JP2008042208A - 酸素含有炭化ケイ素膜を形成するための方法 - Google Patents
酸素含有炭化ケイ素膜を形成するための方法 Download PDFInfo
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 114
- 238000000034 method Methods 0.000 title claims abstract description 61
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title description 17
- 239000001301 oxygen Substances 0.000 title description 16
- 239000011261 inert gas Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000006243 chemical reaction Methods 0.000 claims abstract description 31
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 30
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 26
- 239000002243 precursor Substances 0.000 claims abstract description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 23
- 229910018557 Si O Inorganic materials 0.000 claims abstract description 18
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 claims description 70
- 239000010949 copper Substances 0.000 claims description 48
- 230000004888 barrier function Effects 0.000 claims description 26
- 230000035515 penetration Effects 0.000 claims description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 229910052734 helium Inorganic materials 0.000 claims description 6
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 229910052743 krypton Inorganic materials 0.000 claims description 5
- 238000000206 photolithography Methods 0.000 claims description 4
- 229910052724 xenon Inorganic materials 0.000 claims description 4
- 230000008033 biological extinction Effects 0.000 claims description 3
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 3
- 238000001459 lithography Methods 0.000 abstract description 10
- 230000007423 decrease Effects 0.000 abstract description 8
- 230000006866 deterioration Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 299
- 238000009792 diffusion process Methods 0.000 description 25
- 239000004065 semiconductor Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 18
- 239000012528 membrane Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 13
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 11
- 239000000654 additive Substances 0.000 description 10
- 230000000903 blocking effect Effects 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- 230000000996 additive effect Effects 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 238000003848 UV Light-Curing Methods 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 230000001603 reducing effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- 229910008051 Si-OH Inorganic materials 0.000 description 4
- 229910006358 Si—OH Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 239000007800 oxidant agent Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- -1 silicon hydrocarbon Chemical class 0.000 description 2
- 0 C1C2C1CCC*2 Chemical compound C1C2C1CCC*2 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910002656 O–Si–O Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910020177 SiOF Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- BQLQQEHXQQLKEV-UHFFFAOYSA-N dimethoxy-methyl-trimethylsilylsilane Chemical compound CO[Si](C)(OC)[Si](C)(C)C BQLQQEHXQQLKEV-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007589 penetration resistance test Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000011041 water permeability test Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
【解決手段】反応空間の中に置かれた基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を形成させるための方法であって、Si、C、O、およびHを含み、その分子内に少なくとも1個のSi−O結合を有する前駆体を導入する工程と、前記反応空間の中に不活性ガスを導入する工程と、前記反応空間にRF電力を印加するが、ここで、前記不活性ガスの流量(sccm)の前記RF電力(W/cm2)に対する比率を、30〜850に調節する工程と、それによって、前記基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を堆積させる工程を含む方法。
【選択図】図1
Description
1.6・ρ≦k≦1.6・ρ+1.0
1.6・ρ≦k≦1.6・ρ+1.0
ここで、上述の目的の一つまたは複数を達成することが可能である。
1.6・ρ≦k≦1.6・ρ+1.0
(1.6・ρ+a)≦k≦(1.6・ρ+b)
ここで、a=0〜0.5、b=0.5〜1.0である。
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:500sccm
27.12MHzにおける電力:400W(1.2W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:3.9(200nm)
リーク電流(2MV/cm):1.59E−10
耐圧:6.9MV/cm
弾性率:70GPa
膜密度:2.2g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=393
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:400sccm
27.12MHzにおける電力:400W(1.2W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:3.8(200nm)
リーク電流(2MV/cm):3.12E−10
耐圧:7MV/cm
弾性率:65GPa
膜密度:2.05g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=314
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:300sccm
27.12MHzにおける電力:400W(1.2W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:3.6(200nm)
リーク電流(2MV/cm):2.77E−10
弾性率:55GPa
膜密度:1.9g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=236
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:600sccm
27.12MHzにおける電力:400W(1.2W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:3.98(200nm)
リーク電流(2MV/cm):4.12E−10
弾性率:89GPa
膜密度:2.3g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=471
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:200sccm
27.12MHzにおける電力:300W(0.9W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:3.5(200nm)
リーク電流(2MV/cm):3.1E−10
弾性率:50GPa
膜密度:1.8g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=209
膜厚:50nm
サセプター温度:390℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:100sccm
27.12MHzにおける電力:400W(1.2W/cm2)
430kHzにおける電力:100W(0.3W/cm2)
誘電率:2.9(200nm)
リーク電流(2MV/cm):5.0E−10
弾性率:20GPa
膜密度:1.5g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=79
膜厚:50nm
サセプター温度:430℃
DM−DMOS流量:100sccm
圧力:630Pa
He流量:1000sccm
27.12MHzにおける電力:900W(2.8W/cm2)
誘電率:3.85(200nm)
リーク電流(2MV/cm):2.00E−10
耐圧:7MV/cm
弾性率:55GPa
膜密度:2.1g/cm3
193nmにおけるnおよびk:1.8(n)、0.15(k)
不活性ガス流量(sccm)/高周波電力(W/cm2)=349
膜厚:50nm
サセプター温度:430℃
DMDMOS流量:100sccm
圧力:800Pa
He流量:100sccm
27MHzにおける電力:500W(1.5W/cm2)
