JP2007059596A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2007059596A JP2007059596A JP2005242641A JP2005242641A JP2007059596A JP 2007059596 A JP2007059596 A JP 2007059596A JP 2005242641 A JP2005242641 A JP 2005242641A JP 2005242641 A JP2005242641 A JP 2005242641A JP 2007059596 A JP2007059596 A JP 2007059596A
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- semiconductor chip
- chip
- dam
- corner
- semiconductor device
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 78
- 229910000679 solder Inorganic materials 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000013508 migration Methods 0.000 description 3
- 230000005012 migration Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Abstract
【解決手段】 プリント配線基板の表面に半導体チップがフリップチップ接続された半導体装置であって、
基板表面において、アンダーフィル流出範囲制限用の枠状ダムが半導体チップの全周を取り囲み、枠状ダムの外側に半導体チップ用の外部接続端子としてのはんだボールが配設されており、フリップチップ接続箇所およびはんだボール配設箇所を除く基板表面がソルダーレジスト層で覆われており、
半導体チップのコーナー部と、これに対面する上記枠状ダムのコーナー部との間の領域内において、ソルダーレジスト層に掘り込みを設けた。
【選択図】 図3
Description
上記基板表面において、アンダーフィル流出範囲制限用の枠状ダムが該半導体チップの全周を取り囲み、該枠状ダムの外側に該半導体チップ用の外部接続端子が配設されており、上記フリップチップ接続箇所および上記外部接続端子配設箇所を除く上記基板表面がソルダーレジスト層で覆われており、
上記半導体チップのコーナー部と、これに対面する上記枠状ダムのコーナー部との間の領域内において、上記ソルダーレジスト層に掘り込みを設けたことを特徴とする。
ソルダーレジスト層22の厚さ:10〜20μm
半導体チップ14と基板12との間隙28:15〜35μm
(厳密には半導体チップ14とソルダーレジスト層22との間隙)
ダム16:厚さ10〜20μm、幅50〜100μm
フリップチップ接続部掘り込み26の幅W:300〜500μm
一般にダム16は、ソルダーレジスト層22と同様の材質の樹脂で同様の方法により形成するので、厚さもソルダーレジスト層22と同等の10〜20μmとする。ただし、ダム16の材質、形成方法、厚さを上記のように限定する必要はない。
14 半導体チップ
16 枠状ダム
18 はんだボール
18A 増設はんだボール
20 アンダーフィル
22 ソルダーレジスト層
24 コーナー部掘り込み
26 フリップチップ接続部掘り込み
28 チップ/基板間の間隙
50 半導体装置
Claims (2)
- プリント配線基板の表面に半導体チップがフリップチップ接続された半導体装置であって、
上記基板表面において、アンダーフィル流出範囲制限用の枠状ダムが該半導体チップの全周を取り囲み、該枠状ダムの外側に該半導体チップ用の外部接続端子が配設されており、上記フリップチップ接続箇所および上記外部接続端子配設箇所を除く上記基板表面がソルダーレジスト層で覆われており、
上記半導体チップのコーナー部と、これに対面する上記枠状ダムのコーナー部との間の領域内において、上記ソルダーレジスト層に掘り込みを設けたことを特徴とする半導体装置。 - 請求項1において、上記外部接続端子がはんだボールであることを特徴とする半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005242641A JP4535969B2 (ja) | 2005-08-24 | 2005-08-24 | 半導体装置 |
US11/463,724 US7432602B2 (en) | 2005-08-24 | 2006-08-10 | Semiconductor device |
KR1020060076559A KR101070277B1 (ko) | 2005-08-24 | 2006-08-14 | 반도체 장치 |
CNB2006101119278A CN100508177C (zh) | 2005-08-24 | 2006-08-24 | 半导体器件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005242641A JP4535969B2 (ja) | 2005-08-24 | 2005-08-24 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007059596A true JP2007059596A (ja) | 2007-03-08 |
JP4535969B2 JP4535969B2 (ja) | 2010-09-01 |
Family
ID=37778765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005242641A Active JP4535969B2 (ja) | 2005-08-24 | 2005-08-24 | 半導体装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7432602B2 (ja) |
JP (1) | JP4535969B2 (ja) |
KR (1) | KR101070277B1 (ja) |
CN (1) | CN100508177C (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009277915A (ja) * | 2008-05-15 | 2009-11-26 | Shinko Electric Ind Co Ltd | 配線基板 |
US7999368B2 (en) | 2008-09-29 | 2011-08-16 | Samsung Electronics Co., Ltd. | Semiconductor package having ink-jet type dam and method of manufacturing the same |
US8021932B2 (en) | 2008-05-29 | 2011-09-20 | Renesas Electronics Corporation | Semiconductor device, and manufacturing method therefor |
