JP2008147560A - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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Abstract
【解決手段】主面2aに集積回路3を備える基板2と、パッド電極4を介して前記集積回路3と電気的に接続される再配線5と、該再配線5上に形成された電極端子6と、該電極端子6を外方に露出させるように前記再配線5を含む前記基板2の全面を封止する樹脂層7とを備えて略板状の外観をなす半導体装置1において、前記基板2の裏面2bを被覆した前記樹脂層7の裏面7bと前記基板2の裏面2bに交差する側面2cを被覆した前記樹脂層7の側面7cとの角部に、前記樹脂層7の裏面7bから側面7cに向けて傾斜する傾斜面7dを形成する。
【選択図】図1
Description
本発明の半導体装置は、主面に集積回路を備える基板と、パッド電極を介して前記集積回路と電気的に接続される再配線と、該再配線上に形成された電極端子と、該電極端子を外方に露出させるように前記再配線を含む前記基板の全面を封止する樹脂層とを備えて略板状の外観をなし、前記基板の裏面を被覆した前記樹脂層の裏面と前記基板の裏面に交差する側面を被覆した前記樹脂層の側面との角部に、前記樹脂層の裏面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする。
さらに、本発明の半導体装置は、前記傾斜面を形成した前記樹脂層の角部に対応する前記基板の主面と側面との角部にも、該基板の主面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする。
これら場合には、傾斜面とした樹脂層の角部における樹脂層の厚みを十分に確保することができるため、樹脂層により基板をさらに良好に保護することができる。
この場合には、樹脂層の裏面と側面との角部に衝撃が加えられても、これら第1樹脂層と第2樹脂層との界面に応力が集中することを防いで、第1樹脂層が第2樹脂層から剥離することを効果的に防止できる。
基板2の側面(後述する1回目のダイシングによって画成される側面)2cは、主面2a及びこの反対側に位置する裏面2bに対して略直交しており、基板2の側面2cと裏面2bとの角部には、基板2の裏面2bから側面2cに向けて傾斜する傾斜面2dが形成されている。
はじめに、図2に示すように、主面2aに複数の集積回路3が形成された円板状のウェハ2を用意し、複数の集積回路3を個々に区画する境界線に沿ってウェハ2の裏面2bをダイシングして深さの浅い断面略V字状のウェハV字溝11を形成する。次いで、ウェハ2の主面2aにパッド電極4に接続された再配線5と、再配線5上に柱状のメタルポスト6とを形成する。ここで、再配線5は、エッチング処理が施されて形成されている。
また、この際に形成されるダイシング溝12の幅は、ウェハV字溝11の幅よりも狭く形成されており、ダイシング溝12の形成によってウェハV字溝11の幅方向中央部のみが削り落とされることになる。そして、このウェハV字溝11の残部が各基板2における傾斜面2dをなすことになる。
そして、図7に示すように、第2樹脂層10の表面7aに露出されたメタルポスト6の上面6aにバンプ8を搭載するとともに、ウェハ2の裏面2b側を封止した第1樹脂層9の裏面7bにダイシングテープ15を貼り付ける。その後、ウェハ2の主面2a側(第2樹脂層10の表面7a側)からダイシングテープ15の途中まで到達するように、ダイシング溝12内に切り込みを入れる2回目のダイシングを実施し、この段階で半導体装置1が個片化されることになる。
最後に、ダイシングテープ15を引き伸ばすように引っ張り、ダイシングテープ15に貼りついた状態で個片化された半導体装置1を剥離する。これにより、図1に示す半導体装置1の製造が完了する。
また、樹脂層7の裏面7b側の傾斜面7dに対応する基板2の裏面2b側の角部にも傾斜面2dが形成されているため、樹脂層7の裏面7b側の角部における樹脂層7の厚みを十分に確保することができ、樹脂層7により基板2をさらに良好に保護することが可能となる。
また、第1樹脂層9の裏面7bに形成される樹脂V字溝13は、第2樹脂層10の形成後に限らず、少なくとも第1樹脂層9の形成後から2回目のダイシングの前までに形成すればよい。
また、この構成の半導体装置21を製造する場合には、第1樹脂層9がウェハ2の裏面2bのみに形成されることになる。この場合、樹脂層7に形成される傾斜面7dは、上記第1実施形態と同様に、第1樹脂層9のみに形成されるとしても構わないが、図示例のように、第1樹脂層9及び第2樹脂層10の両方にわたって形成されることがより好ましい。すなわち、この半導体装置21の製造においては、樹脂V字溝13を形成する際に樹脂V字溝13を第2樹脂層10に到達させることが好ましい。このようにすることで、樹脂層7の裏面7bと側面7cとの角部に強い衝撃が加えられても、これら第1樹脂層9と第2樹脂層10との界面に応力が集中することを防いで、第1樹脂層9が第2樹脂層10から剥離することを効果的に防止できる。