430kHzにおける電力:50W(0.1W/cm2)
誘電率:2.75
リーク電流(2MV/cm):2.0E−9
耐圧:6.0MV/cm
弾性率:25GPa
膜密度:1.4g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=63
膜厚:50nm
サセプター温度:430℃
DMDMOS流量:100sccm
圧力:800Pa
He流量:3000sccm
27MHzにおける電力:500W(1.5W/cm2)
430kHzにおける電力:50W(0.1W/cm2)
誘電率:5
リーク電流(2MV/cm):7.0E−10
耐圧:6.0MV/cm
弾性率:100GPa
膜密度:2.4g/cm3
不活性ガス流量(sccm)/高周波電力(W/cm2)=1,885
比較例(従来技術の例)2〜6においては、下記の表1に示した膜堆積条件下で炭化ケイ素膜を堆積させ、得られた膜の誘電率と密度を測定した。得られた膜は、比較例2においてはNを含むSiC膜、比較例3においてはNを含むSiC膜、比較例4においてはNを含むSiC膜、比較例5においてはOを含むSiC膜、そして比較例6においてはSiC膜であった。それらの結果を表2に示す。
k=1.591・ρ+b
ここで、bは0.523(±0.3)の定数である。
(1.6・ρ+a)≦k≦(1.6・ρ+b)
ここでa=0、b=1.0である。
膜厚:50nm
サセプター温度:375℃
DMDMOS流量:150sccm
圧力:630Pa
He流量:1500sccm
27.12MHzにおける電力:1100W(3.50W/cm2)
誘電率:4.5(200nm)
リーク電流(2MV/cm):2.40E−9
耐圧:8MV/cm
弾性率:57GPa
膜密度:2.2g/cm3
193nmにおけるnおよびk:1.8(n)、0.21(k)
不活性ガスの流量/高周波電力=1.36sccm/W(428sccm/W/cm2)
膜厚:50nm
サセプター温度:430℃
DMDMOS流量:100sccm
圧力:630Pa
He流量:1500sccm
27MHzMHzにおける電力:700W(2.23W/cm2)
誘電率:4.3(200nm)
リーク電流(2MV/cm):3.0E−9
耐圧:6.0MV/cm
弾性率:130GPa
膜密度:2.1g/cm3
不活性ガスの流量/高周波電力=2.14sccm/W(673sccm/W/cm2)
(1.6・ρ+a)≦k≦(1.6・ρ+b)
ここでa=0、b=1.0である。
膜厚:50nm
サセプター温度:375℃
DMOTMDS流量:100sccm
TMB(C6H3(CH3)3)流量:50sccm
圧力:533Pa
He流量:1SLM
27MHzにおける電力:400W(1.27W/cm2)
400kHzにおける電力:50W
誘電率:3.0(200nm)
リーク電流(2MV/cm):2.7E−9
耐圧:6.0MV/cm
弾性率:30GPa
膜密度:1.55g/cm3
不活性ガスの流量/高周波電力=2.5sccm/W(785sccm/W/cm2)
膜厚:50nm
サセプター温度:375℃
DMOTMDS:300sccm
TMB流量:200sccm
圧力:266Pa
He流量:900sccm
27MHzにおける電力:500W(1.59W/cm2)
400kHzにおける電力:100W
誘電率:3.3(200nm)
リーク電流(2MV/cm):1.5E−9
耐圧:6.0MV/cm
弾性率:50GPa
膜密度:1.60g/cm3
不活性ガスの流量/高周波電力=1.8sccm/W(565sccm/W/cm2)
膜厚:50nm
サセプター温度:375℃
HMDSO流量:150sccm
TMB流量:150sccm
圧力:533Pa
He流量:1000sccm
27MHzにおける電力:400W(1.27W/cm2)
400kHzにおける電力:50W
誘電率:3.2(200nm)
リーク電流(2MV/cm):1.5E−9
耐圧:6.0MV/cm
弾性率:45GPa
膜密度:1.55g/cm3
不活性ガスの流量/高周波電力=2.5sccm/W(785sccm/W/cm2)
膜厚:50nm
サセプター温度:430℃
DMDMOS流量:100sccm
TMB流量:0sccm
圧力:630Pa
He流量:1000sccm
27.12MHzにおける電力:900W(2.86W/cm2)
誘電率:3.95(200nm)
リーク電流(2MV/cm):2.00E−10
耐圧:7MV/cm
弾性率:55GPa
膜密度:2.0g/cm3
193nmにおけるnおよびk:1.8(n)、0.15(k)
不活性ガスの流量/高周波電力=1.1sccm/W(349sccm/W/cm2)
膜厚:50nm
サセプター温度:375℃
DMDMOS流量:150sccm
TMB流量:30sccm
圧力:630Pa
He流量:1000sccm
13.56MHzにおける電力:1000W(3.18W/cm2)
400kHzにおける電力:150W
誘電率:2.8(200nm)
リーク電流(2MV/cm):7.90E−10
耐圧:7.2MV/cm
弾性率:39GPa
膜密度:1.5g/cm3
193nmにおけるnおよびk:1.6(n)、0.12(k)
不活性ガスの流量/高周波電力=1.0sccm/W(314sccm/W/cm2)
膜厚:50nm
サセプター温度:395℃
DMDMOS流量:150sccm
圧力:630Pa
He流量:300sccm
CO2流量:2000sccm
27MHzにおける電力:300W(0.95W/cm2)
400kHzにおける電力:100W
誘電率:3.5(200nm)
リーク電流(2MV/cm):2.5E−10
耐圧:6.0MV/cm
弾性率:100GPa
膜密度:1.9g/cm3
不活性ガスの流量/高周波電力=1.0sccm/W(314sccm/W/cm2)
膜厚:50nm
サセプター温度:390℃
DMDMOS流量:150sccm
圧力:630Pa
He流量:150sccm
H2流量:200sccm
27MHzにおける電力:300W(0.95W/cm2)
400kHzにおける電力:100W
誘電率:3.4(200nm)
リーク電流(2MV/cm):3.0E−9
耐圧:6.0MV/cm
弾性率:80GPa
膜密度:1.7g/cm3
不活性ガスの流量/高周波電力=1.5sccm/W(157sccm/W/cm2)
1)半導体基板の上に堆積させるバリヤー膜または反射防止膜を形成させる方法であるが、ここで、具体的には、SiaCbOcHdまたはSiaCbOcNdHe(これらの化学式において、a、b、c、dおよびeは任意の整数である)で表される炭化ケイ素膜が形成される。上述の炭化ケイ素膜は、Si−O結合を有する前駆体を使用することにより、従来からの炭化ケイ素膜に比較して、高い密度と安定性を得ている。
2)上述の1)に記載の方法であるが、ここで、Si−O結合を有する材料を選択していることが理由で、酸化剤は使用しない。
3)上述の1)または2)に記載の方法であるが、ここで、その不活性ガスの流量のRF電力に対する比率を調節して、4.0以下の誘電率において高い密度を達成し、さらにCu−拡散ブロッキング機能も与える。
4)上述の3)に記載の方法であるが、ここで、その不活性ガス(sccm)の前記RF電力(W)に対する比率が、(直径200mmの基板を基準として)(4:1)から(1:6)までの範囲である。
5)上述の1)〜4)のいずれかの項目に記載の方法であるが、ここで、その不活性ガスの流量が1100sccm未満である。
6)上述の1)〜5)のいずれかの項目に記載の方法であるが、ここで、反射防止膜の機能を有する膜が、炭化ケイ素膜に加えて、リソグラフィのために形成される。
7)上述の1)〜6)のいずれかの項目に記載の方法であるが、ここで、安定性をさらに向上させ、絶縁膜に関しての選択性を改良するために、その膜の中に窒素基が含まれている。
8)上述の1)〜7)のいずれかの項目に記載の方法であるが、ここで、そのシリコン炭化水素化合物が、米国特許第6,455,445号明細書に開示されている物質に相当している。
9)上述の1)〜8)のいずれかの項目に記載の方法であるが、ここで、その希釈ガスが、N2、He、Ar、Kr、Xeおよびそれらすべての組合せの中から選択される。
10)上述の1)〜9)のいずれかの項目に記載の方法であるが、ここで、その希釈ガス流量が、10sccm〜1000sccmの範囲内である。
11)上述の1)〜10)のいずれかの項目に記載の方法であるが、その処理される半導体基板の温度が、50℃〜550℃の範囲内である。
12)上述の1)〜11)のいずれかの項目に記載の方法であるが、ここで、使用される高周波電力の周波数が、13.56MHz、27MHzおよび60MHzから選択される。
13)上述の1)〜12)のいずれかの項目に記載の方法であるが、ここで、2種の周波数を組み合わせた電力、具体的には、13.56MHz、27MHzまたは60MHzの高周波電力と、5MHz以下(430kHz、400kHzなど)の低周波電力とを使用する。
2 上側電極
3 下側電極
4 高周波(RF)発生器
5、16 半導体基板
6 ガス入口ポート
7 RF供給ポート
8 排気ポート
11 硬化チャンバー
12 UVランプ
13 サセプターヒーター
14 排気ポート
15 ガス入口ポート
Claims (27)
- 反応空間中に置かれた基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を形成させるための方法であって:
前記反応空間の中に、Si、C、O、およびHを含み、そしてその分子内に少なくとも1個のSi−O結合を有する前駆体を導入する工程;
前記反応空間の中に不活性ガスを導入する工程;
前記反応空間にRF電力を印加するが、ここで、前記不活性ガスの流量(sccm)の前記RF電力(W/cm2)に対する比率を、0より大であるが850以下に調節する、工程;および
それによって、前記基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を堆積させる工程、
を含む方法。 - 不活性ガスの流量のRF電力に対する前記比率を調節して、前記堆積してくる炭化ケイ素膜の誘電率(k)と密度(ρ、g/cm3)が次式を満足させるように合わせる、
1.6・ρ≦k≦1.6・ρ+1.0
請求項1に記載の方法。 - 前記反応空間において、前記RF電力を0.3〜7W/cm2で印加し、前記不活性ガスを20〜1,100sccmの流量で導入する、請求項1に記載の方法。
- 不活性ガスの流量(sccm)のRF電力(W/cm2)に対する前記比率を、30〜550に調節する、請求項1に記載の方法。
- 前記前駆体に酸化性ガスをまったく添加しない、請求項1に記載の方法。
- 前記前駆体と前記不活性ガスとだけを、前記反応空間の中に導入する、請求項1に記載の方法。
- 前記堆積してきた炭化ケイ素膜が、2.8〜3.8の誘電率を有する、請求項1に記載の方法。
- 前記堆積してきた炭化ケイ素膜が、1.4〜2.0g/cm3の密度を有する、請求項1に記載の方法。
- 炭化ケイ素膜を形成させる工程より前に銅層を形成させる工程をさらに含み、ここで、前記炭化ケイ素膜が、バリヤー層として前記銅層の上に形成される、請求項1に記載の方法。
- 炭化ケイ素膜を形成させる工程より前にフォトリソグラフィにより被エッチング層を形成させる工程をさらに含み、ここで、前記炭化ケイ素膜が、反射防止層として前記被エッチング層の上に形成される、請求項1に記載の方法。
- 前記反射防止層が193nmにおいて、1.4〜2.0のn値および0.10〜0.45のk値を有する、請求項10に記載の方法。
- 前記炭化ケイ素膜が、10〜50nmの厚みで堆積される、請求項1に記載の方法。
- 前記前駆体ガスが、一般式SiaObCxHy(ここでa、b、x、およびyは任意の整数である)を有する有機ケイ素ガスである、請求項1に記載の方法。
- 前記有機ケイ素ガスが、以下のものからなる群より選択されるものの内の少なくとも一つである、請求項13に記載の方法。
- 前記不活性ガスが、He、Ar、Kr、およびXeからなる群より選択される、請求項1に記載の方法。
- 前記RF電力が、高周波数および低周波数を有し、前記高周波数が13.56MHz、27MHz、または60MHzであり、前記低周波数が5MHz以下である、請求項1に記載の方法。
- 前記不活性ガスが、Si、C、O、H、およびNを含む炭化ケイ素膜の中にNを組み入れるための窒素ガスである、請求項1に記載の方法。
- 反応空間中に置かれた基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を形成させるための方法であって:
前記反応空間の中に、Si、C、O、およびHを含み、その分子内に少なくとも1個のSi−O結合を有する前駆体、ならびに不活性ガスを導入する工程;
前記反応空間にRF電力を印加する工程;および
前記堆積してくる炭化ケイ素膜の誘電率(k)および密度(ρ、g/cm3)が次式を満足させるように調節しながら、前記基板の上に、Si、C、O、H、および場合によってはNを含む炭化ケイ素膜を堆積させる工程:
