JPH0139207B2 - - Google Patents

Info

Publication number
JPH0139207B2
JPH0139207B2 JP56004153A JP415381A JPH0139207B2 JP H0139207 B2 JPH0139207 B2 JP H0139207B2 JP 56004153 A JP56004153 A JP 56004153A JP 415381 A JP415381 A JP 415381A JP H0139207 B2 JPH0139207 B2 JP H0139207B2
Authority
JP
Japan
Prior art keywords
exposure
light
sample stage
photoelectric conversion
conversion means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56004153A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57117238A (en
Inventor
Toshio Matsura
Kyoichi Suwa
Toshuki Shimizu
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP56004153A priority Critical patent/JPS57117238A/ja
Priority to US06/335,733 priority patent/US4465368A/en
Publication of JPS57117238A publication Critical patent/JPS57117238A/ja
Priority to US06/895,132 priority patent/USRE32795E/en
Publication of JPH0139207B2 publication Critical patent/JPH0139207B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56004153A 1981-01-14 1981-01-14 Exposing and baking device for manufacturing integrated circuit with illuminometer Granted JPS57117238A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56004153A JPS57117238A (en) 1981-01-14 1981-01-14 Exposing and baking device for manufacturing integrated circuit with illuminometer
US06/335,733 US4465368A (en) 1981-01-14 1981-12-30 Exposure apparatus for production of integrated circuit
US06/895,132 USRE32795E (en) 1981-01-14 1986-08-11 Exposure apparatus for production of integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56004153A JPS57117238A (en) 1981-01-14 1981-01-14 Exposing and baking device for manufacturing integrated circuit with illuminometer

Publications (2)

Publication Number Publication Date
JPS57117238A JPS57117238A (en) 1982-07-21
JPH0139207B2 true JPH0139207B2 (https=) 1989-08-18

Family

ID=11576807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56004153A Granted JPS57117238A (en) 1981-01-14 1981-01-14 Exposing and baking device for manufacturing integrated circuit with illuminometer

Country Status (2)

Country Link
US (2) US4465368A (https=)
JP (1) JPS57117238A (https=)

Families Citing this family (162)

* Cited by examiner, † Cited by third party
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US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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