JP2008300806A5 - - Google Patents

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Publication number
JP2008300806A5
JP2008300806A5 JP2007148622A JP2007148622A JP2008300806A5 JP 2008300806 A5 JP2008300806 A5 JP 2008300806A5 JP 2007148622 A JP2007148622 A JP 2007148622A JP 2007148622 A JP2007148622 A JP 2007148622A JP 2008300806 A5 JP2008300806 A5 JP 2008300806A5
Authority
JP
Japan
Prior art keywords
cryopump
partition
vacuum vessel
substrate processing
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007148622A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008300806A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007148622A priority Critical patent/JP2008300806A/ja
Priority claimed from JP2007148622A external-priority patent/JP2008300806A/ja
Priority to US12/123,541 priority patent/US20080299493A1/en
Priority to EP08156643A priority patent/EP2000854A3/en
Priority to EP09180374A priority patent/EP2161351A1/en
Priority to TW097119725A priority patent/TW200913008A/zh
Priority to KR1020080052369A priority patent/KR20080106859A/ko
Publication of JP2008300806A publication Critical patent/JP2008300806A/ja
Publication of JP2008300806A5 publication Critical patent/JP2008300806A5/ja
Pending legal-status Critical Current

Links

JP2007148622A 2007-06-04 2007-06-04 基板処理装置、露光装置及びデバイス製造方法 Pending JP2008300806A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2007148622A JP2008300806A (ja) 2007-06-04 2007-06-04 基板処理装置、露光装置及びデバイス製造方法
US12/123,541 US20080299493A1 (en) 2007-06-04 2008-05-20 Substrate processing apparatus and method of manufacturing device
EP08156643A EP2000854A3 (en) 2007-06-04 2008-05-21 Substrate processing apparatus and method of manufacturing device
EP09180374A EP2161351A1 (en) 2007-06-04 2008-05-21 Substrate processing apparatus and method of manufacturing a device
TW097119725A TW200913008A (en) 2007-06-04 2008-05-28 Substrate processing apparatus and method of manufacturing device
KR1020080052369A KR20080106859A (ko) 2007-06-04 2008-06-04 기판처리장치 및 디바이스의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007148622A JP2008300806A (ja) 2007-06-04 2007-06-04 基板処理装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2008300806A JP2008300806A (ja) 2008-12-11
JP2008300806A5 true JP2008300806A5 (enExample) 2010-07-15

Family

ID=39769412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007148622A Pending JP2008300806A (ja) 2007-06-04 2007-06-04 基板処理装置、露光装置及びデバイス製造方法

Country Status (5)

Country Link
US (1) US20080299493A1 (enExample)
EP (2) EP2000854A3 (enExample)
JP (1) JP2008300806A (enExample)
KR (1) KR20080106859A (enExample)
TW (1) TW200913008A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008300806A (ja) 2007-06-04 2008-12-11 Canon Inc 基板処理装置、露光装置及びデバイス製造方法
WO2011075110A1 (en) * 2008-11-19 2011-06-23 Brooks Automation, Inc. Process chamber with intergrated pumping
JP5538931B2 (ja) 2010-02-04 2014-07-02 キヤノン株式会社 捕獲器、真空容器、処理装置、及びデバイス製造方法
JP6316759B2 (ja) * 2015-01-21 2018-04-25 東京エレクトロン株式会社 ガス供給系清浄化方法および基板処理装置
SG11201908803XA (en) * 2017-04-11 2019-10-30 Asml Netherlands Bv Lithographic apparatus and cooling method
US12217945B2 (en) 2019-09-06 2025-02-04 Lam Research Corporation Sorption chamber walls for semiconductor equipment
EP4575644A1 (en) * 2023-12-19 2025-06-25 ASML Netherlands B.V. Vessel configured to receive a radiation beam with a cold trap for contamination capture

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638587A (en) * 1979-09-01 1981-04-13 Nec Corp Vacuum device
US4464342A (en) * 1982-05-14 1984-08-07 At&T Bell Laboratories Molecular beam epitaxy apparatus for handling phosphorus
JPH01237365A (ja) * 1988-03-15 1989-09-21 Toshiba Corp クライオポンプ装置
JPH0749084A (ja) * 1993-08-05 1995-02-21 Hitachi Ltd クライオポンプ
JPH07208332A (ja) * 1994-01-07 1995-08-08 Anelva Corp スパッタリング装置におけるクライオポンプ再生方法
US5520002A (en) * 1995-02-01 1996-05-28 Sony Corporation High speed pump for a processing vacuum chamber
NL9500225A (nl) * 1995-02-07 1996-09-02 Hauzer Techno Coating Europ B Werkwijze voor het regenereren van cryocondensatiepomppanelen in een vacuümkamer, vacuümkamer geschikt voor het uitvoeren van de werkwijze en een inrichting voor het coaten van produkten voorzien van een dergelijke vacuümkamer.
US5644568A (en) 1995-03-15 1997-07-01 Motorola, Inc. Method and apparatus for organizing and recovering information communicated in a radio communication system
JPH10121224A (ja) * 1996-10-18 1998-05-12 Anelva Corp クライオポンプを用いたスパッタリング装置の動作方法及びその装置
JPH11200031A (ja) * 1997-12-25 1999-07-27 Applied Materials Inc スパッタリング装置及びその高速真空排気方法
JP4274648B2 (ja) * 1999-09-29 2009-06-10 住友重機械工業株式会社 クライオポンプの制御装置
EP1491955A1 (en) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP4370924B2 (ja) * 2003-08-27 2009-11-25 株式会社ニコン 真空装置、真空装置の運転方法、露光装置、及び露光装置の運転方法
JP2005101537A (ja) * 2003-08-29 2005-04-14 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
KR20060095763A (ko) * 2003-10-21 2006-09-01 가부시키가이샤 니콘 환경 제어장치, 디바이스 제조장치, 디바이스 제조방법, 및노광장치
JP2005353986A (ja) 2004-06-14 2005-12-22 Canon Inc 露光装置
KR20060088817A (ko) * 2005-01-28 2006-08-07 가부시키가이샤 이빔 기판처리장치 및 기판처리방법
JP2006222198A (ja) * 2005-02-09 2006-08-24 Canon Inc 露光装置
JP2008300806A (ja) 2007-06-04 2008-12-11 Canon Inc 基板処理装置、露光装置及びデバイス製造方法

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