JP2008153645A - パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 - Google Patents

パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 Download PDF

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Publication number
JP2008153645A
JP2008153645A JP2007305689A JP2007305689A JP2008153645A JP 2008153645 A JP2008153645 A JP 2008153645A JP 2007305689 A JP2007305689 A JP 2007305689A JP 2007305689 A JP2007305689 A JP 2007305689A JP 2008153645 A JP2008153645 A JP 2008153645A
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JP
Japan
Prior art keywords
pulse
radiation
pulse energy
energy
current
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JP2007305689A
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English (en)
Japanese (ja)
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JP2008153645A5 (enExample
Inventor
Jesko Brudermann
ブルーダーマン イェスコ
Juergen Kleinschmidt
クラインシュミット ユルゲン
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Xtreme Technologies GmbH
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Xtreme Technologies GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Xtreme Technologies GmbH filed Critical Xtreme Technologies GmbH
Publication of JP2008153645A publication Critical patent/JP2008153645A/ja
Publication of JP2008153645A5 publication Critical patent/JP2008153645A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • G01J1/18—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors using comparison with a reference electric value
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007305689A 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 Pending JP2008153645A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006060368A DE102006060368B3 (de) 2006-12-16 2006-12-16 Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle

Publications (2)

Publication Number Publication Date
JP2008153645A true JP2008153645A (ja) 2008-07-03
JP2008153645A5 JP2008153645A5 (enExample) 2009-03-19

Family

ID=39526726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007305689A Pending JP2008153645A (ja) 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置

Country Status (4)

Country Link
US (1) US7974321B2 (enExample)
JP (1) JP2008153645A (enExample)
DE (1) DE102006060368B3 (enExample)
NL (1) NL2001094C2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018533755A (ja) * 2015-10-27 2018-11-15 サイマー リミテッド ライアビリティ カンパニー 光学システムのためのコントローラ
JP2022059163A (ja) * 2020-10-01 2022-04-13 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101698141B1 (ko) * 2009-12-08 2017-01-19 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
CN105359038B (zh) * 2013-06-18 2018-08-10 Asml荷兰有限公司 光刻方法和光刻系统
DE102016212928B3 (de) 2016-07-14 2017-09-07 Trumpf Laser Gmbh Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals
CN117791287B (zh) * 2024-02-23 2024-04-30 深圳市智鼎自动化技术有限公司 激光脉冲能量控制系统及方法

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US582621A (en) * 1897-05-18 Combined churn and butter-worker
US3747019A (en) * 1970-07-16 1973-07-17 Union Carbide Corp Method and means for stabilizing the amplitude and repetition frequency of a repetitively q-switched laser
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
JPH02177313A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光制御装置
JP3235078B2 (ja) * 1993-02-24 2001-12-04 株式会社ニコン 走査露光方法、露光制御装置、走査型露光装置、及びデバイス製造方法
JP3296448B2 (ja) * 1993-03-15 2002-07-02 株式会社ニコン 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法
JPH07254559A (ja) * 1994-01-26 1995-10-03 Canon Inc 走査型露光装置及びそれを用いたデバイス製造方法
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
US5632739A (en) * 1994-10-13 1997-05-27 The General Hospital Corporation Two-pulse, lateral tissue illuminator
JPH09190966A (ja) 1996-01-08 1997-07-22 Canon Inc 走査型露光装置及びそれを用いたデバイスの製造方法
KR100210569B1 (ko) 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
EP0829036B9 (en) * 1996-04-01 2001-07-25 ASM Lithography B.V. Lithographic scanning exposure projection apparatus
US6538723B2 (en) * 1996-08-05 2003-03-25 Nikon Corporation Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5852621A (en) * 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP3807933B2 (ja) * 2000-12-14 2006-08-09 株式会社ルネサステクノロジ 投影露光装置及び投影露光方法
DE10209161B4 (de) * 2002-02-26 2009-09-17 Xtreme Technologies Gmbh Verfahren zur Energieregelung von gepulst betriebenen, gasentladungsgepumpten Strahlungsquellen
DE10244105B3 (de) * 2002-02-26 2004-09-16 Xtreme Technologies Gmbh Verfahren zur Energiestabilisierung gasentladungsgepumpter, in definierten Impulsfolgen betriebener Strahlungsquellen
DE10219805B4 (de) * 2002-04-30 2013-03-14 Xtreme Technologies Gmbh Verfahren zur Stabilisierung der Strahlungsleistung einer gepuist betriebenen, auf gasentladungserzeugtem Plasma basierenden Strahlungsquelle
FR2859545B1 (fr) * 2003-09-05 2005-11-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018533755A (ja) * 2015-10-27 2018-11-15 サイマー リミテッド ライアビリティ カンパニー 光学システムのためのコントローラ
JP2022059163A (ja) * 2020-10-01 2022-04-13 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
JP7697779B2 (ja) 2020-10-01 2025-06-24 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法

Also Published As

Publication number Publication date
NL2001094A1 (nl) 2008-06-17
US20080143989A1 (en) 2008-06-19
DE102006060368B3 (de) 2008-07-31
NL2001094C2 (nl) 2011-01-31
US7974321B2 (en) 2011-07-05

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