1.6・ρ≦k≦1.6・ρ+1.0
を含む方法。 - 炭化ケイ素膜を堆積させるための前記工程に、前記不活性ガスの流量(sccm)の前記RF電力(W/cm2)に対する比率が30〜850になるように調節することを含む、請求項18に記載の方法。
- 前記前駆体および前記不活性ガスを導入する工程において、前記前駆体ガスおよび前記不活性ガス以外のガスを使用しない、請求項18に記載の方法。
- 次式を満足させる誘電率(k)および密度(ρ、g/cm3)を有する炭化ケイ素膜。
1.6・ρ≦k≦1.6・ρ+1.0 - 2.8〜3.8の誘電率を有する、請求項21に記載の炭化ケイ素膜。
- 1.4〜2.0g/cm3の密度を有する、請求項21に記載の炭化ケイ素膜。
- 炭化ケイ素膜を銅層の上に堆積させ、400℃で4時間保持させたときに、20nm以下の銅浸透深さを有する、請求項21に記載の炭化ケイ素膜。
- 湿分の浸透防止性能を有する、請求項21に記載の炭化ケイ素膜。
- 193nmにおいて、1.4〜2.0の屈折率(n)および0.10〜0.45の吸光係数(k)を有する、請求項21に記載の炭化ケイ素膜。
- 窒素をまったく含まない、請求項26に記載の炭化ケイ素膜。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021509765A (ja) * | 2018-11-30 | 2021-04-01 | ハンソル ケミカル カンパニー リミテッドHansol Chemical Co., Ltd. | シリコン前駆体およびこれを用いたシリコン含有薄膜の製造方法 |
Families Citing this family (340)
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---|---|---|---|---|
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US9394608B2 (en) | 2009-04-06 | 2016-07-19 | Asm America, Inc. | Semiconductor processing reactor and components thereof |
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KR102300403B1 (ko) | 2014-11-19 | 2021-09-09 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 |
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US10501866B2 (en) | 2016-03-09 | 2019-12-10 | Asm Ip Holding B.V. | Gas distribution apparatus for improved film uniformity in an epitaxial system |
US10343920B2 (en) | 2016-03-18 | 2019-07-09 | Asm Ip Holding B.V. | Aligned carbon nanotubes |
US9892913B2 (en) | 2016-03-24 | 2018-02-13 | Asm Ip Holding B.V. | Radial and thickness control via biased multi-port injection settings |
US10087522B2 (en) | 2016-04-21 | 2018-10-02 | Asm Ip Holding B.V. | Deposition of metal borides |
US10865475B2 (en) | 2016-04-21 | 2020-12-15 | Asm Ip Holding B.V. | Deposition of metal borides and silicides |
US10190213B2 (en) | 2016-04-21 | 2019-01-29 | Asm Ip Holding B.V. | Deposition of metal borides |
US10032628B2 (en) | 2016-05-02 | 2018-07-24 | Asm Ip Holding B.V. | Source/drain performance through conformal solid state doping |
US10367080B2 (en) | 2016-05-02 | 2019-07-30 | Asm Ip Holding B.V. | Method of forming a germanium oxynitride film |
KR102592471B1 (ko) | 2016-05-17 | 2023-10-20 | 에이에스엠 아이피 홀딩 비.브이. | 금속 배선 형성 방법 및 이를 이용한 반도체 장치의 제조 방법 |
US11453943B2 (en) | 2016-05-25 | 2022-09-27 | Asm Ip Holding B.V. | Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor |
US10388509B2 (en) | 2016-06-28 | 2019-08-20 | Asm Ip Holding B.V. | Formation of epitaxial layers via dislocation filtering |
US10612137B2 (en) | 2016-07-08 | 2020-04-07 | Asm Ip Holdings B.V. | Organic reactants for atomic layer deposition |
US9859151B1 (en) | 2016-07-08 | 2018-01-02 | Asm Ip Holding B.V. | Selective film deposition method to form air gaps |
US9793135B1 (en) | 2016-07-14 | 2017-10-17 | ASM IP Holding B.V | Method of cyclic dry etching using etchant film |
US10714385B2 (en) | 2016-07-19 | 2020-07-14 | Asm Ip Holding B.V. | Selective deposition of tungsten |
US10381226B2 (en) | 2016-07-27 | 2019-08-13 | Asm Ip Holding B.V. | Method of processing substrate |
US10395919B2 (en) | 2016-07-28 | 2019-08-27 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
US9812320B1 (en) | 2016-07-28 | 2017-11-07 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
KR102532607B1 (ko) | 2016-07-28 | 2023-05-15 | 에이에스엠 아이피 홀딩 비.브이. | 기판 가공 장치 및 그 동작 방법 |
US9887082B1 (en) | 2016-07-28 | 2018-02-06 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
US10177025B2 (en) | 2016-07-28 | 2019-01-08 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
KR102613349B1 (ko) | 2016-08-25 | 2023-12-14 | 에이에스엠 아이피 홀딩 비.브이. | 배기 장치 및 이를 이용한 기판 가공 장치와 박막 제조 방법 |
US10090316B2 (en) | 2016-09-01 | 2018-10-02 | Asm Ip Holding B.V. | 3D stacked multilayer semiconductor memory using doped select transistor channel |
US10410943B2 (en) | 2016-10-13 | 2019-09-10 | Asm Ip Holding B.V. | Method for passivating a surface of a semiconductor and related systems |
US10643826B2 (en) | 2016-10-26 | 2020-05-05 | Asm Ip Holdings B.V. | Methods for thermally calibrating reaction chambers |
US11532757B2 (en) | 2016-10-27 | 2022-12-20 | Asm Ip Holding B.V. | Deposition of charge trapping layers |
US10643904B2 (en) | 2016-11-01 | 2020-05-05 | Asm Ip Holdings B.V. | Methods for forming a semiconductor device and related semiconductor device structures |
US10714350B2 (en) | 2016-11-01 | 2020-07-14 | ASM IP Holdings, B.V. | Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures |
US10435790B2 (en) | 2016-11-01 | 2019-10-08 | Asm Ip Holding B.V. | Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap |
US10229833B2 (en) | 2016-11-01 | 2019-03-12 | Asm Ip Holding B.V. | Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures |
US10134757B2 (en) | 2016-11-07 | 2018-11-20 | Asm Ip Holding B.V. | Method of processing a substrate and a device manufactured by using the method |
KR102546317B1 (ko) | 2016-11-15 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | 기체 공급 유닛 및 이를 포함하는 기판 처리 장치 |
US10340135B2 (en) | 2016-11-28 | 2019-07-02 | Asm Ip Holding B.V. | Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride |
KR20180068582A (ko) | 2016-12-14 | 2018-06-22 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11447861B2 (en) | 2016-12-15 | 2022-09-20 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus and a method of forming a patterned structure |
US11581186B2 (en) | 2016-12-15 | 2023-02-14 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus |
US9916980B1 (en) | 2016-12-15 | 2018-03-13 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
