NL2001094C2 - Werkwijze en inrichting voor het stabiliseren van het gemiddelde afgegeven stralingsvermogen van een gepulseerd uitgevoerde stralingsbron. - Google Patents

Werkwijze en inrichting voor het stabiliseren van het gemiddelde afgegeven stralingsvermogen van een gepulseerd uitgevoerde stralingsbron. Download PDF

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Publication number
NL2001094C2
NL2001094C2 NL2001094A NL2001094A NL2001094C2 NL 2001094 C2 NL2001094 C2 NL 2001094C2 NL 2001094 A NL2001094 A NL 2001094A NL 2001094 A NL2001094 A NL 2001094A NL 2001094 C2 NL2001094 C2 NL 2001094C2
Authority
NL
Netherlands
Prior art keywords
pulse
radiation
pulse energy
burst
average
Prior art date
Application number
NL2001094A
Other languages
English (en)
Dutch (nl)
Other versions
NL2001094A1 (nl
Inventor
Jesko Brudermann
Juergen Kleinschmidt
Original Assignee
Xtreme Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Tech Gmbh filed Critical Xtreme Tech Gmbh
Publication of NL2001094A1 publication Critical patent/NL2001094A1/nl
Application granted granted Critical
Publication of NL2001094C2 publication Critical patent/NL2001094C2/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
    • G01J1/18—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors using comparison with a reference electric value
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2001094A 2006-12-16 2007-12-14 Werkwijze en inrichting voor het stabiliseren van het gemiddelde afgegeven stralingsvermogen van een gepulseerd uitgevoerde stralingsbron. NL2001094C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006060368 2006-12-16
DE102006060368A DE102006060368B3 (de) 2006-12-16 2006-12-16 Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle

Publications (2)

Publication Number Publication Date
NL2001094A1 NL2001094A1 (nl) 2008-06-17
NL2001094C2 true NL2001094C2 (nl) 2011-01-31

Family

ID=39526726

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2001094A NL2001094C2 (nl) 2006-12-16 2007-12-14 Werkwijze en inrichting voor het stabiliseren van het gemiddelde afgegeven stralingsvermogen van een gepulseerd uitgevoerde stralingsbron.

Country Status (4)

Country Link
US (1) US7974321B2 (enExample)
JP (1) JP2008153645A (enExample)
DE (1) DE102006060368B3 (enExample)
NL (1) NL2001094C2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101698141B1 (ko) * 2009-12-08 2017-01-19 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
KR102219069B1 (ko) 2013-06-18 2021-02-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 시스템
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system
DE102016212928B3 (de) 2016-07-14 2017-09-07 Trumpf Laser Gmbh Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals
JP7697779B2 (ja) 2020-10-01 2025-06-24 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
CN117791287B (zh) * 2024-02-23 2024-04-30 深圳市智鼎自动化技术有限公司 激光脉冲能量控制系统及方法

Citations (9)

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US5107275A (en) * 1988-12-28 1992-04-21 Canon Kabushiki Kaisha Exposure control system
US5608492A (en) * 1994-01-26 1997-03-04 Canon Kabushiki Kaisha Scanning type exposure apparatus and method and device manufacturing method
JPH09190966A (ja) * 1996-01-08 1997-07-22 Canon Inc 走査型露光装置及びそれを用いたデバイスの製造方法
US5677754A (en) * 1994-06-17 1997-10-14 Nikon Corporation Scanning exposure apparatus
US5852621A (en) * 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
EP0957401A1 (en) * 1995-09-29 1999-11-17 Canon Kabushiki Kaisha Exposure method, exposure apparatus and device manufacturing method
US20020076628A1 (en) * 2000-12-14 2002-06-20 Semiconductor Leading Edge Technologies, Inc. Projection aligner, exposing method and semiconductor device
US20030198263A1 (en) * 2002-02-26 2003-10-23 Xtreme Technologies Gmbh Method for energy control of pulsed driven, gas discharged-coupled beam sources
FR2859545A1 (fr) * 2003-09-05 2005-03-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet

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US582621A (en) * 1897-05-18 Combined churn and butter-worker
US3747019A (en) * 1970-07-16 1973-07-17 Union Carbide Corp Method and means for stabilizing the amplitude and repetition frequency of a repetitively q-switched laser
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
JP3235078B2 (ja) * 1993-02-24 2001-12-04 株式会社ニコン 走査露光方法、露光制御装置、走査型露光装置、及びデバイス製造方法
JP3296448B2 (ja) * 1993-03-15 2002-07-02 株式会社ニコン 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法
US5632739A (en) * 1994-10-13 1997-05-27 The General Hospital Corporation Two-pulse, lateral tissue illuminator
KR100500770B1 (ko) * 1996-04-01 2005-12-28 에이에스엠엘 네델란즈 비.브이. 리소그래픽스캐닝노광프로젝션장치
US6538723B2 (en) * 1996-08-05 2003-03-25 Nikon Corporation Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
DE10244105B3 (de) * 2002-02-26 2004-09-16 Xtreme Technologies Gmbh Verfahren zur Energiestabilisierung gasentladungsgepumpter, in definierten Impulsfolgen betriebener Strahlungsquellen
DE10219805B4 (de) * 2002-04-30 2013-03-14 Xtreme Technologies Gmbh Verfahren zur Stabilisierung der Strahlungsleistung einer gepuist betriebenen, auf gasentladungserzeugtem Plasma basierenden Strahlungsquelle

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5107275A (en) * 1988-12-28 1992-04-21 Canon Kabushiki Kaisha Exposure control system
US5608492A (en) * 1994-01-26 1997-03-04 Canon Kabushiki Kaisha Scanning type exposure apparatus and method and device manufacturing method
US5677754A (en) * 1994-06-17 1997-10-14 Nikon Corporation Scanning exposure apparatus
EP0957401A1 (en) * 1995-09-29 1999-11-17 Canon Kabushiki Kaisha Exposure method, exposure apparatus and device manufacturing method
JPH09190966A (ja) * 1996-01-08 1997-07-22 Canon Inc 走査型露光装置及びそれを用いたデバイスの製造方法
US5852621A (en) * 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US20020076628A1 (en) * 2000-12-14 2002-06-20 Semiconductor Leading Edge Technologies, Inc. Projection aligner, exposing method and semiconductor device
US20030198263A1 (en) * 2002-02-26 2003-10-23 Xtreme Technologies Gmbh Method for energy control of pulsed driven, gas discharged-coupled beam sources
FR2859545A1 (fr) * 2003-09-05 2005-03-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet

Also Published As

Publication number Publication date
NL2001094A1 (nl) 2008-06-17
US20080143989A1 (en) 2008-06-19
JP2008153645A (ja) 2008-07-03
US7974321B2 (en) 2011-07-05
DE102006060368B3 (de) 2008-07-31

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