JP2008034709A - 半導体ウエハへの粘着テープ貼付け方法および半導体ウエハからの保護テープ剥離方法 - Google Patents
半導体ウエハへの粘着テープ貼付け方法および半導体ウエハからの保護テープ剥離方法 Download PDFInfo
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- 230000001681 protective effect Effects 0.000 title claims abstract description 96
- 239000002390 adhesive tape Substances 0.000 title claims abstract description 95
- 239000004065 semiconductor Substances 0.000 title claims description 88
- 238000000034 method Methods 0.000 title claims description 52
- 239000012530 fluid Substances 0.000 claims abstract description 13
- 239000000853 adhesive Substances 0.000 claims description 17
- 230000001070 adhesive effect Effects 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 174
- 230000008569 process Effects 0.000 description 22
- 230000002093 peripheral effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1126—Using direct fluid current against work during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
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- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
【解決手段】ウエハ裏面外周には、裏面研削域を囲繞する環状凸部41が残存形成されている。環状凸部41を保持テーブル6に密着させて吸着保持し、ウエハWの裏面と保持テーブル6との間に形成された空間Sに流体を供給して空間Sの内圧を高め、保護テープPTの表面に剥離用の粘着テープTを供給し、貼付け部材で粘着テープTの非粘着表面を押圧しながらウエハWの一端側から他端側に移動させ、粘着テープを保護テープPTの表面に貼り付ける。貼り付けられた粘着テープTをウエハWの一端側から他端側に移動する案内部材28で反転案内し、粘着テープTと保護テープPTを同時にウエハ表面から剥離する。
【選択図】図16
Description
前記半導体ウエハの裏面外周には、バックグラインド域を囲繞するように環状凸部が残存形成されており、
この環状凸部を全周に亘って保持テーブルに密着させて吸着保持し、
半導体ウエハの裏面と保持テーブルとの間に形成された空間に保持テーブル側から流体を供給して前記空間の内圧を高め、
半導体ウエハに貼付けられている保護テープの表面に剥離用の粘着テープを供給し、
半導体ウエハの外径よりも幅広の貼付け部材で粘着テープの非粘着表面を押圧しながら貼付け部材を半導体ウエハの一端側から他端側に移動させて、粘着テープを保護テープの表面に貼り付ける
ことを特徴とする。
前記半導体ウエハの裏面に研削形成された扁平凹部に連通する凹部を前記保持テーブルに形成し、この凹部の外周で半導体ウエハの前記環状凸部を吸着保持する
ことを特徴とする。
前記空間からの流体流出を許容しながら前記空間に流体を供給して加圧する
ことを特徴とする。
前記半導体ウエハの裏面外周には、バックグラインド域を囲繞するように環状凸部が残存形成されており、
この環状凸部を全周に亘って保持テーブルに密着させて吸着保持し、
半導体ウエハの裏面と保持テーブルとの間に形成された空間に保持テーブル側から流体を供給して前記空間の内圧を高め、
半導体ウエハに貼付けられている保護テープの表面に剥離用の粘着テープを供給し、
半導体ウエハの外径よりも幅広の貼付け部材で粘着テープの非粘着表面を押圧しながら貼付け部材を半導体ウエハの一端側から他端側に移動させて、粘着テープを保護テープの表面に貼り付け、
貼り付けられた剥離用の粘着テープを、半導体ウエハの一端側から他端側に移動する案内部材で反転案内して、粘着テープと一体化された保護テープを半導体ウエハの表面から剥離する
ことを特徴とする。
前記案内部材で前記貼付け部材を兼用し、保護テープへの粘着テープの貼付けと半導体ウエハからの保護テープの剥離を同時に行う
ことを特徴とする。
前記案内部材にエッジ状に形成された板材を使用する
ことを特徴とする。
25 … 貼付け部材(貼付けローラ)
28 … 案内部材
41 … 環状凸部
54 … 案内部材
S … 空間
T … 粘着テープ
PT … 保護テープ
W … 半導体ウエハ
Claims (6)
- 半導体ウエハの表面に貼付けられた保護テープに剥離用の粘着テープを貼り付ける半導体ウエハへの粘着テープ貼付け方法であって、
前記半導体ウエハの裏面外周には、バックグラインド域を囲繞するように環状凸部が残存形成されており、
この環状凸部を全周に亘って保持テーブルに密着させて吸着保持し、
半導体ウエハの裏面と保持テーブルとの間に形成された空間に保持テーブル側から流体を供給して前記空間の内圧を高め、
半導体ウエハに貼付けられている保護テープの表面に剥離用の粘着テープを供給し、
半導体ウエハの外径よりも幅広の貼付け部材で粘着テープの非粘着表面を押圧しながら貼付け部材を半導体ウエハの一端側から他端側に移動させて、粘着テープを保護テープの表面に貼り付ける
ことを特徴とする半導体ウエハへの粘着テープ貼付け方法。 - 請求項1に記載の半導体ウエハへの粘着テープ貼付け方法において、
前記半導体ウエハの裏面に研削形成された扁平凹部に連通する凹部を前記保持テーブルに形成し、この凹部の外周で半導体ウエハの前記環状凸部を吸着保持する
ことを特徴とする半導体ウエハへの粘着テープ貼付け方法。 - 請求項1または請求項2に記載の半導体ウエハへの粘着テープ貼付け方法において、
前記空間からの流体流出を許容しながら前記空間に流体を供給して加圧する
ことを特徴とする半導体ウエハへの粘着テープ貼付け方法。 - 半導体ウエハの表面に貼付けられた保護テープを剥離する半導体ウエハからの保護テープ剥離方法であって、
前記半導体ウエハの裏面外周には、バックグラインド域を囲繞するように環状凸部が残存形成されており、
この環状凸部を全周に亘って保持テーブルに密着させて吸着保持し、
半導体ウエハの裏面と保持テーブルとの間に形成された空間に保持テーブル側から流体を供給して前記空間の内圧を高め、