KR20180070971A (ko) | 2016-12-19 | 2018-06-27 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US10269558B2 (en) | 2016-12-22 | 2019-04-23 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US10867788B2 (en) | 2016-12-28 | 2020-12-15 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US11390950B2 (en) | 2017-01-10 | 2022-07-19 | Asm Ip Holding B.V. | Reactor system and method to reduce residue buildup during a film deposition process |
US10655221B2 (en) | 2017-02-09 | 2020-05-19 | Asm Ip Holding B.V. | Method for depositing oxide film by thermal ALD and PEALD |
US10468261B2 (en) | 2017-02-15 | 2019-11-05 | Asm Ip Holding B.V. | Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures |
US10529563B2 (en) | 2017-03-29 | 2020-01-07 | Asm Ip Holdings B.V. | Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures |
KR102324630B1 (ko) * | 2017-03-29 | 2021-11-10 | 삼성전자주식회사 | 집적회로 소자의 제조 방법 |
US10283353B2 (en) | 2017-03-29 | 2019-05-07 | Asm Ip Holding B.V. | Method of reforming insulating film deposited on substrate with recess pattern |
US10103040B1 (en) | 2017-03-31 | 2018-10-16 | Asm Ip Holding B.V. | Apparatus and method for manufacturing a semiconductor device |
USD830981S1 (en) | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
KR102457289B1 (ko) | 2017-04-25 | 2022-10-21 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 및 반도체 장치의 제조 방법 |
US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
US10446393B2 (en) | 2017-05-08 | 2019-10-15 | Asm Ip Holding B.V. | Methods for forming silicon-containing epitaxial layers and related semiconductor device structures |
US10892156B2 (en) | 2017-05-08 | 2021-01-12 | Asm Ip Holding B.V. | Methods for forming a silicon nitride film on a substrate and related semiconductor device structures |
US10504742B2 (en) | 2017-05-31 | 2019-12-10 | Asm Ip Holding B.V. | Method of atomic layer etching using hydrogen plasma |
US10886123B2 (en) | 2017-06-02 | 2021-01-05 | Asm Ip Holding B.V. | Methods for forming low temperature semiconductor layers and related semiconductor device structures |
US11306395B2 (en) | 2017-06-28 | 2022-04-19 | Asm Ip Holding B.V. | Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus |
US10685834B2 (en) | 2017-07-05 | 2020-06-16 | Asm Ip Holdings B.V. | Methods for forming a silicon germanium tin layer and related semiconductor device structures |
KR20190009245A (ko) | 2017-07-18 | 2019-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자 구조물 형성 방법 및 관련된 반도체 소자 구조물 |
US11018002B2 (en) | 2017-07-19 | 2021-05-25 | Asm Ip Holding B.V. | Method for selectively depositing a Group IV semiconductor and related semiconductor device structures |
US10541333B2 (en) | 2017-07-19 | 2020-01-21 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US11374112B2 (en) | 2017-07-19 | 2022-06-28 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US10590535B2 (en) | 2017-07-26 | 2020-03-17 | Asm Ip Holdings B.V. | Chemical treatment, deposition and/or infiltration apparatus and method for using the same |
US10605530B2 (en) | 2017-07-26 | 2020-03-31 | Asm Ip Holding B.V. | Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace |
US10312055B2 (en) | 2017-07-26 | 2019-06-04 | Asm Ip Holding B.V. | Method of depositing film by PEALD using negative bias |
US10770336B2 (en) | 2017-08-08 | 2020-09-08 | Asm Ip Holding B.V. | Substrate lift mechanism and reactor including same |
US10692741B2 (en) | 2017-08-08 | 2020-06-23 | Asm Ip Holdings B.V. | Radiation shield |
US10249524B2 (en) | 2017-08-09 | 2019-04-02 | Asm Ip Holding B.V. | Cassette holder assembly for a substrate cassette and holding member for use in such assembly |
US11139191B2 (en) | 2017-08-09 | 2021-10-05 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11769682B2 (en) | 2017-08-09 | 2023-09-26 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US10236177B1 (en) | 2017-08-22 | 2019-03-19 | ASM IP Holding B.V.. | Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures |
USD900036S1 (en) | 2017-08-24 | 2020-10-27 | Asm Ip Holding B.V. | Heater electrical connector and adapter |
US11830730B2 (en) | 2017-08-29 | 2023-11-28 | Asm Ip Holding B.V. | Layer forming method and apparatus |
KR102491945B1 (ko) | 2017-08-30 | 2023-01-26 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11056344B2 (en) | 2017-08-30 | 2021-07-06 | Asm Ip Holding B.V. | Layer forming method |
US11295980B2 (en) | 2017-08-30 | 2022-04-05 | Asm Ip Holding B.V. | Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures |
KR102401446B1 (ko) | 2017-08-31 | 2022-05-24 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US10607895B2 (en) | 2017-09-18 | 2020-03-31 | Asm Ip Holdings B.V. | Method for forming a semiconductor device structure comprising a gate fill metal |
KR102630301B1 (ko) | 2017-09-21 | 2024-01-29 | 에이에스엠 아이피 홀딩 비.브이. | 침투성 재료의 순차 침투 합성 방법 처리 및 이를 이용하여 형성된 구조물 및 장치 |
US10844484B2 (en) | 2017-09-22 | 2020-11-24 | Asm Ip Holding B.V. | Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US10658205B2 (en) | 2017-09-28 | 2020-05-19 | Asm Ip Holdings B.V. | Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber |
US10403504B2 (en) | 2017-10-05 | 2019-09-03 | Asm Ip Holding B.V. | Method for selectively depositing a metallic film on a substrate |
US10319588B2 (en) | 2017-10-10 | 2019-06-11 | Asm Ip Holding B.V. | Method for depositing a metal chalcogenide on a substrate by cyclical deposition |
US10923344B2 (en) | 2017-10-30 | 2021-02-16 | Asm Ip Holding B.V. | Methods for forming a semiconductor structure and related semiconductor structures |
KR102443047B1 (ko) | 2017-11-16 | 2022-09-14 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 방법 및 그에 의해 제조된 장치 |
US10910262B2 (en) | 2017-11-16 | 2021-02-02 | Asm Ip Holding B.V. | Method of selectively depositing a capping layer structure on a semiconductor device structure |
