DE60229887D1 - Oberflächenbehandlungssystem - Google Patents

Oberflächenbehandlungssystem

Info

Publication number
DE60229887D1
DE60229887D1 DE60229887T DE60229887T DE60229887D1 DE 60229887 D1 DE60229887 D1 DE 60229887D1 DE 60229887 T DE60229887 T DE 60229887T DE 60229887 T DE60229887 T DE 60229887T DE 60229887 D1 DE60229887 D1 DE 60229887D1
Authority
DE
Germany
Prior art keywords
surface treatment
treatment system
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60229887T
Other languages
English (en)
Inventor
Cheon-Soo Cho
Dong-Sik Youn
Hyun-Wook Lee
Samchul Ha
Hyun-Woo Jun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Electronics Inc
Original Assignee
LG Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Electronics Inc filed Critical LG Electronics Inc
Application granted granted Critical
Publication of DE60229887D1 publication Critical patent/DE60229887D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE60229887T 2002-03-29 2002-12-28 Oberflächenbehandlungssystem Expired - Lifetime DE60229887D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2002-0017510A KR100486692B1 (ko) 2002-03-29 2002-03-29 연속처리가 가능한 열교환기 표면처리장치
PCT/KR2002/002472 WO2003083163A1 (en) 2002-03-29 2002-12-28 Surface treatment system and method thereof

Publications (1)

Publication Number Publication Date
DE60229887D1 true DE60229887D1 (de) 2008-12-24

Family

ID=28673041

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60229887T Expired - Lifetime DE60229887D1 (de) 2002-03-29 2002-12-28 Oberflächenbehandlungssystem

Country Status (8)

Country Link
US (1) US7572339B2 (de)
EP (1) EP1511880B1 (de)
KR (1) KR100486692B1 (de)
CN (1) CN1229516C (de)
AU (1) AU2002359061A1 (de)
DE (1) DE60229887D1 (de)
MX (1) MXPA04001103A (de)
WO (1) WO2003083163A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100408721C (zh) * 2002-08-19 2008-08-06 乐金电子(天津)电器有限公司 热交换器表面处理装置
US20110104381A1 (en) * 2004-01-15 2011-05-05 Stefan Laure Plasma Treatment of Large-Scale Components
JP5305900B2 (ja) * 2005-04-11 2013-10-02 ドクトル・ラウレ・プラスマテヒノロギー・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング プラズマコーティングを施す装置および方法
WO2008108170A1 (ja) * 2007-03-07 2008-09-12 Ulvac, Inc. 真空装置、基板搬送方法
EP1973154B1 (de) * 2007-03-13 2012-04-25 Applied Materials, Inc. Vorrichtung zum Bewegen eines Carriers in einer Vakuumkammer
EP2689048B1 (de) * 2011-03-25 2017-05-03 LG Electronics Inc. Vorrichtung zur plasmavertärkten chemischen gasphasenabscheidung
US11532461B2 (en) * 2018-10-23 2022-12-20 Tokyo Electron Limited Substrate processing apparatus

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5521525A (en) * 1978-07-28 1980-02-15 Ulvac Corp Treating method for surface of brazer aluminum product
JPS5521573A (en) * 1978-08-02 1980-02-15 Nippon Paint Co Ltd Metal surface treating device
US4501766A (en) * 1982-02-03 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Film depositing apparatus and a film depositing method
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
JPS63109174A (ja) * 1986-10-24 1988-05-13 Hitachi Ltd 枚葉式ｃｖｄ装置
US5079031A (en) * 1988-03-22 1992-01-07 Semiconductor Energy Laboratory Co., Ltd. Apparatus and method for forming thin films
JPH01259175A (ja) * 1988-04-09 1989-10-16 Ulvac Corp 多層膜成膜用プラズマｃｖｄ装置
JP2913316B2 (ja) * 1990-04-17 1999-06-28 トヨタ自動車株式会社 連続表面処理炉
US5244559A (en) * 1991-07-31 1993-09-14 Leybold Aktiengesellschaft Apparatus for transport and heat treatment of substrates
JP2888026B2 (ja) * 1992-04-30 1999-05-10 松下電器産業株式会社 プラズマｃｖｄ装置
JP2711617B2 (ja) * 1992-06-26 1998-02-10 昭和アルミニウム株式会社 遠心分離機をインライン化した連続式表面処理方法及びその装置
JPH0853752A (ja) * 1994-08-10 1996-02-27 Idemitsu Material Kk 真空成膜装置およびその減圧方法
JPH0950992A (ja) * 1995-08-04 1997-02-18 Sharp Corp 成膜装置
EP0783174B1 (de) * 1995-10-27 2006-12-13 Applied Materials GmbH & Co. KG Vorrichtung zum Beschichten eines Substrats
US6015597A (en) 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles
US6021738A (en) * 1998-03-04 2000-02-08 Compuvac Systems, Inc. Carriage electrode contact system used in coating objects by vacuum deposit
KR100320197B1 (ko) * 1999-08-21 2002-01-10 구자홍 직류전원 플라즈마중합 연속처리장치

Also Published As

Publication number Publication date
US7572339B2 (en) 2009-08-11
EP1511880B1 (de) 2008-11-12
KR20030078455A (ko) 2003-10-08
CN1229516C (zh) 2005-11-30
CN1543513A (zh) 2004-11-03
AU2002359061A1 (en) 2003-10-13
WO2003083163A1 (en) 2003-10-09
US20040244690A1 (en) 2004-12-09
KR100486692B1 (ko) 2005-05-03
EP1511880A1 (de) 2005-03-09
MXPA04001103A (es) 2005-02-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition