JP2008512565A5 - - Google Patents

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Publication number
JP2008512565A5
JP2008512565A5 JP2007530232A JP2007530232A JP2008512565A5 JP 2008512565 A5 JP2008512565 A5 JP 2008512565A5 JP 2007530232 A JP2007530232 A JP 2007530232A JP 2007530232 A JP2007530232 A JP 2007530232A JP 2008512565 A5 JP2008512565 A5 JP 2008512565A5
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JP
Japan
Prior art keywords
substrate
coater
coating material
conveyor
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007530232A
Other languages
English (en)
Japanese (ja)
Other versions
JP5090911B2 (ja
JP2008512565A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/030667 external-priority patent/WO2006028774A2/en
Publication of JP2008512565A publication Critical patent/JP2008512565A/ja
Publication of JP2008512565A5 publication Critical patent/JP2008512565A5/ja
Application granted granted Critical
Publication of JP5090911B2 publication Critical patent/JP5090911B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007530232A 2004-09-03 2005-08-29 断続的コンベヤシステムを有するコータ Expired - Fee Related JP5090911B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US60709104P 2004-09-03 2004-09-03
US60/607,091 2004-09-03
US64413905P 2005-01-07 2005-01-07
US60/644,139 2005-01-07
PCT/US2005/030667 WO2006028774A2 (en) 2004-09-03 2005-08-29 Coater having interrupted conveyor system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012027319A Division JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Publications (3)

Publication Number Publication Date
JP2008512565A JP2008512565A (ja) 2008-04-24
JP2008512565A5 true JP2008512565A5 (https=) 2012-03-29
JP5090911B2 JP5090911B2 (ja) 2012-12-05

Family

ID=35482371

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007530232A Expired - Fee Related JP5090911B2 (ja) 2004-09-03 2005-08-29 断続的コンベヤシステムを有するコータ
JP2012027319A Expired - Fee Related JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012027319A Expired - Fee Related JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Country Status (5)

Country Link
US (1) US7749364B2 (https=)
EP (2) EP1786947B1 (https=)
JP (2) JP5090911B2 (https=)
CA (1) CA2556573A1 (https=)
WO (1) WO2006028774A2 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352144B8 (de) * 2003-11-04 2008-11-13 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten
DE102004036170B4 (de) * 2004-07-26 2007-10-11 Schott Ag Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung
CN101304962B (zh) 2005-11-15 2012-09-26 威士伯采购公司 用于纤维水泥基材的抗碎胶乳面层组合物
CN101374787B (zh) * 2006-01-31 2013-12-11 威士伯采购公司 涂布水泥纤维板制品的方法
WO2007090131A1 (en) * 2006-01-31 2007-08-09 Valspar Sourcing, Inc. Coating system for cement composite articles
WO2007089913A1 (en) * 2006-01-31 2007-08-09 Valspar Sourcing, Inc. Coating system for cement composite articles
US9783622B2 (en) * 2006-01-31 2017-10-10 Axalta Coating Systems Ip Co., Llc Coating system for cement composite articles
CA2653048C (en) 2006-05-19 2014-12-09 Valspar Sourcing, Inc. Coating system for cement composite articles
DE602007012700D1 (de) * 2006-06-02 2011-04-07 Valspar Sourcing Inc Wässrige hochleistungsbeschichtungszusammensetzungen
US7812090B2 (en) * 2006-06-02 2010-10-12 Valspar Sourcing, Inc. High performance aqueous coating compositions
CA2656689C (en) * 2006-07-07 2017-01-03 Valspar Sourcing, Inc. Coating systems for cement composite articles
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
MX2008002220A (es) * 2007-02-16 2009-02-25 Valspar Sourcing Inc Tratamiento para articulos compuestos de cemento.
CN101772472B (zh) * 2007-08-01 2016-04-20 威士伯采购公司 用于水泥复合制品的涂层体系
DE102007058052B4 (de) * 2007-11-30 2013-12-05 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage
BRPI0917455B1 (pt) * 2008-08-15 2018-11-21 Valspar Sourcing Inc composição de revestimento, método para preparar um artigo revestido, e, artigo revestido
US20100059115A1 (en) * 2008-09-05 2010-03-11 First Solar, Inc. Coated Substrates and Semiconductor Devices Including the Substrates
JP2010077508A (ja) * 2008-09-26 2010-04-08 Tokyo Electron Ltd 成膜装置及び基板処理装置
AU2009316285A1 (en) 2008-11-24 2010-05-27 Valspar Sourcing, Inc. Coating system for cement composite articles
US20100163406A1 (en) * 2008-12-30 2010-07-01 Applied Materials, Inc. Substrate support in a reactive sputter chamber
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system
EP2641665A1 (en) * 2012-03-19 2013-09-25 Deceuninck NV Multi-step process for fully coloured construction elements
ITTO20120981A1 (it) * 2012-11-13 2014-05-14 Itt Italia Srl Metodo ed impianto per la verniciatura a polvere di elementi elettricamente non conduttivi, in particolare pastiglie freno
DE102012022237A1 (de) * 2012-11-14 2014-05-15 Heraeus Materials Technology Gmbh & Co. Kg Sputtertarget mit optimierten Gebrauchseigenschaften
US9435028B2 (en) 2013-05-06 2016-09-06 Lotus Applied Technology, Llc Plasma generation for thin film deposition on flexible substrates
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
CN206768212U (zh) * 2017-06-08 2017-12-19 合肥鑫晟光电科技有限公司 成膜设备
CN107235642A (zh) * 2017-07-03 2017-10-10 中国建材国际工程集团有限公司 用于生产镀膜玻璃的镀膜段及其用途
WO2019188683A1 (ja) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 表面処理設備
RU2765964C1 (ru) * 2021-11-29 2022-02-07 Дмитрий Юрьевич Старцев Способы нанесения на стеклянные изделия покрытий из оксида титана