US11022879B2 (en) | 2017-11-24 | 2021-06-01 | Asm Ip Holding B.V. | Method of forming an enhanced unexposed photoresist layer |
TWI779134B (zh) | 2017-11-27 | 2022-10-01 | 荷蘭商Asm智慧財產控股私人有限公司 | 用於儲存晶圓匣的儲存裝置及批爐總成 |
WO2019103610A1 (en) | 2017-11-27 | 2019-05-31 | Asm Ip Holding B.V. | Apparatus including a clean mini environment |
US10290508B1 (en) | 2017-12-05 | 2019-05-14 | Asm Ip Holding B.V. | Method for forming vertical spacers for spacer-defined patterning |
US10872771B2 (en) | 2018-01-16 | 2020-12-22 | Asm Ip Holding B. V. | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures |
US11482412B2 (en) | 2018-01-19 | 2022-10-25 | Asm Ip Holding B.V. | Method for depositing a gap-fill layer by plasma-assisted deposition |
TW202325889A (zh) | 2018-01-19 | 2023-07-01 | 荷蘭商Asm 智慧財產控股公司 | 沈積方法 |
USD903477S1 (en) | 2018-01-24 | 2020-12-01 | Asm Ip Holdings B.V. | Metal clamp |
US11018047B2 (en) | 2018-01-25 | 2021-05-25 | Asm Ip Holding B.V. | Hybrid lift pin |
USD880437S1 (en) | 2018-02-01 | 2020-04-07 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
US10535516B2 (en) | 2018-02-01 | 2020-01-14 | Asm Ip Holdings B.V. | Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures |
US11081345B2 (en) | 2018-02-06 | 2021-08-03 | Asm Ip Holding B.V. | Method of post-deposition treatment for silicon oxide film |
US10896820B2 (en) | 2018-02-14 | 2021-01-19 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
CN111699278B (zh) | 2018-02-14 | 2023-05-16 | Asm Ip私人控股有限公司 | 通过循环沉积工艺在衬底上沉积含钌膜的方法 |
US10731249B2 (en) | 2018-02-15 | 2020-08-04 | Asm Ip Holding B.V. | Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus |
US10658181B2 (en) | 2018-02-20 | 2020-05-19 | Asm Ip Holding B.V. | Method of spacer-defined direct patterning in semiconductor fabrication |
KR102636427B1 (ko) | 2018-02-20 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 장치 |
US10975470B2 (en) | 2018-02-23 | 2021-04-13 | Asm Ip Holding B.V. | Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment |
US11473195B2 (en) | 2018-03-01 | 2022-10-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus and a method for processing a substrate |
US11629406B2 (en) | 2018-03-09 | 2023-04-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate |
US11114283B2 (en) | 2018-03-16 | 2021-09-07 | Asm Ip Holding B.V. | Reactor, system including the reactor, and methods of manufacturing and using same |
KR102646467B1 (ko) | 2018-03-27 | 2024-03-11 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상에 전극을 형성하는 방법 및 전극을 포함하는 반도체 소자 구조 |
US11230766B2 (en) | 2018-03-29 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
US11088002B2 (en) | 2018-03-29 | 2021-08-10 | Asm Ip Holding B.V. | Substrate rack and a substrate processing system and method |
US10510536B2 (en) | 2018-03-29 | 2019-12-17 | Asm Ip Holding B.V. | Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber |
KR102501472B1 (ko) | 2018-03-30 | 2023-02-20 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 |
KR20190128558A (ko) | 2018-05-08 | 2019-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 기판 상에 산화물 막을 주기적 증착 공정에 의해 증착하기 위한 방법 및 관련 소자 구조 |
TWI816783B (zh) | 2018-05-11 | 2023-10-01 | 荷蘭商Asm 智慧財產控股公司 | 用於基板上形成摻雜金屬碳化物薄膜之方法及相關半導體元件結構 |
KR102596988B1 (ko) | 2018-05-28 | 2023-10-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 방법 및 그에 의해 제조된 장치 |
US11718913B2 (en) | 2018-06-04 | 2023-08-08 | Asm Ip Holding B.V. | Gas distribution system and reactor system including same |
US11270899B2 (en) | 2018-06-04 | 2022-03-08 | Asm Ip Holding B.V. | Wafer handling chamber with moisture reduction |
US11286562B2 (en) | 2018-06-08 | 2022-03-29 | Asm Ip Holding B.V. | Gas-phase chemical reactor and method of using same |
US10797133B2 (en) | 2018-06-21 | 2020-10-06 | Asm Ip Holding B.V. | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures |
KR102568797B1 (ko) | 2018-06-21 | 2023-08-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 시스템 |
CN112292477A (zh) | 2018-06-27 | 2021-01-29 | Asm Ip私人控股有限公司 | 用于形成含金属的材料的循环沉积方法及包含含金属的材料的膜和结构 |
US11492703B2 (en) | 2018-06-27 | 2022-11-08 | Asm Ip Holding B.V. | Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material |
KR20200002519A (ko) | 2018-06-29 | 2020-01-08 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 및 반도체 장치의 제조 방법 |
US10612136B2 (en) | 2018-06-29 | 2020-04-07 | ASM IP Holding, B.V. | Temperature-controlled flange and reactor system including same |
US10755922B2 (en) | 2018-07-03 | 2020-08-25 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10388513B1 (en) | 2018-07-03 | 2019-08-20 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10767789B2 (en) | 2018-07-16 | 2020-09-08 | Asm Ip Holding B.V. | Diaphragm valves, valve components, and methods for forming valve components |
US10483099B1 (en) | 2018-07-26 | 2019-11-19 | Asm Ip Holding B.V. | Method for forming thermally stable organosilicon polymer film |
US11053591B2 (en) | 2018-08-06 | 2021-07-06 | Asm Ip Holding B.V. | Multi-port gas injection system and reactor system including same |
US10883175B2 (en) | 2018-08-09 | 2021-01-05 | Asm Ip Holding B.V. | Vertical furnace for processing substrates and a liner for use therein |
US10829852B2 (en) | 2018-08-16 | 2020-11-10 | Asm Ip Holding B.V. | Gas distribution device for a wafer processing apparatus |
US11430674B2 (en) | 2018-08-22 | 2022-08-30 | Asm Ip Holding B.V. | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US11024523B2 (en) | 2018-09-11 | 2021-06-01 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR20200030162A (ko) | 2018-09-11 | 2020-03-20 | 에이에스엠 아이피 홀딩 비.브이. | 박막 증착 방법 |