半導体ウエハに貼付けられている保護テープの表面に剥離用の粘着テープを供給し、
半導体ウエハの外径よりも幅広の貼付け部材で粘着テープの非粘着表面を押圧しながら貼付け部材を半導体ウエハの一端側から他端側に移動させて、粘着テープを保護テープの表面に貼り付け、
貼り付けられた剥離用の粘着テープを、半導体ウエハの一端側から他端側に移動する案内部材で反転案内して、粘着テープと一体化された保護テープを半導体ウエハの表面から剥離する
ことを特徴とする半導体ウエハからの保護テープ剥離方法。 - 請求項4に記載の半導体ウエハからの保護テープ剥離方法において、
前記案内部材で前記貼付け部材を兼用し、保護テープへの粘着テープの貼付けと半導体ウエハからの保護テープの剥離を同時に行う
ことを特徴とする半導体ウエハからの保護テープ剥離方法。 - 請求項4または請求項5に記載の半導体ウエハからの保護テープ剥離方法において、
前記案内部材にエッジ状に形成された板材を使用する
ことを特徴とする半導体ウエハからの保護テープ剥離方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006208118A JP4641984B2 (ja) | 2006-07-31 | 2006-07-31 | 半導体ウエハへの粘着テープ貼付け方法および半導体ウエハからの保護テープ剥離方法 |
EP07012033A EP1884991A3 (en) | 2006-07-31 | 2007-06-20 | Method for joining adhesive tape to semiconductor wafer, method for separating protective tape from semiconductor wafer, and apparatuses using the methods |
US11/819,827 US7763141B2 (en) | 2006-07-31 | 2007-06-29 | Method for joining adhesive tape to semiconductor wafer, method for separating protective tape from semiconductor wafer, and apparatuses using the methods |
TW096127009A TWI446471B (zh) | 2006-07-31 | 2007-07-25 | 對半導體晶圓黏貼黏著帶之方法、自半導體晶圓剝離保護帶之方法及使用此等方法之裝置 |
CN2007101437063A CN101118842B (zh) | 2006-07-31 | 2007-07-30 | 对半导体晶圆粘贴粘合带、剥离保护带的方法及装置 |
KR1020070076122A KR101280670B1 (ko) | 2006-07-31 | 2007-07-30 | 반도체 웨이퍼로의 점착 테이프 부착 방법 및 반도체웨이퍼로부터의 보호 테이프 박리 방법 및 이들을 이용한장치 |
Applications Claiming Priority (1)
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JP2012164839A (ja) * | 2011-02-08 | 2012-08-30 | Lintec Corp | 板状部材の支持装置及び支持方法、並びに、シート剥離装置及び剥離方法 |
JP2017107946A (ja) * | 2015-12-08 | 2017-06-15 | リンテック株式会社 | シート剥離装置 |
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- 2007-06-29 US US11/819,827 patent/US7763141B2/en not_active Expired - Fee Related
- 2007-07-25 TW TW096127009A patent/TWI446471B/zh not_active IP Right Cessation
- 2007-07-30 KR KR1020070076122A patent/KR101280670B1/ko active IP Right Grant
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JP2010109142A (ja) * | 2008-10-30 | 2010-05-13 | Lintec Corp | テーブル及びこれを用いたシート剥離装置並びに剥離方法 |
JP2010135436A (ja) * | 2008-12-02 | 2010-06-17 | Takatori Corp | 基板への接着テープ貼り付け装置 |
EP2445001A2 (en) | 2010-10-19 | 2012-04-25 | Nitto Denko Corporation | Method and apparatus for separating protective tape |
US8679289B2 (en) | 2010-10-19 | 2014-03-25 | Nitto Denko Corporation | Method and apparatus for separating protective tape |
JP2012164839A (ja) * | 2011-02-08 | 2012-08-30 | Lintec Corp | 板状部材の支持装置及び支持方法、並びに、シート剥離装置及び剥離方法 |
JP2017107946A (ja) * | 2015-12-08 | 2017-06-15 | リンテック株式会社 | シート剥離装置 |
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Also Published As
Publication number | Publication date |
---|---|
EP1884991A3 (en) | 2009-09-16 |
EP1884991A2 (en) | 2008-02-06 |
TWI446471B (zh) | 2014-07-21 |
JP4641984B2 (ja) | 2011-03-02 |
CN101118842B (zh) | 2010-08-18 |
CN101118842A (zh) | 2008-02-06 |
KR20080012184A (ko) | 2008-02-11 |
US20080023133A1 (en) | 2008-01-31 |
KR101280670B1 (ko) | 2013-07-01 |
US7763141B2 (en) | 2010-07-27 |
TW200820365A (en) | 2008-05-01 |
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