JP2016122795A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016122795A5 JP2016122795A5 JP2014263378A JP2014263378A JP2016122795A5 JP 2016122795 A5 JP2016122795 A5 JP 2016122795A5 JP 2014263378 A JP2014263378 A JP 2014263378A JP 2014263378 A JP2014263378 A JP 2014263378A JP 2016122795 A5 JP2016122795 A5 JP 2016122795A5
- Authority
- JP
- Japan
- Prior art keywords
- vacuum processing
- processing chamber
- pressure
- torr
- valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014263378A JP6408904B2 (ja) | 2014-12-25 | 2014-12-25 | 真空引き方法及び真空処理装置 |
| US14/977,778 US9984907B2 (en) | 2014-12-25 | 2015-12-22 | Evacuation method and vacuum processing apparatus |
| TW104143285A TWI676222B (zh) | 2014-12-25 | 2015-12-23 | 真空吸引方法及真空處理裝置 |
| KR1020150185257A KR102364950B1 (ko) | 2014-12-25 | 2015-12-23 | 진공 배기 방법 및 진공 처리 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014263378A JP6408904B2 (ja) | 2014-12-25 | 2014-12-25 | 真空引き方法及び真空処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016122795A JP2016122795A (ja) | 2016-07-07 |
| JP2016122795A5 true JP2016122795A5 (enExample) | 2018-01-18 |
| JP6408904B2 JP6408904B2 (ja) | 2018-10-17 |
Family
ID=56165058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014263378A Active JP6408904B2 (ja) | 2014-12-25 | 2014-12-25 | 真空引き方法及び真空処理装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9984907B2 (enExample) |
| JP (1) | JP6408904B2 (enExample) |
| KR (1) | KR102364950B1 (enExample) |
| TW (1) | TWI676222B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI756475B (zh) * | 2017-10-06 | 2022-03-01 | 日商東京威力科創股份有限公司 | 抑制粒子產生之方法及真空裝置 |
| CN108987235B (zh) * | 2018-07-12 | 2020-06-05 | 昆山龙腾光电股份有限公司 | 一种等离子体处理装置 |
| JP7238461B2 (ja) * | 2019-02-25 | 2023-03-14 | 株式会社島津製作所 | バルブ制御装置および真空バルブ |
| SG11202110276WA (en) * | 2019-03-25 | 2021-10-28 | Kokusai Electric Corp | Substrate processing apparatus, method of manufacturing semiconductor device, and program |
| JP7433164B2 (ja) * | 2019-08-15 | 2024-02-19 | 東京エレクトロン株式会社 | 基板処理システム |
| US11742188B2 (en) * | 2019-08-15 | 2023-08-29 | Tokyo Electron Limited | Substrate processing method, pressure control apparatus and substrate processing system |
| CN113097095A (zh) * | 2019-12-23 | 2021-07-09 | 长鑫存储技术有限公司 | 半导体工艺的控制方法及其系统 |
| NL2025916B1 (en) * | 2020-06-25 | 2022-02-21 | Suss Microtec Lithography Gmbh | Wet Process Module and Method of Operation |
| US12072267B2 (en) * | 2020-08-31 | 2024-08-27 | Applied Materials, Inc. | Method and hardware for post maintenance vacuum recovery system |
| CN113345979A (zh) * | 2021-05-25 | 2021-09-03 | 通威太阳能（成都）有限公司 | 一种真空机台快速复机方法 |
| CN115323359B (zh) * | 2022-09-13 | 2025-09-12 | 拉普拉斯新能源科技股份有限公司 | 沉积处理装置 |
| US12411503B2 (en) * | 2023-01-13 | 2025-09-09 | Hamilton Sundstrand Corporation | High turn down ratio direct control for variable displacement pumps with flow sensing |
| US12286967B2 (en) | 2023-01-13 | 2025-04-29 | Hamilton Sundstrand Corporation | High turn down ratio direct control for variable displacement pumps |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5656238A (en) * | 1994-10-11 | 1997-08-12 | Johnson & Johnson Medical, Inc. | Plasma-enhanced vacuum drying |
| US5961922A (en) * | 1996-10-04 | 1999-10-05 | Johnson & Johnson Medical, Inc. | Method and apparatus for detecting water entrapment in a vaccum chamber |
| JPH10125652A (ja) * | 1996-10-16 | 1998-05-15 | Fujitsu Ltd | 半導体製造装置 |
| JP2000182966A (ja) | 1998-12-15 | 2000-06-30 | Sony Corp | 気相成長方法および気相成長装置 |
| JP3326559B2 (ja) * | 1999-08-31 | 2002-09-24 | 日本酸素株式会社 | Ｃｖｄ装置及びそのパージ方法 |
| US6562141B2 (en) * | 2000-07-03 | 2003-05-13 | Andrew Peter Clarke | Dual degas/cool loadlock cluster tool |
| JP2002249876A (ja) | 2001-02-26 | 2002-09-06 | Nec Kansai Ltd | 真空排気方法および真空装置 |
| US20030045098A1 (en) * | 2001-08-31 | 2003-03-06 | Applied Materials, Inc. | Method and apparatus for processing a wafer |
| US7504066B2 (en) * | 2003-09-11 | 2009-03-17 | Tuttnauer Israel Ltd. | Ozone plasma medical sterilization |
| US20050145341A1 (en) * | 2003-11-19 | 2005-07-07 | Masaki Suzuki | Plasma processing apparatus |
| JP2006210671A (ja) * | 2005-01-28 | 2006-08-10 | Shibaura Mechatronics Corp | 半導体製造装置のクリーニング方法 |
| JP5064119B2 (ja) * | 2007-06-07 | 2012-10-31 | 東京エレクトロン株式会社 | 真空引き方法及び記憶媒体 |
| EP2902042A4 (en) * | 2012-09-27 | 2016-09-21 | Saraya Co Ltd | STERILIZATION PROCESS AND DEVICE |
| TWI654695B (zh) * | 2012-12-06 | 2019-03-21 | 英福康公司 | 真空工具及測量該真空工具的客真空室中的氛圍的方法 |
| KR101453767B1 (ko) * | 2013-03-07 | 2014-10-22 | 한신메디칼 주식회사 | 플라즈마 멸균장치 및 멸균방법 |
| JP2015069987A (ja) * | 2013-09-26 | 2015-04-13 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法及び基板処理方法 |
-
2014
- 2014-12-25 JP JP2014263378A patent/JP6408904B2/ja active Active
-
2015
- 2015-12-22 US US14/977,778 patent/US9984907B2/en active Active
- 2015-12-23 TW TW104143285A patent/TWI676222B/zh active
- 2015-12-23 KR KR1020150185257A patent/KR102364950B1/ko active Active