JP2008311541A - 炭化珪素半導体基板の製造方法 - Google Patents
炭化珪素半導体基板の製造方法 Download PDFInfo
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- JP2008311541A JP2008311541A JP2007159643A JP2007159643A JP2008311541A JP 2008311541 A JP2008311541 A JP 2008311541A JP 2007159643 A JP2007159643 A JP 2007159643A JP 2007159643 A JP2007159643 A JP 2007159643A JP 2008311541 A JP2008311541 A JP 2008311541A
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02529—Silicon carbide
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02378—Silicon carbide
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02634—Homoepitaxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02658—Pretreatments
Abstract
【解決手段】オフ角1度乃至8度の炭化珪素基板1上にエピタキシャル成長層を形成する際に、前記エピタキシャル成長に先立ち、前記炭化珪素基板のtanオフ角以上の凹凸断面のアスペクト比を有する平行線状の凹凸を前記基板表面に形成した後、エピタキシャル成長層を形成する炭化珪素半導体基板の製造方法において、前記凹凸の高さが0.25μm乃至5μmである炭化珪素半導体基板の製造方法とする。
【選択図】図1
Description
2 …SiC基板上トレンチ
3 …N(窒素)ドープn型SiCエピタキシャル層
4 …BPD(基底面転位)
5 …TED(刃状転位)。
Claims (3)
- オフ角1度乃至8度の炭化珪素基板上に炭化珪素エピタキシャル成長層を形成する際に、前記炭化珪素エピタキシャル成長に先立ち、前記炭化珪素基板のtanオフ角以上の凹凸断面のアスペクト比を有する平行線状の凹凸を前記基板表面に形成した後、炭化珪素エピタキシャル成長層を形成する炭化珪素半導体基板の製造方法において、前記凹凸の高さが0.25μm乃至5μmであることを特徴とする炭化珪素半導体基板の製造方法。
- 前記炭化珪素エピタキシャル成長層を形成した後に、1800℃以上の温度でアニールを行うことを特徴とする請求項1記載の炭化珪素半導体基板の製造方法。
- 前記基板表面に形成される平行線状の凹凸の線方向が、前記炭化珪素基板オフ角の傾斜方向に対して垂直であることを特徴とする請求項1または2に記載の炭化珪素半導体基板の製造方法。
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JP2007159643A JP2008311541A (ja) | 2007-06-18 | 2007-06-18 | 炭化珪素半導体基板の製造方法 |
US12/139,446 US20080318359A1 (en) | 2007-06-18 | 2008-06-13 | Method of manufacturing silicon carbide semiconductor substrate |
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JP2007159643A JP2008311541A (ja) | 2007-06-18 | 2007-06-18 | 炭化珪素半導体基板の製造方法 |
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JP2008311541A true JP2008311541A (ja) | 2008-12-25 |
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JP2007159643A Withdrawn JP2008311541A (ja) | 2007-06-18 | 2007-06-18 | 炭化珪素半導体基板の製造方法 |
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Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010184833A (ja) * | 2009-02-12 | 2010-08-26 | Denso Corp | 炭化珪素単結晶基板および炭化珪素単結晶エピタキシャルウェハ |
WO2011126145A1 (ja) | 2010-04-07 | 2011-10-13 | 新日本製鐵株式会社 | エピタキシャル炭化珪素単結晶基板の製造方法、及びこの方法によって得られたエピタキシャル炭化珪素単結晶基板 |
WO2012067105A1 (ja) * | 2010-11-15 | 2012-05-24 | Hoya株式会社 | 炭化珪素基板、半導体素子ならびに炭化珪素基板の製造方法 |
WO2013035691A1 (ja) * | 2011-09-09 | 2013-03-14 | 昭和電工株式会社 | SiCエピタキシャルウェハ及びその製造方法 |
JP2014031313A (ja) * | 2013-09-26 | 2014-02-20 | Denso Corp | 炭化珪素単結晶基板および炭化珪素単結晶エピタキシャルウェハ |
CN103789822A (zh) * | 2012-10-31 | 2014-05-14 | Lg伊诺特有限公司 | 外延片 |
JP2016507462A (ja) * | 2013-02-05 | 2016-03-10 | ダウ コーニング コーポレーションDow Corning Corporation | 昇華(PVT)により成長させたSiC結晶での転位を減少させる方法 |
US9337277B2 (en) | 2012-09-11 | 2016-05-10 | Dow Corning Corporation | High voltage power semiconductor device on SiC |
WO2016166939A1 (ja) * | 2015-04-17 | 2016-10-20 | 富士電機株式会社 | 半導体の製造方法およびSiC基板 |
US9738991B2 (en) | 2013-02-05 | 2017-08-22 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion |
US9797064B2 (en) | 2013-02-05 | 2017-10-24 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion |
