JP2008153645A5 - - Google Patents

Download PDF

Info

Publication number
JP2008153645A5
JP2008153645A5 JP2007305689A JP2007305689A JP2008153645A5 JP 2008153645 A5 JP2008153645 A5 JP 2008153645A5 JP 2007305689 A JP2007305689 A JP 2007305689A JP 2007305689 A JP2007305689 A JP 2007305689A JP 2008153645 A5 JP2008153645 A5 JP 2008153645A5
Authority
JP
Japan
Prior art keywords
pulse
radiation
pulse energy
current
burst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007305689A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008153645A (ja
Filing date
Publication date
Priority claimed from DE102006060368A external-priority patent/DE102006060368B3/de
Application filed filed Critical
Publication of JP2008153645A publication Critical patent/JP2008153645A/ja
Publication of JP2008153645A5 publication Critical patent/JP2008153645A5/ja
Pending legal-status Critical Current

Links

JP2007305689A 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 Pending JP2008153645A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006060368A DE102006060368B3 (de) 2006-12-16 2006-12-16 Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle

Publications (2)

Publication Number Publication Date
JP2008153645A JP2008153645A (ja) 2008-07-03
JP2008153645A5 true JP2008153645A5 (enExample) 2009-03-19

Family

ID=39526726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007305689A Pending JP2008153645A (ja) 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置

Country Status (4)

Country Link
US (1) US7974321B2 (enExample)
JP (1) JP2008153645A (enExample)
DE (1) DE102006060368B3 (enExample)
NL (1) NL2001094C2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101698141B1 (ko) * 2009-12-08 2017-01-19 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
KR102219069B1 (ko) 2013-06-18 2021-02-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 시스템
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system
DE102016212928B3 (de) 2016-07-14 2017-09-07 Trumpf Laser Gmbh Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals
JP7697779B2 (ja) 2020-10-01 2025-06-24 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
CN117791287B (zh) * 2024-02-23 2024-04-30 深圳市智鼎自动化技术有限公司 激光脉冲能量控制系统及方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US582621A (en) * 1897-05-18 Combined churn and butter-worker
US3747019A (en) * 1970-07-16 1973-07-17 Union Carbide Corp Method and means for stabilizing the amplitude and repetition frequency of a repetitively q-switched laser
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
JPH02177313A (ja) 1988-12-28 1990-07-10 Canon Inc 露光制御装置
JP3235078B2 (ja) * 1993-02-24 2001-12-04 株式会社ニコン 走査露光方法、露光制御装置、走査型露光装置、及びデバイス製造方法
JP3296448B2 (ja) * 1993-03-15 2002-07-02 株式会社ニコン 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法
JPH07254559A (ja) * 1994-01-26 1995-10-03 Canon Inc 走査型露光装置及びそれを用いたデバイス製造方法
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
US5632739A (en) * 1994-10-13 1997-05-27 The General Hospital Corporation Two-pulse, lateral tissue illuminator
JPH09190966A (ja) 1996-01-08 1997-07-22 Canon Inc 走査型露光装置及びそれを用いたデバイスの製造方法
KR100210569B1 (ko) 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
KR100500770B1 (ko) * 1996-04-01 2005-12-28 에이에스엠엘 네델란즈 비.브이. 리소그래픽스캐닝노광프로젝션장치
US6538723B2 (en) * 1996-08-05 2003-03-25 Nikon Corporation Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5852621A (en) * 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP3807933B2 (ja) 2000-12-14 2006-08-09 株式会社ルネサステクノロジ 投影露光装置及び投影露光方法
DE10209161B4 (de) * 2002-02-26 2009-09-17 Xtreme Technologies Gmbh Verfahren zur Energieregelung von gepulst betriebenen, gasentladungsgepumpten Strahlungsquellen
DE10244105B3 (de) * 2002-02-26 2004-09-16 Xtreme Technologies Gmbh Verfahren zur Energiestabilisierung gasentladungsgepumpter, in definierten Impulsfolgen betriebener Strahlungsquellen
DE10219805B4 (de) * 2002-04-30 2013-03-14 Xtreme Technologies Gmbh Verfahren zur Stabilisierung der Strahlungsleistung einer gepuist betriebenen, auf gasentladungserzeugtem Plasma basierenden Strahlungsquelle
FR2859545B1 (fr) 2003-09-05 2005-11-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet

Similar Documents

Publication Publication Date Title
JP6557353B2 (ja) 光源のための波長安定化
JP2008153645A5 (enExample)
JP6782775B2 (ja) 繰り返し率依存の性能変数のオンライン較正
JP6184500B2 (ja) Euv光のためのターゲット材料プッシュアウトの事前補償
CN108029186B (zh) 经由激光能量调制来稳定液滴-等离子体相互作用的系统和方法
CN102834988B (zh) 用于控制光带宽的方法和设备
TWI625601B (zh) 微影設備及方法
JP5095209B2 (ja) 超紫外放射によってフォトリソグラフィーを行うための方法および装置
CN108348763B (zh) 用于在lpp euv光源中控制源激光器激发的系统和方法
KR101564391B1 (ko) Euv 광원에서의 온도 영향을 보상하기 위한 시스템 및 방법
US20170181258A1 (en) Euv lpp source with improved dose control by tracking dose over specified window
JP2019530204A (ja) 光ビームのコヒーレンス量の調整
JP2018533755A (ja) 光学システムのためのコントローラ
US20160044772A1 (en) System and method to reduce oscillations in extreme ultraviolet light generation
TWI759344B (zh) 用於控制極紫外光(euv)輻射之劑量之方法與系統及相關之非暫時性電腦可讀儲存媒體
US7974321B2 (en) Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source
JP2018185523A (ja) レーザビームパルスのタイミングを調整して極端紫外線光注入を調節する方法
US9755396B1 (en) EUV LPP source with improved dose control by combining pulse modulation and pulse control mode
KR102823850B1 (ko) 리소그래피 시스템 제어 방법
CN209860345U (zh) 准分子激光器剂量稳定控制系统
KR20200037401A (ko) 포토리소그래피를 위한 디더 프리 적응형 로버스트 선량 제어 방법
WO2024056330A1 (en) Mixed energy control in an euv lithography system