JP5090911B2 - 断続的コンベヤシステムを有するコータ - Google Patents

断続的コンベヤシステムを有するコータ Download PDF

Info

Publication number
JP5090911B2
JP5090911B2 JP2007530232A JP2007530232A JP5090911B2 JP 5090911 B2 JP5090911 B2 JP 5090911B2 JP 2007530232 A JP2007530232 A JP 2007530232A JP 2007530232 A JP2007530232 A JP 2007530232A JP 5090911 B2 JP5090911 B2 JP 5090911B2
Authority
JP
Japan
Prior art keywords
substrate
coater
coating material
conveyor
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007530232A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008512565A5 (https=
JP2008512565A (ja
Inventor
ハーティッヒ、クラウス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cardinal CG Co
Original Assignee
Cardinal CG Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal CG Co filed Critical Cardinal CG Co
Publication of JP2008512565A publication Critical patent/JP2008512565A/ja
Publication of JP2008512565A5 publication Critical patent/JP2008512565A5/ja
Application granted granted Critical
Publication of JP5090911B2 publication Critical patent/JP5090911B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
JP2007530232A 2004-09-03 2005-08-29 断続的コンベヤシステムを有するコータ Expired - Fee Related JP5090911B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US60709104P 2004-09-03 2004-09-03
US60/607,091 2004-09-03
US64413905P 2005-01-07 2005-01-07
US60/644,139 2005-01-07
PCT/US2005/030667 WO2006028774A2 (en) 2004-09-03 2005-08-29 Coater having interrupted conveyor system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012027319A Division JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Publications (3)

Publication Number Publication Date
JP2008512565A JP2008512565A (ja) 2008-04-24
JP2008512565A5 JP2008512565A5 (https=) 2012-03-29
JP5090911B2 true JP5090911B2 (ja) 2012-12-05

Family

ID=35482371

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007530232A Expired - Fee Related JP5090911B2 (ja) 2004-09-03 2005-08-29 断続的コンベヤシステムを有するコータ
JP2012027319A Expired - Fee Related JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012027319A Expired - Fee Related JP5449423B2 (ja) 2004-09-03 2012-02-10 断続的コンベヤシステムを有するコータ

Country Status (5)

Country Link
US (1) US7749364B2 (https=)
EP (2) EP1786947B1 (https=)
JP (2) JP5090911B2 (https=)
CA (1) CA2556573A1 (https=)
WO (1) WO2006028774A2 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352144B8 (de) * 2003-11-04 2008-11-13 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten
DE102004036170B4 (de) * 2004-07-26 2007-10-11 Schott Ag Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung
CN101304962B (zh) 2005-11-15 2012-09-26 威士伯采购公司 用于纤维水泥基材的抗碎胶乳面层组合物
CN101374787B (zh) * 2006-01-31 2013-12-11 威士伯采购公司 涂布水泥纤维板制品的方法
WO2007090131A1 (en) * 2006-01-31 2007-08-09 Valspar Sourcing, Inc. Coating system for cement composite articles
WO2007089913A1 (en) * 2006-01-31 2007-08-09 Valspar Sourcing, Inc. Coating system for cement composite articles
US9783622B2 (en) * 2006-01-31 2017-10-10 Axalta Coating Systems Ip Co., Llc Coating system for cement composite articles
CA2653048C (en) 2006-05-19 2014-12-09 Valspar Sourcing, Inc. Coating system for cement composite articles
DE602007012700D1 (de) * 2006-06-02 2011-04-07 Valspar Sourcing Inc Wässrige hochleistungsbeschichtungszusammensetzungen
US7812090B2 (en) * 2006-06-02 2010-10-12 Valspar Sourcing, Inc. High performance aqueous coating compositions
CA2656689C (en) * 2006-07-07 2017-01-03 Valspar Sourcing, Inc. Coating systems for cement composite articles
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
MX2008002220A (es) * 2007-02-16 2009-02-25 Valspar Sourcing Inc Tratamiento para articulos compuestos de cemento.
CN101772472B (zh) * 2007-08-01 2016-04-20 威士伯采购公司 用于水泥复合制品的涂层体系
DE102007058052B4 (de) * 2007-11-30 2013-12-05 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage
BRPI0917455B1 (pt) * 2008-08-15 2018-11-21 Valspar Sourcing Inc composição de revestimento, método para preparar um artigo revestido, e, artigo revestido
US20100059115A1 (en) * 2008-09-05 2010-03-11 First Solar, Inc. Coated Substrates and Semiconductor Devices Including the Substrates
JP2010077508A (ja) * 2008-09-26 2010-04-08 Tokyo Electron Ltd 成膜装置及び基板処理装置
AU2009316285A1 (en) 2008-11-24 2010-05-27 Valspar Sourcing, Inc. Coating system for cement composite articles
US20100163406A1 (en) * 2008-12-30 2010-07-01 Applied Materials, Inc. Substrate support in a reactive sputter chamber
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system
EP2641665A1 (en) * 2012-03-19 2013-09-25 Deceuninck NV Multi-step process for fully coloured construction elements
ITTO20120981A1 (it) * 2012-11-13 2014-05-14 Itt Italia Srl Metodo ed impianto per la verniciatura a polvere di elementi elettricamente non conduttivi, in particolare pastiglie freno
DE102012022237A1 (de) * 2012-11-14 2014-05-15 Heraeus Materials Technology Gmbh & Co. Kg Sputtertarget mit optimierten Gebrauchseigenschaften
US9435028B2 (en) 2013-05-06 2016-09-06 Lotus Applied Technology, Llc Plasma generation for thin film deposition on flexible substrates
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
CN206768212U (zh) * 2017-06-08 2017-12-19 合肥鑫晟光电科技有限公司 成膜设备
CN107235642A (zh) * 2017-07-03 2017-10-10 中国建材国际工程集团有限公司 用于生产镀膜玻璃的镀膜段及其用途
WO2019188683A1 (ja) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 表面処理設備
RU2765964C1 (ru) * 2021-11-29 2022-02-07 Дмитрий Юрьевич Старцев Способы нанесения на стеклянные изделия покрытий из оксида титана

