JP2008042017A - レジストを回収可能なレジスト剥離除去方法及びそれを用いる半導体製造装置 - Google Patents
レジストを回収可能なレジスト剥離除去方法及びそれを用いる半導体製造装置 Download PDFInfo
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- JP2008042017A JP2008042017A JP2006215979A JP2006215979A JP2008042017A JP 2008042017 A JP2008042017 A JP 2008042017A JP 2006215979 A JP2006215979 A JP 2006215979A JP 2006215979 A JP2006215979 A JP 2006215979A JP 2008042017 A JP2008042017 A JP 2008042017A
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006215979A JP2008042017A (ja) | 2006-08-08 | 2006-08-08 | レジストを回収可能なレジスト剥離除去方法及びそれを用いる半導体製造装置 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006215979A JP2008042017A (ja) | 2006-08-08 | 2006-08-08 | レジストを回収可能なレジスト剥離除去方法及びそれを用いる半導体製造装置 |
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| Publication Number | Publication Date |
|---|---|
| JP2008042017A true JP2008042017A (ja) | 2008-02-21 |
| JP2008042017A5 JP2008042017A5 (enExample) | 2009-09-17 |
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| JP2006215979A Pending JP2008042017A (ja) | 2006-08-08 | 2006-08-08 | レジストを回収可能なレジスト剥離除去方法及びそれを用いる半導体製造装置 |
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| JP (1) | JP2008042017A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101607706B1 (ko) | 2008-06-13 | 2016-03-30 | 예놉틱 아우토마티지어룽스테히닉 게엠베하 | 박막 태양 전지 모듈을 위한 재활용 방법 |
| CN106797014A (zh) * | 2014-09-12 | 2017-05-31 | 东莞新能源科技有限公司 | 极片涂层的移除装置 |
| CN106797015A (zh) * | 2014-09-12 | 2017-05-31 | 东莞新能源科技有限公司 | 极片涂层的移除方法 |
| CN109570151A (zh) * | 2019-01-25 | 2019-04-05 | 中国工程物理研究院激光聚变研究中心 | 液流超声复合辅助激光清洗光学元件的装置及清洗方法 |
| CN114425661A (zh) * | 2020-10-15 | 2022-05-03 | 株式会社迪思科 | 激光加工方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11145108A (ja) * | 1997-11-05 | 1999-05-28 | Denso Corp | 微細加工方法および微細加工装置 |
| JP2003249427A (ja) * | 2001-12-17 | 2003-09-05 | Tokyo Electron Ltd | 膜除去装置及び膜除去方法 |
| JP2003303789A (ja) * | 2002-04-10 | 2003-10-24 | Laser Gijutsu Sogo Kenkyusho | フォトレジスト剥離除去方法及び装置 |
| JP2004157424A (ja) * | 2002-11-08 | 2004-06-03 | Sony Corp | レジストの剥離方法及び半導体装置の製造方法 |
| JP2005340668A (ja) * | 2004-05-28 | 2005-12-08 | Purex:Kk | 有機物質の除去方法および除去装置 |
-
2006
- 2006-08-08 JP JP2006215979A patent/JP2008042017A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11145108A (ja) * | 1997-11-05 | 1999-05-28 | Denso Corp | 微細加工方法および微細加工装置 |
| JP2003249427A (ja) * | 2001-12-17 | 2003-09-05 | Tokyo Electron Ltd | 膜除去装置及び膜除去方法 |
| JP2003303789A (ja) * | 2002-04-10 | 2003-10-24 | Laser Gijutsu Sogo Kenkyusho | フォトレジスト剥離除去方法及び装置 |
| JP2004157424A (ja) * | 2002-11-08 | 2004-06-03 | Sony Corp | レジストの剥離方法及び半導体装置の製造方法 |
| JP2005340668A (ja) * | 2004-05-28 | 2005-12-08 | Purex:Kk | 有機物質の除去方法および除去装置 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101607706B1 (ko) | 2008-06-13 | 2016-03-30 | 예놉틱 아우토마티지어룽스테히닉 게엠베하 | 박막 태양 전지 모듈을 위한 재활용 방법 |
| CN106797014A (zh) * | 2014-09-12 | 2017-05-31 | 东莞新能源科技有限公司 | 极片涂层的移除装置 |
| CN106797015A (zh) * | 2014-09-12 | 2017-05-31 | 东莞新能源科技有限公司 | 极片涂层的移除方法 |
| EP3190646A4 (en) * | 2014-09-12 | 2018-04-04 | Dongguan Amperex Technology Limited | Electrode plate coating removal method |
| CN109570151A (zh) * | 2019-01-25 | 2019-04-05 | 中国工程物理研究院激光聚变研究中心 | 液流超声复合辅助激光清洗光学元件的装置及清洗方法 |
| CN109570151B (zh) * | 2019-01-25 | 2023-12-22 | 中国工程物理研究院激光聚变研究中心 | 液流超声复合辅助激光清洗光学元件的装置及清洗方法 |
| CN114425661A (zh) * | 2020-10-15 | 2022-05-03 | 株式会社迪思科 | 激光加工方法 |
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