KR100913271B1 - 노광장치, 노광방법, 및 디바이스의 제조방법 - Google Patents

노광장치, 노광방법, 및 디바이스의 제조방법 Download PDF

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Publication number
KR100913271B1
KR100913271B1 KR1020070122385A KR20070122385A KR100913271B1 KR 100913271 B1 KR100913271 B1 KR 100913271B1 KR 1020070122385 A KR1020070122385 A KR 1020070122385A KR 20070122385 A KR20070122385 A KR 20070122385A KR 100913271 B1 KR100913271 B1 KR 100913271B1
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KR
South Korea
Prior art keywords
light
optical system
exposure
amount
reticle
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Expired - Fee Related
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KR1020070122385A
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English (en)
Korean (ko)
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KR20080048966A (ko
Inventor
켄이치로 모리
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캐논 가부시끼가이샤
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Publication of KR20080048966A publication Critical patent/KR20080048966A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020070122385A 2006-11-29 2007-11-29 노광장치, 노광방법, 및 디바이스의 제조방법 Expired - Fee Related KR100913271B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006322526A JP5025236B2 (ja) 2006-11-29 2006-11-29 露光装置及び方法、並びに、デバイス製造方法
JPJP-P-2006-00322526 2006-11-29

Publications (2)

Publication Number Publication Date
KR20080048966A KR20080048966A (ko) 2008-06-03
KR100913271B1 true KR100913271B1 (ko) 2009-08-21

Family

ID=39463333

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KR1020070122385A Expired - Fee Related KR100913271B1 (ko) 2006-11-29 2007-11-29 노광장치, 노광방법, 및 디바이스의 제조방법

Country Status (4)

Country Link
US (1) US7936442B2 (https=)
JP (1) JP5025236B2 (https=)
KR (1) KR100913271B1 (https=)
TW (1) TWI397780B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI456356B (zh) * 2009-04-09 2014-10-11 Nsk Technology Co Ltd 曝光裝置用之光照射裝置及其點亮控制方法、曝光裝置及基板
JP6506670B2 (ja) * 2015-10-07 2019-04-24 キヤノン株式会社 露光装置及びデバイス製造方法
US10274836B2 (en) * 2017-06-23 2019-04-30 International Business Machines Corporation Determination of lithography effective dose uniformity

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11288870A (ja) 1998-04-03 1999-10-19 Nikon Corp 露光装置
KR20070062416A (ko) * 2005-12-12 2007-06-15 칼 짜이스 에스엠테 아게 오염을 고려한 광학 소자 검사기구 및 검사방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0225016A (ja) 1988-07-13 1990-01-26 Nec Corp 露光装置
JP2842879B2 (ja) * 1989-01-06 1999-01-06 株式会社日立製作所 表面分析方法および装置
US5389555A (en) * 1989-12-21 1995-02-14 Olympus Optical Co., Ltd. Particle pattern judging method
US5172421A (en) * 1991-03-27 1992-12-15 Hughes Aircraft Company Automated method of classifying optical fiber flaws
JP3314440B2 (ja) * 1993-02-26 2002-08-12 株式会社日立製作所 欠陥検査装置およびその方法
AU1175799A (en) * 1997-11-21 1999-06-15 Nikon Corporation Projection aligner and projection exposure method
JP4066083B2 (ja) * 1998-02-09 2008-03-26 株式会社ニコン 光学素子光洗浄方法および投影露光装置
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11288870A (ja) 1998-04-03 1999-10-19 Nikon Corp 露光装置
KR20070062416A (ko) * 2005-12-12 2007-06-15 칼 짜이스 에스엠테 아게 오염을 고려한 광학 소자 검사기구 및 검사방법

Also Published As

Publication number Publication date
JP2008140795A (ja) 2008-06-19
US7936442B2 (en) 2011-05-03
US20080123068A1 (en) 2008-05-29
KR20080048966A (ko) 2008-06-03
TWI397780B (zh) 2013-06-01
JP5025236B2 (ja) 2012-09-12
TW200837504A (en) 2008-09-16

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