CN108140668A (zh) * | 2015-07-03 | 2018-06-08 | 应用材料公司 | 半导体器件 |
US10002760B2 (en) | 2014-07-29 | 2018-06-19 | Dow Silicones Corporation | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
WO2018174105A1 (ja) * | 2017-03-22 | 2018-09-27 | 東洋炭素株式会社 | 改質SiCウエハの製造方法、エピタキシャル層付きSiCウエハ、その製造方法、及び表面処理方法 |
CN117637463A (zh) * | 2024-01-26 | 2024-03-01 | 希科半导体科技(苏州)有限公司 | 碳化硅衬底的位错缺陷的处理方法 |
Families Citing this family (6)
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JP5678622B2 (ja) * | 2010-12-03 | 2015-03-04 | 株式会社デンソー | 炭化珪素単結晶の製造方法 |
US20140054609A1 (en) * | 2012-08-26 | 2014-02-27 | Cree, Inc. | Large high-quality epitaxial wafers |
US9018639B2 (en) | 2012-10-26 | 2015-04-28 | Dow Corning Corporation | Flat SiC semiconductor substrate |
US8940614B2 (en) | 2013-03-15 | 2015-01-27 | Dow Corning Corporation | SiC substrate with SiC epitaxial film |
JP6965499B2 (ja) * | 2016-03-16 | 2021-11-10 | 富士電機株式会社 | 炭化珪素半導体装置および炭化珪素半導体装置の製造方法 |
CN114318551B (zh) * | 2022-03-14 | 2022-06-17 | 浙江大学杭州国际科创中心 | 一种碳化硅晶片位错腐蚀方法及装置 |
Family Cites Families (2)
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US6596080B2 (en) * | 2000-04-07 | 2003-07-22 | Hoya Corporation | Silicon carbide and method for producing the same |
US7192482B2 (en) * | 2004-08-10 | 2007-03-20 | Cree, Inc. | Seed and seedholder combinations for high quality growth of large silicon carbide single crystals |
-
2007
- 2007-06-18 JP JP2007159643A patent/JP2008311541A/ja not_active Withdrawn
-
2008
- 2008-06-13 US US12/139,446 patent/US20080318359A1/en not_active Abandoned
Cited By (29)
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JP2010184833A (ja) * | 2009-02-12 | 2010-08-26 | Denso Corp | 炭化珪素単結晶基板および炭化珪素単結晶エピタキシャルウェハ |
WO2011126145A1 (ja) | 2010-04-07 | 2011-10-13 | 新日本製鐵株式会社 | エピタキシャル炭化珪素単結晶基板の製造方法、及びこの方法によって得られたエピタキシャル炭化珪素単結晶基板 |
JP5945505B2 (ja) * | 2010-11-15 | 2016-07-05 | Hoya株式会社 | 炭化珪素基板、半導体素子ならびに炭化珪素基板の製造方法 |
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US8890170B2 (en) | 2010-11-15 | 2014-11-18 | Hoya Corporation | Silicon carbide substrate, semiconductor device and method for manufacturing silicon carbide substrate |
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WO2018174105A1 (ja) * | 2017-03-22 | 2018-09-27 | 東洋炭素株式会社 | 改質SiCウエハの製造方法、エピタキシャル層付きSiCウエハ、その製造方法、及び表面処理方法 |
KR20190129104A (ko) * | 2017-03-22 | 2019-11-19 | 토요 탄소 가부시키가이샤 | 개질 SiC 웨이퍼의 제조 방법, 에피택셜층 부착 SiC 웨이퍼, 그의 제조 방법, 및 표면 처리 방법 |
JPWO2018174105A1 (ja) * | 2017-03-22 | 2020-01-30 | 東洋炭素株式会社 | 改質SiCウエハの製造方法、エピタキシャル層付きSiCウエハ、その製造方法、及び表面処理方法 |
JP7008063B2 (ja) | 2017-03-22 | 2022-01-25 | 東洋炭素株式会社 | 改質SiCウエハの製造方法及びエピタキシャル層付きSiCウエハの製造方法 |
US11261539B2 (en) | 2017-03-22 | 2022-03-01 | Toyo Tanso Co., Ltd. | Method for manufacturing reformed sic wafer, epitaxial layer-attached sic wafer, method for manufacturing same, and surface treatment method |
KR102604446B1 (ko) | 2017-03-22 | 2023-11-22 | 토요타 쯔우쇼우 가부시키가이샤 | 개질 SiC 웨이퍼의 제조 방법, 에피택셜층 부착 SiC 웨이퍼, 그의 제조 방법, 및 표면 처리 방법 |
CN117637463A (zh) * | 2024-01-26 | 2024-03-01 | 希科半导体科技(苏州)有限公司 | 碳化硅衬底的位错缺陷的处理方法 |
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