JP2008034851A5 - - Google Patents
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- Publication number
- JP2008034851A5 JP2008034851A5 JP2007195432A JP2007195432A JP2008034851A5 JP 2008034851 A5 JP2008034851 A5 JP 2008034851A5 JP 2007195432 A JP2007195432 A JP 2007195432A JP 2007195432 A JP2007195432 A JP 2007195432A JP 2008034851 A5 JP2008034851 A5 JP 2008034851A5
- Authority
- JP
- Japan
- Prior art keywords
- optoelectronic device
- superlattice
- layers
- layer
- function
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005693 optoelectronics Effects 0.000 claims 20
- 239000004065 semiconductor Substances 0.000 claims 7
- 230000003287 optical effect Effects 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- 238000012886 linear function Methods 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006034820 | 2006-07-27 | ||
| DE102006046237A DE102006046237A1 (de) | 2006-07-27 | 2006-09-29 | Halbleiter-Schichtstruktur mit Übergitter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008034851A JP2008034851A (ja) | 2008-02-14 |
| JP2008034851A5 true JP2008034851A5 (enExample) | 2011-06-23 |
Family
ID=38542049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007195432A Pending JP2008034851A (ja) | 2006-07-27 | 2007-07-27 | 超格子を有する半導体層構造 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US7893424B2 (enExample) |
| EP (1) | EP1883141B1 (enExample) |
| JP (1) | JP2008034851A (enExample) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060039498A1 (en) * | 2004-08-19 | 2006-02-23 | De Figueiredo Rui J P | Pre-distorter for orthogonal frequency division multiplexing systems and method of operating the same |
| EP1883119B1 (de) | 2006-07-27 | 2015-11-04 | OSRAM Opto Semiconductors GmbH | Halbleiter-Schichtstruktur mit Übergitter |
| EP1883141B1 (de) | 2006-07-27 | 2017-05-24 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht |
| EP1883140B1 (de) | 2006-07-27 | 2013-02-27 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht und Dotierungsgradienten |
| US8563995B2 (en) * | 2008-03-27 | 2013-10-22 | Nitek, Inc. | Ultraviolet light emitting diode/laser diode with nested superlattice |
| DE102008030584A1 (de) | 2008-06-27 | 2009-12-31 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Bauelementes und optoelektronisches Bauelement |
| JP5167081B2 (ja) * | 2008-11-13 | 2013-03-21 | パナソニック株式会社 | 窒化物半導体デバイス |
| DE102009037416B4 (de) | 2009-08-13 | 2021-10-14 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Elektrisch gepumpter optoelektronischer Halbleiterchip |
| WO2011037251A1 (ja) * | 2009-09-28 | 2011-03-31 | 株式会社トクヤマ | 積層体の製造方法 |
| US8389977B2 (en) | 2009-12-10 | 2013-03-05 | Transphorm Inc. | Reverse side engineered III-nitride devices |
| JP5060656B2 (ja) | 2009-12-21 | 2012-10-31 | 株式会社東芝 | 窒化物半導体発光素子およびその製造方法 |
| DE102009060749B4 (de) | 2009-12-30 | 2021-12-30 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip |
| FR2957718B1 (fr) * | 2010-03-16 | 2012-04-20 | Commissariat Energie Atomique | Diode electroluminescente hybride a rendement eleve |
| US8742460B2 (en) | 2010-12-15 | 2014-06-03 | Transphorm Inc. | Transistors with isolation regions |
| US8643062B2 (en) | 2011-02-02 | 2014-02-04 | Transphorm Inc. | III-N device structures and methods |
| US8358673B2 (en) * | 2011-02-17 | 2013-01-22 | Corning Incorporated | Strain balanced laser diode |
