DE602005025695D1 - Verfahren und vorrichtung zur steuerung der verdampfung von organischem material - Google Patents

Verfahren und vorrichtung zur steuerung der verdampfung von organischem material

Info

Publication number
DE602005025695D1
DE602005025695D1 DE602005025695T DE602005025695T DE602005025695D1 DE 602005025695 D1 DE602005025695 D1 DE 602005025695D1 DE 602005025695 T DE602005025695 T DE 602005025695T DE 602005025695 T DE602005025695 T DE 602005025695T DE 602005025695 D1 DE602005025695 D1 DE 602005025695D1
Authority
DE
Germany
Prior art keywords
evaporation
controlling
organic material
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005025695T
Other languages
English (en)
Inventor
Michael Louis Boroson
Michael Long
Jeremy Matthew Grace
Jinmei Zhang
Bruce Edward Koppe
Thomas William Palone
Neil Peter Redden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Global OLED Technology LLC
Original Assignee
Global OLED Technology LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Global OLED Technology LLC filed Critical Global OLED Technology LLC
Publication of DE602005025695D1 publication Critical patent/DE602005025695D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
DE602005025695T 2004-11-09 2005-11-09 Verfahren und vorrichtung zur steuerung der verdampfung von organischem material Active DE602005025695D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/984,095 US20060099344A1 (en) 2004-11-09 2004-11-09 Controlling the vaporization of organic material
PCT/US2005/040539 WO2006053017A1 (en) 2004-11-09 2005-11-09 Method and apparatus for controlling the vaporization of organic material

Publications (1)

Publication Number Publication Date
DE602005025695D1 true DE602005025695D1 (de) 2011-02-10

Family

ID=35892418

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005025695T Active DE602005025695D1 (de) 2004-11-09 2005-11-09 Verfahren und vorrichtung zur steuerung der verdampfung von organischem material

Country Status (8)

Country Link
US (2) US20060099344A1 (de)
EP (1) EP1834364B1 (de)
JP (1) JP5144268B2 (de)
KR (1) KR101172410B1 (de)
CN (1) CN101057349B (de)
DE (1) DE602005025695D1 (de)
TW (1) TWI382099B (de)
WO (1) WO2006053017A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7989021B2 (en) 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
JP5325471B2 (ja) * 2007-07-06 2013-10-23 株式会社半導体エネルギー研究所 発光装置の作製方法
WO2010035446A1 (ja) * 2008-09-24 2010-04-01 出光興産株式会社 複合有機エレクトロルミネッセンス材料
US8425801B2 (en) * 2009-04-10 2013-04-23 Idemitsu Kosan Co., Ltd. Composite organic electroluminescent material and production method thereof
DE102010007111B4 (de) * 2010-02-05 2012-02-16 Von Ardenne Anlagentechnik Gmbh Verfahren und Pulvermischung zur Beschichtung von Substraten aus der Dampfphase
CN104711514B (zh) * 2015-04-07 2017-05-31 合肥京东方光电科技有限公司 一种成膜装置及方法

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) * 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
GB1253124A (de) 1969-02-28 1971-11-10
DE3200848C2 (de) * 1982-01-14 1984-09-27 GfO Gesellschaft für Oberflächentechnik mbH, 7070 Schwäbisch Gmünd Vorrichtung zum Beschicken von Verdampfern in Aufdampfanlagen
JPS59177365A (ja) * 1983-03-24 1984-10-08 Matsushita Electric Ind Co Ltd 蒸発方法とその装置
JPH0743322B2 (ja) 1985-07-19 1995-05-15 株式会社日立製作所 検査方法および装置
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US5041719A (en) * 1990-06-01 1991-08-20 General Electric Company Two-zone electrical furnace for molecular beam epitaxial apparatus
JPH05117864A (ja) 1991-06-25 1993-05-14 Anelva Corp Ｃｖｄ装置
JPH0530761U (ja) 1991-09-30 1993-04-23 京セラ株式会社 欠陥観察装置
JPH09219289A (ja) 1996-02-09 1997-08-19 Chisso Corp 有機薄膜電界発光素子とその製造方法
US5849089A (en) * 1997-03-14 1998-12-15 Kabushiki Kaisha Toshiba Evaporator for liquid raw material and evaporation method therefor
CN1144198C (zh) * 1997-05-08 2004-03-31 松下电器产业株式会社 光记录媒体制造装置和制造方法
JPH1161386A (ja) * 1997-08-22 1999-03-05 Fuji Electric Co Ltd 有機薄膜発光素子の成膜装置
US6337102B1 (en) * 1997-11-17 2002-01-08 The Trustees Of Princeton University Low pressure vapor phase deposition of organic thin films
JPH11251067A (ja) * 1998-03-02 1999-09-17 Junji Kido 有機エレクトロルミネッセント素子
CN1146492C (zh) * 1998-06-09 2004-04-21 索尼公司 机器人装置及其姿态控制方法
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
JP3610837B2 (ja) 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
US6123993A (en) * 1998-09-21 2000-09-26 Advanced Technology Materials, Inc. Method and apparatus for forming low dielectric constant polymeric films
JP2000248358A (ja) 1999-03-01 2000-09-12 Casio Comput Co Ltd 蒸着装置および蒸着方法
TW521303B (en) * 2000-02-28 2003-02-21 Semiconductor Energy Lab Electronic device
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
US6660328B1 (en) * 2000-03-31 2003-12-09 Florida State University Research Foundation Powder precursor delivery system for chemical vapor deposition
ATE497028T1 (de) * 2000-06-22 2011-02-15 Panasonic Elec Works Co Ltd Vorrichtung und verfahren zum vakuum-ausdampfen
JP4153652B2 (ja) 2000-10-05 2008-09-24 株式会社東芝 パターン評価装置及びパターン評価方法
US6467427B1 (en) 2000-11-10 2002-10-22 Helix Technology Inc. Evaporation source material supplier
JP4906018B2 (ja) 2001-03-12 2012-03-28 株式会社半導体エネルギー研究所 成膜方法、発光装置の作製方法及び成膜装置
US20030015140A1 (en) * 2001-04-26 2003-01-23 Eastman Kodak Company Physical vapor deposition of organic layers using tubular sources for making organic light-emitting devices
AU2002346665A1 (en) 2001-12-04 2003-06-17 Primaxx, Inc. Chemical vapor deposition vaporizer
WO2003083169A1 (en) * 2002-04-01 2003-10-09 Ans Inc Apparatus and method for depositing organic matter of vapor phase
JP2003293121A (ja) * 2002-04-05 2003-10-15 Cluster Ion Beam Technology Kk 蒸着材料供給手段を備えた蒸着用坩堝
EP1560467B1 (de) * 2002-07-19 2014-02-26 LG Display Co., Ltd. Quelle zur thermischen PVD-Beschichtung für organische elektrolumineszente Schichten
JP4901090B2 (ja) 2004-10-06 2012-03-21 株式会社ニコン 欠陥検査方法及び欠陥検出装置
US7643137B2 (en) 2003-03-26 2010-01-05 Nikon Corporation Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
US6837939B1 (en) * 2003-07-22 2005-01-04 Eastman Kodak Company Thermal physical vapor deposition source using pellets of organic material for making OLED displays
TWI242463B (en) 2003-08-28 2005-11-01 Ind Tech Res Inst Apparatus and process for vacuum sublimation
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
KR101346492B1 (ko) 2003-10-27 2013-12-31 가부시키가이샤 니콘 패턴 검사장치 및 패턴 검사방법
US7232588B2 (en) 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
US7364772B2 (en) 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
US7501152B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7501151B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone

Also Published As

Publication number Publication date
WO2006053017A1 (en) 2006-05-18
JP5144268B2 (ja) 2013-02-13
US20100233367A1 (en) 2010-09-16
CN101057349B (zh) 2010-06-23
EP1834364A1 (de) 2007-09-19
US8012537B2 (en) 2011-09-06
TWI382099B (zh) 2013-01-11
KR101172410B1 (ko) 2012-08-09
JP2008519904A (ja) 2008-06-12
TW200624577A (en) 2006-07-16
KR20070074616A (ko) 2007-07-12
CN101057349A (zh) 2007-10-17
US20060099344A1 (en) 2006-05-11
EP1834364B1 (de) 2010-12-29

Similar Documents

Publication Publication Date Title
DE602006004529D1 (de) Verfahren und Vorrichtung zur Kontrolle von Objekten
DE602005022123D1 (de) Vorrichtung und verfahren zur beförderung von bohrklein
DE60214971D1 (de) Verfahren und Vorrichtung zur Steuerung von Geräten
DE502005008502D1 (de) Vorrichtung zur veränderung der steuerzeiten von g
DE602006015182D1 (de) Zusammensetzung und verfahren zur kontrolle von insekten
DE602006009444D1 (de) Vorrichtungen und Verfahren zur Regelung von stroboskopischer Beleuchtung
DE602006010125D1 (de) Vibrationskreiselsensor und Verfahren zur Regelung des Vibrationskreiselsensors
DE602006020815D1 (de) Verfahren und System zur koordinierten Steuerung von Robotern
DE602005006068D1 (de) Vorrichtung und Verfahren zur sicheren Inhaltsschlüsselaktualisierung
DE602004016883D1 (de) Vorrichtung und verfahren zur steuerung der verzögfförmigen materials bei der herstellung von saugförmigen artikeln
DE602005023693D1 (de) Verfahren und Vorrichtung zur Steuerung des Leistungsniveaus und/oder Kontrastes einer Anzeigevorrichtung
DE602005022265D1 (de) Vorrichtung und Verfahren zur Spannungsversorgungssteuerung
DE602005024986D1 (de) Verfahren und vorrichtung zur generatorsteuerung
DE602005020433D1 (de) Auslegerhubwagen und verfahren zur steuerung der hubfunktionen
DE502007005222D1 (de) Vorrichtung und verfahren zur ansteuerung von personenschutzmittel
DE602005021851D1 (de) Vorrichtung und Verfahren zur Kompressorregelung
DE602006005437D1 (de) Verfahren und Vorrichtung zum Herstellung von Bauteilen
DE112006001499A5 (de) Verfahren und Vorrichtung zur Temperierung von Vorformlingen
DE602005019590D1 (de) Eine Methode und Vorrichtung zur Ansteuerung von Stromrichtern
DE602005025695D1 (de) Verfahren und vorrichtung zur steuerung der verdampfung von organischem material
DE602005024782D1 (de) Verfahren und vorrichtung zur steuerung des walzens von rohren mit festem durchmesser
DE602006001082D1 (de) Verfahren und Vorrichtung zur Regelung der Kraftstoffzumessung
DE60323590D1 (de) Kreuztischvorrichtung und Verfahren zur Steuerung derselben
DE602004030893D1 (de) Robotervorrichtung und verfahren zur steuerung derselben
DE602006004954D1 (de) Verfahren und Vorrichtung zur Steuerung des Leistungsniveaus einer Anzeigevorrichtung