JP2008140795A5 - - Google Patents

Download PDF

Info

Publication number
JP2008140795A5
JP2008140795A5 JP2006322526A JP2006322526A JP2008140795A5 JP 2008140795 A5 JP2008140795 A5 JP 2008140795A5 JP 2006322526 A JP2006322526 A JP 2006322526A JP 2006322526 A JP2006322526 A JP 2006322526A JP 2008140795 A5 JP2008140795 A5 JP 2008140795A5
Authority
JP
Japan
Prior art keywords
exposure
light
optical system
light amount
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006322526A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008140795A (ja
JP5025236B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006322526A priority Critical patent/JP5025236B2/ja
Priority claimed from JP2006322526A external-priority patent/JP5025236B2/ja
Priority to TW096143203A priority patent/TWI397780B/zh
Priority to US11/943,885 priority patent/US7936442B2/en
Priority to KR1020070122385A priority patent/KR100913271B1/ko
Publication of JP2008140795A publication Critical patent/JP2008140795A/ja
Publication of JP2008140795A5 publication Critical patent/JP2008140795A5/ja
Application granted granted Critical
Publication of JP5025236B2 publication Critical patent/JP5025236B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006322526A 2006-11-29 2006-11-29 露光装置及び方法、並びに、デバイス製造方法 Expired - Fee Related JP5025236B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006322526A JP5025236B2 (ja) 2006-11-29 2006-11-29 露光装置及び方法、並びに、デバイス製造方法
TW096143203A TWI397780B (zh) 2006-11-29 2007-11-15 曝光設備、曝光方法、和裝置製造方法
US11/943,885 US7936442B2 (en) 2006-11-29 2007-11-21 Exposure apparatus, exposure method, and device fabrication method
KR1020070122385A KR100913271B1 (ko) 2006-11-29 2007-11-29 노광장치, 노광방법, 및 디바이스의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006322526A JP5025236B2 (ja) 2006-11-29 2006-11-29 露光装置及び方法、並びに、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008140795A JP2008140795A (ja) 2008-06-19
JP2008140795A5 true JP2008140795A5 (https=) 2010-01-21
JP5025236B2 JP5025236B2 (ja) 2012-09-12

Family

ID=39463333

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006322526A Expired - Fee Related JP5025236B2 (ja) 2006-11-29 2006-11-29 露光装置及び方法、並びに、デバイス製造方法

Country Status (4)

Country Link
US (1) US7936442B2 (https=)
JP (1) JP5025236B2 (https=)
KR (1) KR100913271B1 (https=)
TW (1) TWI397780B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI456356B (zh) * 2009-04-09 2014-10-11 Nsk Technology Co Ltd 曝光裝置用之光照射裝置及其點亮控制方法、曝光裝置及基板
JP6506670B2 (ja) * 2015-10-07 2019-04-24 キヤノン株式会社 露光装置及びデバイス製造方法
US10274836B2 (en) * 2017-06-23 2019-04-30 International Business Machines Corporation Determination of lithography effective dose uniformity

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0225016A (ja) 1988-07-13 1990-01-26 Nec Corp 露光装置
JP2842879B2 (ja) * 1989-01-06 1999-01-06 株式会社日立製作所 表面分析方法および装置
US5389555A (en) * 1989-12-21 1995-02-14 Olympus Optical Co., Ltd. Particle pattern judging method
US5172421A (en) * 1991-03-27 1992-12-15 Hughes Aircraft Company Automated method of classifying optical fiber flaws
JP3314440B2 (ja) * 1993-02-26 2002-08-12 株式会社日立製作所 欠陥検査装置およびその方法
AU1175799A (en) * 1997-11-21 1999-06-15 Nikon Corporation Projection aligner and projection exposure method
JP4066083B2 (ja) * 1998-02-09 2008-03-26 株式会社ニコン 光学素子光洗浄方法および投影露光装置
JPH11288870A (ja) * 1998-04-03 1999-10-19 Nikon Corp 露光装置
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置
US7659976B2 (en) * 2005-12-12 2010-02-09 Carl Zeiss Smt Ag Devices and methods for inspecting optical elements with a view to contamination

Similar Documents

Publication Publication Date Title
JP6723269B2 (ja) 焦点感応オーバーレイターゲットを使用する焦点決定のためのシステムおよび方法
JP5843241B2 (ja) 検査装置、及び検査方法
JP2013034013A5 (https=)
JP2011040547A5 (https=)
JP2007248086A5 (https=)
JPH0139207B2 (https=)
JP2008171960A5 (https=)
JP2008109104A (ja) 角度分解分光リソグラフィキャラクタライゼイション方法およびデバイス
JP2011040549A5 (https=)
JP2009016761A5 (https=)
JP2010192470A5 (https=)
JP2009182253A5 (https=)
EP3598112B1 (en) Cylindrical body surface inspection device and cylindrical body surface inspection method
JP5322841B2 (ja) マスク欠陥の形状測定方法及びマスク良否判定方法
JP2015511405A5 (https=)
JP5808015B2 (ja) 欠陥検査方法
US20100309309A1 (en) Method for precisely detecting crack width
JP6038434B2 (ja) 欠陥検査装置
JP2008140795A5 (https=)
JP2012008078A (ja) 欠陥検査装置
JP2010192667A5 (https=)
JP5048558B2 (ja) 基板検査方法および基板検査装置
JP2005003691A5 (https=)
JP2004163129A (ja) 欠陥検査方法
JP4496257B2 (ja) 欠陥検査装置