JP2008300351A5 - - Google Patents

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Publication number
JP2008300351A5
JP2008300351A5 JP2008125983A JP2008125983A JP2008300351A5 JP 2008300351 A5 JP2008300351 A5 JP 2008300351A5 JP 2008125983 A JP2008125983 A JP 2008125983A JP 2008125983 A JP2008125983 A JP 2008125983A JP 2008300351 A5 JP2008300351 A5 JP 2008300351A5
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JP
Japan
Prior art keywords
gas
slit nozzle
plasma
optical system
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008125983A
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English (en)
Japanese (ja)
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JP2008300351A (ja
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Publication date
Priority claimed from DE102007023444A external-priority patent/DE102007023444B4/de
Application filed filed Critical
Publication of JP2008300351A publication Critical patent/JP2008300351A/ja
Publication of JP2008300351A5 publication Critical patent/JP2008300351A5/ja
Pending legal-status Critical Current

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JP2008125983A 2007-05-16 2008-05-13 プラズマベースのｅｕｖ放射線源用のガスカーテンを生成する装置 Pending JP2008300351A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007023444A DE102007023444B4 (de) 2007-05-16 2007-05-16 Einrichtung zur Erzeugung eines Gasvorhangs für plasmabasierte EUV-Strahlungsquellen

Publications (2)

Publication Number Publication Date
JP2008300351A JP2008300351A (ja) 2008-12-11
JP2008300351A5 true JP2008300351A5 (enExample) 2009-04-23

Family

ID=39868866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008125983A Pending JP2008300351A (ja) 2007-05-16 2008-05-13 プラズマベースのｅｕｖ放射線源用のガスカーテンを生成する装置

Country Status (4)

Country Link
US (1) US7750327B2 (enExample)
JP (1) JP2008300351A (enExample)
DE (1) DE102007023444B4 (enExample)
NL (1) NL2001585C2 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
NL2004085A (en) * 2009-03-11 2010-09-14 Asml Netherlands Bv Radiation source, lithographic apparatus, and device manufacturing method.
KR101415886B1 (ko) 2009-09-01 2014-07-04 가부시키가이샤 아이에이치아이 플라즈마 광원
JP2011054376A (ja) * 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP6057221B2 (ja) * 2011-04-05 2017-01-11 イーティーエイチ・チューリッヒ 液滴供給装置および該液滴供給装置を備える光源
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
DE102012212394A1 (de) * 2012-07-16 2013-05-29 Carl Zeiss Smt Gmbh Abtrennvorrichtung und abtrennverfahren für projektionsbelichtungsanlagen
DE102012213927A1 (de) 2012-08-07 2013-06-06 Carl Zeiss Smt Gmbh Vorrichtung zur Erzeugung eines Gasvorhangs, Gasdüse und EUV-Lithographiesystem damit
KR20140036538A (ko) 2012-09-17 2014-03-26 삼성전자주식회사 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
US10101664B2 (en) 2014-11-01 2018-10-16 Kla-Tencor Corporation Apparatus and methods for optics protection from debris in plasma-based light source
US10217625B2 (en) * 2015-03-11 2019-02-26 Kla-Tencor Corporation Continuous-wave laser-sustained plasma illumination source
US10953493B2 (en) * 2017-07-07 2021-03-23 Arvinmeritor Technology, Llc Gas delivery system
US10631392B2 (en) * 2018-04-30 2020-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. EUV collector contamination prevention
JP7467174B2 (ja) * 2020-03-16 2024-04-15 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置、及び電子デバイスの製造方法
US12158576B2 (en) 2021-05-28 2024-12-03 Kla Corporation Counterflow gas nozzle for contamination mitigation in extreme ultraviolet inspection systems
JP7637579B2 (ja) * 2021-06-30 2025-02-28 Ｊｓｗアクティナシステム株式会社 レーザ照射装置、情報処理方法、及びプログラム

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JPS5238804B2 (enExample) * 1973-06-28 1977-10-01
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