JP2007142262A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP2007142262A JP2007142262A JP2005335836A JP2005335836A JP2007142262A JP 2007142262 A JP2007142262 A JP 2007142262A JP 2005335836 A JP2005335836 A JP 2005335836A JP 2005335836 A JP2005335836 A JP 2005335836A JP 2007142262 A JP2007142262 A JP 2007142262A
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- 239000000758 substrate Substances 0.000 title claims abstract description 50
- 239000011261 inert gas Substances 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 26
- 239000003960 organic solvent Substances 0.000 claims description 12
- 230000003028 elevating effect Effects 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract description 63
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 48
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 229910001873 dinitrogen Inorganic materials 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 230000002093 peripheral effect Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
【解決手段】少なくともチャンバ11内にノズル35からイソプロピルアルコールを含んだ不活性ガスを供給している間は、制御部77が槽温調ジャケット49とチャンバ温調ジャケット51により加熱を行う。したがって、チャンバ11内に供給されたイソプロピルアルコールがチャンバ11や処理槽1に結露するのを防止でき、その結果、チャンバ11内のイソプロピルアルコール濃度が低下することがないので、基板Wの乾燥不良を防止できる。
【選択図】図1
Description
すなわち、従来の装置では、処理槽が例えば純水を貯留している場合、処理槽自体の温度が低下する関係上、不活性ガスに含まれているイソプロピルアルコールが処理槽に結露するという問題がある。このような結露が生じると、チャンバ内に供給されたイソプロピルアルコールの濃度が低下し、基板に付着した純水の置換を十分に行えなくなって乾燥不良を生じる恐れがある。
すなわち、請求項1に記載の発明は、基板を処理液により処理する基板処理装置において、処理液を貯留し、基板を処理液に浸漬させて基板に対する処理を行う処理槽と、前記処理槽の周囲を囲うチャンバと、前記チャンバ内に有機溶剤を含んだ不活性ガスを供給する供給手段と、基板を支持した状態で、前記処理槽の処理位置と前記チャンバ内における前記処理槽上方の待機位置とにわたって昇降する昇降機構と、前記処理槽を温調する槽温調手段と、前記チャンバを温調するチャンバ温調手段と、少なくとも前記供給手段から有機溶剤を含んだ不活性ガスを供給している間、前記槽温調手段及び前記チャンバ温調手段に加熱処理を行わせる制御手段と、を備えていることを特徴とするものである。
図1は、実施例に係る基板処理装置の概略構成を示すブロック図である。
3 … 内槽
5 … 外槽
7 … 噴出管
WP … 待機位置
11 … チャンバ
17 … 昇降機構
PP … 処理位置
OP … 待避位置
19 … 保持部
27 … 供給管
35 … ノズル
49 … 槽温調ジャケット
51 … チャンバ温調ジャケット
77 … 制御部
Claims (4)
- 基板を処理液により処理する基板処理装置において、
処理液を貯留し、基板を処理液に浸漬させて基板に対する処理を行う処理槽と、
前記処理槽の周囲を囲うチャンバと、
前記チャンバ内に有機溶剤を含んだ不活性ガスを供給する供給手段と、
基板を支持した状態で、前記処理槽の処理位置と前記チャンバ内における前記処理槽上方の待機位置とにわたって昇降する昇降機構と、
前記処理槽を温調する槽温調手段と、
前記チャンバを温調するチャンバ温調手段と、
少なくとも前記供給手段から有機溶剤を含んだ不活性ガスを供給している間、前記槽温調手段及び前記チャンバ温調手段に加熱処理を行わせる制御手段と、
を備えていることを特徴とする基板処理装置。 - 請求項1に記載の基板処理装置において、
前記槽温調手段は、前記処理槽の外面に付設された槽温調ジャケットを備えていることを特徴とする基板処理装置。 - 請求項1または2に記載の基板処理装置において、
前記チャンバ温調手段は、前記チャンバの外面に付設されたチャンバ温調ジャケットを備えていることを特徴とする基板処理装置。 - 請求項1から3のいずれかに記載の基板処理装置において、
前記槽温調手段及び前記チャンバ温調手段は、加熱及び冷却が可能であり、
前記制御手段は、前記処理槽内に貯留されている処理液を降温する際、前記槽温調手段に冷却を行わせることを特徴とする基板処理装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005335836A JP4666494B2 (ja) | 2005-11-21 | 2005-11-21 | 基板処理装置 |
KR1020060109440A KR100778957B1 (ko) | 2005-11-21 | 2006-11-07 | 기판처리장치 |