| JP2014508416A (ja) * | 2011-02-28 | 2014-04-03 | コーニング インコーポレイテッド | インジウム含有クラッド層を有する半導体レーザ |
| US8901604B2 (en) | 2011-09-06 | 2014-12-02 | Transphorm Inc. | Semiconductor devices with guard rings |
| US9257547B2 (en) | 2011-09-13 | 2016-02-09 | Transphorm Inc. | III-N device structures having a non-insulating substrate |
| US8598937B2 (en) | 2011-10-07 | 2013-12-03 | Transphorm Inc. | High power semiconductor electronic components with increased reliability |
| KR20130079873A (ko) * | 2012-01-03 | 2013-07-11 | 엘지이노텍 주식회사 | 발광소자 및 이를 포함하는 조명시스템 |
| CN102544281A (zh) * | 2012-01-20 | 2012-07-04 | 厦门市三安光电科技有限公司 | 具有多层势垒结构的氮化镓基发光二极管 |
| US9165766B2 (en) * | 2012-02-03 | 2015-10-20 | Transphorm Inc. | Buffer layer structures suited for III-nitride devices with foreign substrates |
| WO2013155108A1 (en) | 2012-04-09 | 2013-10-17 | Transphorm Inc. | N-polar iii-nitride transistors |
| US9401452B2 (en) | 2012-09-14 | 2016-07-26 | Palo Alto Research Center Incorporated | P-side layers for short wavelength light emitters |
| US9219189B2 (en) | 2012-09-14 | 2015-12-22 | Palo Alto Research Center Incorporated | Graded electron blocking layer |
| KR101936312B1 (ko) * | 2012-10-09 | 2019-01-08 | 엘지이노텍 주식회사 | 발광소자 |
| KR102042181B1 (ko) * | 2012-10-22 | 2019-11-07 | 엘지이노텍 주식회사 | 발광소자 |
| JP2014143338A (ja) * | 2013-01-25 | 2014-08-07 | Sharp Corp | 窒化物半導体発光素子 |
| US9087718B2 (en) | 2013-03-13 | 2015-07-21 | Transphorm Inc. | Enhancement-mode III-nitride devices |
| US9245993B2 (en) | 2013-03-15 | 2016-01-26 | Transphorm Inc. | Carbon doping semiconductor devices |
| KR20140117117A (ko) * | 2013-03-26 | 2014-10-07 | 인텔렉추얼디스커버리 주식회사 | 질화물 반도체 발광소자 |
| US9443938B2 (en) | 2013-07-19 | 2016-09-13 | Transphorm Inc. | III-nitride transistor including a p-type depleting layer |
| US9318593B2 (en) | 2014-07-21 | 2016-04-19 | Transphorm Inc. | Forming enhancement mode III-nitride devices |
| KR102237111B1 (ko) * | 2014-07-28 | 2021-04-08 | 엘지이노텍 주식회사 | 발광소자 및 조명시스템 |
| FR3028670B1 (fr) * | 2014-11-18 | 2017-12-22 | Commissariat Energie Atomique | Structure semi-conductrice a couche de semi-conducteur du groupe iii-v ou ii-vi comprenant une structure cristalline a mailles cubiques ou hexagonales |
| US9536966B2 (en) | 2014-12-16 | 2017-01-03 | Transphorm Inc. | Gate structures for III-N devices |
| US9536967B2 (en) | 2014-12-16 | 2017-01-03 | Transphorm Inc. | Recessed ohmic contacts in a III-N device |
| TWI577046B (zh) * | 2014-12-23 | 2017-04-01 | 錼創科技股份有限公司 | 半導體發光元件及其製作方法 |
| US9673352B2 (en) * | 2015-04-30 | 2017-06-06 | National Chiao Tung University | Semiconductor light emitting device |
| CN108604597B (zh) | 2016-01-15 | 2021-09-17 | 创世舫电子有限公司 | 具有al(1-x)sixo栅极绝缘体的增强模式iii-氮化物器件 |
| WO2017210323A1 (en) | 2016-05-31 | 2017-12-07 | Transphorm Inc. | Iii-nitride devices including a graded depleting layer |
| DE102017119931A1 (de) * | 2017-08-30 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement |
| US20190103509A1 (en) | 2017-09-30 | 2019-04-04 | Sensor Electronic Technology, Inc. | Semiconductor Heterostructure with P-type Superlattice |
| US10516076B2 (en) | 2018-02-01 | 2019-12-24 | Silanna UV Technologies Pte Ltd | Dislocation filter for semiconductor devices |
| US10879420B2 (en) | 2018-07-09 | 2020-12-29 | University Of Iowa Research Foundation | Cascaded superlattice LED system |
| CN110600591B (zh) * | 2019-08-21 | 2021-11-26 | 苏州紫灿科技有限公司 | 具有啁啾超晶格最终势垒结构的深紫外led及制备方法 |