JP2012054353A (ja) * | 2010-08-31 | 2012-03-15 | Toshiba Corp | 半導体装置 |
US9474164B2 (en) | 2013-03-19 | 2016-10-18 | Seiko Epson Corporation | Module, electronic apparatus, moving object, and method of manufacturing module |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6673649B1 (en) * | 2002-07-05 | 2004-01-06 | Micron Technology, Inc. | Microelectronic device packages and methods for controlling the disposition of non-conductive materials in such packages |
US8081484B2 (en) | 2006-11-30 | 2011-12-20 | Cisco Technology, Inc. | Method and apparatus for supporting a computer chip on a printed circuit board assembly |
JP5356647B2 (ja) * | 2006-12-25 | 2013-12-04 | 新光電気工業株式会社 | 実装基板及び電子装置 |
JP5211493B2 (ja) * | 2007-01-30 | 2013-06-12 | 富士通セミコンダクター株式会社 | 配線基板及び半導体装置 |
JP2009206286A (ja) * | 2008-02-27 | 2009-09-10 | Kyocera Corp | プリント基板及びこれを用いた携帯電子機器 |
KR101019151B1 (ko) * | 2008-06-02 | 2011-03-04 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
KR101627574B1 (ko) * | 2008-09-22 | 2016-06-21 | 쿄세라 코포레이션 | 배선 기판 및 그 제조 방법 |
JP5210839B2 (ja) * | 2008-12-10 | 2013-06-12 | 新光電気工業株式会社 | 配線基板及びその製造方法 |
JP5117371B2 (ja) * | 2008-12-24 | 2013-01-16 | 新光電気工業株式会社 | 半導体装置およびその製造方法 |
JP5463092B2 (ja) * | 2009-07-07 | 2014-04-09 | アルプス電気株式会社 | 電子回路ユニットおよびその製造方法 |
US8441123B1 (en) | 2009-08-13 | 2013-05-14 | Amkor Technology, Inc. | Semiconductor device with metal dam and fabricating method |
US8952552B2 (en) * | 2009-11-19 | 2015-02-10 | Qualcomm Incorporated | Semiconductor package assembly systems and methods using DAM and trench structures |
US8624364B2 (en) * | 2010-02-26 | 2014-01-07 | Stats Chippac Ltd. | Integrated circuit packaging system with encapsulation connector and method of manufacture thereof |
US8399300B2 (en) * | 2010-04-27 | 2013-03-19 | Stats Chippac, Ltd. | Semiconductor device and method of forming adjacent channel and DAM material around die attach area of substrate to control outward flow of underfill material |
JP2012084840A (ja) * | 2010-09-13 | 2012-04-26 | Renesas Electronics Corp | 半導体装置及びその製造方法 |
US8304880B2 (en) | 2010-09-14 | 2012-11-06 | Stats Chippac Ltd. | Integrated circuit packaging system with package-on-package and method of manufacture thereof |
US9497861B2 (en) | 2012-12-06 | 2016-11-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and apparatus for package with interposers |
US8994176B2 (en) * | 2012-12-13 | 2015-03-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and apparatus for package with interposers |
JP6044473B2 (ja) * | 2013-06-28 | 2016-12-14 | 株式会社デンソー | 電子装置およびその電子装置の製造方法 |
US9343431B2 (en) | 2013-07-10 | 2016-05-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dam structure for enhancing joint yield in bonding processes |
US9368458B2 (en) | 2013-07-10 | 2016-06-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Die-on-interposer assembly with dam structure and method of manufacturing the same |
US20220028704A1 (en) * | 2018-12-18 | 2022-01-27 | Octavo Systems Llc | Molded packages in a molded device |
US11152226B2 (en) | 2019-10-15 | 2021-10-19 | International Business Machines Corporation | Structure with controlled capillary coverage |
