000-06-22 |
2011-02-15 |
Panasonic Elec Works Co Ltd |
Vorrichtung und verfahren zum vakuum-ausdampfen
|
|
JP4153652B2
(ja)
|
2000-10-05 |
2008-09-24 |
株式会社東芝 |
パターン評価装置及びパターン評価方法
|
|
US6467427B1
(en)
|
2000-11-10 |
2002-10-22 |
Helix Technology Inc. |
Evaporation source material supplier
|
|
JP4906018B2
(ja)
|
2001-03-12 |
2012-03-28 |
株式会社半導体エネルギー研究所 |
成膜方法、発光装置の作製方法及び成膜装置
|
|
US20030015140A1
(en)
*
|
2001-04-26 |
2003-01-23 |
Eastman Kodak Company |
Physical vapor deposition of organic layers using tubular sources for making organic light-emitting devices
|
|
EP1451386A1
(en)
|
2001-12-04 |
2004-09-01 |
Primaxx, Inc. |
Chemical vapor deposition vaporizer
|
|
AU2003217530A1
(en)
*
|
2002-04-01 |
2003-10-13 |
Ans Inc |
Apparatus and method for depositing organic matter of vapor phase
|
|
JP2003293121A
(ja)
*
|
2002-04-05 |
2003-10-15 |
Cluster Ion Beam Technology Kk |
蒸着材料供給手段を備えた蒸着用坩堝
|
|
EP1560468B1
(en)
*
|
2002-07-19 |
2018-03-21 |
LG Display Co., Ltd. |
Source for thermal physical vapor deposition of organic electroluminescent layers
|
|
JP4901090B2
(ja)
|
2004-10-06 |
2012-03-21 |
株式会社ニコン |
欠陥検査方法及び欠陥検出装置
|
|
US7643137B2
(en)
|
2003-03-26 |
2010-01-05 |
Nikon Corporation |
Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
|
|
US6837939B1
(en)
*
|
2003-07-22 |
2005-01-04 |
Eastman Kodak Company |
Thermal physical vapor deposition source using pellets of organic material for making OLED displays
|
|
TWI242463B
(en)
|
2003-08-28 |
2005-11-01 |
Ind Tech Res Inst |
Apparatus and process for vacuum sublimation
|
|
US7339139B2
(en)
*
|
2003-10-03 |
2008-03-04 |
Darly Custom Technology, Inc. |
Multi-layered radiant thermal evaporator and method of use
|
|
KR101346492B1
(ko)
|
2003-10-27 |
2013-12-31 |
가부시키가이샤 니콘 |
패턴 검사장치 및 패턴 검사방법
|
|
US7232588B2
(en)
|
2004-02-23 |
2007-06-19 |
Eastman Kodak Company |
Device and method for vaporizing temperature sensitive materials
|
|
US7364772B2
(en)
|
2004-03-22 |
2008-04-29 |
Eastman Kodak Company |
Method for coating an organic layer onto a substrate in a vacuum chamber
|
|
US7501151B2
(en)
*
|
2004-09-21 |
2009-03-10 |
Eastman Kodak Company |
Delivering particulate material to a vaporization zone
|
|
US7501152B2
(en)
*
|
2004-09-21 |
2009-03-10 |
Eastman Kodak Company |
Delivering particulate material to a vaporization zone
|