| US20220368108A1 (en) * | 2019-09-30 | 2022-11-17 | Nlight, Inc. | Strain-engineered cladding layer for optimized active region strain and improved laser diode performance |
| US11322647B2 (en) | 2020-05-01 | 2022-05-03 | Silanna UV Technologies Pte Ltd | Buried contact layer for UV emitting device |
| US12444907B2 (en) * | 2022-04-18 | 2025-10-14 | Epistar Corporation | Light-emitting device |
| US20240379765A1 (en) * | 2023-05-10 | 2024-11-14 | Gan Systems Inc. | Superlattice epitaxial structure with varying lattice parameter differences |
| CN118412373B (zh) * | 2024-06-28 | 2024-09-27 | 合肥欧益睿芯科技有限公司 | 含超晶格外延插入的外延片及其制备方法、晶体管 |
Family Cites Families (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60145686A (ja) | 1984-01-09 | 1985-08-01 | Nec Corp | 半導体レ−ザ |
| US4839899A (en) * | 1988-03-09 | 1989-06-13 | Xerox Corporation | Wavelength tuning of multiple quantum well (MQW) heterostructure lasers |
| US4882734A (en) | 1988-03-09 | 1989-11-21 | Xerox Corporation | Quantum well heterostructure lasers with low current density threshold and higher TO values |
| JPH01241192A (ja) | 1988-03-23 | 1989-09-26 | Fujitsu Ltd | 半導体装置 |
| US4961197A (en) | 1988-09-07 | 1990-10-02 | Hitachi, Ltd. | Semiconductor laser device |
| CA1299719C (en) | 1989-01-13 | 1992-04-28 | Hui Chun Liu | Semiconductor superlattice infrared source |
| US5060028A (en) | 1989-01-19 | 1991-10-22 | Hewlett-Packard Company | High band-gap opto-electronic device |
| US4984242A (en) * | 1989-09-18 | 1991-01-08 | Spectra Diode Laboratories, Inc. | GaAs/AlGaAs heterostructure laser containing indium |
| US5319657A (en) | 1991-10-08 | 1994-06-07 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser of modulation doping quantum well structure with stopper against dopant dispersion and manufacturing method thereof |
| US5198682A (en) | 1991-11-12 | 1993-03-30 | Hughes Aircraft Company | Multiple quantum well superlattice infrared detector with graded conductive band |
| JPH0794829A (ja) | 1993-04-05 | 1995-04-07 | Matsushita Electric Ind Co Ltd | 半導体レーザ |
| US5395793A (en) | 1993-12-23 | 1995-03-07 | National Research Council Of Canada | Method of bandgap tuning of semiconductor quantum well structures |
| US5570386A (en) | 1994-04-04 | 1996-10-29 | Lucent Technologies Inc. | Semiconductor laser |
| US5751013A (en) | 1994-07-21 | 1998-05-12 | Matsushita Electric Industrial Co., Ltd. | Semiconductor light-emitting device and production method thereof |
| US5497012A (en) | 1994-06-15 | 1996-03-05 | Hewlett-Packard Company | Unipolar band minima devices |
| US5670798A (en) | 1995-03-29 | 1997-09-23 | North Carolina State University | Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact non-nitride buffer layer and methods of fabricating same |
| US5588015A (en) | 1995-08-22 | 1996-12-24 | University Of Houston | Light emitting devices based on interband transitions in type-II quantum well heterostructures |
| JPH1022524A (ja) | 1996-07-02 | 1998-01-23 | Omron Corp | 半導体発光素子 |
| US5936989A (en) | 1997-04-29 | 1999-08-10 | Lucent Technologies, Inc. | Quantum cascade laser |
| US6677619B1 (en) | 1997-01-09 | 2004-01-13 | Nichia Chemical Industries, Ltd. | Nitride semiconductor device |
| WO1998031055A1 (en) | 1997-01-09 | 1998-07-16 | Nichia Chemical Industries, Ltd. | Nitride semiconductor device |