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1848102A (en) * 1928-07-14 1932-03-08 Libbey Owens Ford Glass Co Process and apparatus for producing sheet glass
US2975753A (en) * 1958-11-18 1961-03-21 Nat Res Corp Vacuum coating apparatus
US3528906A (en) * 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
US3968018A (en) * 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
GB1442314A (en) * 1973-07-20 1976-07-14 Triplex Safety Glass Co Heat treatment of glass sheets
JPS5374005A (en) 1976-12-14 1978-07-01 Matsushita Electric Ind Co Ltd Manufacture of magnetic recording medium
US4194962A (en) * 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
US4890714A (en) * 1986-02-14 1990-01-02 Brown H Gary Conveying system
FR2596920A1 (fr) * 1986-04-03 1987-10-09 Saint Roch Sa Glaceries Cathode de pulverisation
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
JPH0649937B2 (ja) * 1987-12-17 1994-06-29 株式会社日立製作所 磁性膜形成装置
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten
US5228553A (en) * 1992-02-24 1993-07-20 Circuit Chemistry Equipment, Inc. Drive mechanism for a conveyor of a printer circuit board processor
DE4428136A1 (de) * 1994-08-09 1996-02-15 Leybold Ag Vakuum-Beschichtungsanlage
JPH09184070A (ja) * 1996-01-05 1997-07-15 Chugai Ro Co Ltd Ｐｖｄ成膜装置のシャッタ機構
JP3245810B2 (ja) * 1996-05-28 2002-01-15 住友重機械工業株式会社 プラズマ処理方法
KR19990047679A (ko) * 1997-12-05 1999-07-05 박호군 이온 빔을 이용한 재료의 표면 처리 장치
EP1147065B1 (en) * 1998-12-21 2003-04-09 Cardinal CG Company Soil-resistant coating for glass surfaces
KR100646620B1 (ko) * 1999-05-06 2006-11-23 동경 엘렉트론 주식회사 유리 기판의 반송 시스템
ATE402126T1 (de) * 2000-09-11 2008-08-15 Cardinal Cg Co Hydrophile oberfläche mit temporären schutzverkleidungen
JP4364423B2 (ja) * 2000-12-20 2009-11-18 新明和工業株式会社 成膜装置
JP2003041361A (ja) * 2001-08-02 2003-02-13 Sony Corp 成膜装置
CN1535327A (zh) * 2001-08-07 2004-10-06 �ձ�������ʽ���� 溅射装置
JP4000823B2 (ja) * 2001-10-30 2007-10-31 セイコーエプソン株式会社 蒸着装置、蒸着方法、液晶装置の製造方法
EP1579025B1 (en) * 2002-12-31 2010-09-29 Cardinal CG Company Coater having substrate cleaning device and coating deposition method employing such coater

Also Published As

Publication number Publication date
US20060048708A1 (en) 2006-03-09
CA2556573A1 (en) 2006-03-16
JP5449423B2 (ja) 2014-03-19
JP2012112046A (ja) 2012-06-14
EP1786947B1 (en) 2012-12-19
WO2006028774A3 (en) 2006-07-13
EP1786947A2 (en) 2007-05-23
WO2006028774A2 (en) 2006-03-16
JP2008512565A (ja) 2008-04-24
US7749364B2 (en) 2010-07-06
EP2253732A2 (en) 2010-11-24

Similar Documents

Publication Publication Date Title
JP5449423B2 (ja) 断続的コンベヤシステムを有するコータ
CA2512010C (en) Coater having substrate cleaning device and coating deposition methods employing such coater
CA2586842C (en) Methods and equipment for depositing coatings having sequenced structures
US20100221422A1 (en) Vertical-offset coater and methods of use
JP7117332B2 (ja) フレキシブル基板をコーティングするための堆積装置、及びフレキシブル基板をコーティングする方法
JP2006521462A (ja) プラズマ増強膜堆積
JP2008512565A5 (https=)
JP2009540122A5 (https=)
CN108603291A (zh) 真空处理系统和其方法
CN101778963A (zh) 用于连续真空涂布网幅式材料的系统和方法
EP2044238B1 (en) System and method for deposition of a material on a substrate
JP4580636B2 (ja) 成膜装置および成膜方法
CN106460147B (zh) 针对较好的均匀性和增加的边缘寿命的平坦边缘设计
JP2008202146A (ja) 縦型化学気相成長装置及び該装置を用いた成膜方法
JP2854478B2 (ja) 連続式スパッタリング装置
JP2004232067A (ja) 薄膜形成装置
KR102913628B1 (ko) 기판 상에 제 1 및 제 2 층을 적층하기 위한 시스템 및 방법
WO2019121289A1 (en) Surface treatment chamber transport system

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20070405

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20070405

A625 Written request for application examination (by other person)

Free format text: JAPANESE INTERMEDIATE CODE: A625

Effective date: 20080829

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20081006

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20081006

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081006

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081006

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111129

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20120210

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120904

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120913

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150921

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees