DE10352144B8 - Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten - Google Patents

Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten Download PDF

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Publication number
DE10352144B8
DE10352144B8 DE10352144A DE10352144A DE10352144B8 DE 10352144 B8 DE10352144 B8 DE 10352144B8 DE 10352144 A DE10352144 A DE 10352144A DE 10352144 A DE10352144 A DE 10352144A DE 10352144 B8 DE10352144 B8 DE 10352144B8
Authority
DE
Germany
Prior art keywords
coating
vacuum
longitudinal substrates
coating system
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE10352144A
Other languages
English (en)
Other versions
DE10352144B4 (de
DE10352144A1 (de
Inventor
Olaf Gawer
Jens Melcher
Steffen Lessmann
Erwin Zschieschang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne Anlagentechnik GmbH
Original Assignee
Von Ardenne Anlagentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne Anlagentechnik GmbH filed Critical Von Ardenne Anlagentechnik GmbH
Priority to DE10352144A priority Critical patent/DE10352144B8/de
Priority to PCT/DE2004/002465 priority patent/WO2005045091A2/de
Priority to CN2004800327338A priority patent/CN1878887B/zh
Priority to US10/577,600 priority patent/US20080035477A1/en
Publication of DE10352144A1 publication Critical patent/DE10352144A1/de
Publication of DE10352144B4 publication Critical patent/DE10352144B4/de
Application granted granted Critical
Publication of DE10352144B8 publication Critical patent/DE10352144B8/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
DE10352144A 2003-11-04 2003-11-04 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten Expired - Fee Related DE10352144B8 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE10352144A DE10352144B8 (de) 2003-11-04 2003-11-04 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten
PCT/DE2004/002465 WO2005045091A2 (de) 2003-11-04 2004-11-04 Vakuumbeschichtungsanlage zum beschichten von längserstreckten substraten
CN2004800327338A CN1878887B (zh) 2003-11-04 2004-11-04 用于涂覆细长基底的真空涂覆系统
US10/577,600 US20080035477A1 (en) 2003-11-04 2004-11-04 Vacuum Coating System for Coating Elongate Substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10352144A DE10352144B8 (de) 2003-11-04 2003-11-04 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten

Publications (3)

Publication Number Publication Date
DE10352144A1 DE10352144A1 (de) 2005-07-07
DE10352144B4 DE10352144B4 (de) 2008-04-10
DE10352144B8 true DE10352144B8 (de) 2008-11-13

Family

ID=34559481

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10352144A Expired - Fee Related DE10352144B8 (de) 2003-11-04 2003-11-04 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten

Country Status (4)

Country Link
US (1) US20080035477A1 (de)
CN (1) CN1878887B (de)
DE (1) DE10352144B8 (de)
WO (1) WO2005045091A2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004021734B4 (de) * 2004-04-30 2010-09-02 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur kontinuierlichen Beschichtung flacher Substrate mit optisch aktiven Schichtsystemen
US20070111367A1 (en) * 2005-10-19 2007-05-17 Basol Bulent M Method and apparatus for converting precursor layers into photovoltaic absorbers
EP1820880A1 (de) 2006-02-01 2007-08-22 Applied Materials GmbH & Co. KG Pumpanordnung für eine Vakuumbeschichtungsanlage und Vakuumbeschichtungsanlage
US20070256934A1 (en) * 2006-05-08 2007-11-08 Perata Michael R Apparatus and Method for Coating Substrates With Approximate Process Isolation
US7966968B2 (en) * 2007-04-27 2011-06-28 Taiwan Semiconductor Manufacturing Company, Ltd. Electroless plating apparatus with non-liquid heating source
US7763535B2 (en) * 2007-08-30 2010-07-27 Applied Materials, Inc. Method for producing a metal backside contact of a semiconductor component, in particular, a solar cell
EP2031659A1 (de) 2007-08-30 2009-03-04 Applied Materials, Inc. Verfahren zur Erzeugung eines metallischen Rückkontaktes eines Halbleiterbauelements, insbesondere einer Solarzelle
EP2085494B1 (de) 2008-02-01 2011-08-03 Applied Materials, Inc. Doppelbeschichtungsvorrichtung mit verbesserter Trennplatte
US20100163406A1 (en) * 2008-12-30 2010-07-01 Applied Materials, Inc. Substrate support in a reactive sputter chamber
DE102009020512B4 (de) * 2009-05-08 2017-07-27 Von Ardenne Gmbh Durchlauf-Vakuumbeschichtungsanlage
MX366096B (es) * 2010-10-22 2019-06-27 Agc Glass Europe Separacion de maquina de recubrimiento modular.
EP2650135A1 (de) 2012-04-12 2013-10-16 KBA-NotaSys SA Intaglio-Druckplattenbeschichtungsvorrichtung
JP5768194B2 (ja) * 2012-10-16 2015-08-26 フオン・アルデンネ・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング バンド状基層の為の多重コーティング装置およびバンド状基層真空コーティング装置
US11951509B2 (en) 2013-09-10 2024-04-09 Awi Licensing Llc System for applying a coating to a workpiece
US9266141B2 (en) 2013-09-10 2016-02-23 Awi Licensing Company System for applying a coating to a workpiece
DE102014104366A1 (de) * 2014-03-28 2015-10-01 Von Ardenne Gmbh Vorrichtung zum Behandeln von Substraten
DE102016101197A1 (de) 2016-01-25 2017-07-27 Hella Kgaa Hueck & Co. Verfahren zum Oberflächenbeschichten eines Bauteils unter Vakuum und Vakuumbeschichtungsanlage hierzu
WO2019188976A1 (ja) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 方向性電磁鋼板の製造方法および連続成膜装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
EP1179516A1 (de) * 1998-12-21 2002-02-13 Cardinal CG Company Verfahren zur Beschichtung von beiden Seiten eines Glassubstrats

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303489A (en) * 1978-08-21 1981-12-01 Vac-Tec Systems, Inc. Method and apparatus for producing a variable intensity pattern of sputtering material on a substrate
US4949669A (en) * 1988-12-20 1990-08-21 Texas Instruments Incorporated Gas flow systems in CCVD reactors
US5045165A (en) * 1990-02-01 1991-09-03 Komag, Inc. Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk
US5382126A (en) * 1992-03-30 1995-01-17 Leybold Ag Multichamber coating apparatus
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
EP0783174B1 (de) * 1995-10-27 2006-12-13 Applied Materials GmbH & Co. KG Vorrichtung zum Beschichten eines Substrats
DE10147708C5 (de) * 2001-09-27 2005-03-24 Von Ardenne Anlagentechnik Gmbh Targetanordnung
WO2004101844A1 (en) * 2002-12-18 2004-11-25 Cardinal Cg Company Plasma-enhanced film deposition
WO2006028774A2 (en) * 2004-09-03 2006-03-16 Cardinal Cg Company Coater having interrupted conveyor system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
EP1179516A1 (de) * 1998-12-21 2002-02-13 Cardinal CG Company Verfahren zur Beschichtung von beiden Seiten eines Glassubstrats

Also Published As

Publication number Publication date
CN1878887A (zh) 2006-12-13
DE10352144B4 (de) 2008-04-10
DE10352144A1 (de) 2005-07-07
WO2005045091A3 (de) 2005-07-14
US20080035477A1 (en) 2008-02-14
CN1878887B (zh) 2010-05-26
WO2005045091A2 (de) 2005-05-19

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8327 Change in the person/name/address of the patent owner

Owner name: VON ARDENNE ANLAGENTECHNIK GMBH, 01324 DRESDEN, DE

8364 No opposition during term of opposition
8396 Reprint of erroneous front page
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20110601

Effective date: 20110531