| JP3282175B2 (ja) * | 1997-02-04 | 2002-05-13 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| JP3014339B2 (ja) * | 1997-04-25 | 2000-02-28 | カナレ電気株式会社 | 量子波干渉層を有した半導体素子 |
| JP3642157B2 (ja) | 1997-05-26 | 2005-04-27 | ソニー株式会社 | p型III族ナイトライド化合物半導体、発光ダイオードおよび半導体レーザ |
| DE69835216T2 (de) | 1997-07-25 | 2007-05-31 | Nichia Corp., Anan | Halbleitervorrichtung aus einer nitridverbindung |
| JPH1168158A (ja) | 1997-08-20 | 1999-03-09 | Sanyo Electric Co Ltd | 窒化ガリウム系化合物半導体装置 |
| JP3468082B2 (ja) | 1998-02-26 | 2003-11-17 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| JPH11340505A (ja) * | 1998-05-25 | 1999-12-10 | Matsushita Electric Ind Co Ltd | 窒化ガリウム系化合物半導体発光素子 |
| JP2000091708A (ja) | 1998-09-14 | 2000-03-31 | Toshiba Corp | 半導体発光素子 |
| JP2000286451A (ja) | 1998-11-17 | 2000-10-13 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
| JP2000244070A (ja) | 1999-02-19 | 2000-09-08 | Sony Corp | 半導体装置および半導体発光素子 |
| CN1347581A (zh) | 1999-03-26 | 2002-05-01 | 松下电器产业株式会社 | 带有应变补偿层的半导体结构及其制备方法 |
| GB9913950D0 (en) | 1999-06-15 | 1999-08-18 | Arima Optoelectronics Corp | Unipolar light emitting devices based on iii-nitride semiconductor superlattices |
| DE19955747A1 (de) * | 1999-11-19 | 2001-05-23 | Osram Opto Semiconductors Gmbh | Optische Halbleitervorrichtung mit Mehrfach-Quantentopf-Struktur |
| US6441393B2 (en) | 1999-11-17 | 2002-08-27 | Lumileds Lighting U.S., Llc | Semiconductor devices with selectively doped III-V nitride layers |
| JP2001168385A (ja) | 1999-12-06 | 2001-06-22 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子及びiii族窒化物系化合物半導体発光素子 |
| US6535536B2 (en) | 2000-04-10 | 2003-03-18 | Fuji Photo Film Co., Ltd. | Semiconductor laser element |
| JP2002057410A (ja) * | 2000-05-29 | 2002-02-22 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
| US6556604B1 (en) | 2000-11-08 | 2003-04-29 | Lucent Technologies Inc. | Flat minibands with spatially symmetric wavefunctions in intersubband superlattice light emitters |
| JP3453558B2 (ja) | 2000-12-25 | 2003-10-06 | 松下電器産業株式会社 | 窒化物半導体素子 |
| MY129352A (en) | 2001-03-28 | 2007-03-30 | Nichia Corp | Nitride semiconductor device |
| US6489636B1 (en) | 2001-03-29 | 2002-12-03 | Lumileds Lighting U.S., Llc | Indium gallium nitride smoothing structures for III-nitride devices |
| US6649942B2 (en) | 2001-05-23 | 2003-11-18 | Sanyo Electric Co., Ltd. | Nitride-based semiconductor light-emitting device |
| US6630692B2 (en) | 2001-05-29 | 2003-10-07 | Lumileds Lighting U.S., Llc | III-Nitride light emitting devices with low driving voltage |
| US7692182B2 (en) | 2001-05-30 | 2010-04-06 | Cree, Inc. | Group III nitride based quantum well light emitting device structures with an indium containing capping structure |
| US6958497B2 (en) | 2001-05-30 | 2005-10-25 | Cree, Inc. | Group III nitride based light emitting diode structures with a quantum well and superlattice, group III nitride based quantum well structures and group III nitride based superlattice structures |
| JP2003008058A (ja) | 2001-06-18 | 2003-01-10 | Showa Denko Kk | AlGaInPエピタキシャルウエーハ及びそれを製造する方法並びにそれを用いた半導体発光素子 |
| JP4057802B2 (ja) | 2001-09-05 | 2008-03-05 | 株式会社日立製作所 | 半導体光素子 |
| MY139533A (en) | 2001-11-05 | 2009-10-30 | Nichia Corp | Nitride semiconductor device |
| US6618413B2 (en) | 2001-12-21 | 2003-09-09 | Xerox Corporation | Graded semiconductor layers for reducing threshold voltage for a nitride-based laser diode structure |