また、基板2には、その裏面2bから側面2cに向けて傾斜する傾斜面2dに加えて、基板2の主面2aと側面2cとの角部にも主面2aから側面2cに向かう傾斜面2eが形成されている。この基板2の主面2a側の傾斜面2eは、樹脂層7の表面7a側の傾斜面7eに対応づけて形成されており、これら基板2及び樹脂層7の傾斜面2e,7eは相互に平行に形成されていることが好ましい。
また、表面7a側及び裏面7b側の両方に傾斜面7d,7eが形成されるとしたが、例えば、樹脂層7の表面7a側にのみ傾斜面7eが形成されるとしてもよい。
Claims (8)
- 主面に集積回路を備える基板と、パッド電極を介して前記集積回路と電気的に接続される再配線と、該再配線上に形成された電極端子と、該電極端子を外方に露出させるように前記再配線を含む前記基板の全面を封止する樹脂層とを備えて略板状の外観をなし、
前記基板の裏面を被覆した前記樹脂層の裏面と前記基板の裏面に交差する側面を被覆した前記樹脂層の側面との角部に、前記樹脂層の裏面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする半導体装置。 - 前記傾斜面を形成した前記樹脂層の角部に対応する前記基板の裏面と側面との角部にも、前記基板の裏面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする請求項1に記載の半導体装置。
- 前記樹脂層が、前記基板の裏面を被覆する第1樹脂層と、前記基板の主面及び側面を被覆する第2樹脂層とからなり、
前記樹脂層に形成された傾斜面が、これら第1樹脂層及び第2樹脂層にわたって形成されていることを特徴とする請求項1に記載の半導体装置。 - 前記基板の主面を被覆した前記樹脂層の表面と前記樹脂層の側面との角部にも、前記樹脂層の表面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする請求項1から請求項3のいずれか1項に記載の半導体装置。
- 前記傾斜面を形成した前記樹脂層の角部に対応する前記基板の主面と側面との角部にも、該基板の主面から側面に向けて傾斜する傾斜面が形成されていることを特徴とする請求項4に記載の半導体装置。
- 主面に複数の集積回路が形成されたウェハが用意され、パッド電極を介して前記集積回路と電気的に接続される再配線を形成するとともに、該再配線上に電極端子を形成した後に、前記ウェハをダイシングして個片化する半導体装置の製造方法であって、
前記再配線及び前記電極端子の形成前から形成後までの間に、前記ウェハの裏面を被覆する第1樹脂層を形成し、
前記再配線、前記電極端子及び前記第1樹脂層の形成後に、前記ウェハの主面側から裏面に向けて前記第1樹脂層の途中まで1回目のダイシングを行って前記複数の集積回路を区画するためのダイシング溝を形成し、
該ダイシング溝の形成後に、該ダイシング溝及び前記ウェハの主面を連続的に封止する第2樹脂層を形成し、
前記第1樹脂層の形成後から前記第2樹脂層の形成後までの間に、前記ダイシング溝と前記ウェハの厚さ方向に重なるように前記ウェハの裏面側からダイシングして断面略V字状に形成された樹脂V字溝を少なくとも前記第1樹脂層に形成し、
前記1回目のダイシングによって画成された前記ウェハの側面を被覆する前記第2樹脂層が残るように、かつ、前記樹脂V字溝の一部が前記ウェハの裏面を被覆する前記第1樹脂層の裏面から傾斜する傾斜面として残るように2回目のダイシングを行って個片化することを特徴とする半導体装置の製造方法。 - 前記第1樹脂層の形成前に、前記樹脂V字溝と前記ウェハの厚さ方向に重なるように前記ウェハの裏面に断面略V字状のウェハV字溝を形成して、前記第1樹脂層の形成時に前記ウェハの裏面と共に前記ウェハV字溝も被覆することを特徴とする請求項6に記載の半導体装置の製造方法。
- 前記第2樹脂層の形成後から前記2回目のダイシングの前までに、前記ダイシング溝と前記ウェハの厚さ方向に重なるように前記ウェハの主面側からダイシングして断面略V字状に形成された樹脂V字溝を前記第2樹脂層にも形成し、
前記2回目のダイシングに際して、前記第2樹脂層に形成された前記樹脂V字溝の一部が前記ウェハの主面を被覆する前記第2樹脂層の表面から傾斜する傾斜面として残るようにすることを特徴とする請求項6又は請求項7に記載の半導体装置の製造方法。
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