US11049751B2 (en) | 2018-09-14 | 2021-06-29 | Asm Ip Holding B.V. | Cassette supply system to store and handle cassettes and processing apparatus equipped therewith |
CN110970344A (zh) | 2018-10-01 | 2020-04-07 | Asm Ip控股有限公司 | 衬底保持设备、包含所述设备的系统及其使用方法 |
US11232963B2 (en) | 2018-10-03 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR102592699B1 (ko) | 2018-10-08 | 2023-10-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치 |
US10847365B2 (en) | 2018-10-11 | 2020-11-24 | Asm Ip Holding B.V. | Method of forming conformal silicon carbide film by cyclic CVD |
US10811256B2 (en) | 2018-10-16 | 2020-10-20 | Asm Ip Holding B.V. | Method for etching a carbon-containing feature |
KR102546322B1 (ko) | 2018-10-19 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
KR102605121B1 (ko) | 2018-10-19 | 2023-11-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 기판 처리 방법 |
USD948463S1 (en) | 2018-10-24 | 2022-04-12 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate supporting apparatus |
US10381219B1 (en) | 2018-10-25 | 2019-08-13 | Asm Ip Holding B.V. | Methods for forming a silicon nitride film |
US11087997B2 (en) | 2018-10-31 | 2021-08-10 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
KR20200051105A (ko) | 2018-11-02 | 2020-05-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 기판 처리 장치 |
US11572620B2 (en) | 2018-11-06 | 2023-02-07 | Asm Ip Holding B.V. | Methods for selectively depositing an amorphous silicon film on a substrate |
US11031242B2 (en) | 2018-11-07 | 2021-06-08 | Asm Ip Holding B.V. | Methods for depositing a boron doped silicon germanium film |
US10847366B2 (en) | 2018-11-16 | 2020-11-24 | Asm Ip Holding B.V. | Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process |
US10818758B2 (en) | 2018-11-16 | 2020-10-27 | Asm Ip Holding B.V. | Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures |
US10559458B1 (en) | 2018-11-26 | 2020-02-11 | Asm Ip Holding B.V. | Method of forming oxynitride film |
US11217444B2 (en) | 2018-11-30 | 2022-01-04 | Asm Ip Holding B.V. | Method for forming an ultraviolet radiation responsive metal oxide-containing film |
KR102636428B1 (ko) | 2018-12-04 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치를 세정하는 방법 |
US11158513B2 (en) | 2018-12-13 | 2021-10-26 | Asm Ip Holding B.V. | Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures |
TW202037745A (zh) | 2018-12-14 | 2020-10-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成裝置結構之方法、其所形成之結構及施行其之系統 |
TWI819180B (zh) | 2019-01-17 | 2023-10-21 | 荷蘭商Asm 智慧財產控股公司 | 藉由循環沈積製程於基板上形成含過渡金屬膜之方法 |
KR20200091543A (ko) | 2019-01-22 | 2020-07-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
CN111524788B (zh) | 2019-02-01 | 2023-11-24 | Asm Ip私人控股有限公司 | 氧化硅的拓扑选择性膜形成的方法 |
KR102626263B1 (ko) | 2019-02-20 | 2024-01-16 | 에이에스엠 아이피 홀딩 비.브이. | 처리 단계를 포함하는 주기적 증착 방법 및 이를 위한 장치 |
JP2020136677A (ja) | 2019-02-20 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基材表面内に形成された凹部を充填するための周期的堆積方法および装置 |
US11482533B2 (en) | 2019-02-20 | 2022-10-25 | Asm Ip Holding B.V. | Apparatus and methods for plug fill deposition in 3-D NAND applications |
JP2020136678A (ja) | 2019-02-20 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基材表面内に形成された凹部を充填するための方法および装置 |
JP2020133004A (ja) | 2019-02-22 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | 基材を処理するための基材処理装置および方法 |
KR20200108243A (ko) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | SiOC 층을 포함한 구조체 및 이의 형성 방법 |
KR20200108242A (ko) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 질화물 층을 선택적으로 증착하는 방법, 및 선택적으로 증착된 실리콘 질화물 층을 포함하는 구조체 |
US11742198B2 (en) | 2019-03-08 | 2023-08-29 | Asm Ip Holding B.V. | Structure including SiOCN layer and method of forming same |
KR20200116033A (ko) | 2019-03-28 | 2020-10-08 | 에이에스엠 아이피 홀딩 비.브이. | 도어 개방기 및 이를 구비한 기판 처리 장치 |
KR20200116855A (ko) | 2019-04-01 | 2020-10-13 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 소자를 제조하는 방법 |
US11447864B2 (en) | 2019-04-19 | 2022-09-20 | Asm Ip Holding B.V. | Layer forming method and apparatus |
KR20200125453A (ko) | 2019-04-24 | 2020-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 기상 반응기 시스템 및 이를 사용하는 방법 |
KR20200130121A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
KR20200130118A (ko) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 비정질 탄소 중합체 막을 개질하는 방법 |
KR20200130652A (ko) | 2019-05-10 | 2020-11-19 | 에이에스엠 아이피 홀딩 비.브이. | 표면 상에 재료를 증착하는 방법 및 본 방법에 따라 형성된 구조 |
JP2020188254A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
JP2020188255A (ja) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | ウェハボートハンドリング装置、縦型バッチ炉および方法 |
USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD947913S1 (en) | 2019-05-17 | 2022-04-05 | Asm Ip Holding B.V. | Susceptor shaft |
USD935572S1 (en) | 2019-05-24 | 2021-11-09 | Asm Ip Holding B.V. | Gas channel plate |
USD922229S1 (en) | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
KR20200141003A (ko) | 2019-06-06 | 2020-12-17 | 에이에스엠 아이피 홀딩 비.브이. | 가스 감지기를 포함하는 기상 반응기 시스템 |
KR20200143254A (ko) | 2019-06-11 | 2020-12-23 | 에이에스엠 아이피 홀딩 비.브이. | 개질 가스를 사용하여 전자 구조를 형성하는 방법, 상기 방법을 수행하기 위한 시스템, 및 상기 방법을 사용하여 형성되는 구조 |
USD944946S1 (en) | 2019-06-14 | 2022-03-01 | Asm Ip Holding B.V. | Shower plate |
USD931978S1 (en) | 2019-06-27 | 2021-09-28 | Asm Ip Holding B.V. | Showerhead vacuum transport |
KR20210005515A (ko) | 2019-07-03 | 2021-01-14 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치용 온도 제어 조립체 및 이를 사용하는 방법 |
JP7499079B2 (ja) | 2019-07-09 | 2024-06-13 | エーエスエム・アイピー・ホールディング・ベー・フェー | 同軸導波管を用いたプラズマ装置、基板処理方法 |
CN112216646A (zh) | 2019-07-10 | 2021-01-12 | Asm Ip私人控股有限公司 | 基板支撑组件及包括其的基板处理装置 |
KR20210010307A (ko) | 2019-07-16 | 2021-01-27 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20210010816A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 라디칼 보조 점화 플라즈마 시스템 및 방법 |
KR20210010820A (ko) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | 실리콘 게르마늄 구조를 형성하는 방법 |
US11643724B2 (en) | 2019-07-18 | 2023-05-09 | Asm Ip Holding B.V. | Method of forming structures using a neutral beam |
CN112242296A (zh) | 2019-07-19 | 2021-01-19 | Asm Ip私人控股有限公司 | 形成拓扑受控的无定形碳聚合物膜的方法 |
CN112309843A (zh) | 2019-07-29 | 2021-02-02 | Asm Ip私人控股有限公司 | 实现高掺杂剂掺入的选择性沉积方法 |
CN112309899A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112309900A (zh) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | 基板处理设备 |
US11587814B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11587815B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11227782B2 (en) | 2019-07-31 | 2022-01-18 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
CN112323048B (zh) | 2019-08-05 | 2024-02-09 | Asm Ip私人控股有限公司 | 用于化学源容器的液位传感器 |
USD965044S1 (en) | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD965524S1 (en) | 2019-08-19 | 2022-10-04 | Asm Ip Holding B.V. | Susceptor support |
JP2021031769A (ja) | 2019-08-21 | 2021-03-01 | エーエスエム アイピー ホールディング ビー.ブイ. | 成膜原料混合ガス生成装置及び成膜装置 |
USD930782S1 (en) | 2019-08-22 | 2021-09-14 | Asm Ip Holding B.V. | Gas distributor |
USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
USD949319S1 (en) | 2019-08-22 | 2022-04-19 | Asm Ip Holding B.V. | Exhaust duct |
USD940837S1 (en) | 2019-08-22 | 2022-01-11 | Asm Ip Holding B.V. | Electrode |
KR20210024423A (ko) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 홀을 구비한 구조체를 형성하기 위한 방법 |
US11286558B2 (en) | 2019-08-23 | 2022-03-29 | Asm Ip Holding B.V. | Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film |
KR20210024420A (ko) | 2019-08-23 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 비스(디에틸아미노)실란을 사용하여 peald에 의해 개선된 품질을 갖는 실리콘 산화물 막을 증착하기 위한 방법 |
KR20210029090A (ko) | 2019-09-04 | 2021-03-15 | 에이에스엠 아이피 홀딩 비.브이. | 희생 캡핑 층을 이용한 선택적 증착 방법 |
KR20210029663A (ko) | 2019-09-05 | 2021-03-16 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
US11562901B2 (en) | 2019-09-25 | 2023-01-24 | Asm Ip Holding B.V. | Substrate processing method |
CN112593212B (zh) | 2019-10-02 | 2023-12-22 | Asm Ip私人控股有限公司 | 通过循环等离子体增强沉积工艺形成拓扑选择性氧化硅膜的方法 |
KR20210042810A (ko) | 2019-10-08 | 2021-04-20 | 에이에스엠 아이피 홀딩 비.브이. | 활성 종을 이용하기 위한 가스 분배 어셈블리를 포함한 반응기 시스템 및 이를 사용하는 방법 |
CN112635282A (zh) | 2019-10-08 | 2021-04-09 | Asm Ip私人控股有限公司 | 具有连接板的基板处理装置、基板处理方法 |
KR20210043460A (ko) | 2019-10-10 | 2021-04-21 | 에이에스엠 아이피 홀딩 비.브이. | 포토레지스트 하부층을 형성하기 위한 방법 및 이를 포함한 구조체 |
US12009241B2 (en) | 2019-10-14 | 2024-06-11 | Asm Ip Holding B.V. | Vertical batch furnace assembly with detector to detect cassette |
TWI834919B (zh) | 2019-10-16 | 2024-03-11 | 荷蘭商Asm Ip私人控股有限公司 | 氧化矽之拓撲選擇性膜形成之方法 |
US11637014B2 (en) | 2019-10-17 | 2023-04-25 | Asm Ip Holding B.V. | Methods for selective deposition of doped semiconductor material |
KR20210047808A (ko) | 2019-10-21 | 2021-04-30 | 에이에스엠 아이피 홀딩 비.브이. | 막을 선택적으로 에칭하기 위한 장치 및 방법 |
KR20210050453A (ko) | 2019-10-25 | 2021-05-07 | 에이에스엠 아이피 홀딩 비.브이. | 기판 표면 상의 갭 피처를 충진하는 방법 및 이와 관련된 반도체 소자 구조 |
US11646205B2 (en) | 2019-10-29 | 2023-05-09 | Asm Ip Holding B.V. | Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same |
KR20210054983A (ko) | 2019-11-05 | 2021-05-14 | 에이에스엠 아이피 홀딩 비.브이. | 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템 |
US11501968B2 (en) | 2019-11-15 | 2022-11-15 | Asm Ip Holding B.V. | Method for providing a semiconductor device with silicon filled gaps |
KR20210062561A (ko) | 2019-11-20 | 2021-05-31 | 에이에스엠 아이피 홀딩 비.브이. | 기판의 표면 상에 탄소 함유 물질을 증착하는 방법, 상기 방법을 사용하여 형성된 구조물, 및 상기 구조물을 형성하기 위한 시스템 |
KR20210065848A (ko) | 2019-11-26 | 2021-06-04 | 에이에스엠 아이피 홀딩 비.브이. | 제1 유전체 표면과 제2 금속성 표면을 포함한 기판 상에 타겟 막을 선택적으로 형성하기 위한 방법 |
CN112951697A (zh) | 2019-11-26 | 2021-06-11 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112885692A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
CN112885693A (zh) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | 基板处理设备 |
JP2021090042A (ja) | 2019-12-02 | 2021-06-10 | エーエスエム アイピー ホールディング ビー.ブイ. | 基板処理装置、基板処理方法 |
KR20210070898A (ko) | 2019-12-04 | 2021-06-15 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 |
KR20210078405A (ko) | 2019-12-17 | 2021-06-28 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐 나이트라이드 층을 형성하는 방법 및 바나듐 나이트라이드 층을 포함하는 구조 |
US11527403B2 (en) | 2019-12-19 | 2022-12-13 | Asm Ip Holding B.V. | Methods for filling a gap feature on a substrate surface and related semiconductor structures |
JP2021109175A (ja) | 2020-01-06 | 2021-08-02 | エーエスエム・アイピー・ホールディング・ベー・フェー | ガス供給アセンブリ、その構成要素、およびこれを含む反応器システム |
US11993847B2 (en) | 2020-01-08 | 2024-05-28 | Asm Ip Holding B.V. | Injector |
TW202129068A (zh) | 2020-01-20 | 2021-08-01 | 荷蘭商Asm Ip控股公司 | 形成薄膜之方法及修飾薄膜表面之方法 |
TW202130846A (zh) | 2020-02-03 | 2021-08-16 | 荷蘭商Asm Ip私人控股有限公司 | 形成包括釩或銦層的結構之方法 |
KR20210100010A (ko) | 2020-02-04 | 2021-08-13 | 에이에스엠 아이피 홀딩 비.브이. | 대형 물품의 투과율 측정을 위한 방법 및 장치 |
US11776846B2 (en) | 2020-02-07 | 2023-10-03 | Asm Ip Holding B.V. | Methods for depositing gap filling fluids and related systems and devices |
TW202146715A (zh) | 2020-02-17 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 用於生長磷摻雜矽層之方法及其系統 |
TW202203344A (zh) | 2020-02-28 | 2022-01-16 | 荷蘭商Asm Ip控股公司 | 專用於零件清潔的系統 |
KR20210116249A (ko) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 록아웃 태그아웃 어셈블리 및 시스템 그리고 이의 사용 방법 |
KR20210116240A (ko) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | 조절성 접합부를 갖는 기판 핸들링 장치 |
CN113394086A (zh) | 2020-03-12 | 2021-09-14 | Asm Ip私人控股有限公司 | 用于制造具有目标拓扑轮廓的层结构的方法 |
KR20210124042A (ko) | 2020-04-02 | 2021-10-14 | 에이에스엠 아이피 홀딩 비.브이. | 박막 형성 방법 |
TW202146689A (zh) | 2020-04-03 | 2021-12-16 | 荷蘭商Asm Ip控股公司 | 阻障層形成方法及半導體裝置的製造方法 |