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1848102A (en) * 1928-07-14 1932-03-08 Libbey Owens Ford Glass Co Process and apparatus for producing sheet glass
US2975753A (en) * 1958-11-18 1961-03-21 Nat Res Corp Vacuum coating apparatus
US3528906A (en) * 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
US3968018A (en) * 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
GB1442314A (en) * 1973-07-20 1976-07-14 Triplex Safety Glass Co Heat treatment of glass sheets
JPS5374005A (en) 1976-12-14 1978-07-01 Matsushita Electric Ind Co Ltd Manufacture of magnetic recording medium
US4194962A (en) * 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
US4890714A (en) * 1986-02-14 1990-01-02 Brown H Gary Conveying system
FR2596920A1 (fr) * 1986-04-03 1987-10-09 Saint Roch Sa Glaceries Cathode de pulverisation
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
JPH0649937B2 (ja) * 1987-12-17 1994-06-29 株式会社日立製作所 磁性膜形成装置
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten
US5228553A (en) * 1992-02-24 1993-07-20 Circuit Chemistry Equipment, Inc. Drive mechanism for a conveyor of a printer circuit board processor
DE4428136A1 (de) * 1994-08-09 1996-02-15 Leybold Ag Vakuum-Beschichtungsanlage
JPH09184070A (ja) * 1996-01-05 1997-07-15 Chugai Ro Co Ltd Ｐｖｄ成膜装置のシャッタ機構
JP3245810B2 (ja) * 1996-05-28 2002-01-15 住友重機械工業株式会社 プラズマ処理方法
KR19990047679A (ko) * 1997-12-05 1999-07-05 박호군 이온 빔을 이용한 재료의 표면 처리 장치
EP1147065B1 (en) * 1998-12-21 2003-04-09 Cardinal CG Company Soil-resistant coating for glass surfaces
KR100646620B1 (ko) * 1999-05-06 2006-11-23 동경 엘렉트론 주식회사 유리 기판의 반송 시스템
ATE402126T1 (de) * 2000-09-11 2008-08-15 Cardinal Cg Co Hydrophile oberfläche mit temporären schutzverkleidungen
JP4364423B2 (ja) * 2000-12-20 2009-11-18 新明和工業株式会社 成膜装置
JP2003041361A (ja) * 2001-08-02 2003-02-13 Sony Corp 成膜装置
CN1535327A (zh) * 2001-08-07 2004-10-06 �ձ�������ʽ���� 溅射装置
JP4000823B2 (ja) * 2001-10-30 2007-10-31 セイコーエプソン株式会社 蒸着装置、蒸着方法、液晶装置の製造方法
EP1579025B1 (en) * 2002-12-31 2010-09-29 Cardinal CG Company Coater having substrate cleaning device and coating deposition method employing such coater

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