US11/560,121 US8178821B2 (en) | 2005-11-21 | 2006-11-15 | Substrate treating apparatus |
TW095142361A TWI349958B (en) | 2005-11-21 | 2006-11-16 | Substrate treating apparatus |
CNB2006101493980A CN100559550C (zh) | 2005-11-21 | 2006-11-21 | 基板处理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005335836A JP4666494B2 (ja) | 2005-11-21 | 2005-11-21 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007142262A true JP2007142262A (ja) | 2007-06-07 |
JP4666494B2 JP4666494B2 (ja) | 2011-04-06 |
Family
ID=38089219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005335836A Expired - Fee Related JP4666494B2 (ja) | 2005-11-21 | 2005-11-21 | 基板処理装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8178821B2 (ja) |
JP (1) | JP4666494B2 (ja) |
KR (1) | KR100778957B1 (ja) |
CN (1) | CN100559550C (ja) |
TW (1) | TWI349958B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010098038A (ja) * | 2008-10-15 | 2010-04-30 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置及びその温調方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101561218B (zh) * | 2008-04-16 | 2010-12-08 | 富葵精密组件(深圳)有限公司 | 真空氮气烘箱 |
JP6017999B2 (ja) | 2013-03-15 | 2016-11-02 | 株式会社Screenホールディングス | 基板処理装置 |
JP7312656B2 (ja) * | 2019-09-24 | 2023-07-21 | 株式会社Screenホールディングス | 基板処理装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07204592A (ja) * | 1994-01-25 | 1995-08-08 | Chiyoda Manufacturing Co Ltd | 超音波処理を行なう容器中の液体の温度調節方法と装置 |
JPH08264265A (ja) * | 1995-03-23 | 1996-10-11 | Sekisui Plastics Co Ltd | ヒータおよびその使用方法 |
JPH08334235A (ja) * | 1995-06-09 | 1996-12-17 | Matsushita Electric Ind Co Ltd | 加熱装置 |
JPH1197409A (ja) * | 1997-07-15 | 1999-04-09 | Samsung Electron Co Ltd | 減圧式乾燥装置及びこれを用いる半導体装置の乾燥方法 |
JPH11121429A (ja) * | 1997-10-08 | 1999-04-30 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置およびそれを備えた基板処理装置 |
JP2002317069A (ja) * | 2001-04-18 | 2002-10-31 | Potto Japan Kk | 廃プラスチックの減容溶融機 |
JP2003075067A (ja) * | 2002-05-30 | 2003-03-12 | Dainippon Screen Mfg Co Ltd | 基板の洗浄・乾燥処理装置 |
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JP3347814B2 (ja) * | 1993-05-17 | 2002-11-20 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
US6050275A (en) * | 1996-09-27 | 2000-04-18 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
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JP3151613B2 (ja) | 1997-06-17 | 2001-04-03 | 東京エレクトロン株式会社 | 洗浄・乾燥処理方法及びその装置 |
US6027760A (en) * | 1997-12-08 | 2000-02-22 | Gurer; Emir | Photoresist coating process control with solvent vapor sensor |
US6729040B2 (en) * | 1999-05-27 | 2004-05-04 | Oliver Design, Inc. | Apparatus and method for drying a substrate using hydrophobic and polar organic compounds |
JP3448613B2 (ja) | 1999-06-29 | 2003-09-22 | オメガセミコン電子株式会社 | 乾燥装置 |