TW202145344A (zh) | 2020-04-08 | 2021-12-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於選擇性蝕刻氧化矽膜之設備及方法 |
US11821078B2 (en) | 2020-04-15 | 2023-11-21 | Asm Ip Holding B.V. | Method for forming precoat film and method for forming silicon-containing film |
US11996289B2 (en) | 2020-04-16 | 2024-05-28 | Asm Ip Holding B.V. | Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods |
KR20210132600A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐, 질소 및 추가 원소를 포함한 층을 증착하기 위한 방법 및 시스템 |
KR20210132576A (ko) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | 바나듐 나이트라이드 함유 층을 형성하는 방법 및 이를 포함하는 구조 |
TW202146831A (zh) | 2020-04-24 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | 垂直批式熔爐總成、及用於冷卻垂直批式熔爐之方法 |
KR20210134226A (ko) | 2020-04-29 | 2021-11-09 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 전구체 용기 |
KR20210134869A (ko) | 2020-05-01 | 2021-11-11 | 에이에스엠 아이피 홀딩 비.브이. | Foup 핸들러를 이용한 foup의 빠른 교환 |
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US11946137B2 (en) | 2020-12-16 | 2024-04-02 | Asm Ip Holding B.V. | Runout and wobble measurement fixtures |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004228599A (ja) * | 2000-07-21 | 2004-08-12 | Canon Sales Co Inc | 半導体装置 |
WO2004083495A2 (en) * | 2003-03-18 | 2004-09-30 | International Business Machines Corporation | Ultra low k (ulk) sicoh film and method |
WO2005087974A2 (en) * | 2004-03-05 | 2005-09-22 | Applied Materials, Inc. | Cvd processes for the deposition of amorphous carbon films |
JP2005294333A (ja) * | 2004-03-31 | 2005-10-20 | Semiconductor Process Laboratory Co Ltd | 成膜方法及び半導体装置 |
JP2006148100A (ja) * | 2004-11-17 | 2006-06-08 | Asm Japan Kk | 低誘電率ナノ粒子膜の形成技術 |
JP2006165573A (ja) * | 2004-12-09 | 2006-06-22 | Asm Japan Kk | 半導体デバイスの層間接続の形成方法及び装置 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3984726A (en) | 1975-04-25 | 1976-10-05 | Ppg Industries, Inc. | Ultraviolet light system having means for maintaining constant intensity light profile |
US5472827A (en) * | 1991-12-30 | 1995-12-05 | Sony Corporation | Method of forming a resist pattern using an anti-reflective layer |
US5228206A (en) | 1992-01-15 | 1993-07-20 | Submicron Systems, Inc. | Cluster tool dry cleaning system |
US5580421A (en) | 1994-06-14 | 1996-12-03 | Fsi International | Apparatus for surface conditioning |
JPH1197494A (ja) | 1997-09-18 | 1999-04-09 | Hitachi Ltd | 半導体装置およびその製造方法 |
US6514880B2 (en) | 1998-02-05 | 2003-02-04 | Asm Japan K.K. | Siloxan polymer film on semiconductor substrate and method for forming same |
TW437017B (en) | 1998-02-05 | 2001-05-28 | Asm Japan Kk | Silicone polymer insulation film on semiconductor substrate and method for formation thereof |
US6432846B1 (en) | 1999-02-02 | 2002-08-13 | Asm Japan K.K. | Silicone polymer insulation film on semiconductor substrate and method for forming the film |
US6881683B2 (en) | 1998-02-05 | 2005-04-19 | Asm Japan K.K. | Insulation film on semiconductor substrate and method for forming same |
US6383955B1 (en) | 1998-02-05 | 2002-05-07 | Asm Japan K.K. | Silicone polymer insulation film on semiconductor substrate and method for forming the film |
US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
US6284050B1 (en) | 1998-05-18 | 2001-09-04 | Novellus Systems, Inc. | UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
US20010038894A1 (en) * | 2000-03-14 | 2001-11-08 | Minoru Komada | Gas barrier film |
US6794311B2 (en) * | 2000-07-14 | 2004-09-21 | Applied Materials Inc. | Method and apparatus for treating low k dielectric layers to reduce diffusion |
US6486082B1 (en) * | 2001-06-18 | 2002-11-26 | Applied Materials, Inc. | CVD plasma assisted lower dielectric constant sicoh film |
US6756085B2 (en) | 2001-09-14 | 2004-06-29 | Axcelis Technologies, Inc. | Ultraviolet curing processes for advanced low-k materials |
US6759327B2 (en) * | 2001-10-09 | 2004-07-06 | Applied Materials Inc. | Method of depositing low k barrier layers |
US6818570B2 (en) * | 2002-03-04 | 2004-11-16 | Asm Japan K.K. | Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength |
US7105460B2 (en) * | 2002-07-11 | 2006-09-12 | Applied Materials | Nitrogen-free dielectric anti-reflective coating and hardmask |
JP4109531B2 (ja) * | 2002-10-25 | 2008-07-02 | 松下電器産業株式会社 | 半導体装置及びその製造方法 |
US20060165904A1 (en) | 2005-01-21 | 2006-07-27 | Asm Japan K.K. | Semiconductor-manufacturing apparatus provided with ultraviolet light-emitting mechanism and method of treating semiconductor substrate using ultraviolet light emission |
-
2006
- 2006-08-08 US US11/463,247 patent/US8080282B2/en active Active
-
2007
- 2007-08-03 JP JP2007203606A patent/JP5268130B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004228599A (ja) * | 2000-07-21 | 2004-08-12 | Canon Sales Co Inc | 半導体装置 |
WO2004083495A2 (en) * | 2003-03-18 | 2004-09-30 | International Business Machines Corporation | Ultra low k (ulk) sicoh film and method |
WO2005087974A2 (en) * | 2004-03-05 | 2005-09-22 | Applied Materials, Inc. | Cvd processes for the deposition of amorphous carbon films |
JP2005294333A (ja) * | 2004-03-31 | 2005-10-20 | Semiconductor Process Laboratory Co Ltd | 成膜方法及び半導体装置 |
JP2006148100A (ja) * | 2004-11-17 | 2006-06-08 | Asm Japan Kk | 低誘電率ナノ粒子膜の形成技術 |
JP2006165573A (ja) * | 2004-12-09 | 2006-06-22 | Asm Japan Kk | 半導体デバイスの層間接続の形成方法及び装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021509765A (ja) * | 2018-11-30 | 2021-04-01 | ハンソル ケミカル カンパニー リミテッドHansol Chemical Co., Ltd. | シリコン前駆体およびこれを用いたシリコン含有薄膜の製造方法 |
US11267828B2 (en) | 2018-11-30 | 2022-03-08 | Hansol Chemical Co., Ltd. | Silicon precursor and method of manufacturing silicon-containing thin film using the same |
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