JPS5638587A - Vacuum device - Google Patents

Vacuum device

Info

Publication number
JPS5638587A
JPS5638587A JP11225979A JP11225979A JPS5638587A JP S5638587 A JPS5638587 A JP S5638587A JP 11225979 A JP11225979 A JP 11225979A JP 11225979 A JP11225979 A JP 11225979A JP S5638587 A JPS5638587 A JP S5638587A
Authority
JP
Japan
Prior art keywords
cryopumps
vacuum chamber
vacuum
exhaust
regenerative processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11225979A
Other languages
Japanese (ja)
Inventor
Sueo Tsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11225979A priority Critical patent/JPS5638587A/en
Publication of JPS5638587A publication Critical patent/JPS5638587A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

PURPOSE: To raise the operating ratio of a device by a method wherein at least two high-vacuum exhaust systems including cryopumps, etc. are provided in one vacuum chamber and thereby the regenerative processing time for cryopumps in operation is made unnecessary.
CONSTITUTION: In one vacuum chamber 1 are provided at least two high-vacuum exhaust systems containing cryopumps 2 and 2', gate valves 5 and 5' and fore valves 7 and 7' and changeable independently into the exhaust operation of the vacuum chamber 1 or the regenerative processing of the cryopumps 2 and 2'. Thus, while regenerative processing for one of cryopumps 2 and 2' is performed, the exhaust in the vacuum chamber 1 is conducted by the other. In the case of said application, the down time of the vacuum chamber 1 can be made zero by employing the cryopumps 2 and 2' alternately.
COPYRIGHT: (C)1981,JPO&Japio
JP11225979A 1979-09-01 1979-09-01 Vacuum device Pending JPS5638587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11225979A JPS5638587A (en) 1979-09-01 1979-09-01 Vacuum device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11225979A JPS5638587A (en) 1979-09-01 1979-09-01 Vacuum device

Publications (1)

Publication Number Publication Date
JPS5638587A true JPS5638587A (en) 1981-04-13

Family

ID=14582221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11225979A Pending JPS5638587A (en) 1979-09-01 1979-09-01 Vacuum device

Country Status (1)

Country Link
JP (1) JPS5638587A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60142932A (en) * 1983-11-14 1985-07-29 メルク　エンド　カムパニ−　インコ−ポレ−テツド Indene derivative useful as antagonist against thrombocyte activating factor
EP2000854A3 (en) * 2007-06-04 2009-09-23 Canon Kabushiki Kaisha Substrate processing apparatus and method of manufacturing device
JP2010073707A (en) * 2008-09-16 2010-04-02 Nippon Steel Corp Heat dissipation board
CN102278570A (en) * 2011-07-06 2011-12-14 苏州维艾普新材料有限公司 High vacuum packaging device of vacuum insulation panel
CN102953958A (en) * 2012-12-03 2013-03-06 上海集成电路研发中心有限公司 Dual cryogenic pump system and control method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60142932A (en) * 1983-11-14 1985-07-29 メルク　エンド　カムパニ−　インコ−ポレ−テツド Indene derivative useful as antagonist against thrombocyte activating factor
EP2000854A3 (en) * 2007-06-04 2009-09-23 Canon Kabushiki Kaisha Substrate processing apparatus and method of manufacturing device
JP2010073707A (en) * 2008-09-16 2010-04-02 Nippon Steel Corp Heat dissipation board
CN102278570A (en) * 2011-07-06 2011-12-14 苏州维艾普新材料有限公司 High vacuum packaging device of vacuum insulation panel
CN102953958A (en) * 2012-12-03 2013-03-06 上海集成电路研发中心有限公司 Dual cryogenic pump system and control method thereof
CN102953958B (en) * 2012-12-03 2016-09-28 上海集成电路研发中心有限公司 Dual cryogenic pump system and control method thereof

Similar Documents

Publication Publication Date Title
JPS5270473A (en) Refrigerator
JPS5638587A (en) Vacuum device
JPS5410825A (en) Prefiring preventing arrangement for two cycle engine
JPS51131267A (en) The exhaustion system of the electronic microscope
JPS52135659A (en) Magnetron and its manufacturing method
JPS5423464A (en) Exhaust system for vacuum unit
JPS5346262A (en) Manufacture for magnetron
JPS5359368A (en) Plasma etching
JPS5276761A (en) Manufacturing method of heat pipe
JPS51141970A (en) Air cylinder
JPS53113954A (en) Oil port of oil pressure cylinder and its molding method
JPS53321A (en) Exhaust circulation control system
JPS54160977A (en) Functioning speed changing method by means of operating lever
JPS5315765A (en) Vacuum caontact prevention method of hard mask
JPS5420277A (en) Process control system
JPS5260334A (en) Exhaust gas reflux control system
JPS548237A (en) Control system in multistage hydraulic machine
JPS5286258A (en) Waste-water treating equipment
JPS53135762A (en) Arrangement for pump
JPS5735681A (en) Vacuum device
JPS5314403A (en) Swash plate pump
JPS53319A (en) Exhaust circulation control system
JPS51119477A (en) Hydraulic pressure drive device for heating furnace
JPS5361171A (en) Vacuum cleaner
JPS51138918A (en) Method of making ease assembly work of instrusion type pipe-coupling