| US7919791B2 (en) | 2002-03-25 | 2011-04-05 | Cree, Inc. | Doped group III-V nitride materials, and microelectronic devices and device precursor structures comprising same |
| GB0207307D0 (en) | 2002-03-27 | 2002-05-08 | Koninkl Philips Electronics Nv | In-pixel memory for display devices |
| JP4204982B2 (ja) * | 2002-04-04 | 2009-01-07 | シャープ株式会社 | 半導体レーザ素子 |
| JP4119158B2 (ja) | 2002-04-23 | 2008-07-16 | 三菱電機株式会社 | 傾斜状多重量子バリアを用いた半導体発光素子 |
| JP3755084B2 (ja) | 2002-04-24 | 2006-03-15 | 中東産業株式会社 | 蝶番 |
| JP4221697B2 (ja) | 2002-06-17 | 2009-02-12 | 日本電気株式会社 | 半導体装置 |
| US20030235224A1 (en) | 2002-06-19 | 2003-12-25 | Ohlander Ulf Roald | Strained quantum-well structure having ternary-alloy material in both quantum-well layers and barrier layers |
| GB2396054B (en) | 2002-11-20 | 2006-01-11 | Intense Photonics Ltd | Semiconductor optical device with beam focusing |
| GB0306279D0 (en) | 2003-03-19 | 2003-04-23 | Bookham Technology Plc | High power semiconductor laser with large optical superlattice waveguide |
| US7609737B2 (en) * | 2003-07-10 | 2009-10-27 | Nichia Corporation | Nitride semiconductor laser element |
| KR100580623B1 (ko) | 2003-08-04 | 2006-05-16 | 삼성전자주식회사 | 초격자 구조의 반도체층을 갖는 반도체 소자 및 그 제조방법 |
| TWI228320B (en) | 2003-09-09 | 2005-02-21 | Ind Tech Res Inst | An avalanche photo-detector(APD) with high saturation power, high gain-bandwidth product |
| WO2005034301A1 (ja) | 2003-09-25 | 2005-04-14 | Matsushita Electric Industrial Co., Ltd. | 窒化物半導体素子およびその製造方法 |
| US20050162616A1 (en) * | 2004-01-23 | 2005-07-28 | Hewlett-Packard Co. | System and method of contrast enhancement in digital projectors |
| DE102004009531B4 (de) | 2004-02-20 | 2007-03-01 | Forschungszentrum Rossendorf E.V. | Quanten-Kaskaden-Laser-Struktur |
| US7294868B2 (en) | 2004-06-25 | 2007-11-13 | Finisar Corporation | Super lattice tunnel junctions |
| KR100662191B1 (ko) | 2004-12-23 | 2006-12-27 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| US7885306B2 (en) * | 2006-06-30 | 2011-02-08 | Osram Opto Semiconductors Gmbh | Edge-emitting semiconductor laser chip |
| EP1883140B1 (de) | 2006-07-27 | 2013-02-27 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht und Dotierungsgradienten |
| EP1883119B1 (de) | 2006-07-27 | 2015-11-04 | OSRAM Opto Semiconductors GmbH | Halbleiter-Schichtstruktur mit Übergitter |
| EP1883141B1 (de) * | 2006-07-27 | 2017-05-24 | OSRAM Opto Semiconductors GmbH | LD oder LED mit Übergitter-Mantelschicht |
| DE102006046237A1 (de) | 2006-07-27 | 2008-01-31 | Osram Opto Semiconductors Gmbh | Halbleiter-Schichtstruktur mit Übergitter |
| DE102006046228A1 (de) * | 2006-07-27 | 2008-01-31 | Osram Opto Semiconductors Gmbh | Halbleiter-Schichtstruktur mit Übergitter |
| US7547908B2 (en) * | 2006-12-22 | 2009-06-16 | Philips Lumilieds Lighting Co, Llc | III-nitride light emitting devices grown on templates to reduce strain |
| DE102010009457A1 (de) * | 2010-02-26 | 2011-09-01 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
-
2007
- 2007-07-13 EP EP07013822.7A patent/EP1883141B1/de not_active Ceased
- 2007-07-20 US US11/780,514 patent/US7893424B2/en not_active Expired - Fee Related
- 2007-07-27 JP JP2007195432A patent/JP2008034851A/ja active Pending
-
2011
- 2011-01-19 US US13/009,422 patent/US8471240B2/en not_active Expired - Fee Related
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