JP2001176833A (ja) | 1999-12-14 | 2001-06-29 | Tokyo Electron Ltd | 基板処理装置 |
US6286231B1 (en) | 2000-01-12 | 2001-09-11 | Semitool, Inc. | Method and apparatus for high-pressure wafer processing and drying |
US6558477B1 (en) * | 2000-10-16 | 2003-05-06 | Micron Technology, Inc. | Removal of photoresist through the use of hot deionized water bath, water vapor and ozone gas |
US20020174882A1 (en) * | 2001-05-25 | 2002-11-28 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and substrate processing method |
US6878216B2 (en) * | 2001-09-03 | 2005-04-12 | Tokyo Electron Limited | Substrate processing method and substrate processing system |
KR100456527B1 (ko) * | 2001-12-11 | 2004-11-09 | 삼성전자주식회사 | 마란고니 효과를 증대시키기 위한 건조 장비 및 건조 방법 |
JP4076365B2 (ja) | 2002-04-09 | 2008-04-16 | シャープ株式会社 | 半導体洗浄装置 |
JP2004063513A (ja) | 2002-07-25 | 2004-02-26 | Matsushita Electric Ind Co Ltd | 半導体基板の洗浄乾燥方法 |
JP3964862B2 (ja) | 2003-12-22 | 2007-08-22 | 島田理化工業株式会社 | 洗浄乾燥装置および洗浄乾燥方法 |
-
2005
- 2005-11-21 JP JP2005335836A patent/JP4666494B2/ja not_active Expired - Fee Related
-
2006
- 2006-11-07 KR KR1020060109440A patent/KR100778957B1/ko not_active IP Right Cessation
- 2006-11-15 US US11/560,121 patent/US8178821B2/en not_active Expired - Fee Related
- 2006-11-16 TW TW095142361A patent/TWI349958B/zh not_active IP Right Cessation
- 2006-11-21 CN CNB2006101493980A patent/CN100559550C/zh not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07204592A (ja) * | 1994-01-25 | 1995-08-08 | Chiyoda Manufacturing Co Ltd | 超音波処理を行なう容器中の液体の温度調節方法と装置 |
JPH08264265A (ja) * | 1995-03-23 | 1996-10-11 | Sekisui Plastics Co Ltd | ヒータおよびその使用方法 |
JPH08334235A (ja) * | 1995-06-09 | 1996-12-17 | Matsushita Electric Ind Co Ltd | 加熱装置 |
JPH1197409A (ja) * | 1997-07-15 | 1999-04-09 | Samsung Electron Co Ltd | 減圧式乾燥装置及びこれを用いる半導体装置の乾燥方法 |
JPH11121429A (ja) * | 1997-10-08 | 1999-04-30 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置およびそれを備えた基板処理装置 |
JP2002317069A (ja) * | 2001-04-18 | 2002-10-31 | Potto Japan Kk | 廃プラスチックの減容溶融機 |
JP2003075067A (ja) * | 2002-05-30 | 2003-03-12 | Dainippon Screen Mfg Co Ltd | 基板の洗浄・乾燥処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010098038A (ja) * | 2008-10-15 | 2010-04-30 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置及びその温調方法 |
Also Published As
Publication number | Publication date |
---|---|
US8178821B2 (en) | 2012-05-15 |
KR20070053611A (ko) | 2007-05-25 |
US20070113744A1 (en) | 2007-05-24 |
JP4666494B2 (ja) | 2011-04-06 |
TWI349958B (en) | 2011-10-01 |
KR100778957B1 (ko) | 2007-11-22 |
CN100559550C (zh) | 2009-11-11 |
CN1971841A (zh) | 2007-05-30 |
TW200741839A (en) | 2007-11-01 |
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