JP5796168B2 - インライン型蒸着装置 - Google Patents
インライン型蒸着装置 Download PDFInfo
- Publication number
- JP5796168B2 JP5796168B2 JP2013532452A JP2013532452A JP5796168B2 JP 5796168 B2 JP5796168 B2 JP 5796168B2 JP 2013532452 A JP2013532452 A JP 2013532452A JP 2013532452 A JP2013532452 A JP 2013532452A JP 5796168 B2 JP5796168 B2 JP 5796168B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- plate
- radiant heat
- line type
- diffusion plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
2 被蒸着体
3 蒸発源
32 蒸着材料
4 筒状体
41 開口部
5 補正板
51 開口延伸部
6 拡散板(輻射熱拡散板)
6a 鏡面領域
6b 粗面領域
60 拡散板対
61 延伸部
8 冷却装置
80 ポンプ(水冷機構)
81 水冷配管(水冷機構)
9 冷却板
91 接続部
Claims (13)
- 被蒸着体に蒸着される蒸着材料を蒸発させる蒸発源と、前記蒸発源及び前記被蒸着体の間の空間を囲い、前記被蒸着体側に開口部を有する筒状体と、前記筒状体の開口部近傍に設けられて前記筒状体から放射される前記蒸着材料の量を制御する補正板と、を備え、
前記筒状体は、該筒状体を前記蒸着材料が蒸発する温度に加熱するヒータを有し、
前記補正板より前記被蒸着体側に、直線辺及び円弧辺から成る半月形状の板材である輻射熱拡散板を設けたことを特徴とするインライン型蒸着装置。 - 前記輻射熱拡散板は、冷却装置を有することを特徴とする請求項1に記載のインライン型蒸着装置。
- 前記冷却装置は、水冷機構であることを特徴とする請求項2に記載のインライン型蒸着装置。
- 前記輻射熱拡散板を複数備え、
該複数の輻射熱拡散板は、上面視において重複した部分を有することを特徴とする請求項1乃至請求項3のいずれか一項に記載のインライン型蒸着装置。 - 前記複数の輻射熱拡散板が、前記被蒸着体の搬送方向の上流側と下流側に同一平面上に離間して配置されて拡散板対を形成することを特徴とする請求項4に記載のインライン型蒸着装置。
- 前記拡散板対が複数個積層され、
前記被蒸着体側の拡散板対の離間距離が、前記蒸発源側の拡散板対の離間距離より大きいことを特徴とする請求項5に記載のインライン型蒸着装置。 - 前記輻射熱拡散板は、前記筒状体の開口部の周縁よりも外方へ延伸された延伸部を有することを特徴とする請求項1乃至請求項6のいずれか一項に記載のインライン型蒸着装置。
- 前記輻射熱拡散板の延伸部と平面視において重複する位置に設けられた冷却板を更に備え、
前記冷却板は、前記輻射熱拡散板からの輻射熱を排出することを特徴とする請求項7に記載のインライン型蒸着装置。 - 前記冷却板は、前記輻射熱拡散板と接続される接続部を有し、
前記接続部は、前記輻射熱拡散板から前記冷却板へ熱を伝導することを特徴とする請求項8に記載のインライン型蒸着装置。 - 前記冷却板は、前記輻射熱拡散板より前記蒸着源側に形成されていることを特徴とする請求項8又は請求項9に記載のインライン型蒸着装置。
- 前記輻射熱拡散板は、前記筒状体と平面視において重複する位置に鏡面化処理が施された鏡面領域を有することを特徴とする請求項8乃至請求項10のいずれか一項に記載のインライン型蒸着装置。
- 前記輻射熱拡散板は、前記冷却板と平面視において重複する位置に粗面化処理が施された粗面領域を有することを特徴とする請求項8乃至請求項11のいずれか一項に記載のインライン型蒸着装置。
- 前記補正板は、該補正板の開口部側端部から前記被蒸着体方向に延伸された開口延伸部を有することを特徴とする請求項1乃至請求項12のいずれか一項に記載のインライン型蒸着装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013532452A JP5796168B2 (ja) | 2011-09-06 | 2012-09-06 | インライン型蒸着装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011194294 | 2011-09-06 | ||
JP2011194294 | 2011-09-06 | ||
JP2013532452A JP5796168B2 (ja) | 2011-09-06 | 2012-09-06 | インライン型蒸着装置 |
PCT/JP2012/005651 WO2013035328A1 (ja) | 2011-09-06 | 2012-09-06 | インライン型蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2013035328A1 JPWO2013035328A1 (ja) | 2015-03-23 |
JP5796168B2 true JP5796168B2 (ja) | 2015-10-21 |
Family
ID=47831798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013532452A Expired - Fee Related JP5796168B2 (ja) | 2011-09-06 | 2012-09-06 | インライン型蒸着装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5796168B2 (ja) |
KR (1) | KR20140029529A (ja) |
CN (1) | CN103732787A (ja) |
TW (1) | TWI464288B (ja) |
WO (1) | WO2013035328A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6238003B2 (ja) * | 2013-12-20 | 2017-11-29 | パナソニックIpマネジメント株式会社 | 蒸着装置 |
CN104278239A (zh) * | 2014-10-31 | 2015-01-14 | 京东方科技集团股份有限公司 | 蒸镀坩埚装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004158337A (ja) * | 2002-11-07 | 2004-06-03 | Sony Corp | 蒸着装置 |
JP4380319B2 (ja) * | 2002-12-19 | 2009-12-09 | ソニー株式会社 | 蒸着装置および有機エレクトロルミネッセンス素子の製造方法 |
JP4160381B2 (ja) * | 2002-12-27 | 2008-10-01 | ローム株式会社 | 音声出力装置を有する電子装置 |
JP2004238663A (ja) * | 2003-02-05 | 2004-08-26 | Sony Corp | 蒸着装置 |
WO2008120610A1 (ja) * | 2007-03-30 | 2008-10-09 | Tokyo Electron Limited | 蒸着源ユニット、蒸着装置および蒸着源ユニットの温度調整装置 |
JP4831841B2 (ja) * | 2009-07-10 | 2011-12-07 | 三菱重工業株式会社 | 真空蒸着装置及び方法 |
-
2012
- 2012-09-06 CN CN201280039982.4A patent/CN103732787A/zh active Pending
- 2012-09-06 TW TW101132570A patent/TWI464288B/zh not_active IP Right Cessation
- 2012-09-06 JP JP2013532452A patent/JP5796168B2/ja not_active Expired - Fee Related
- 2012-09-06 KR KR1020147002113A patent/KR20140029529A/ko not_active Application Discontinuation
- 2012-09-06 WO PCT/JP2012/005651 patent/WO2013035328A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JPWO2013035328A1 (ja) | 2015-03-23 |
WO2013035328A1 (ja) | 2013-03-14 |
CN103732787A (zh) | 2014-04-16 |
KR20140029529A (ko) | 2014-03-10 |
TW201326439A (zh) | 2013-07-01 |
TWI464288B (zh) | 2014-12-11 |
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