TWI713166B (zh) * | 2020-02-17 | 2020-12-11 | 頎邦科技股份有限公司 | 晶片封裝構造及其電路板 |
Citations (1)
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JP2005175113A (ja) * | 2003-12-10 | 2005-06-30 | Fdk Corp | フリップチップ実装用プリント配線基板 |
Family Cites Families (9)
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JPH065697B2 (ja) | 1992-05-21 | 1994-01-19 | イビデン株式会社 | 半導体チップ搭載用プリント配線板 |
JP3461073B2 (ja) | 1995-12-08 | 2003-10-27 | 株式会社デンソー | ベアチップ封止方法 |
WO1997045868A1 (en) * | 1996-05-27 | 1997-12-04 | Dai Nippon Printing Co., Ltd. | Circuit member for semiconductor device, semiconductor device using the same, and method for manufacturing them |
JP2001244384A (ja) | 2000-02-28 | 2001-09-07 | Matsushita Electric Works Ltd | ベアチップ搭載プリント配線基板 |
US6614122B1 (en) * | 2000-09-29 | 2003-09-02 | Intel Corporation | Controlling underfill flow locations on high density packages using physical trenches and dams |
EP1381081A4 (en) * | 2001-04-09 | 2008-02-27 | Sumitomo Metal Smi Electronics | RADIATION TYPE BGA HOUSING AND PRODUCTION PRODUCTION THEREOF |
JP3651413B2 (ja) * | 2001-05-21 | 2005-05-25 | 日立電線株式会社 | 半導体装置用テープキャリア及びそれを用いた半導体装置、半導体装置用テープキャリアの製造方法及び半導体装置の製造方法 |
JP4963148B2 (ja) * | 2001-09-18 | 2012-06-27 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
US7023084B2 (en) * | 2003-03-18 | 2006-04-04 | Sumitomo Metal (Smi) Electronics Devices Inc. | Plastic packaging with high heat dissipation and method for the same |
-
2005
- 2005-08-24 JP JP2005242641A patent/JP4535969B2/ja active Active
-
2006
- 2006-08-10 US US11/463,724 patent/US7432602B2/en active Active
- 2006-08-14 KR KR1020060076559A patent/KR101070277B1/ko active IP Right Grant
- 2006-08-24 CN CNB2006101119278A patent/CN100508177C/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005175113A (ja) * | 2003-12-10 | 2005-06-30 | Fdk Corp | フリップチップ実装用プリント配線基板 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009277915A (ja) * | 2008-05-15 | 2009-11-26 | Shinko Electric Ind Co Ltd | 配線基板 |
US8021932B2 (en) | 2008-05-29 | 2011-09-20 | Renesas Electronics Corporation | Semiconductor device, and manufacturing method therefor |
US8222738B2 (en) | 2008-05-29 | 2012-07-17 | Renesas Electronics Corporation | Semiconductor device, and manufacturing method therefor |
US7999368B2 (en) | 2008-09-29 | 2011-08-16 | Samsung Electronics Co., Ltd. | Semiconductor package having ink-jet type dam and method of manufacturing the same |
JP2012054353A (ja) * | 2010-08-31 | 2012-03-15 | Toshiba Corp | 半導体装置 |
US8759971B2 (en) | 2010-08-31 | 2014-06-24 | Kabushiki Kaisha Toshiba | Semiconductor apparatus |
US9474164B2 (en) | 2013-03-19 | 2016-10-18 | Seiko Epson Corporation | Module, electronic apparatus, moving object, and method of manufacturing module |
Also Published As
Publication number | Publication date |
---|---|
US20070045870A1 (en) | 2007-03-01 |
KR101070277B1 (ko) | 2011-10-06 |
JP4535969B2 (ja) | 2010-09-01 |
CN100508177C (zh) | 2009-07-01 |
KR20070023519A (ko) | 2007-02-28 |
CN1921101A (zh) | 2007-02-28 |
US7432602B2 (en) | 2008-10-07 |
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