JP2006502942A - プラズマ・ディスプレイ・パネルにおける感光性隔壁ペースト製造方法 - Google Patents

プラズマ・ディスプレイ・パネルにおける感光性隔壁ペースト製造方法 Download PDF

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Publication number
JP2006502942A
JP2006502942A JP2004525866A JP2004525866A JP2006502942A JP 2006502942 A JP2006502942 A JP 2006502942A JP 2004525866 A JP2004525866 A JP 2004525866A JP 2004525866 A JP2004525866 A JP 2004525866A JP 2006502942 A JP2006502942 A JP 2006502942A
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JP
Japan
Prior art keywords
photosensitive
barrier rib
powder
partition
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004525866A
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English (en)
Japanese (ja)
Inventor
イ スン パク
サン ウォン ユン
シン ヘ ベク
ヒョンソク チェ
ムシキ イム
ソンウ パク
ボンチョル キム
キョン ソク シン
ヒョシキ イ
Original Assignee
ウルトラプラズマディスプレイコーポレーション
イルドン ケミカル コー リミテッド
イ スン パク
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by ウルトラプラズマディスプレイコーポレーション, イルドン ケミカル コー リミテッド, イ スン パク filed Critical ウルトラプラズマディスプレイコーポレーション
Publication of JP2006502942A publication Critical patent/JP2006502942A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
JP2004525866A 2002-08-02 2003-08-02 プラズマ・ディスプレイ・パネルにおける感光性隔壁ペースト製造方法 Pending JP2006502942A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2002-0045812A KR100497763B1 (ko) 2002-08-02 2002-08-02 퓸드 실리카 입자로 표면 처리된 격벽 분말을 포함하는감광성 격벽 페이스트 조성물 및 그의 제조방법, 그리고그를 사용한 플라즈마 디스플레이 패널의 격벽 형성방법
PCT/KR2003/001562 WO2004012854A2 (en) 2002-08-02 2003-08-02 Method for preparing photosensitive barrier rib paste composition for fabricating plasma display pannel

Publications (1)

Publication Number Publication Date
JP2006502942A true JP2006502942A (ja) 2006-01-26

Family

ID=36788751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004525866A Pending JP2006502942A (ja) 2002-08-02 2003-08-02 プラズマ・ディスプレイ・パネルにおける感光性隔壁ペースト製造方法

Country Status (5)

Country Link
JP (1) JP2006502942A (ko)
KR (1) KR100497763B1 (ko)
CN (1) CN1791561A (ko)
AU (1) AU2003248494A1 (ko)
WO (1) WO2004012854A2 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100658714B1 (ko) * 2004-11-30 2006-12-15 삼성에스디아이 주식회사 감광성 조성물, 이를 포함하는 격벽 형성용 감광성페이스트 조성물, 및 이를 이용한 플라즈마 디스플레이패널용 격벽의 제조방법.
KR100927610B1 (ko) 2005-01-05 2009-11-23 삼성에스디아이 주식회사 감광성 페이스트 조성물, 및 이를 이용하여 제조된플라즈마 디스플레이 패널
KR100763389B1 (ko) * 2005-07-01 2007-10-05 엘지전자 주식회사 플라즈마 디스플레이 패널 및 그 제조방법
KR100730044B1 (ko) 2005-12-06 2007-06-20 엘지전자 주식회사 격벽용 슬러리, 그린시트 및 플라즈마 디스플레이 패널의격벽 제조방법
KR100754485B1 (ko) * 2005-12-14 2007-09-03 엘지전자 주식회사 플라즈마 디스플레이 패널의 유전체층 제조방법
KR100730042B1 (ko) * 2005-12-29 2007-06-20 엘지전자 주식회사 플라즈마 디스플레이 패널의 격벽용 페이스트 조성물,그린시트, 및 이를 이용한 플라즈마 디스플레이 패널
JP6017110B2 (ja) * 2007-05-29 2016-11-09 ティーピーケイ ホールディング カンパニー リミテッド 粒子含有表面とその関連方法
CN101226332B (zh) * 2007-12-26 2011-02-16 彩虹集团公司 一种障壁浆料的制备方法
KR20090080756A (ko) * 2008-01-22 2009-07-27 삼성에스디아이 주식회사 감광성 페이스트 조성물, 이를 이용하여 제조된 플라즈마디스플레이 패널의 격벽 및 이를 포함하는 플라즈마디스플레이 패널
KR101660813B1 (ko) 2008-08-21 2016-10-10 티피케이 홀딩 컴퍼니 리미티드 개선된 표면, 코팅 및 관련 방법
CH703054A2 (de) * 2010-04-16 2011-10-31 Christine Hardman Reversible lichtempfindliche nanoskalierte Aussenschicht und Verfahren zu deren Herstellung.
EP3651212A3 (en) 2010-08-07 2020-06-24 Tpk Holding Co., Ltd Device components with surface-embedded additives and related manufacturing methods

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3829959B2 (ja) * 1997-10-07 2006-10-04 日本電気硝子株式会社 プラズマディスプレーパネル用誘電体形成材料
JPH11217238A (ja) * 1998-02-02 1999-08-10 Jsr Corp ガラスペースト組成物、転写フィルムおよびプラズマディスプレイパネル
KR20000015470A (ko) * 1998-08-29 2000-03-15 박이순 플라즈마 디스플레이 패널용 광중합형 감광성 격벽 페이스트 조성물 및 이를 이용한 격벽 형성방법
JP2000119038A (ja) * 1998-10-12 2000-04-25 Nippon Electric Glass Co Ltd プラズマディスプレーパネル用材料
JP3619035B2 (ja) * 1998-11-30 2005-02-09 富士フイルムアーチ株式会社 プラズマディスプレーパネル用の隔壁形成方法及び組成物
KR20010018259A (ko) * 1999-08-18 2001-03-05 박선우 플라즈마 디스플레이 패널용 감광성 격벽 페이스트 조성물 및이를 이용한 격벽 형성방법
JP3384400B2 (ja) * 2000-05-25 2003-03-10 凸版印刷株式会社 プラズマディスプレイパネルの隔壁形成用ガラスペースト組成物、プラズマディスプレイパネルの背面基板及びその製造方法、プラズマディスプレイパネルおよびその製造方法
JP2002367519A (ja) * 2001-06-04 2002-12-20 Nippon Electric Glass Co Ltd プラズマディスプレイパネル用隔壁材料
KR20030017247A (ko) * 2001-08-24 2003-03-03 주식회사 유피디 플라즈마 디스플레이 패널의 격벽 형성용 페이스트 조성물및 그를 사용한 격벽 형성방법
KR100452742B1 (ko) * 2002-04-04 2004-10-12 엘지전자 주식회사 수용액의 후막 식각에 의한 플라즈마 디스플레이 소자의격벽 제조방법 및 그것의 후막 조성물

Also Published As

Publication number Publication date
WO2004012854A2 (en) 2004-02-12
WO2004012854A3 (en) 2008-03-13
KR20040012298A (ko) 2004-02-11
AU2003248494A8 (en) 2004-02-23
AU2003248494A1 (en) 2004-02-23
CN1791561A (zh) 2006-06-21
KR100497763B1 (ko) 2005-08-03

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